EP2659518A4 - LASER PROCESSING METHODS FOR PHOTOVOLTAIC SOLAR CELLS - Google Patents
LASER PROCESSING METHODS FOR PHOTOVOLTAIC SOLAR CELLSInfo
- Publication number
- EP2659518A4 EP2659518A4 EP11853473.4A EP11853473A EP2659518A4 EP 2659518 A4 EP2659518 A4 EP 2659518A4 EP 11853473 A EP11853473 A EP 11853473A EP 2659518 A4 EP2659518 A4 EP 2659518A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- solar cells
- laser processing
- processing methods
- photovoltaic solar
- photovoltaic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
- H10F77/703—Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
- B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1 ns or less
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
- H10F10/146—Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P34/00—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices
- H10P34/40—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation
- H10P34/42—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation with electromagnetic radiation, e.g. laser annealing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
- H10P95/90—Thermal treatments, e.g. annealing or sintering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic materials other than metals or composite materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Photovoltaic Devices (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201061428600P | 2010-12-30 | 2010-12-30 | |
| US201061428953P | 2010-12-31 | 2010-12-31 | |
| US201061428957P | 2010-12-31 | 2010-12-31 | |
| US201113057104A | 2011-02-01 | 2011-02-01 | |
| US13/118,295 US8399331B2 (en) | 2007-10-06 | 2011-05-27 | Laser processing for high-efficiency thin crystalline silicon solar cell fabrication |
| US13/271,212 US9508886B2 (en) | 2007-10-06 | 2011-10-11 | Method for making a crystalline silicon solar cell substrate utilizing flat top laser beam |
| US13/303,488 US20130164883A1 (en) | 2007-10-06 | 2011-11-23 | Laser annealing applications in high-efficiency solar cells |
| PCT/US2011/068037 WO2012092537A2 (en) | 2010-12-30 | 2011-12-30 | Laser processing methods for photovoltaic solar cells |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP2659518A2 EP2659518A2 (en) | 2013-11-06 |
| EP2659518A4 true EP2659518A4 (en) | 2014-09-24 |
Family
ID=46383873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP11853473.4A Withdrawn EP2659518A4 (en) | 2010-12-30 | 2011-12-30 | LASER PROCESSING METHODS FOR PHOTOVOLTAIC SOLAR CELLS |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP2659518A4 (en) |
| KR (1) | KR101384853B1 (en) |
| WO (1) | WO2012092537A2 (en) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8637340B2 (en) | 2004-11-30 | 2014-01-28 | Solexel, Inc. | Patterning of silicon oxide layers using pulsed laser ablation |
| US9508886B2 (en) | 2007-10-06 | 2016-11-29 | Solexel, Inc. | Method for making a crystalline silicon solar cell substrate utilizing flat top laser beam |
| US8399331B2 (en) | 2007-10-06 | 2013-03-19 | Solexel | Laser processing for high-efficiency thin crystalline silicon solar cell fabrication |
| US9455362B2 (en) | 2007-10-06 | 2016-09-27 | Solexel, Inc. | Laser irradiation aluminum doping for monocrystalline silicon substrates |
| US9583651B2 (en) | 2011-12-26 | 2017-02-28 | Solexel, Inc. | Systems and methods for enhanced light trapping in solar cells |
| CN103346200A (en) * | 2013-05-13 | 2013-10-09 | 福建铂阳精工设备有限公司 | Glass substrate and method for manufacturing the same, and method for manufacturing thin-film solar cell |
| DE102014101235A1 (en) * | 2014-01-31 | 2015-08-06 | Rofin-Baasel Lasertech Gmbh & Co. Kg | Method for removing dielectric layers of semiconductor devices by means of a laser beam |
| KR102030521B1 (en) | 2017-11-30 | 2019-10-10 | (주)에스엠텍 | Glass surface machining device for solar module using laser |
| CN111063760B (en) * | 2018-10-17 | 2022-06-14 | 晶澳太阳能有限公司 | Preparation process of solar cell |
| CN113257957B (en) * | 2021-06-11 | 2022-08-23 | 四川蜀旺新能源股份有限公司 | Super-doped silicon thin-film solar cell and manufacturing method thereof |
| CN114447156A (en) * | 2022-01-27 | 2022-05-06 | 环晟光伏(江苏)有限公司 | A method for laser grooving on the front surface of electroplating cells |
| CN116618821B (en) * | 2022-05-17 | 2024-06-28 | 武汉帝尔激光科技股份有限公司 | A method for modifying a film and realizing patterning by using a laser beam and its application |
| CN115528136A (en) * | 2022-09-21 | 2022-12-27 | 浙江爱旭太阳能科技有限公司 | A kind of back contact battery and its manufacturing method, battery component, photovoltaic system |
