IT8067559A0 - Procedimento e polvere per la sensi bilizzazione a secco di una superficie isolante ai fini della deposizione non elettrolitica di un rivestimento metallico - Google Patents

Procedimento e polvere per la sensi bilizzazione a secco di una superficie isolante ai fini della deposizione non elettrolitica di un rivestimento metallico

Info

Publication number
IT8067559A0
IT8067559A0 IT8067559A IT6755980A IT8067559A0 IT 8067559 A0 IT8067559 A0 IT 8067559A0 IT 8067559 A IT8067559 A IT 8067559A IT 6755980 A IT6755980 A IT 6755980A IT 8067559 A0 IT8067559 A0 IT 8067559A0
Authority
IT
Italy
Prior art keywords
bilization
dry
powder
procedure
insulating surface
Prior art date
Application number
IT8067559A
Other languages
English (en)
Other versions
IT1128410B (it
Inventor
Gunnar Sorensen
Leo Gulvad Svendsen
Original Assignee
Neselco As
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Neselco As filed Critical Neselco As
Publication of IT8067559A0 publication Critical patent/IT8067559A0/it
Application granted granted Critical
Publication of IT1128410B publication Critical patent/IT1128410B/it

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1603—Process or apparatus coating on selected surface areas
    • C23C18/1607—Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1608—Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28—Sensitising or activating
    • C23C18/285—Sensitising or activating with tin based compound or composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/22—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20
    • G03G15/225—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 using contact-printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/65—Apparatus which relate to the handling of copy material
    • G03G15/6582—Special processing for irreversibly adding or changing the sheet copy material characteristics or its appearance, e.g. stamping, annotation printing, punching
    • G03G15/6585—Special processing for irreversibly adding or changing the sheet copy material characteristics or its appearance, e.g. stamping, annotation printing, punching by using non-standard toners, e.g. transparent toner, gloss adding devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0517—Electrographic patterning
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1266—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by electrographic or magnetographic printing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2998—Coated including synthetic resin or polymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
IT67559/80A 1979-04-11 1980-04-10 Procedimento e polvere per sensibilizzazione a secco di una superficie isolante ai fini della deposizione non elettrolitica di un rivestimento metallico IT1128410B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DK150779A DK153337C (da) 1979-04-11 1979-04-11 Fremgangsmaade til toer sensibilisering af en isolerende overflade

Publications (2)

Publication Number Publication Date
IT8067559A0 true IT8067559A0 (it) 1980-04-10
IT1128410B IT1128410B (it) 1986-05-28

Family

ID=8105559

Family Applications (1)

Application Number Title Priority Date Filing Date
IT67559/80A IT1128410B (it) 1979-04-11 1980-04-10 Procedimento e polvere per sensibilizzazione a secco di una superficie isolante ai fini della deposizione non elettrolitica di un rivestimento metallico

Country Status (12)

