FR2286419A1 - Procede de formation d'image avec une matiere photoresistante a base de polysulfone - Google Patents

Procede de formation d'image avec une matiere photoresistante a base de polysulfone

Info

Publication number
FR2286419A1
FR2286419A1 FR7525149A FR7525149A FR2286419A1 FR 2286419 A1 FR2286419 A1 FR 2286419A1 FR 7525149 A FR7525149 A FR 7525149A FR 7525149 A FR7525149 A FR 7525149A FR 2286419 A1 FR2286419 A1 FR 2286419A1
Authority
FR
France
Prior art keywords
polysulfone
image formation
formation process
material based
photoresistant material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7525149A
Other languages
English (en)
French (fr)
Other versions
FR2286419B1 (2
Inventor
Edward Gipstein
Wayne M Moreau
Omar U Need Iii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2286419A1 publication Critical patent/FR2286419A1/fr
Application granted granted Critical
Publication of FR2286419B1 publication Critical patent/FR2286419B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
FR7525149A 1974-09-26 1975-08-07 Procede de formation d'image avec une matiere photoresistante a base de polysulfone Granted FR2286419A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US509595A US3916036A (en) 1974-09-26 1974-09-26 Sensitized decomposition of polysulfone resists

Publications (2)

Publication Number Publication Date
FR2286419A1 true FR2286419A1 (fr) 1976-04-23
FR2286419B1 FR2286419B1 (2) 1981-05-29

Family

ID=24027322

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7525149A Granted FR2286419A1 (fr) 1974-09-26 1975-08-07 Procede de formation d'image avec une matiere photoresistante a base de polysulfone

Country Status (5)

Country Link
US (1) US3916036A (2)
JP (1) JPS5143127A (2)
DE (1) DE2536300A1 (2)
FR (1) FR2286419A1 (2)
GB (1) GB1500403A (2)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4045318A (en) * 1976-07-30 1977-08-30 Rca Corporation Method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer
US4289845A (en) * 1978-05-22 1981-09-15 Bell Telephone Laboratories, Inc. Fabrication based on radiation sensitive resists and related products
JPS5828571B2 (ja) * 1978-07-20 1983-06-16 沖電気工業株式会社 微細加工用レジスト形成方法
US4262073A (en) * 1979-11-23 1981-04-14 Rca Corporation Positive resist medium and method of employing same
JPS57128334A (en) * 1981-01-31 1982-08-09 Toppan Printing Co Ltd Electron beam resist developing method
JPS59152A (ja) * 1982-06-25 1984-01-05 Hitachi Chem Co Ltd 画像形成性樹脂組成物
US4837125A (en) * 1986-03-25 1989-06-06 Siemens Aktiengesellschaft Electron-beam-sensitive resist material for microstructures in electronics
CN119735810B (zh) * 2024-12-23 2025-11-25 上海交通大学 一种薁基聚砜阴离子交换膜及其制备方法和应用

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3661582A (en) * 1970-03-23 1972-05-09 Western Electric Co Additives to positive photoresists which increase the sensitivity thereof
US3820993A (en) * 1971-05-07 1974-06-28 Horizons Research Inc Light sensitive reproduction and electron beam sensitive material

Also Published As

Publication number Publication date
FR2286419B1 (2) 1981-05-29
DE2536300A1 (de) 1976-04-08
GB1500403A (en) 1978-02-08
US3916036A (en) 1975-10-28
JPS5143127A (2) 1976-04-13

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Legal Events

Date Code Title Description
ST Notification of lapse