EP3914750A4 - Method of forming moisture and oxygen barrier coatings - Google Patents

Method of forming moisture and oxygen barrier coatings Download PDF

Info

Publication number
EP3914750A4
EP3914750A4 EP19912156.7A EP19912156A EP3914750A4 EP 3914750 A4 EP3914750 A4 EP 3914750A4 EP 19912156 A EP19912156 A EP 19912156A EP 3914750 A4 EP3914750 A4 EP 3914750A4
Authority
EP
European Patent Office
Prior art keywords
oxygen barrier
barrier coatings
forming moisture
moisture
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP19912156.7A
Other languages
German (de)
French (fr)
Other versions
EP3914750A1 (en
Inventor
Geetika Bajaj
Darshan THAKARE
Prerna Sonthalia Goradia
Sivapackia Ganapathiappan
David Britz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of EP3914750A1 publication Critical patent/EP3914750A1/en
Publication of EP3914750A4 publication Critical patent/EP3914750A4/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
EP19912156.7A 2019-01-25 2019-11-18 Method of forming moisture and oxygen barrier coatings Pending EP3914750A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IN201941003143 2019-01-25
PCT/US2019/061970 WO2020154023A1 (en) 2019-01-25 2019-11-18 Method of forming moisture and oxygen barrier coatings

Publications (2)

Publication Number Publication Date
EP3914750A1 EP3914750A1 (en) 2021-12-01
EP3914750A4 true EP3914750A4 (en) 2023-02-15

Family

ID=71736904

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19912156.7A Pending EP3914750A4 (en) 2019-01-25 2019-11-18 Method of forming moisture and oxygen barrier coatings

Country Status (3)

Country Link
EP (1) EP3914750A4 (en)
CN (1) CN113302334A (en)
WO (1) WO2020154023A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114411121A (en) * 2021-12-13 2022-04-29 江苏鲁汶仪器有限公司 Method for preparing distributed barrier layer and distributed barrier layer thereof

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5654054A (en) * 1992-12-18 1997-08-05 Becton, Dickinson And Company Barrier coating
US6165566A (en) * 1996-01-30 2000-12-26 Becton Dickinson And Company Method for depositing a multilayer barrier coating on a plastic substrate
US20100255625A1 (en) * 2007-09-07 2010-10-07 Fujifilm Manufacturing Europe B.V. Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma
US20140242365A1 (en) * 2011-10-06 2014-08-28 Fujifilm Manufacturing Europe Bv Method and Device for Manufacturing a Barrier Layer on a Flexible Substrate
EP2929938A1 (en) * 2014-04-11 2015-10-14 Plasma Electronic GmbH Analysis container and analysis system
EP3239066A1 (en) * 2014-12-26 2017-11-01 Takemoto Yohki Co. Ltd. Resin container and resin container-covering device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1629543B1 (en) * 2003-05-16 2013-08-07 E.I. Du Pont De Nemours And Company Barrier films for flexible polymer substrates fabricated by atomic layer deposition
US20050172897A1 (en) * 2004-02-09 2005-08-11 Frank Jansen Barrier layer process and arrangement
KR100926030B1 (en) * 2008-02-25 2009-11-11 한국과학기술연구원 Organic / inorganic composite thin film protective layer and its manufacturing method for blocking oxygen and moisture permeation and improving gas barrier properties
KR101264257B1 (en) * 2009-12-24 2013-05-23 경희대학교 산학협력단 Method for preparing barrier film for plastic substrate by using low frequency plasma enhanced atomic layer deposition
JP2012096432A (en) * 2010-11-01 2012-05-24 Sony Corp Barrier film, and method of manufacturing the same
JP2017533995A (en) * 2014-10-17 2017-11-16 ロータス アプライド テクノロジー エルエルシーＬｏｔｕｓ Ａｐｐｌｉｅｄ Ｔｅｃｈｎｏｌｏｇｙ， Ｌｌｃ High speed deposition of mixed oxide barrier films.
CN204398441U (en) * 2014-11-20 2015-06-17 北京印刷学院 Surface is coated with the Key works Drug packing high-barrier plastic film of MULTILAYER COMPOSITE nano coating
KR101874292B1 (en) * 2014-11-27 2018-08-02 주식회사 엘지화학 Barrier film

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5654054A (en) * 1992-12-18 1997-08-05 Becton, Dickinson And Company Barrier coating
US6165566A (en) * 1996-01-30 2000-12-26 Becton Dickinson And Company Method for depositing a multilayer barrier coating on a plastic substrate
US20100255625A1 (en) * 2007-09-07 2010-10-07 Fujifilm Manufacturing Europe B.V. Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma
US20140242365A1 (en) * 2011-10-06 2014-08-28 Fujifilm Manufacturing Europe Bv Method and Device for Manufacturing a Barrier Layer on a Flexible Substrate
EP2929938A1 (en) * 2014-04-11 2015-10-14 Plasma Electronic GmbH Analysis container and analysis system
EP3239066A1 (en) * 2014-12-26 2017-11-01 Takemoto Yohki Co. Ltd. Resin container and resin container-covering device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2020154023A1 *

Also Published As

Publication number Publication date
CN113302334A (en) 2021-08-24
EP3914750A1 (en) 2021-12-01
WO2020154023A1 (en) 2020-07-30

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