CH466703A - Process for the production of photographic resist images or printing plates - Google Patents

Process for the production of photographic resist images or printing plates

Info

Publication number
CH466703A
CH466703A CH790666A CH790666A CH466703A CH 466703 A CH466703 A CH 466703A CH 790666 A CH790666 A CH 790666A CH 790666 A CH790666 A CH 790666A CH 466703 A CH466703 A CH 466703A
Authority
CH
Switzerland
Prior art keywords
production
printing plates
resist images
photographic resist
photographic
Prior art date
Application number
CH790666A
Other languages
German (de)
Inventor
Leopold Laridon Urbain
Albert Delzenne Gerard
Original Assignee
Agfa Gevaert Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert Ag filed Critical Agfa Gevaert Ag
Publication of CH466703A publication Critical patent/CH466703A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1433Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1477Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing nitrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1433Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1483Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CH790666A 1965-06-01 1966-06-01 Process for the production of photographic resist images or printing plates CH466703A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2339265A GB1118213A (en) 1965-06-01 1965-06-01 Light-sensitive modified epoxy resins

Publications (1)

Publication Number Publication Date
CH466703A true CH466703A (en) 1968-12-15

Family

ID=10194878

Family Applications (1)

Application Number Title Priority Date Filing Date
CH790666A CH466703A (en) 1965-06-01 1966-06-01 Process for the production of photographic resist images or printing plates

Country Status (6)

Country Link
AT (1) AT272071B (en)
BE (1) BE681794A (en)
CH (1) CH466703A (en)
DE (1) DE1522382A1 (en)
GB (1) GB1118213A (en)
NL (1) NL6607506A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0167051B1 (en) * 1984-06-29 1988-10-12 Siemens Aktiengesellschaft Thermostable and irradiation-curable polymer system based on bisphenol and epichlorohydrine, and method for its preparation

Also Published As

Publication number Publication date
NL6607506A (en) 1966-08-25
DE1522382A1 (en) 1969-11-06
GB1118213A (en) 1968-06-26
BE681794A (en) 1966-10-31
AT272071B (en) 1969-06-25

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CH466703A (en) Process for the production of photographic resist images or printing plates