GB1495480A - Forming a sputtered polymeric coating - Google Patents

Forming a sputtered polymeric coating

Info

Publication number: GB1495480A
Authority: GB; United Kingdom
Prior art keywords: substrate; electrodes; electrode; glow discharge; deposited
Prior art date: 1975-03-03
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

GB8294/76A

Other languages

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Airco Inc

Original Assignee

Airco Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1975-03-03

Filing date

1976-03-02

Publication date

1977-12-21

1976-03-02 Application filed by Airco Inc filed Critical Airco Inc

1977-12-21 Publication of GB1495480A publication Critical patent/GB1495480A/en

Status Expired legal-status Critical Current

Links

239000011248 coating agent Substances 0.000 title abstract 3
238000000576 coating method Methods 0.000 title abstract 3
239000000758 substrate Substances 0.000 abstract 6
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 4
229920000642 polymer Polymers 0.000 abstract 4
239000007789 gas Substances 0.000 abstract 3
238000004544 sputter deposition Methods 0.000 abstract 2
BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 abstract 2
229920006384 Airco Polymers 0.000 abstract 1
239000004793 Polystyrene Substances 0.000 abstract 1
238000000429 assembly Methods 0.000 abstract 1
230000000712 assembly Effects 0.000 abstract 1
238000000151 deposition Methods 0.000 abstract 1
230000008021 deposition Effects 0.000 abstract 1
239000007772 electrode material Substances 0.000 abstract 1
230000004907 flux Effects 0.000 abstract 1
239000011521 glass Substances 0.000 abstract 1
239000011261 inert gas Substances 0.000 abstract 1
239000012212 insulator Substances 0.000 abstract 1
239000000463 material Substances 0.000 abstract 1
239000000178 monomer Substances 0.000 abstract 1
238000006116 polymerization reaction Methods 0.000 abstract 1
229920002223 polystyrene Polymers 0.000 abstract 1
229910001220 stainless steel Inorganic materials 0.000 abstract 1
239000010935 stainless steel Substances 0.000 abstract 1
239000000126 substance Substances 0.000 abstract 1

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physics & Mathematics (AREA)
Plasma & Fusion (AREA)
Physical Vapour Deposition (AREA)
Polymerisation Methods In General (AREA)

GB8294/76A 1975-03-03 1976-03-02 Forming a sputtered polymeric coating Expired GB1495480A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US05/554,823 US4013532A (en)	1975-03-03	1975-03-03	Method for coating a substrate

Publications (1)

Publication Number	Publication Date
GB1495480A true GB1495480A (en)	1977-12-21

Family

ID=24214842

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
GB8294/76A Expired GB1495480A (en)	1975-03-03	1976-03-02	Forming a sputtered polymeric coating

Country Status (9)

Country	Link
US (1)	US4013532A (2)
JP (1)	JPS51112489A (2)
BE (1)	BE839057A (2)
CA (1)	CA1044177A (2)
DE (1)	DE2608415C2 (2)
FR (1)	FR2303091A1 (2)
GB (1)	GB1495480A (2)
IT (1)	IT1055462B (2)
NL (1)	NL176642C (2)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2920780A1 (de) *	1978-08-21	1980-03-06	Vac Tec Syst	Zerstaeubungsvorrichtung mit magnetischer verstaerkung
GB2132636A (en) *	1982-10-12	1984-07-11	Secr Defence	Glow discharge coating method
US4704339A (en) *	1982-10-12	1987-11-03	The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland	Infra-red transparent optical components
GB2203758A (en) *	1987-03-31	1988-10-26	Central Glass Co Ltd	Method of forming coating film of fluororesin by physical vapor deposition
GB2493264A (en) *	2011-07-21	2013-01-30	P2I Ltd	Formation of a liquid repellent coating, using plasma polymerisation

Families Citing this family (68)

