CS892888A1 - Substrate for photolitographically formed mask - Google Patents

Substrate for photolitographically formed mask

Info

Publication number
CS892888A1
CS892888A1 CS888928A CS892888A CS892888A1 CS 892888 A1 CS892888 A1 CS 892888A1 CS 888928 A CS888928 A CS 888928A CS 892888 A CS892888 A CS 892888A CS 892888 A1 CS892888 A1 CS 892888A1
Authority
CS
Czechoslovakia
Prior art keywords
photolitographically
substrate
formed mask
mask
photolitographically formed
Prior art date
Application number
CS888928A
Other languages
English (en)
Other versions
CS273791B1 (en
Inventor
Jan Ing Kacer
Vladimir Ing Andrs
Milena Mitrova
Ladislav Maly
Pavel Ing Pojman
Miroslav Rndr Sebela
Jaroslav Rndr Zamastil
Original Assignee
Jan Ing Kacer
Vladimir Ing Andrs
Milena Mitrova
Ladislav Maly
Pojman Pavel
Sebela Miroslav
Zamastil Jaroslav
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jan Ing Kacer, Vladimir Ing Andrs, Milena Mitrova, Ladislav Maly, Pojman Pavel, Sebela Miroslav, Zamastil Jaroslav filed Critical Jan Ing Kacer
Priority to CS892888A priority Critical patent/CS273791B1/cs
Publication of CS892888A1 publication Critical patent/CS892888A1/cs
Publication of CS273791B1 publication Critical patent/CS273791B1/cs

Links

CS892888A 1988-12-29 1988-12-29 Substrate for photolitographically formed mask CS273791B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CS892888A CS273791B1 (en) 1988-12-29 1988-12-29 Substrate for photolitographically formed mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CS892888A CS273791B1 (en) 1988-12-29 1988-12-29 Substrate for photolitographically formed mask

Publications (2)

Publication Number Publication Date
CS892888A1 true CS892888A1 (en) 1990-08-14
CS273791B1 CS273791B1 (en) 1991-04-11

Family

ID=5440528

Family Applications (1)

Application Number Title Priority Date Filing Date
CS892888A CS273791B1 (en) 1988-12-29 1988-12-29 Substrate for photolitographically formed mask

Country Status (1)

Country Link
CS (1) CS273791B1 (cs)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7298556B2 (ja) * 2020-06-30 2023-06-27 信越化学工業株式会社 フォトマスクブランクの製造方法

Also Published As

Publication number Publication date
CS273791B1 (en) 1991-04-11

Similar Documents

Publication Publication Date Title
EP0325243A3 (en) Etching apparatus
EP0328036A3 (en) Photopolymerizable composition
EP0350914A3 (en) Humidity-retaining mask
EP0182651A3 (en) Semiconductor substrate
EP0355444A3 (en) Face mask
EP0396620A4 (en) Aminomethyl-chroman and -thiochroman compounds
GB8420531D0 (en) Substrate
GB8909322D0 (en) A compound for covering a substrate
EP0367292A3 (en) Compound semiconductor substrate
EP0333224A3 (en) Photopolymerizable composition
GB8906628D0 (en) Process for manufacturing poly-epsilon-caproamide film
AU3508084A (en) Foot pattern device
GB8805053D0 (en) Mask & masking method
CS892888A1 (en) Substrate for photolitographically formed mask
GB9114481D0 (en) Substrate
GB8329535D0 (en) Forming pattern on substrate
GB8722434D0 (en) Protecting substrate
CS8903803A2 (en) Wafer tape
IE862590L (en) Electrolevelled substrate for electrophotographic¹photoreceptors
ZA88605B (en) Face mask
GB8826893D0 (en) Photomechanical masking
GB8708556D0 (en) Assembly for protecting substrate
GB8727474D0 (en) Substrate
GB8801185D0 (en) Solder masks
GB9219214D0 (en) Lithographic substrate preparation