IE45575L - Scale for calibrating electron beam instruments - Google Patents
Scale for calibrating electron beam instrumentsInfo
- Publication number
- IE45575L IE45575L IE771797A IE179777A IE45575L IE 45575 L IE45575 L IE 45575L IE 771797 A IE771797 A IE 771797A IE 179777 A IE179777 A IE 179777A IE 45575 L IE45575 L IE 45575L
- Authority
- IE
- Ireland
- Prior art keywords
- scale
- layers
- metals
- deposited
- thick
- Prior art date
Links
- 238000010894 electron beam technology Methods 0.000 title abstract 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 4
- 239000010931 gold Substances 0.000 abstract 4
- 229910052737 gold Inorganic materials 0.000 abstract 4
- 239000002184 metal Substances 0.000 abstract 4
- 229910052751 metal Inorganic materials 0.000 abstract 4
- 150000002739 metals Chemical class 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 2
- 238000007373 indentation Methods 0.000 abstract 2
- 239000002131 composite material Substances 0.000 abstract 1
- 238000003384 imaging method Methods 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B3/00—Measuring instruments characterised by the use of mechanical techniques
- G01B3/30—Bars, blocks, or strips in which the distance between a pair of faces is fixed, although it may be preadjustable, e.g. end measure, feeler strip
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49789—Obtaining plural product pieces from unitary workpiece
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electroplating Methods And Accessories (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Sampling And Sample Adjustment (AREA)
- Luminescent Compositions (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/736,978 US4068381A (en) | 1976-10-29 | 1976-10-29 | Scanning electron microscope micrometer scale and method for fabricating same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IE45575L true IE45575L (en) | 1978-04-29 |
| IE45575B1 IE45575B1 (en) | 1982-10-06 |
Family
ID=24962098
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IE1797/77A IE45575B1 (en) | 1976-10-29 | 1977-08-29 | A scale for calibrating electron beam instruments and methhod of fabricating the same |
Country Status (11)
| Country | Link |
|---|---|
| US (2) | US4068381A ( ) |
| JP (1) | JPS5355953A ( ) |
| AU (1) | AU505385B2 ( ) |
| BE (1) | BE860196A ( ) |
| CA (1) | CA1080369A ( ) |
| DE (1) | DE2740224A1 ( ) |
| FR (1) | FR2369544A1 ( ) |
| GB (1) | GB1540780A ( ) |
| IE (1) | IE45575B1 ( ) |
| IT (1) | IT1090530B ( ) |
| NL (1) | NL7711544A ( ) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE455736B (sv) * | 1984-03-15 | 1988-08-01 | Sarastro Ab | Forfaringssett och anordning for mikrofotometrering och efterfoljande bildsammanstellning |
| US4655884A (en) * | 1985-08-19 | 1987-04-07 | General Electric Company | Nickel plating of refractory metals |
| US4818873A (en) * | 1987-10-30 | 1989-04-04 | Vickers Instruments (Canada) Inc. | Apparatus for automatically controlling the magnification factor of a scanning electron microscope |
| US5479252A (en) * | 1993-06-17 | 1995-12-26 | Ultrapointe Corporation | Laser imaging system for inspection and analysis of sub-micron particles |
| US5923430A (en) * | 1993-06-17 | 1999-07-13 | Ultrapointe Corporation | Method for characterizing defects on semiconductor wafers |
| JP2746125B2 (ja) * | 1994-06-17 | 1998-04-28 | 日本電気株式会社 | 電子線露光装置の装置較正用基準マーク及び装置較正方法。 |
| US5822875A (en) * | 1995-08-09 | 1998-10-20 | Siemens Aktiengesellschaft | Scanning electron microscopic ruler and method |
| DE19604348C2 (de) * | 1996-02-07 | 2003-10-23 | Deutsche Telekom Ag | Verfahren zur Herstellung einer kalibrierten Längenskala im Nanometerbereich für technische Geräte, die der hochauflösenden bis ultrahochauflösenden Abbildung von Strukturen dienen |