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US4210701A (en) *	1972-08-14	1980-07-01	Precision Thin Film Corporation	Method and apparatus for depositing film on a substrate, and products produced thereby
FR2371524A1 (fr) *	1976-11-18	1978-06-16	Alsthom Atlantique	Procede de depot d'une couche mince par decomposition d'un gaz dans un plasma
JPS5391084A (en) *	1977-01-20	1978-08-10	Gnii Pi Redkometa	Method and apparatus for evaporating source matter to evaporation portion
FR2379889A1 (fr) *	1977-02-08	1978-09-01	Thomson Csf	Dielectrique constitue par un polymere en couche mince, procede de fabrication de ladite couche, et condensateurs electriques comportant un tel dielectrique
US4116806A (en) *	1977-12-08	1978-09-26	Battelle Development Corporation	Two-sided planar magnetron sputtering apparatus
US4175030A (en) *	1977-12-08	1979-11-20	Battelle Development Corporation	Two-sided planar magnetron sputtering apparatus
US4226896A (en) *	1977-12-23	1980-10-07	International Business Machines Corporation	Plasma method for forming a metal containing polymer
US4212719A (en) *	1978-08-18	1980-07-15	The Regents Of The University Of California	Method of plasma initiated polymerization
US4194962A (en) *	1978-12-20	1980-03-25	Advanced Coating Technology, Inc.	Cathode for sputtering
US4183797A (en) *	1978-12-22	1980-01-15	International Business Machines Corporation	Two-sided bias sputter deposition method and apparatus
US4269896A (en) *	1979-08-31	1981-05-26	Hughes Aircraft Company	Surface passivated alkali halide infrared windows
US4422915A (en) *	1979-09-04	1983-12-27	Battelle Memorial Institute	Preparation of colored polymeric film-like coating
DE3107914A1 (de) *	1981-03-02	1982-09-16	Leybold-Heraeus GmbH, 5000 Köln	Verfahren und vorrichtung zum beschichten von formteilen durch katodenzerstaeubung
GB2119236A (en) *	1982-03-26	1983-11-16	Philips Electronic Associated	Magazine and disc holders for supporting discs in the magazine
US4415427A (en) *	1982-09-30	1983-11-15	Gte Products Corporation	Thin film deposition by sputtering
US4562091A (en) *	1982-12-23	1985-12-31	International Business Machines Corporation	Use of plasma polymerized orgaosilicon films in fabrication of lift-off masks
US4493855A (en) *	1982-12-23	1985-01-15	International Business Machines Corporation	Use of plasma polymerized organosilicon films in fabrication of lift-off masks
JPS59154643A (ja) *	1983-02-24	1984-09-03	Fuji Photo Film Co Ltd	磁気記録媒体
DE3316548C2 (de) *	1983-03-25	1985-01-17	Flachglas AG, 8510 Fürth	Verfahren zur Beschichtung eines transparenten Substrates
US4598022A (en) *	1983-11-22	1986-07-01	Olin Corporation	One-step plasma treatment of copper foils to increase their laminate adhesion
US4526806A (en) *	1983-11-22	1985-07-02	Olin Corporation	One-step plasma treatment of copper foils to increase their laminate adhesion
US4524089A (en) *	1983-11-22	1985-06-18	Olin Corporation	Three-step plasma treatment of copper foils to enhance their laminate adhesion
US4588641A (en) *	1983-11-22	1986-05-13	Olin Corporation	Three-step plasma treatment of copper foils to enhance their laminate adhesion
US4536271A (en) *	1983-12-29	1985-08-20	Mobil Oil Corporation	Method of plasma treating a polymer film to change its properties
US4609445A (en) *	1983-12-29	1986-09-02	Mobil Oil Corporation	Method of plasma treating a polymer film to change its properties
US4622120A (en) *	1984-01-31	1986-11-11	Ppg Industries, Inc.	Sputtered indium oxide films
US4515668A (en) *	1984-04-25	1985-05-07	Honeywell Inc.	Method of forming a dielectric layer comprising a gettering material
US4560577A (en) *	1984-09-14	1985-12-24	The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration	Oxidation protection coatings for polymers
US4604181A (en) *	1984-09-14	1986-08-05	The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration	Apparatus for producing oxidation protection coatings for polymers
US4618477A (en) *	1985-01-17	1986-10-21	International Business Machines Corporation	Uniform plasma for drill smear removal reactor
JPS61168922A (ja)	1985-01-17	1986-07-30	インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション	プラズマ・エツチング装置
DE3521318A1 (de) *	1985-06-14	1986-12-18	Leybold-Heraeus GmbH, 5000 Köln	Verfahren und vorrichtung zum behandeln, insbesondere zum beschichten, von substraten mittels einer plasmaentladung
