FR2285423A1 - Compositions photopolymerisables - Google Patents

Compositions photopolymerisables

Info

Publication number
FR2285423A1
FR2285423A1 FR7528525A FR7528525A FR2285423A1 FR 2285423 A1 FR2285423 A1 FR 2285423A1 FR 7528525 A FR7528525 A FR 7528525A FR 7528525 A FR7528525 A FR 7528525A FR 2285423 A1 FR2285423 A1 FR 2285423A1
Authority
FR
France
Prior art keywords
compsns
compsn
hydrocarbyl
constituent
photopolymerisable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7528525A
Other languages
English (en)
French (fr)
Other versions
FR2285423B1 (it
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial Chemical Industries Ltd
Original Assignee
Imperial Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB40682/74A external-priority patent/GB1526923A/en
Application filed by Imperial Chemical Industries Ltd filed Critical Imperial Chemical Industries Ltd
Publication of FR2285423A1 publication Critical patent/FR2285423A1/fr
Application granted granted Critical
Publication of FR2285423B1 publication Critical patent/FR2285423B1/fr
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00General processes for preparing compounds provided for in this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Epoxy Resins (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
FR7528525A 1974-09-18 1975-09-17 Compositions photopolymerisables Granted FR2285423A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB40682/74A GB1526923A (en) 1974-09-18 1974-09-18 Photopolymerisable compositions
GB759875 1975-02-24

Publications (2)

Publication Number Publication Date
FR2285423A1 true FR2285423A1 (fr) 1976-04-16
FR2285423B1 FR2285423B1 (it) 1979-08-31

Family

ID=26241548

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7528525A Granted FR2285423A1 (fr) 1974-09-18 1975-09-17 Compositions photopolymerisables

Country Status (9)

Country Link
JP (1) JPS6057442B2 (it)
DE (1) DE2541709C2 (it)
DK (1) DK415875A (it)
FR (1) FR2285423A1 (it)
IE (1) IE42085B1 (it)
IT (1) IT1042624B (it)
NL (1) NL179654C (it)
NZ (1) NZ178699A (it)
SE (1) SE425399B (it)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2358434A1 (fr) * 1976-07-14 1978-02-10 Gen Electric Compositions aptes a subir une polymerisation cationique renfermant un sel d'onium
FR2380322A1 (fr) * 1977-02-14 1978-09-08 Gen Electric Compositions de resines organiques durcissables par la lumiere ultra-violette
FR2399444A1 (fr) * 1977-08-05 1979-03-02 Gen Electric Compositions de resines organiques photodurcissables depourvues d'oxygene appartenant a un groupe oxirane et procede de durcissement
FR2399443A1 (fr) * 1977-08-05 1979-03-02 Gen Electric Composition photodurcissable a base de materiau organique aliphatiquement insature
FR2403351A1 (fr) * 1977-09-14 1979-04-13 Gen Electric Photoinitiateurs formes de sels d'onium d'elements du groupe via
FR2416920A1 (fr) * 1978-02-08 1979-09-07 Minnesota Mining & Mfg Compositions photopolymerisables sulfonium epoxydes inodores
FR2416922A1 (fr) * 1978-02-08 1979-09-07 Minnesota Mining & Mfg Compositions liquides contenant des sels complexes de sulfonium et de l'oxyethylene
FR2447387A1 (fr) * 1979-01-29 1980-08-22 Minnesota Mining & Mfg Compositions liquides a base de sels complexes photodecomposables
EP0014785A1 (en) * 1979-02-12 1980-09-03 General Electric Company Coating method and curable compositions
EP0011918A3 (en) * 1978-10-27 1981-01-21 Imperial Chemical Industries Plc Polymerisable compositions, derived coatings and other polymerised products
EP1591832A3 (en) * 2004-04-20 2005-11-16 Fuji Photo Film Co., Ltd. Photosensitive composition, compound used in the same, and patterning method using the same

