ATE488783T1 - Lösungsmittelbeständige copolymere - Google Patents

Lösungsmittelbeständige copolymere

Info

Publication number
ATE488783T1
ATE488783T1 AT03745306T AT03745306T ATE488783T1 AT E488783 T1 ATE488783 T1 AT E488783T1 AT 03745306 T AT03745306 T AT 03745306T AT 03745306 T AT03745306 T AT 03745306T AT E488783 T1 ATE488783 T1 AT E488783T1
Authority
AT
Austria
Prior art keywords
unit
group
cyclic
urea
mol
Prior art date
Application number
AT03745306T
Other languages
English (en)
Inventor
Mathias Jarek
Original Assignee
Kodak Graphic Comm Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Graphic Comm Gmbh filed Critical Kodak Graphic Comm Gmbh
Application granted granted Critical
Publication of ATE488783T1 publication Critical patent/ATE488783T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Glass Compositions (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Electronic Switches (AREA)
AT03745306T 2002-03-13 2003-03-13 Lösungsmittelbeständige copolymere ATE488783T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/096,651 US6645689B2 (en) 2002-03-13 2002-03-13 Solvent resistant polymers with improved bakeability features
PCT/EP2003/003559 WO2003083577A2 (en) 2002-03-13 2003-03-13 Solvent resistant copolymers

Publications (1)

Publication Number Publication Date
ATE488783T1 true ATE488783T1 (de) 2010-12-15

Family

ID=28673491

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03745306T ATE488783T1 (de) 2002-03-13 2003-03-13 Lösungsmittelbeständige copolymere

Country Status (5)

Country Link
US (2) US6645689B2 (de)
EP (1) EP1483623B1 (de)
AT (1) ATE488783T1 (de)
DE (1) DE60334975D1 (de)
WO (1) WO2003083577A2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7163777B2 (en) * 2001-09-07 2007-01-16 Eastman Kodak Company Thermally sensitive imageable element
US6911293B2 (en) * 2002-04-11 2005-06-28 Clariant Finance (Bvi) Limited Photoresist compositions comprising acetals and ketals as solvents
US7049045B2 (en) * 2003-08-14 2006-05-23 Kodak Polychrome Graphics Llc Multilayer imageable elements
EP1577330B1 (de) * 2003-08-22 2012-02-15 Okamoto Chemical Industry Co., Ltd Copolymer, bilderzeugende Zusammensetzung und Platte für Lithographie
US6893783B2 (en) * 2003-10-08 2005-05-17 Kodak Polychrome Graphics Lld Multilayer imageable elements
US7060416B2 (en) * 2004-04-08 2006-06-13 Eastman Kodak Company Positive-working, thermally sensitive imageable element
US7186482B2 (en) 2004-06-04 2007-03-06 Eastman Kodak Company Multilayer imageable elements
US7014983B1 (en) 2004-10-05 2006-03-21 Eastman Kodak Company Multilayer imageable element
US6969579B1 (en) 2004-12-21 2005-11-29 Eastman Kodak Company Solvent resistant imageable element
US7255056B2 (en) * 2005-03-04 2007-08-14 Lockheed Martin Corporation Stable, high-speed marine vessel
US20060210917A1 (en) * 2005-03-18 2006-09-21 Kodak Polychrome Graphics Llc Positive-working, thermally sensitive imageable element
US7291440B2 (en) * 2005-05-16 2007-11-06 Eastman Kodak Company Bakeable multi-layer imageable element
US7144661B1 (en) 2005-11-01 2006-12-05 Eastman Kodak Company Multilayer imageable element with improved chemical resistance
US20100227269A1 (en) 2009-03-04 2010-09-09 Simpson Christopher D Imageable elements with colorants
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2871223A (en) * 1954-11-01 1959-01-27 Rohm & Haas Polymers, copolymers, and processes for preparing them
JPH01291245A (ja) 1988-05-18 1989-11-22 Konica Corp 感光性組成物
JP2547883B2 (ja) 1990-04-06 1996-10-23 タムラ化研株式会社 感光性樹脂組成物
DE4334178A1 (de) * 1993-10-07 1995-04-13 Basf Ag Wäßrige Polymerisatzubereitungen
JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
EP0689098B1 (de) * 1994-06-22 2000-08-16 Ciba SC Holding AG Positiv-Photoresist
US5731127A (en) * 1995-04-11 1998-03-24 Dainippon Ink And Chemicals, Inc. Photosensitive composition and photosensitive planographic printing plate having a resin with urea bonds in the side chain
JP3289655B2 (ja) 1997-09-12 2002-06-10 国産電機株式会社 内燃機関の回転方向切換制御方法
DE19803564A1 (de) * 1998-01-30 1999-08-05 Agfa Gevaert Ag Polymere mit Einheiten aus N-substituiertem Maleimid und deren Verwendung in strahlungsempfindlichen Gemischen
EP1074887B1 (de) * 1999-08-02 2004-10-06 Kodak Polychrome Graphics GmbH Strahlungsempfindliche Zusammensetzungen für Druckplatten mit verbesserter chemischer Beständigkeit und Entwickler-Beständigkeit und mit diesen Zusammensetzungen hergestellte Druckplatten

Also Published As

Publication number Publication date
DE60334975D1 (de) 2010-12-30
WO2003083577A3 (en) 2004-03-25
EP1483623B1 (de) 2010-11-17
EP1483623A2 (de) 2004-12-08
WO2003083577A2 (en) 2003-10-09
US20030194633A1 (en) 2003-10-16
USRE41083E1 (en) 2010-01-19
US6645689B2 (en) 2003-11-11

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Legal Events

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