US4816287A (en) *	1985-08-30	1989-03-28	Optical Materials, Inc.	Optical recording media with thermal insulation and method of making the media
ZA884511B (en) *	1987-07-15	1989-03-29	Boc Group Inc	Method of plasma enhanced silicon oxide deposition
US4915805A (en) *	1988-11-21	1990-04-10	At&T Bell Laboratories	Hollow cathode type magnetron apparatus construction
US5047131A (en) *	1989-11-08	1991-09-10	The Boc Group, Inc.	Method for coating substrates with silicon based compounds
DE69032691T2 (de) *	1989-12-07	1999-06-10	Japan Science And Technology Corp., Kawaguchi, Saitama	Verfahren und Gerät zur Plasmabehandlung unter atmosphärischem Druck
JP2897055B2 (ja) *	1990-03-14	1999-05-31	株式会社ブリヂストン	ゴム系複合材料の製造方法
DE4009151A1 (de) *	1990-03-22	1991-09-26	Leybold Ag	Vorrichtung zum beschichten von substraten durch katodenzerstaeubung
US5407548A (en) *	1990-10-26	1995-04-18	Leybold Aktiengesellschaft	Method for coating a substrate of low resistance to corrosion
US5244730A (en) *	1991-04-30	1993-09-14	International Business Machines Corporation	Plasma deposition of fluorocarbon
DE4123274C2 (de) *	1991-07-13	1996-12-19	Leybold Ag	Vorrichtung zum Beschichten von Bauteilen bzw. Formteilen durch Kathodenzerstäubung
JPH07508617A (ja)	1992-06-26	1995-09-21	マティリアルズ　リサーチ　コーポレイション	ウエハ処理工程ラインのための輸送装置
US5410425A (en) *	1993-05-10	1995-04-25	The United States Of America As Represented By The United States Department Of Energy	Magnetron cathodes in plasma electrode pockels cells
JP3204801B2 (ja) *	1993-06-18	2001-09-04	富士写真フイルム株式会社	真空グロー放電処理装置及び処理方法
US5464667A (en) *	1994-08-16	1995-11-07	Minnesota Mining And Manufacturing Company	Jet plasma process and apparatus
US6022595A (en) *	1996-02-01	2000-02-08	Rensselaer Polytechnic Institute	Increase of deposition rate of vapor deposited polymer by electric field
US5993598A (en) *	1996-07-30	1999-11-30	The Dow Chemical Company	Magnetron
US5900284A (en) *	1996-07-30	1999-05-04	The Dow Chemical Company	Plasma generating device and method
US5853894A (en) *	1997-02-03	1998-12-29	Cytonix Corporation	Laboratory vessel having hydrophobic coating and process for manufacturing same
US6495624B1 (en) *	1997-02-03	2002-12-17	Cytonix Corporation	Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same
US7268179B2 (en) *	1997-02-03	2007-09-11	Cytonix Corporation	Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same
US8653213B2 (en)	1997-02-03	2014-02-18	Cytonix, Llc	Hydrophobic coating compositions and articles coated with said compositions
US6156389A (en)	1997-02-03	2000-12-05	Cytonix Corporation	Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same
US6203898B1 (en) *	1997-08-29	2001-03-20	3M Innovatave Properties Company	Article comprising a substrate having a silicone coating
US6055929A (en) *	1997-09-24	2000-05-02	The Dow Chemical Company	Magnetron
US6572825B1 (en) *	1999-10-04	2003-06-03	Sandia Corporation	Apparatus for thermally evolving chemical analytes from a removable substrate
US6375811B1 (en) *	1999-08-12	2002-04-23	Northrop Grumman Corporation	Flexible, highly durable, transparent optical coatings
US6811853B1 (en)	2000-03-06	2004-11-02	Shipley Company, L.L.C.	Single mask lithographic process for patterning multiple types of surface features
US6627096B2 (en)	2000-05-02	2003-09-30	Shipley Company, L.L.C.	Single mask technique for making positive and negative micromachined features on a substrate
KR20030030768A (ko) *	2001-10-12	2003-04-18	주식회사 엘지이아이	마그네트를 가지는 플라즈마 연속증착장치
US20050008919A1 (en) *	2003-05-05	2005-01-13	Extrand Charles W.	Lyophilic fuel cell component
JP2007193997A (ja) *	2006-01-17	2007-08-02	Tateyama Machine Kk	プラズマ処理装置
JP4268195B2 (ja) *	2007-02-13	2009-05-27	株式会社神戸製鋼所	プラズマｃｖｄ装置
EP1978038A1 (en) *	2007-04-02	2008-10-08	Vlaamse Instelling Voor Technologisch Onderzoek (Vito)	A method for producing a coating by atmospheric pressure plasma technology
WO2010052846A1 (ja) *	2008-11-05	2010-05-14	株式会社アルバック	巻取式真空処理装置
DE102010015149A1 (de)	2010-04-16	2011-10-20	Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.	Vorrichtung zum Beschichten eines Substrates innerhalb einer Vakuumkammer mittels plasmaunterstützter chemischer Dampfabscheidung
US9250178B2 (en) *	2011-10-07	2016-02-02	Kla-Tencor Corporation	Passivation of nonlinear optical crystals

