FR3000294B1 - Support fonctionnel comprenant des nanofils et des nano-empreintes et procede de fabrication dudit support - Google Patents
Support fonctionnel comprenant des nanofils et des nano-empreintes et procede de fabrication dudit supportInfo
- Publication number
- FR3000294B1 FR3000294B1 FR1262537A FR1262537A FR3000294B1 FR 3000294 B1 FR3000294 B1 FR 3000294B1 FR 1262537 A FR1262537 A FR 1262537A FR 1262537 A FR1262537 A FR 1262537A FR 3000294 B1 FR3000294 B1 FR 3000294B1
- Authority
- FR
- France
- Prior art keywords
- nanowires
- fingerprints
- nano
- manufacturing
- same
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
- H10H20/812—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/014—Manufacture or treatment of FETs having zero-dimensional [0D] or one-dimensional [1D] channels, e.g. quantum wire FETs, single-electron transistors [SET] or Coulomb blockade transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/117—Shapes of semiconductor bodies
- H10D62/118—Nanostructure semiconductor bodies
- H10D62/119—Nanowire, nanosheet or nanotube semiconductor bodies
- H10D62/122—Nanowire, nanosheet or nanotube semiconductor bodies oriented at angles to substrates, e.g. perpendicular to substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/117—Shapes of semiconductor bodies
- H10D62/118—Nanostructure semiconductor bodies
- H10D62/119—Nanowire, nanosheet or nanotube semiconductor bodies
- H10D62/123—Nanowire, nanosheet or nanotube semiconductor bodies comprising junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/81—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
- H10D62/812—Single quantum well structures
- H10D62/813—Quantum wire structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/81—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
- H10D62/812—Single quantum well structures
- H10D62/814—Quantum box structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
- H10H20/0133—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
- H10H20/01335—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/813—Bodies having a plurality of light-emitting regions, e.g. multi-junction LEDs or light-emitting devices having photoluminescent regions within the bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/817—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/817—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
- H10H20/818—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous within the light-emitting regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
- H10H20/821—Bodies characterised by their shape, e.g. curved or truncated substrates of the light-emitting regions, e.g. non-planar junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/832—Electrodes characterised by their material
- H10H20/833—Transparent materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/34—Deposited materials, e.g. layers
- H10P14/3451—Structure
- H10P14/3452—Microstructure
- H10P14/3462—Nanowires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
- H10D8/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/032—Manufacture or treatment of electrodes
Landscapes
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Led Devices (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1262537A FR3000294B1 (fr) | 2012-12-21 | 2012-12-21 | Support fonctionnel comprenant des nanofils et des nano-empreintes et procede de fabrication dudit support |
| EP13814952.1A EP2936571B1 (fr) | 2012-12-21 | 2013-12-20 | Processus de production de régions adjacentes séparés comprenant des fils électriques de diode électroluminescente et dispositif obtenu à l'aide du processus |
| US14/652,435 US11063177B2 (en) | 2012-12-21 | 2013-12-20 | Process for producing adjacent chips comprising LED wires and device obtained by the process |
| PCT/EP2013/077745 WO2014096383A1 (fr) | 2012-12-21 | 2013-12-20 | Processus de production de régions adjacentes comprenant des fils électriques de diode électroluminescente et dispositif obtenu à l'aide du processus |
