EP2000195A4 - Verfahren zum unschädlichmachen von hcd-gas und vorrichtung dafür - Google Patents

Verfahren zum unschädlichmachen von hcd-gas und vorrichtung dafür

Info

Publication number
EP2000195A4
EP2000195A4 EP07708082A EP07708082A EP2000195A4 EP 2000195 A4 EP2000195 A4 EP 2000195A4 EP 07708082 A EP07708082 A EP 07708082A EP 07708082 A EP07708082 A EP 07708082A EP 2000195 A4 EP2000195 A4 EP 2000195A4
Authority
EP
European Patent Office
Prior art keywords
hexachlorosilicium
danger
gases
production
apparatus therefor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP07708082A
Other languages
English (en)
French (fr)
Other versions
EP2000195A2 (de
EP2000195B1 (de
Inventor
Hiroshi Imamura
Hiroaki Takeuchi
Koji Ishikawa
Hiroshi Suzuki
Akira Moriya
Katsuyoshi Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toagosei Co Ltd
Kanken Techno Co Ltd
Original Assignee
Toagosei Co Ltd
Kanken Techno Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toagosei Co Ltd, Kanken Techno Co Ltd filed Critical Toagosei Co Ltd
Publication of EP2000195A2 publication Critical patent/EP2000195A2/de
Publication of EP2000195A4 publication Critical patent/EP2000195A4/de
Application granted granted Critical
Publication of EP2000195B1 publication Critical patent/EP2000195B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G7/00—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals
    • F23G7/06—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G7/00—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals
    • F23G7/06—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases
    • F23G7/061—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating
    • F23G7/063—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating electric heating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23L—SUPPLYING AIR OR NON-COMBUSTIBLE LIQUIDS OR GASES TO COMBUSTION APPARATUS IN GENERAL ; VALVES OR DAMPERS SPECIALLY ADAPTED FOR CONTROLLING AIR SUPPLY OR DRAUGHT IN COMBUSTION APPARATUS; INDUCING DRAUGHT IN COMBUSTION APPARATUS; TOPS FOR CHIMNEYS OR VENTILATING SHAFTS; TERMINALS FOR FLUES
    • F23L7/00—Supplying non-combustible liquids or gases, other than air, to the fire, e.g. oxygen, steam
    • F23L7/002—Supplying water
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Combustion & Propulsion (AREA)
  • Treating Waste Gases (AREA)
  • Incineration Of Waste (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
EP07708082.8A 2006-03-07 2007-02-06 Verfahren zum unschädlichmachen von hcd-gas und vorrichtung dafür Active EP2000195B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006061171 2006-03-07
PCT/JP2007/051964 WO2007102288A1 (ja) 2006-03-07 2007-02-06 Ｈｃｄガスの除害方法とその装置

Publications (3)

Publication Number Publication Date
EP2000195A2 EP2000195A2 (de) 2008-12-10
EP2000195A4 true EP2000195A4 (de) 2009-12-30
EP2000195B1 EP2000195B1 (de) 2013-10-23

Family

ID=38474730

Family Applications (1)

Application Number Title Priority Date Filing Date
EP07708082.8A Active EP2000195B1 (de) 2006-03-07 2007-02-06 Verfahren zum unschädlichmachen von hcd-gas und vorrichtung dafür

Country Status (7)

Country Link
US (1) US7976807B2 (de)
EP (1) EP2000195B1 (de)
JP (1) JP4937998B2 (de)
KR (1) KR101341360B1 (de)
CN (1) CN101384336B (de)
TW (1) TWI448324B (de)
WO (1) WO2007102288A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010004438A2 (en) 2008-06-16 2010-01-14 Patrys Limited Lm-antibodies, functional fragments, lm-1 target antigen, and methods for making and using same
JP5696348B2 (ja) * 2008-08-09 2015-04-08 東京エレクトロン株式会社 金属回収方法、金属回収装置、排気系及びこれを用いた成膜装置
DE102009056438B4 (de) 2009-12-02 2013-05-16 Spawnt Private S.À.R.L. Verfahren zur Herstellung von Hexachlordisilan
DE102010002812A1 (de) 2010-03-12 2011-09-15 Wacker Chemie Ag Verfahren zur Entsorgung Hexachlordisilan-haltiger Dämpfe
TWI495829B (zh) * 2013-08-09 2015-08-11 Orient Service Co Ltd Exhaust gas treatment device
DE102014018435A1 (de) 2014-12-10 2016-06-16 Silicon Products Bitterfeld GmbH&CO.KG Verfahren zur Gewinnung von Hexachlordisilan aus in Prozessabgasströmen enthaltenen Gemischen von Chlorsilanen
US10266414B2 (en) * 2015-06-16 2019-04-23 Hemlock Semiconductor Operations Llc Susceptor arrangement for a reactor and method of heating a process gas for a reactor
CA3029903C (en) * 2016-07-06 2020-12-22 Ihi Corporation Method of producing a silicon compound material and apparatus for producing a silicon compound material
RU2722027C1 (ru) 2016-11-16 2020-05-26 АйЭйчАй КОРПОРЕЙШН Способ стабилизации хлорсиланового полимера
WO2018216446A1 (ja) * 2017-05-24 2018-11-29 カンケンテクノ株式会社 排ガスの減圧除害装置
TWI634939B (zh) * 2018-01-30 2018-09-11 國立高雄科技大學 處理六氯矽乙烷及其水解產物之方法
US10550002B2 (en) 2018-05-23 2020-02-04 National Kaohsiung University Of Science And Technology Method for treatment of hexachlorodisilane and hydrolyzed product
JP7325151B1 (ja) 2023-04-10 2023-08-14 カンケンテクノ株式会社 筒状加熱部と該筒状加熱部を備えた排ガス処理装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5955037A (en) * 1996-12-31 1999-09-21 Atmi Ecosys Corporation Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
US6423284B1 (en) * 1999-10-18 2002-07-23 Advanced Technology Materials, Inc. Fluorine abatement using steam injection in oxidation treatment of semiconductor manufacturing effluent gases