Family Cites Families (10)

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Publication number	Priority date	Publication date	Assignee	Title
US3297465A (en) *	1963-12-31	1967-01-10	Ibm	Method for producing organic plasma and for depositing polymer films
US3318790A (en) *	1964-04-29	1967-05-09	Texas Instruments Inc	Production of thin organic polymer by screened glow discharge
US3475307A (en) *	1965-02-04	1969-10-28	Continental Can Co	Condensation of monomer vapors to increase polymerization rates in a glow discharge
US3471316A (en) *	1965-06-14	1969-10-07	Continental Can Co	Method of forming a flexible organic layer on metal by a pulsed electrical abnormal glow discharge
US3464907A (en) *	1967-02-23	1969-09-02	Victory Eng Corp	Triode sputtering apparatus and method using synchronized pulsating current
DE1809906B2 (de) *	1968-11-20	1971-06-03	Jenaer Glaswerk Schott & Gen , 6500 Mainz	Verfahren zum vakuumaufdampfen von haftfesten mischschichten aus anorganischen und organischen stoffen auf einem substrat
US3767559A (en) *	1970-06-24	1973-10-23	Eastman Kodak Co	Sputtering apparatus with accordion pleated anode means
US3666533A (en) *	1970-11-16	1972-05-30	North American Rockwell	Deposition of polymeric coatings utilizing electrical excitation
NL7202331A (2) *	1972-01-24	1973-07-26
US3878085A (en) *	1973-07-05	1975-04-15	Sloan Technology Corp	Cathode sputtering apparatus

1975
- 1975-03-03 US US05/554,823 patent/US4013532A/en not_active Expired - Lifetime
1976
- 1976-01-27 CA CA244,269A patent/CA1044177A/en not_active Expired
- 1976-02-26 IT IT20627/76A patent/IT1055462B/it active
- 1976-02-27 BE BE164750A patent/BE839057A/xx not_active IP Right Cessation
- 1976-03-01 FR FR7605753A patent/FR2303091A1/fr active Granted
- 1976-03-01 DE DE2608415A patent/DE2608415C2/de not_active Expired
- 1976-03-02 NL NLAANVRAGE7602156,A patent/NL176642C/xx not_active IP Right Cessation
- 1976-03-02 GB GB8294/76A patent/GB1495480A/en not_active Expired
- 1976-03-03 JP JP51023061A patent/JPS51112489A/ja active Granted

