FR2438918B3 - - Google Patents

Info

Publication number
FR2438918B3
FR2438918B3 FR7925431A FR7925431A FR2438918B3 FR 2438918 B3 FR2438918 B3 FR 2438918B3 FR 7925431 A FR7925431 A FR 7925431A FR 7925431 A FR7925431 A FR 7925431A FR 2438918 B3 FR2438918 B3 FR 2438918B3
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7925431A
Other versions
FR2438918A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Micronas GmbH
ITT Inc
Original Assignee
Deutsche ITT Industries GmbH
ITT Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Deutsche ITT Industries GmbH, ITT Industries Inc filed Critical Deutsche ITT Industries GmbH
Publication of FR2438918A1 publication Critical patent/FR2438918A1/fr
Application granted granted Critical
Publication of FR2438918B3 publication Critical patent/FR2438918B3/fr
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/68Floating-gate IGFETs
    • H10D30/681Floating-gate IGFETs having only two programming levels
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/60Electrodes characterised by their materials
    • H10D64/66Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/661Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of silicon contacting the insulator, e.g. polysilicon having vertical doping variation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/60Electrodes characterised by their materials
    • H10D64/66Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/665Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of elemental metal contacting the insulator, e.g. tungsten or molybdenum
FR7925431A 1978-10-14 1979-10-12 Transistor a effet de champ a porte isolee integrale Granted FR2438918A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19782844878 DE2844878A1 (de) 1978-10-14 1978-10-14 Integrierbarer isolierschicht-feldeffekttransistor

Publications (2)

Publication Number Publication Date
FR2438918A1 FR2438918A1 (fr) 1980-05-09
FR2438918B3 true FR2438918B3 (fr) 1981-07-10

Family

ID=6052234

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7925431A Granted FR2438918A1 (fr) 1978-10-14 1979-10-12 Transistor a effet de champ a porte isolee integrale

Country Status (6)

Country Link
US (1) US4251829A (fr)
JP (1) JPS5553463A (fr)
DE (1) DE2844878A1 (fr)
FR (1) FR2438918A1 (fr)
GB (1) GB2033150B (fr)
IT (1) IT1193240B (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4486769A (en) * 1979-01-24 1984-12-04 Xicor, Inc. Dense nonvolatile electrically-alterable memory device with substrate coupling electrode
US4561004A (en) * 1979-10-26 1985-12-24 Texas Instruments High density, electrically erasable, floating gate memory cell
US4404577A (en) * 1980-06-30 1983-09-13 International Business Machines Corp. Electrically alterable read only memory cell
JPS5759387A (en) * 1980-09-26 1982-04-09 Toshiba Corp Semiconductor storage device
JPS59500342A (ja) * 1982-03-09 1984-03-01 ア−ルシ−エ− コ−ポレ−シヨン 電気的に改変可能の不揮発性浮動ゲ−ト記憶装置
US4605946A (en) * 1984-08-16 1986-08-12 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Fet charge sensor and voltage probe
JPS61208865A (ja) * 1985-03-13 1986-09-17 Mitsubishi Electric Corp 半導体記憶装置
JPS6260267A (ja) * 1985-09-10 1987-03-16 Toshiba Corp 不揮発性半導体記憶装置およびその製造方法
KR920001402B1 (ko) * 1988-11-29 1992-02-13 삼성전자 주식회사 불휘발성 반도체 기억소자
US6414318B1 (en) 1998-11-06 2002-07-02 Bridge Semiconductor Corporation Electronic circuit
WO2000028337A2 (fr) 1998-11-06 2000-05-18 Onguard Systems, Inc. Circuit electronique

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2144436C2 (de) * 1971-09-04 1983-01-20 Deutsche Itt Industries Gmbh, 7800 Freiburg Integrierte Festkörperschaltung zum Einstellen der effektiven Schwellenspannung eines Isolierschicht-Feldeffekttransistors
US4004159A (en) * 1973-05-18 1977-01-18 Sanyo Electric Co., Ltd. Electrically reprogrammable nonvolatile floating gate semi-conductor memory device and method of operation
US3996657A (en) * 1974-12-30 1976-12-14 Intel Corporation Double polycrystalline silicon gate memory device
US4028694A (en) * 1975-06-10 1977-06-07 International Business Machines Corporation A/D and D/A converter using C-2C ladder network
JPS5279679A (en) * 1975-12-26 1977-07-04 Toshiba Corp Semiconductor memory device
JPS5853512B2 (ja) * 1976-02-13 1983-11-29 株式会社東芝 半導体記憶装置の製造方法
US4119995A (en) * 1976-08-23 1978-10-10 Intel Corporation Electrically programmable and electrically erasable MOS memory cell
FR2365859A1 (fr) * 1976-09-24 1978-04-21 Thomson Csf Memoire non volatile pour signaux rapides
JPS6037619B2 (ja) * 1976-11-17 1985-08-27 株式会社東芝 半導体メモリ装置
NL7700879A (nl) * 1977-01-28 1978-08-01 Philips Nv Halfgeleiderinrichting.
DE2728927C2 (de) * 1977-06-27 1984-06-28 Siemens AG, 1000 Berlin und 8000 München Ein-Transistor-Speicherelement
US4099196A (en) * 1977-06-29 1978-07-04 Intel Corporation Triple layer polysilicon cell
US4162504A (en) * 1977-12-27 1979-07-24 Rca Corp. Floating gate solid-state storage device

Also Published As

Publication number Publication date
IT7926448A0 (it) 1979-10-12
JPS5553463A (en) 1980-04-18
GB2033150A (en) 1980-05-14
IT1193240B (it) 1988-06-15
GB2033150B (en) 1983-02-02
US4251829A (en) 1981-02-17
FR2438918A1 (fr) 1980-05-09
DE2844878A1 (de) 1980-04-30

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