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5037514A (en) * 1986-01-06 1991-08-06 Semiconductor Energy Laboratory Co., Ltd. Silicon oxide depositing method
JPS62158321A (ja) * 1986-01-06 1987-07-14 Semiconductor Energy Lab Co Ltd 被膜作製方法
JP3016690B2 (ja) * 1994-05-30 2000-03-06 カンケンテクノ株式会社 半導体製造排ガス除害方法とその装置
US5766342A (en) * 1994-10-19 1998-06-16 Matsushita Electric Industrial Co., Ltd. Method for forming silicon film and silicon film forming apparatus
US5649985A (en) * 1995-11-29 1997-07-22 Kanken Techno Co., Ltd. Apparatus for removing harmful substances of exhaust gas discharged from semiconductor manufacturing process
JP3272986B2 (ja) 1997-07-15 2002-04-08 カンケンテクノ株式会社 半導体製造排ガスの除害装置
US6905663B1 (en) * 2000-04-18 2005-06-14 Jose I. Arno Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas
CN1227054C (zh) * 2000-09-07 2005-11-16 康肯科技股份有限公司 全氟化碳或全氟化物的除害方法及除害装置
KR100368811B1 (ko) * 2000-11-17 2003-01-24 엠에이티 주식회사 장치내부 부식방지수단을 구비한 가스 스크러버
SG100773A1 (en) * 2000-12-21 2003-12-26 Kanken Techno Co Ltd Exhaust gas treating tower for use in exhaust gas treatment equipment and electric heater for use in the exhaust gas treating tower
US20020187096A1 (en) * 2001-06-08 2002-12-12 Kendig James Edward Process for preparation of polycrystalline silicon
CN100488598C (zh) * 2001-12-04 2009-05-20 株式会社荏原制作所 处理废气的方法和装置
JP4214717B2 (ja) * 2002-05-31 2009-01-28 株式会社日立製作所 過弗化物処理装置
KR100524197B1 (ko) * 2003-04-29 2005-10-27 삼성전자주식회사 매엽식 반도체 소자 제조장치 및 이를 이용한 게이트 전극및 콘택 전극의 연속 형성방법
JP4340522B2 (ja) * 2003-11-28 2009-10-07 クリーン・テクノロジー株式会社 フッ素化合物を含有する排ガスの処理装置
JP2005199215A (ja) * 2004-01-19 2005-07-28 Japan Pionics Co Ltd 排ガスの処理装置及び処理方法
JP2010529670A (ja) * 2007-06-07 2010-08-26 レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード 半導体適用のための非可燃性溶媒

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5955037A (en) * 1996-12-31 1999-09-21 Atmi Ecosys Corporation Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
US6423284B1 (en) * 1999-10-18 2002-07-23 Advanced Technology Materials, Inc. Fluorine abatement using steam injection in oxidation treatment of semiconductor manufacturing effluent gases

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2007102288A1 *

Also Published As

Publication number Publication date
US20090104100A1 (en) 2009-04-23
KR101341360B1 (ko) 2013-12-13
TW200734032A (en) 2007-09-16
KR20080108992A (ko) 2008-12-16
US7976807B2 (en) 2011-07-12
CN101384336B (zh) 2011-12-28
WO2007102288A1 (ja) 2007-09-13
JPWO2007102288A1 (ja) 2009-07-23
CN101384336A (zh) 2009-03-11
EP2000195A2 (de) 2008-12-10
EP2000195B1 (de) 2013-10-23
TWI448324B (zh) 2014-08-11
JP4937998B2 (ja) 2012-05-23

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