BE783709A - Procede de formation d'une couche enfouie par implantation d'ions - Google Patents
Procede de formation d'une couche enfouie par implantation d'ionsInfo
- Publication number
- BE783709A BE783709A BE783709A BE783709A BE783709A BE 783709 A BE783709 A BE 783709A BE 783709 A BE783709 A BE 783709A BE 783709 A BE783709 A BE 783709A BE 783709 A BE783709 A BE 783709A
- Authority
- BE
- Belgium
- Prior art keywords
- implantation
- ions
- forming
- buried layer
- buried
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W15/00—Highly-doped buried regions of integrated devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6302—Non-deposition formation processes
- H10P14/6304—Formation by oxidation, e.g. oxidation of the substrate
- H10P14/6306—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials
- H10P14/6308—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials of Group IV semiconductors
- H10P14/6309—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials of Group IV semiconductors of silicon in uncombined form, i.e. pure silicon
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6302—Non-deposition formation processes
- H10P14/6322—Formation by thermal treatments
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W15/00—Highly-doped buried regions of integrated devices
- H10W15/01—Manufacture or treatment
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14625271A | 1971-05-24 | 1971-05-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE783709A true BE783709A (fr) | 1972-09-18 |
Family
ID=22516512
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE783709A BE783709A (fr) | 1971-05-24 | 1972-05-19 | Procede de formation d'une couche enfouie par implantation d'ions |
Country Status (11)
| Country | Link |
|---|---|
| JP (1) | JPS5138582B1 (fr) |
| BE (1) | BE783709A (fr) |
| CA (1) | CA921620A (fr) |
| CH (1) | CH535494A (fr) |
| DE (1) | DE2224467B2 (fr) |
| FR (1) | FR2138932B1 (fr) |
| GB (1) | GB1397338A (fr) |
| HK (1) | HK36076A (fr) |
| IT (1) | IT959298B (fr) |
| NL (1) | NL159531B (fr) |
| SE (1) | SE372137B (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2206994A (en) * | 1987-06-08 | 1989-01-18 | Philips Electronic Associated | Semiconductor device |
-
1971
- 1971-12-06 CA CA129402A patent/CA921620A/en not_active Expired
-
1972
- 1972-05-16 SE SE7206397A patent/SE372137B/xx unknown
- 1972-05-19 GB GB2358472A patent/GB1397338A/en not_active Expired
- 1972-05-19 BE BE783709A patent/BE783709A/fr not_active IP Right Cessation
- 1972-05-19 IT IT68603/72A patent/IT959298B/it active
- 1972-05-19 DE DE2224467A patent/DE2224467B2/de not_active Withdrawn
- 1972-05-23 CH CH756172A patent/CH535494A/de not_active IP Right Cessation
- 1972-05-23 FR FR7218367A patent/FR2138932B1/fr not_active Expired
- 1972-05-23 NL NL7206913.A patent/NL159531B/xx not_active IP Right Cessation
- 1972-05-24 JP JP47050844A patent/JPS5138582B1/ja active Pending
-
1976
- 1976-06-10 HK HK360/76*UA patent/HK36076A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CA921620A (en) | 1973-02-20 |
| FR2138932B1 (fr) | 1975-08-29 |
| HK36076A (en) | 1976-06-18 |
| FR2138932A1 (fr) | 1973-01-05 |
| CH535494A (de) | 1973-03-31 |
| DE2224467A1 (de) | 1972-12-07 |
| NL159531B (nl) | 1979-02-15 |
| NL7206913A (fr) | 1972-11-28 |
| JPS5138582B1 (fr) | 1976-10-22 |
| GB1397338A (en) | 1975-06-11 |
| SE372137B (fr) | 1974-12-09 |
| IT959298B (it) | 1973-11-10 |
| DE2224467B2 (de) | 1974-03-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| BE808532A (fr) | Procede de formation d'une couche d'oxyde metallique | |
| BE779059A (fr) | Procede de formation d'un joint rigide | |
| BE783679A (fr) | Procede de production d'hologrammes | |
| FR2328285A1 (fr) | Procede de formation d'une couche electriquement isolante pratiquement plane | |
| RO63885A (fr) | Procede pour empecher la formation du couche de sulfate de calcium | |
| BE831381A (fr) | Procede de dopage d'une couche de semi-conducteur | |
| BE792589A (fr) | Procede d'obtention de structures semiconductrices par implantation d'ions | |
| BE802578A (fr) | Procede de production d'une preparation d'enzyme | |
| BE781466A (fr) | Procede de preparation d'hydroxyaldehydes | |
| BE821512A (fr) | Procede de formation d'une couche de cuivre resistant a brasure | |
| RO63547A (fr) | Procede pour la preparation d'elastomeres dieniques | |
| BE777908A (fr) | Procede permettant la fabrication d'un ballast inductif | |
| BE780893A (fr) | Procede de fabrication d'une electrode | |
| BE790181A (fr) | Procede pour la preparation de trichloromethansulfenylchlorure | |
| BE783709A (fr) | Procede de formation d'une couche enfouie par implantation d'ions | |
| BE773146A (fr) | Procede de production de materiels reprographiques par application d'une couche photosensible par evaporation | |
| ZA732036B (en) | Process for the manufacture of alkoxylated n-methylol compounds | |
| BE794389A (fr) | Procede de preparation de 3-(carbamoyloxymethyl primaire)-cephalosporines | |
| BE804640A (fr) | Procede pour la formation de verre phosphate | |
| BE766635A (fr) | Procede pour former les coins des joints d'expansion de type omega | |
| BE780200A (fr) | Procede de preparation continue de methylal | |
| SU440700A1 (ru) | Способ формировани микрованны дл изготовлени микропровода | |
| BE814714A (fr) | Procede de formation d'une couche d'oxyde de fer suivant un dessin | |
| BE786966R (fr) | Procede pour la preparation de | |
| BE763769A (fr) | Procede pour realiser une couche isolante permettant d'etancheifier desconstructions |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RE20 | Patent expired |
Owner name: WESTERN ELECTRIC CY INC. Effective date: 19920519 |