| US6148114A (en) * | 1996-11-27 | 2000-11-14 | Ultrapointe Corporation | Ring dilation and erosion techniques for digital image processing |
| JPH1125898A (ja) * | 1997-05-08 | 1999-01-29 | Hitachi Ltd | 電子顕微鏡の分解能評価方法および分解能評価用試料 |
| JP4727777B2 (ja) * | 1999-05-24 | 2011-07-20 | 株式会社日立製作所 | 走査形電子顕微鏡による測長方法 |
| US6545275B1 (en) * | 1999-09-03 | 2003-04-08 | Applied Materials, Inc. | Beam evaluation |
| US6570157B1 (en) | 2000-06-09 | 2003-05-27 | Advanced Micro Devices, Inc. | Multi-pitch and line calibration for mask and wafer CD-SEM system |
| US6573497B1 (en) | 2000-06-30 | 2003-06-03 | Advanced Micro Devices, Inc. | Calibration of CD-SEM by e-beam induced current measurement |
| US6573498B1 (en) | 2000-06-30 | 2003-06-03 | Advanced Micro Devices, Inc. | Electric measurement of reference sample in a CD-SEM and method for calibration |
| US6750447B2 (en) * | 2002-04-12 | 2004-06-15 | Agere Systems, Inc. | Calibration standard for high resolution electron microscopy |
| DE10225193B4 (de) * | 2002-06-06 | 2004-08-12 | Leica Microsystems (Schweiz) Ag | Verfahren zur Kalibrierung der Vergrößerung eines Mikroskops sowie kalibrierbares Mikroskop |
| US6875982B2 (en) * | 2003-08-29 | 2005-04-05 | International Business Machines Corporation | Electron microscope magnification standard providing precise calibration in the magnification range 5000X-2000,000X |
| US7323350B2 (en) * | 2004-09-30 | 2008-01-29 | Hitachi Global Storage Technologies Netherlands B.V. | Method of fabricating thin film calibration features for electron/ion beam image based metrology |
| JP4650113B2 (ja) * | 2005-06-09 | 2011-03-16 | 富士ゼロックス株式会社 | 積層構造体、ドナー基板、および積層構造体の製造方法 |
| US8373113B2 (en) * | 2008-11-05 | 2013-02-12 | Hitachi High-Technologies Corporation | Calibration standard member, method for manufacturing the member and scanning electronic microscope using the member |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2116927A (en) * | 1935-04-20 | 1938-05-10 | Germer Edmund | Electrical discharge device |
| US2859158A (en) * | 1957-01-31 | 1958-11-04 | Glenn R Schaer | Method of making a nickel-chromium diffusion alloy |
| DE1932926A1 (de) * | 1969-06-28 | 1971-01-21 | Siemens Ag | Vorrichtung zur Justierung des Elektronenstrahles einer Mikrosonde |
| US3987529A (en) * | 1971-11-01 | 1976-10-26 | Asahi Kasei Kogyo Kabushiki Kaisha | Valve and method for manufacturing the same |
| US3954420A (en) * | 1975-06-24 | 1976-05-04 | Whyco Chromium Co., Inc. | Non-ferrous corrosion resistant undercoating |
| US4005527A (en) * | 1975-12-22 | 1977-02-01 | Wilson Ralph S | Depth gauge |
-
1976
- 1976-10-29 US US05/736,978 patent/US4068381A/en not_active Expired - Lifetime
-
1977
- 1977-08-16 CA CA284,770A patent/CA1080369A/en not_active Expired
- 1977-08-22 AU AU28086/77A patent/AU505385B2/en not_active Expired
- 1977-08-23 GB GB35371/77A patent/GB1540780A/en not_active Expired
- 1977-08-29 IE IE1797/77A patent/IE45575B1/en unknown
- 1977-09-07 DE DE19772740224 patent/DE2740224A1/de not_active Withdrawn
- 1977-10-19 FR FR7731492A patent/FR2369544A1/fr not_active Withdrawn
- 1977-10-19 IT IT51471/77A patent/IT1090530B/it active
- 1977-10-20 NL NL7711544A patent/NL7711544A/xx unknown
- 1977-10-24 JP JP12747877A patent/JPS5355953A/ja active Pending
- 1977-10-27 BE BE182135A patent/BE860196A/xx unknown
- 1977-11-03 US US05/848,176 patent/US4139933A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| FR2369544A1 (fr) | 1978-05-26 |
| JPS5355953A (en) | 1978-05-20 |
| AU505385B2 (en) | 1979-11-15 |
| US4068381A (en) | 1978-01-17 |
| AU2808677A (en) | 1979-03-01 |
| GB1540780A (en) | 1979-02-14 |
| NL7711544A (nl) | 1978-05-03 |
| IE45575B1 (en) | 1982-10-06 |
| US4139933A (en) | 1979-02-20 |
| DE2740224A1 (de) | 1978-05-11 |
| BE860196A (fr) | 1978-02-15 |
| CA1080369A (en) | 1980-06-24 |
| IT1090530B (it) | 1985-06-26 |
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