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4273668A (en) * 1977-09-14 1981-06-16 General Electric Company Arylsulfonium salt-solvent mixtures
DE3909688A1 (de) * 1989-03-23 1990-09-27 Espe Stiftung Verfahren zum kleben oder vergiessen von substraten und vorrichtung zur seiner durchfuehrung
SE8901048D0 (sv) * 1989-03-23 1989-03-23 Becker Wilhelm Ab Polymerisationsinitiator
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
US6723483B1 (en) * 1999-12-27 2004-04-20 Wako Pure Chemical Industries, Ltd. Sulfonium salt compounds
WO2002018332A1 (fr) * 2000-08-30 2002-03-07 Wako Pure Chemical Industries, Ltd. Compose de sel de sulfonium
EP3064996B1 (en) * 2010-02-05 2020-07-22 Canon Kabushiki Kaisha Liquid discharge head
WO2011096458A1 (en) 2010-02-05 2011-08-11 Canon Kabushiki Kaisha Negative photosensitive resin composition, pattern formation method, and liquid discharge head
CN119241596B (zh) * 2024-11-05 2025-10-17 南京邮电大学 硫配位锰卤配合物及其制备方法和应用

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3412046A (en) * 1965-07-01 1968-11-19 Dexter Corp Catalyzed polyepoxide-anhydride resin systems

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3412046A (en) * 1965-07-01 1968-11-19 Dexter Corp Catalyzed polyepoxide-anhydride resin systems

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2358434A1 (fr) * 1976-07-14 1978-02-10 Gen Electric Compositions aptes a subir une polymerisation cationique renfermant un sel d'onium
FR2380322A1 (fr) * 1977-02-14 1978-09-08 Gen Electric Compositions de resines organiques durcissables par la lumiere ultra-violette
FR2399444A1 (fr) * 1977-08-05 1979-03-02 Gen Electric Compositions de resines organiques photodurcissables depourvues d'oxygene appartenant a un groupe oxirane et procede de durcissement
FR2399443A1 (fr) * 1977-08-05 1979-03-02 Gen Electric Composition photodurcissable a base de materiau organique aliphatiquement insature
FR2545491A1 (fr) * 1977-08-05 1984-11-09 Gen Electric Compositions de resines organiques photodurcissables pourvues d'oxygene appartenant a un groupe oxirane et procede de durcisement
FR2403351A1 (fr) * 1977-09-14 1979-04-13 Gen Electric Photoinitiateurs formes de sels d'onium d'elements du groupe via
FR2416922A1 (fr) * 1978-02-08 1979-09-07 Minnesota Mining & Mfg Compositions liquides contenant des sels complexes de sulfonium et de l'oxyethylene
FR2416920A1 (fr) * 1978-02-08 1979-09-07 Minnesota Mining & Mfg Compositions photopolymerisables sulfonium epoxydes inodores
EP0011918A3 (en) * 1978-10-27 1981-01-21 Imperial Chemical Industries Plc Polymerisable compositions, derived coatings and other polymerised products
FR2447387A1 (fr) * 1979-01-29 1980-08-22 Minnesota Mining & Mfg Compositions liquides a base de sels complexes photodecomposables
EP0014785A1 (en) * 1979-02-12 1980-09-03 General Electric Company Coating method and curable compositions
EP1591832A3 (en) * 2004-04-20 2005-11-16 Fuji Photo Film Co., Ltd. Photosensitive composition, compound used in the same, and patterning method using the same
US7323286B2 (en) 2004-04-20 2008-01-29 Fujifilm Corporation Photosensitive composition, compound used in the same, and patterning method using the same

Also Published As

Publication number Publication date
NZ178699A (en) 1978-03-06
JPS6057442B2 (ja) 1985-12-14
IE42085B1 (en) 1980-06-04
DK415875A (da) 1976-03-19
AU8489975A (en) 1977-03-24
DE2541709A1 (de) 1976-04-01
FR2285423B1 (it) 1979-08-31
NL7510920A (nl) 1976-03-22
IE42085L (en) 1976-03-18
IT1042624B (it) 1980-01-30
NL179654C (nl) 1986-10-16
DE2541709C2 (de) 1985-02-21
SE425399B (sv) 1982-09-27
SE7510390L (it) 1976-03-19
NL179654B (nl) 1986-05-16
JPS5156885A (en) 1976-05-18

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Legal Events

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