| CN201380070542.XA CN104937728B (zh) | 2012-12-21 | 2013-12-20 | 生成包括led线的相邻区域的工艺和通过该工艺获得的器件 |
| JP2015548643A JP6370305B2 (ja) | 2012-12-21 | 2013-12-20 | Ledワイヤを備える隣接した領域の製造方法およびその製造方法により得られる装置 |
| US17/232,287 US12027643B2 (en) | 2012-12-21 | 2021-04-16 | Process for producing adjacent chips comprising LED wires and device obtained by the process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1262537A FR3000294B1 (fr) | 2012-12-21 | 2012-12-21 | Support fonctionnel comprenant des nanofils et des nano-empreintes et procede de fabrication dudit support |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR3000294A1 FR3000294A1 (fr) | 2014-06-27 |
| FR3000294B1 true FR3000294B1 (fr) | 2016-03-04 |
Family
ID=48468421
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR1262537A Active FR3000294B1 (fr) | 2012-12-21 | 2012-12-21 | Support fonctionnel comprenant des nanofils et des nano-empreintes et procede de fabrication dudit support |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US11063177B2 (fr) |
| EP (1) | EP2936571B1 (fr) |
| JP (1) | JP6370305B2 (fr) |
| CN (1) | CN104937728B (fr) |
| FR (1) | FR3000294B1 (fr) |
| WO (1) | WO2014096383A1 (fr) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102188494B1 (ko) * | 2014-07-21 | 2020-12-09 | 삼성전자주식회사 | 반도체 발광소자, 반도체 발광소자 제조방법 및 반도체 발광소자 패키지 제조방법 |
| JP7147132B2 (ja) * | 2017-05-31 | 2022-10-05 | セイコーエプソン株式会社 | 発光装置、プロジェクター、および発光装置の製造方法 |
| US10418499B2 (en) | 2017-06-01 | 2019-09-17 | Glo Ab | Self-aligned nanowire-based light emitting diode subpixels for a direct view display and method of making thereof |
| US10707374B2 (en) | 2017-09-15 | 2020-07-07 | Glo Ab | Etendue enhancement for light emitting diode subpixels |
| DE102017130760A1 (de) * | 2017-12-20 | 2019-06-27 | Osram Opto Semiconductors Gmbh | Optoelektronisches halbleiterbauteil und verfahren zur herstellung von optoelektronischen halbleiterbauteilen |
| EP3785289B1 (fr) * | 2018-04-22 | 2025-12-24 | Epinovatech AB | Dispositif à film mince renforcé |
| FR3082657B1 (fr) * | 2018-06-19 | 2021-01-29 | Aledia | Procede de fabrication d’un dispositif optoelectronique a parois de confinement lumineux auto alignes |
| JP7167623B2 (ja) * | 2018-10-23 | 2022-11-09 | 富士通株式会社 | 化合物半導体装置及びその製造方法、検波器、エネルギーハーベスタ |
| JP7137066B2 (ja) | 2018-10-23 | 2022-09-14 | 日亜化学工業株式会社 | 発光素子の製造方法 |
| JP7207012B2 (ja) * | 2019-02-27 | 2023-01-18 | セイコーエプソン株式会社 | 発光装置の製造方法、発光装置、およびプロジェクター |
| EP3754731A1 (fr) * | 2019-06-21 | 2020-12-23 | Aledia | Procédé d'enlèvement local de fils semi-conducteurs |
| EP3836227A1 (fr) | 2019-12-11 | 2021-06-16 | Epinovatech AB | Structure à couches semi-conductrices |
| EP3855530B1 (fr) | 2020-01-24 | 2025-04-16 | Epinovatech AB | Batterie à semi-conducteurs |
| EP3866189B1 (fr) | 2020-02-14 | 2022-09-28 | Epinovatech AB | Module mmic frontal |
| EP3879706A1 (fr) | 2020-03-13 | 2021-09-15 | Epinovatech AB | Dispositif de réseau prédiffusé programmable par l'utilisateur |
| EP3907877A1 (fr) | 2020-05-07 | 2021-11-10 | Epinovatech AB | Machine à induction |
| EP3916804A1 (fr) | 2020-05-29 | 2021-12-01 | Epinovatech AB | Hemt vertical et procédé de fabrication d'un hemt vertical |
| FR3113782B1 (fr) * | 2020-08-31 | 2022-08-05 | Aledia | Procédé de fabrication d’un dispositif optoélectronique |
| EP4090139B1 (fr) | 2021-05-10 | 2023-10-25 | Epinovatech AB | Dispositif convertisseur de puissance |
| EP4101945B1 (fr) | 2021-06-09 | 2024-05-15 | Epinovatech AB | Dispositif pour effectuer une électrolyse de l'eau et système associé |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6340822B1 (en) * | 1999-10-05 | 2002-01-22 | Agere Systems Guardian Corp. | Article comprising vertically nano-interconnected circuit devices and method for making the same |
| US7655327B2 (en) * | 2003-12-29 | 2010-02-02 | Translucent, Inc. | Composition comprising rare-earth dielectric |
| WO2007081381A2 (fr) * | 2005-05-10 | 2007-07-19 | The Regents Of The University Of California | Nanostructures a motifs spinodaux |
