FR2597372B3 - Procede et appareil d'etalement de resine par centrifugation - Google Patents

Procede et appareil d'etalement de resine par centrifugation

Info

Publication number
FR2597372B3
FR2597372B3 FR8605802A FR8605802A FR2597372B3 FR 2597372 B3 FR2597372 B3 FR 2597372B3 FR 8605802 A FR8605802 A FR 8605802A FR 8605802 A FR8605802 A FR 8605802A FR 2597372 B3 FR2597372 B3 FR 2597372B3
Authority
FR
France
Prior art keywords
spreading method
resin spreading
centrifugation
centrifugation resin
spreading
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8605802A
Other languages
English (en)
Other versions
FR2597372A1 (fr
Inventor
Eugene Tonnel
Paul Patruno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR8605802A priority Critical patent/FR2597372B3/fr
Priority to EP19870902553 priority patent/EP0271503A1/fr
Priority to PCT/FR1987/000134 priority patent/WO1987006725A2/fr
Priority to JP62502654A priority patent/JPS63503046A/ja
Publication of FR2597372A1 publication Critical patent/FR2597372A1/fr
Application granted granted Critical
Publication of FR2597372B3 publication Critical patent/FR2597372B3/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
FR8605802A 1986-04-22 1986-04-22 Procede et appareil d'etalement de resine par centrifugation Expired FR2597372B3 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR8605802A FR2597372B3 (fr) 1986-04-22 1986-04-22 Procede et appareil d'etalement de resine par centrifugation
EP19870902553 EP0271503A1 (fr) 1986-04-22 1987-04-22 Procede et appareil d'etalement de resine par centrifugation
PCT/FR1987/000134 WO1987006725A2 (fr) 1986-04-22 1987-04-22 Procede et appareil d'etalement de resine par centrifugation
JP62502654A JPS63503046A (ja) 1986-04-22 1987-04-22 遠心作用により樹脂を塗布するための方法と装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8605802A FR2597372B3 (fr) 1986-04-22 1986-04-22 Procede et appareil d'etalement de resine par centrifugation

Publications (2)

Publication Number Publication Date
FR2597372A1 FR2597372A1 (fr) 1987-10-23
FR2597372B3 true FR2597372B3 (fr) 1988-07-08

Family

ID=9334491

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8605802A Expired FR2597372B3 (fr) 1986-04-22 1986-04-22 Procede et appareil d'etalement de resine par centrifugation

Country Status (4)

Country Link
EP (1) EP0271503A1 (fr)
JP (1) JPS63503046A (fr)
FR (1) FR2597372B3 (fr)
WO (1) WO1987006725A2 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2017719C (fr) * 1990-05-29 1999-01-19 Zarlink Semiconductor Inc. Processus d'application de verre par rotation en l'absence d'humidite
US6248398B1 (en) * 1996-05-22 2001-06-19 Applied Materials, Inc. Coater having a controllable pressurized process chamber for semiconductor processing
US6302960B1 (en) 1998-11-23 2001-10-16 Applied Materials, Inc. Photoresist coater
EP1840940B8 (fr) * 2006-03-28 2014-11-26 Thallner, Erich, Dipl.-Ing. Appareil et procédé pour le revêtement des substrats micro- ou nanostructurés
JP2007260895A (ja) * 2006-03-28 2007-10-11 Erich Thallner マイクロ構造および／またはナノ構造の構造基板をコーティングするための装置および方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB584615A (en) * 1945-01-10 1947-01-20 Pictorial Machinery Ltd Improvements in or relating to methods of drying coated plates for photo-lithographic and like purposes, and apparatus therefor
JPS55166923A (en) * 1979-06-15 1980-12-26 Toshiba Corp Manufacture of semiconductor device
US4385083A (en) * 1980-08-25 1983-05-24 Applied Magnetics Corporation Apparatus and method for forming a thin film of coating material on a substrate having a vacuum applied to the edge thereof
JPS57107032A (en) * 1980-12-25 1982-07-03 Toshiba Corp Coating device for semiconductor substrate
JPS58103132A (ja) * 1981-12-16 1983-06-20 Konishiroku Photo Ind Co Ltd スピンナ−装置
JPS58178522A (ja) * 1982-04-14 1983-10-19 Hitachi Ltd 塗布方法および装置
JPS59106120A (ja) * 1982-12-11 1984-06-19 Toshiba Corp レジスト膜の形成方法

Also Published As

Publication number Publication date
EP0271503A1 (fr) 1988-06-22
JPS63503046A (ja) 1988-11-10
FR2597372A1 (fr) 1987-10-23
WO1987006725A2 (fr) 1987-11-05
WO1987006725A3 (fr) 1987-12-17

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Legal Events

Date Code Title Description
ST Notification of lapse