ATE344938T1 - Einrichtung zum transferieren eines musters auf ein objekt - Google Patents

Einrichtung zum transferieren eines musters auf ein objekt

Info

Publication number
ATE344938T1
ATE344938T1 AT01915982T AT01915982T ATE344938T1 AT E344938 T1 ATE344938 T1 AT E344938T1 AT 01915982 T AT01915982 T AT 01915982T AT 01915982 T AT01915982 T AT 01915982T AT E344938 T1 ATE344938 T1 AT E344938T1
Authority
AT
Austria
Prior art keywords
stamp
contacting
transferring
pattern
contacting means
Prior art date
Application number
AT01915982T
Other languages
German (de)
English (en)
Inventor
Lars Montelius
Babak Heidari
Thord Stjernholm
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Application granted granted Critical
Publication of ATE344938T1 publication Critical patent/ATE344938T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Sewing Machines And Sewing (AREA)
  • Auxiliary Devices For And Details Of Packaging Control (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Measuring Fluid Pressure (AREA)
AT01915982T 2000-03-15 2001-03-14 Einrichtung zum transferieren eines musters auf ein objekt ATE344938T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0000848A SE515962C2 (sv) 2000-03-15 2000-03-15 Anordning för överföring av mönster till objekt

Publications (1)

Publication Number Publication Date
ATE344938T1 true ATE344938T1 (de) 2006-11-15

Family

ID=20278807

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01915982T ATE344938T1 (de) 2000-03-15 2001-03-14 Einrichtung zum transferieren eines musters auf ein objekt

Country Status (9)

Country Link
US (1) US7165957B2 (sv)
EP (1) EP1264215B1 (sv)
JP (1) JP3833537B2 (sv)
CN (1) CN1211706C (sv)
AT (1) ATE344938T1 (sv)
AU (1) AU2001242926A1 (sv)
DE (1) DE60124377T2 (sv)
SE (1) SE515962C2 (sv)
WO (1) WO2001069317A1 (sv)

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AU2001277907A1 (en) 2000-07-17 2002-01-30 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
KR101031528B1 (ko) 2000-10-12 2011-04-27 더 보드 오브 리전츠 오브 더 유니버시티 오브 텍사스 시스템 실온 저압 마이크로- 및 나노- 임프린트 리소그래피용템플릿
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US20030186405A1 (en) * 2002-04-01 2003-10-02 The Ohio State University Research Foundation Micro/nano-embossing process and useful applications thereof
EP1497102B1 (en) * 2002-04-24 2009-08-19 Obducat AB Device and method for transferring a pattern to a substrate
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
AU2003241245A1 (en) * 2002-06-07 2003-12-22 Obducat Ab Method for transferring a pattern
US7252492B2 (en) 2002-06-20 2007-08-07 Obducat Ab Devices and methods for aligning a stamp and a substrate
ATE346752T1 (de) 2002-06-20 2006-12-15 Obducat Ab Formwerkzeug, verfahren zur herstellung eines formwerkzeugs und durch verwendung des formwerkzeugs gebildetes speichermedium
US7179079B2 (en) 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
WO2004021083A1 (en) * 2002-08-27 2004-03-11 Obducat Ab Device for transferring a pattern to an object
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US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US6929762B2 (en) 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
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US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US7122079B2 (en) 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
TW568349U (en) 2003-05-02 2003-12-21 Ind Tech Res Inst Parallelism adjusting device for nano-transferring
US6805054B1 (en) 2003-05-14 2004-10-19 Molecular Imprints, Inc. Method, system and holder for transferring templates during imprint lithography processes
US6951173B1 (en) 2003-05-14 2005-10-04 Molecular Imprints, Inc. Assembly and method for transferring imprint lithography templates
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
JP2005064492A (ja) * 2003-07-28 2005-03-10 Kyocera Corp 単結晶サファイア基板とその製造方法及び半導体発光素子
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US7019835B2 (en) * 2004-02-19 2006-03-28 Molecular Imprints, Inc. Method and system to measure characteristics of a film disposed on a substrate
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KR101264673B1 (ko) * 2005-06-24 2013-05-20 엘지디스플레이 주식회사 소프트 몰드를 이용한 미세 패턴 형성방법
US20070023976A1 (en) * 2005-07-26 2007-02-01 Asml Netherlands B.V. Imprint lithography
JP4330168B2 (ja) * 2005-09-06 2009-09-16 キヤノン株式会社 モールド、インプリント方法、及びチップの製造方法
JP4533358B2 (ja) 2005-10-18 2010-09-01 キヤノン株式会社 インプリント方法、インプリント装置およびチップの製造方法
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
JP4923924B2 (ja) * 2005-11-22 2012-04-25 コニカミノルタホールディングス株式会社 インプリント装置及びインプリント方法
US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
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Also Published As

Publication number Publication date
JP2003527248A (ja) 2003-09-16
US20030170053A1 (en) 2003-09-11
EP1264215A1 (en) 2002-12-11
SE0000848L (sv) 2001-09-16
SE0000848D0 (sv) 2000-03-15
JP3833537B2 (ja) 2006-10-11
CN1211706C (zh) 2005-07-20
EP1264215B1 (en) 2006-11-08
HK1058553A1 (en) 2004-05-21
AU2001242926A1 (en) 2001-09-24
WO2001069317A1 (en) 2001-09-20
DE60124377T2 (de) 2007-09-06
SE515962C2 (sv) 2001-11-05
DE60124377D1 (de) 2006-12-21
CN1437714A (zh) 2003-08-20
US7165957B2 (en) 2007-01-23

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