| EP1727216B1 (fr) * | 2005-05-24 | 2019-04-24 | LG Electronics, Inc. | Diode électroluminescente à bâtonnets et procédé de fabrication correspondant |
| KR20070021671A (ko) * | 2005-08-19 | 2007-02-23 | 서울옵토디바이스주식회사 | 나노막대들의 어레이를 채택한 발광 다이오드 및 그것을제조하는 방법 |
| WO2008034823A1 (fr) * | 2006-09-18 | 2008-03-27 | Qunano Ab | Procédé de fabrication de couches verticales et horizontales de précision dans une structure semi-conductrice verticale |
| WO2008079076A1 (fr) * | 2006-12-22 | 2008-07-03 | Qunano Ab | Diode électroluminescente avec structure de nanofil verticale et procédé de fabrication de celle-ci |
| US20090035513A1 (en) * | 2007-03-28 | 2009-02-05 | Michael Jeremiah Bortner | Tethered nanorods |
| JP2009010012A (ja) * | 2007-06-26 | 2009-01-15 | Panasonic Electric Works Co Ltd | 半導体発光素子、その製造方法及び発光装置 |
| WO2009009612A2 (fr) * | 2007-07-09 | 2009-01-15 | Nanocrystal, Llc | Étirement de nanofils de gan auto-assemblés et application dans un matériau en vrac semi-conducteur de nitrure |
| JP5247109B2 (ja) * | 2007-10-05 | 2013-07-24 | パナソニック株式会社 | 半導体発光装置およびそれを用いる照明装置ならびに半導体発光装置の製造方法 |
| CN102124574B (zh) * | 2008-06-16 | 2013-07-17 | 丰田合成株式会社 | 半导体发光元件、其电极及制造方法以及灯 |
| KR20110039313A (ko) | 2008-07-07 | 2011-04-15 | 글로 에이비 | 나노구조 led |
| US8519378B2 (en) | 2008-10-17 | 2013-08-27 | National University Corporation Hokkaido University | Semiconductor light-emitting element array including a semiconductor rod |
| WO2010062644A2 (fr) * | 2008-10-28 | 2010-06-03 | The Regents Of The University Of California | Nanofils verticaux des groupes iii à v sur du si, hétérostructures, matrices flexibles et fabrication |
| TW201105571A (en) | 2009-08-06 | 2011-02-16 | Univ Nat Cheng Kung | Method for fabricating hollow nanotube structure |
| FR2949278B1 (fr) * | 2009-08-18 | 2012-11-02 | Commissariat Energie Atomique | Procede de fabrication d'un dispositif d'emission de lumiere a base de diodes electroluminescentes |
| FR2951875B1 (fr) * | 2009-10-23 | 2012-05-18 | Commissariat Energie Atomique | Procede de fabrication d?un ecran a tres haute resolution utilisant une couche conductrice anisotropique et emissive |
| US8669544B2 (en) * | 2011-02-10 | 2014-03-11 | The Royal Institution For The Advancement Of Learning/Mcgill University | High efficiency broadband semiconductor nanowire devices and methods of fabricating without foreign catalysis |
| US7906354B1 (en) * | 2010-03-30 | 2011-03-15 | Eastman Kodak Company | Light emitting nanowire device |
| SG186261A1 (en) * | 2010-06-18 | 2013-01-30 | Glo Ab | Nanowire led structure and method for manufacturing the same |
| CN102315347B (zh) | 2010-07-05 | 2014-01-29 | 展晶科技(深圳)有限公司 | 发光二极管磊晶结构及其制造方法 |
| US8835903B2 (en) * | 2010-07-29 | 2014-09-16 | National Tsing Hua University | Light-emitting diode display and method of producing the same |
| WO2013043730A2 (fr) * | 2011-09-19 | 2013-03-28 | Bandgap Engineering, Inc. | Contacts électriques avec des zones nanostructurées |
| KR20150103661A (ko) * | 2012-10-26 | 2015-09-11 | 글로 에이비 | 나노와이어 led 구조 및 이를 제조하는 방법 |
-
2012
- 2012-12-21 FR FR1262537A patent/FR3000294B1/fr active Active
-
2013
- 2013-12-20 EP EP13814952.1A patent/EP2936571B1/fr active Active
- 2013-12-20 US US14/652,435 patent/US11063177B2/en active Active
- 2013-12-20 JP JP2015548643A patent/JP6370305B2/ja active Active
- 2013-12-20 CN CN201380070542.XA patent/CN104937728B/zh active Active
- 2013-12-20 WO PCT/EP2013/077745 patent/WO2014096383A1/fr not_active Ceased
-
2021
- 2021-04-16 US US17/232,287 patent/US12027643B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2014096383A1 (fr) | 2014-06-26 |
| US20210234066A1 (en) | 2021-07-29 |
| JP2016506076A (ja) | 2016-02-25 |
| FR3000294A1 (fr) | 2014-06-27 |
| CN104937728B (zh) | 2018-05-18 |
| EP2936571A1 (fr) | 2015-10-28 |
| US11063177B2 (en) | 2021-07-13 |
| CN104937728A (zh) | 2015-09-23 |
| US20150333216A1 (en) | 2015-11-19 |
| EP2936571B1 (fr) | 2017-02-01 |
| US12027643B2 (en) | 2024-07-02 |
| JP6370305B2 (ja) | 2018-08-08 |
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