EP4130349A4 - CRYSTAL PREPARATION APPARATUS AND CRYSTAL GROWTH METHOD - Google Patents

CRYSTAL PREPARATION APPARATUS AND CRYSTAL GROWTH METHOD Download PDF

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Publication number
EP4130349A4
EP4130349A4 EP21800098.2A EP21800098A EP4130349A4 EP 4130349 A4 EP4130349 A4 EP 4130349A4 EP 21800098 A EP21800098 A EP 21800098A EP 4130349 A4 EP4130349 A4 EP 4130349A4
Authority
EP
European Patent Office
Prior art keywords
crystal
growth method
preparation apparatus
crystal growth
crystal preparation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP21800098.2A
Other languages
German (de)
French (fr)
Other versions
EP4130349A1 (en
Inventor
Yu Wang
Tian YANG
Zhenxing Liang
Min Li
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Boya Advanced Materials Co Ltd
Original Assignee
Meishan Boya Advanced Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN202010373329.8A external-priority patent/CN111254486A/en
Priority claimed from CN202010626511.XA external-priority patent/CN111501096B/en
Application filed by Meishan Boya Advanced Materials Co Ltd filed Critical Meishan Boya Advanced Materials Co Ltd
Publication of EP4130349A1 publication Critical patent/EP4130349A1/en
Publication of EP4130349A4 publication Critical patent/EP4130349A4/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/002—Controlling or regulating
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/36—Carbides
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/06—Joining of crystals
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1004—Apparatus with means for measuring, testing, or sensing
    • Y10T117/1008—Apparatus with means for measuring, testing, or sensing with responsive control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
EP21800098.2A 2020-05-06 2021-04-02 CRYSTAL PREPARATION APPARATUS AND CRYSTAL GROWTH METHOD Pending EP4130349A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN202010373329.8A CN111254486A (en) 2020-05-06 2020-05-06 Crystal preparation device
CN202010626511.XA CN111501096B (en) 2020-07-02 2020-07-02 Crystal preparation device
PCT/CN2021/085468 WO2021223557A1 (en) 2020-05-06 2021-04-02 Crystal preparation apparatus and growth method

Publications (2)

Publication Number Publication Date
EP4130349A1 EP4130349A1 (en) 2023-02-08
EP4130349A4 true EP4130349A4 (en) 2023-10-18

Family

ID=78467789

Family Applications (1)

Application Number Title Priority Date Filing Date
EP21800098.2A Pending EP4130349A4 (en) 2020-05-06 2021-04-02 CRYSTAL PREPARATION APPARATUS AND CRYSTAL GROWTH METHOD

Country Status (4)

Country Link
US (2) US11408089B2 (en)
EP (1) EP4130349A4 (en)
JP (1) JP7644779B2 (en)
WO (1) WO2021223557A1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI762351B (en) * 2021-06-08 2022-04-21 環球晶圓股份有限公司 Silicon carbide wafers and grinding method thereof
AT527630B1 (en) * 2023-09-15 2025-07-15 Eemco Gmbh Crucible for growing crystals
CN121610887B (en) * 2026-01-30 2026-05-08 北京晶格领域半导体有限公司 A device and method for dynamically adjusting the axial temperature gradient during crystal growth.

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US20190211472A1 (en) * 2016-08-31 2019-07-11 Taizhou Beyond Technology Co., Ltd. Silicon Carbide Single Crystal Manufacturing Device
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Title
See also references of WO2021223557A1 *

Also Published As

Publication number Publication date
EP4130349A1 (en) 2023-02-08
JP7644779B2 (en) 2025-03-12
US20220356599A1 (en) 2022-11-10
US11408089B2 (en) 2022-08-09
JP2023524962A (en) 2023-06-14
WO2021223557A1 (en) 2021-11-11
US20220056612A1 (en) 2022-02-24

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Inventor name: LI, MIN

Inventor name: LIANG, ZHENXING

Inventor name: YANG, TIAN

Inventor name: WANG, YU

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Owner name: BOYA ADVANCED MATERIALS CO., LTD.