EP0792386A4 - Method and apparatus for depositing a substance with temperature control - Google Patents

Method and apparatus for depositing a substance with temperature control

Info

Publication number
EP0792386A4
EP0792386A4 EP95901749A EP95901749A EP0792386A4 EP 0792386 A4 EP0792386 A4 EP 0792386A4 EP 95901749 A EP95901749 A EP 95901749A EP 95901749 A EP95901749 A EP 95901749A EP 0792386 A4 EP0792386 A4 EP 0792386A4
Authority
EP
European Patent Office
Prior art keywords
depositing
substance
temperature control
temperature
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP95901749A
Other languages
German (de)
French (fr)
Other versions
EP0792386A1 (en
Inventor
Cecil B Shepard Jr
Daniel V Raney
William A Quirk
Gregory Bak-Boychuk
Michael S Heuser
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Celestech Inc
Original Assignee
Celestech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Celestech Inc filed Critical Celestech Inc
Publication of EP0792386A1 publication Critical patent/EP0792386A1/en
Publication of EP0792386A4 publication Critical patent/EP0792386A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2001—Maintaining constant desired temperature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
EP95901749A 1994-11-01 1994-11-01 Method and apparatus for depositing a substance with temperature control Withdrawn EP0792386A4 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US1994/012605 WO1996013623A1 (en) 1994-11-01 1994-11-01 Method and apparatus for depositing a substance with temperature control

Publications (2)

Publication Number Publication Date
EP0792386A1 EP0792386A1 (en) 1997-09-03
EP0792386A4 true EP0792386A4 (en) 2000-01-05

Family

ID=22243226

Family Applications (1)

Application Number Title Priority Date Filing Date
EP95901749A Withdrawn EP0792386A4 (en) 1994-11-01 1994-11-01 Method and apparatus for depositing a substance with temperature control

Country Status (3)

Country Link
EP (1) EP0792386A4 (en)
JP (1) JPH10508069A (en)
WO (1) WO1996013623A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016100115A1 (en) * 2014-12-17 2016-06-23 Ii-Vi Incorporated Apparatus and method of manufacturing free standing cvd polycrystalline diamond films

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5342660A (en) * 1991-05-10 1994-08-30 Celestech, Inc. Method for plasma jet deposition

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4471003A (en) * 1980-11-25 1984-09-11 Cann Gordon L Magnetoplasmadynamic apparatus and process for the separation and deposition of materials
US5204144A (en) * 1991-05-10 1993-04-20 Celestech, Inc. Method for plasma deposition on apertured substrates

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5342660A (en) * 1991-05-10 1994-08-30 Celestech, Inc. Method for plasma jet deposition

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
LUGSCHEIDER E ET AL: "EXTENSIVE DIAMOND FILM DEPOSITION BY D.C. PLASMA JET CHEMICAL VAPORDEPOSITION", DIAMOND AND RELATED MATERIALS,NL,ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM, vol. 3, no. 4/06, pages 325-327, XP000466660, ISSN: 0925-9635 *
See also references of WO9613623A1 *
ZHUANG Q D ET AL: "EFFECT OF SUBSTRATE TEMPERATURE DISTRIBUTION ON THERMAL PLASMA JET CVD OF DIAMOND", DIAMOND AND RELATED MATERIALS,NL,ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM, vol. 3, no. 4/06, pages 319-324, XP000466659, ISSN: 0925-9635 *

Also Published As

Publication number Publication date
WO1996013623A1 (en) 1996-05-09
EP0792386A1 (en) 1997-09-03
JPH10508069A (en) 1998-08-04

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Legal Events

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