| CN116722077A (en) * | 2023-06-28 | 2023-09-08 | 滁州捷泰新能源科技有限公司 | SE structure preparation method and solar cell |
| CN117253934A (en) * | 2023-11-20 | 2023-12-19 | 隆基绿能科技股份有限公司 | A kind of back contact battery and photovoltaic module |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7517709B1 (en) * | 2007-11-16 | 2009-04-14 | Applied Materials, Inc. | Method of forming backside point contact structures for silicon solar cells |
| US20100055822A1 (en) * | 2008-08-27 | 2010-03-04 | Weidman Timothy W | Back contact solar cells using printed dielectric barrier |
| US20100108130A1 (en) * | 2008-10-31 | 2010-05-06 | Crystal Solar, Inc. | Thin Interdigitated backside contact solar cell and manufacturing process thereof |
| DE102009018112B3 (en) * | 2009-04-20 | 2010-12-16 | Institut Für Solarenergieforschung Gmbh | Method for producing a semiconductor component, in particular a solar cell, with a locally opened dielectric layer and corresponding semiconductor component |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8420435B2 (en) | 2009-05-05 | 2013-04-16 | Solexel, Inc. | Ion implantation fabrication process for thin-film crystalline silicon solar cells |
| KR100946797B1 (en) * | 2007-09-07 | 2010-03-11 | 주식회사 엘티에스 | Manufacturing method of high efficiency solar cell using laser |
| KR20100085736A (en) * | 2009-01-21 | 2010-07-29 | 현대중공업 주식회사 | Crystalline silicon photovoltaic device and thereof manufacturing method |
| KR101145928B1 (en) * | 2009-03-11 | 2012-05-15 | 엘지전자 주식회사 | Solar Cell and Manufacturing Method of the same |
| KR101155563B1 (en) * | 2009-05-27 | 2012-06-19 | 주식회사 효성 | Method for manufacturing for Solar cell using a Laser |
-
2011
- 2011-12-30 WO PCT/US2011/068037 patent/WO2012092537A2/en not_active Ceased
- 2011-12-30 EP EP11853473.4A patent/EP2659518A4/en not_active Withdrawn
- 2011-12-30 KR KR1020137020198A patent/KR101384853B1/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7517709B1 (en) * | 2007-11-16 | 2009-04-14 | Applied Materials, Inc. | Method of forming backside point contact structures for silicon solar cells |
| US20100055822A1 (en) * | 2008-08-27 | 2010-03-04 | Weidman Timothy W | Back contact solar cells using printed dielectric barrier |
| US20100108130A1 (en) * | 2008-10-31 | 2010-05-06 | Crystal Solar, Inc. | Thin Interdigitated backside contact solar cell and manufacturing process thereof |
| DE102009018112B3 (en) * | 2009-04-20 | 2010-12-16 | Institut Für Solarenergieforschung Gmbh | Method for producing a semiconductor component, in particular a solar cell, with a locally opened dielectric layer and corresponding semiconductor component |
Non-Patent Citations (3)
| Title |
|---|
| ANDREAS GROHE ET AL: "Novel laser technologies for crystalline silicon solar cell production", PROCEEDINGS OF SPIE, vol. 7202, 2009, pages 72020P, XP055010538, ISSN: 0277-786X, DOI: 10.1117/12.810128 * |
| MANGERSNES KRISTER ET AL: "Damage free laser ablation of SiO2 for local contact opening on silicon solar cells using an a-Si:H buffer layer", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS, US, vol. 107, no. 4, 23 February 2010 (2010-02-23), pages 43518 - 43518, XP012133434, ISSN: 0021-8979, DOI: 10.1063/1.3309382 * |
| See also references of WO2012092537A2 * |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101384853B1 (en) | 2014-04-16 |
| EP2659518A2 (en) | 2013-11-06 |
| KR20130099229A (en) | 2013-09-05 |
| WO2012092537A3 (en) | 2012-11-22 |
| WO2012092537A2 (en) | 2012-07-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| 17P | Request for examination filed |
Effective date: 20130724 |
|
| AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
| DAX | Request for extension of the european patent (deleted) | ||
| A4 | Supplementary search report drawn up and despatched |
Effective date: 20140827 |
|
| RIC1 | Information provided on ipc code assigned before grant |
Ipc: H01L 21/268 20060101ALI20140821BHEP Ipc: B23K 26/06 20140101ALI20140821BHEP Ipc: B23K 26/40 20140101ALI20140821BHEP Ipc: H01L 31/18 20060101ALI20140821BHEP Ipc: H01L 31/068 20120101AFI20140821BHEP Ipc: H01L 31/0236 20060101ALI20140821BHEP |
|
| 17Q | First examination report despatched |
Effective date: 20151020 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: EXAMINATION IS IN PROGRESS |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
| 18D | Application deemed to be withdrawn |
Effective date: 20190702 |