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2920780A1 (de) *	1978-08-21	1980-03-06	Vac Tec Syst	Zerstaeubungsvorrichtung mit magnetischer verstaerkung
GB2132636A (en) *	1982-10-12	1984-07-11	Secr Defence	Glow discharge coating method
US4704339A (en) *	1982-10-12	1987-11-03	The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland	Infra-red transparent optical components
GB2203758A (en) *	1987-03-31	1988-10-26	Central Glass Co Ltd	Method of forming coating film of fluororesin by physical vapor deposition
GB2203758B (en) *	1987-03-31	1991-06-19	Central Glass Co Ltd	Method of forming coating film of fluororesin by physical vapor deposition
GB2493264A (en) *	2011-07-21	2013-01-30	P2I Ltd	Formation of a liquid repellent coating, using plasma polymerisation

Also Published As

Publication number	Publication date
JPS5527626B2 (2)	1980-07-22
IT1055462B (it)	1981-12-21
CA1044177A (en)	1978-12-12
US4013532A (en)	1977-03-22
FR2303091A1 (fr)	1976-10-01
NL176642C (nl)	1985-05-17
NL176642B (nl)	1984-12-17
NL7602156A (nl)	1976-09-07
DE2608415C2 (de)	1983-09-01
DE2608415A1 (de)	1976-09-16
JPS51112489A (en)	1976-10-04
BE839057A (fr)	1976-08-27
FR2303091B1 (2)	1979-02-02

Legal Events

Date	Code	Title	Description
1978-05-04	PS	Patent sealed [section 19, patents act 1949]
1992-10-28	PCNP	Patent ceased through non-payment of renewal fee

Publication	Publication Date	Title
GB1495480A (en)	1977-12-21	Forming a sputtered polymeric coating
EP0211412B1 (en)	1994-01-19	Planar magnetron sputtering apparatus and its magnetic source
US4478702A (en)	1984-10-23	Anode for magnetic sputtering apparatus
KR930021814A (ko)	1993-11-23	연속 박막 형성방법
JPH04276071A (ja)	1992-10-01	陰極スパッタリング装置で基板を被覆するためのスパッタカソード
JPS57106513A (en)	1982-07-02	Formation of carbon film
US3526584A (en)	1970-09-01	Method of providing a field free region above a substrate during sputter-depositing thereon
US4802968A (en)	1989-02-07	RF plasma processing apparatus
JPH0234780A (ja)	1990-02-05	マグネトロンスパッタ用磁気回路
US3779891A (en)	1973-12-18	Triode sputtering apparatus
JPS63111173A (ja)	1988-05-16	スパツタリング装置
US5149415A (en)	1992-09-22	Film forming apparatus
RU2023744C1 (ru)	1994-11-30	Катодный узел для ионно-плазменного нанесения
JPS5917193B2 (ja)	1984-04-19	スパツタリング装置
US5403663A (en)	1995-04-04	Process for coating a polycarbonate substrate with an aluminum-silicon alloy
JPH02294476A (ja)	1990-12-05	マグネトロンスパッタリング用カソード
RU2102527C1 (ru)	1998-01-20	Магнитная система планарного магнетрона
Abe et al.	1982	Planar magnetron sputtering cathode with deposition rate distribution controllability
GB1482632A (en)	1977-08-10	Method and apparatus for sputtering
JPS596376A (ja)	1984-01-13	スパツタ装置
JPH05222529A (ja)	1993-08-31	陰極スパッタリング装置におけるウェーハを被覆するための装置
GB1181502A (en)	1970-02-18	Polymerising by Electrical Discharge.
JP3327991B2 (ja)	2002-09-24	ペニング放電型エッチング・デポジション方法及び装置
JP3392490B2 (ja)	2003-03-31	スパッタリング方法及びその装置
JPS59190364A (ja)	1984-10-29	スパツタリング装置