Country Link
US (1) US4504529A (it)
EP (1) EP0026211B1 (it)
JP (1) JPH0210593B2 (it)
CA (1) CA1162778A (it)
DE (1) DE3067809D1 (it)
DK (1) DK153337C (it)
IE (1) IE49192B1 (it)
IL (1) IL59807A (it)
IT (1) IT1128410B (it)
NO (1) NO154370C (it)
WO (1) WO1980002222A1 (it)
ZA (1) ZA802121B (it)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
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DK427780A (da) * 1980-10-10 1982-04-11 Neselco As Pulver til brug ved toer sensibilisering for stroemloes metallisering
DK148327C (da) * 1981-07-24 1985-11-04 Neselco As Pulver til brug ved toer sensibilisering for stroemloes metallisering
DE3134507A1 (de) * 1981-09-01 1983-03-17 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt "verfahren zur selektiven chemischen metallabscheidung"
DK153572C (da) * 1982-02-18 1988-12-19 Platonec Aps Pulver til brug ved toer aktivering for stroemloes metallisering, fremgangsmaade til fremstilling deraf samt anvendelse deraf
IT1184408B (it) * 1985-04-09 1987-10-28 Telettra Lab Telefon Processo per la fabbricazione di piastre e circuiti stampati,e prodotti relativi
US5244525A (en) * 1987-11-02 1993-09-14 Kimberly-Clark Corporation Methods for bonding, cutting and printing polymeric materials using xerographic printing of IR absorbing material
US4851320A (en) * 1988-05-23 1989-07-25 Tektronix, Inc. Method of forming a pattern of conductor runs on a dielectric sheet
US5213850A (en) * 1989-03-24 1993-05-25 Nippon Paint Co., Ltd. Process for plating a metallic deposit between functional pattern lines on a substrate
ATE185157T1 (de) 1990-11-19 1999-10-15 Loctite Corp Fotohärtbare polysiloxanzusammensetzung und verfahren zur herstellung
US5269980A (en) * 1991-08-05 1993-12-14 Northeastern University Production of polymer particles in powder form using an atomization technique
DE4142658A1 (de) * 1991-12-19 1993-06-24 Siemens Ag Verfahren zum aufbringen von lot auf eine leiterplatte
US5304447A (en) * 1992-02-11 1994-04-19 Elf Technologies, Inc. Plateable toner and method for producing the same
DE4319759A1 (de) * 1993-06-15 1994-12-22 Bayer Ag Pulvermischungen zum Metallisieren von Substratoberflächen
DE19731346C2 (de) * 1997-06-06 2003-09-25 Lpkf Laser & Electronics Ag Leiterbahnstrukturen und ein Verfahren zu deren Herstellung
DE19942054A1 (de) * 1999-09-03 2001-12-06 Schott Glas Verfahren zur Herstellung einer gedruckten Schaltung
RU2003135208A (ru) * 2001-06-04 2005-05-10 Квинетик Лимитед (Gb) Способ формирования рисунка
GB2381274A (en) * 2001-10-29 2003-04-30 Qinetiq Ltd High resolution patterning method
GB2382798A (en) * 2001-12-04 2003-06-11 Qinetiq Ltd Inkjet printer which deposits at least two fluids on a substrate such that the fluids react chemically to form a product thereon
US20040265531A1 (en) * 2003-06-30 2004-12-30 Mckean Dennis R. Sliders bonded by a debondable silicon-based encapsulant
EP2003939A1 (en) * 2007-06-14 2008-12-17 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Method for preparing a pattern for a 3-dimensional electric circuit
KR20120127599A (ko) * 2010-01-14 2012-11-22 더 리젠츠 오브 더 유니버시티 오브 캘리포니아 전기 전도성 나노구조의 박막을 성장시키기 위한 일반적 해법
RU2673883C2 (ru) 2012-10-12 2018-12-03 Дзе Риджентс Оф Дзе Юниверсити Оф Калифорния Полианилиновые мембраны, их применения и способы увеличения гидрофильности мембран
KR102375661B1 (ko) 2013-05-15 2022-03-16 더 리젠츠 오브 더 유니버시티 오브 캘리포니아 정삼투식 적용을 위한 상 반전에 의해 형성된 폴리아닐린 막
CA2947848C (en) 2014-04-08 2022-08-09 The Regents Of The University Of California Polyaniline-based chlorine resistant hydrophilic filtration membranes

Family Cites Families (33)

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GB299903A (en) * 1927-08-02 1928-11-02 Albert Ivan Gates Warren Improvements in processes for coating non-conducting substances with metals
GB567503A (en) * 1943-06-02 1945-02-16 Frank Enoch Kerridge Improvements in or relating to the production of metallic designs on non-metallic materials
US2910351A (en) * 1955-01-03 1959-10-27 Gen Electric Method of making printed circuit
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US2939804A (en) * 1958-01-23 1960-06-07 Uarco Inc Resin particle coated with metal
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US3942983A (en) * 1967-06-09 1976-03-09 Minnesota Mining And Manufacturing Company Electroless deposition of a non-noble metal on light generated nuclei of a metal more noble than silver
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US3880689A (en) * 1971-09-30 1975-04-29 Eastman Kodak Co Magnetic developer containing an electroless plating sensitizer, and method of using same
BE789988A (fr) * 1971-10-12 1973-04-12 Xerox Corp Composition de revelateur et procede pour son emploi
CA986770A (en) * 1972-04-10 1976-04-06 Jack C. Goldfrank Pressure fixable magnetic toners
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JPS5187042A (it) * 1975-01-29 1976-07-30 Hitachi Metals Ltd
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US4042730A (en) * 1976-03-29 1977-08-16 Bell Telephone Laboratories, Incorporated Process for electroless plating using separate sensitization and activation steps
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US4307168A (en) * 1977-05-05 1981-12-22 Eastman Kodak Company Amplification of developed electrographic image patterns
JPS54126959A (en) * 1978-03-25 1979-10-02 Nippon Mektron Kk Method of producing circuit board

Also Published As

Publication number Publication date
DK153337C (da) 1988-11-14
WO1980002222A1 (en) 1980-10-16
EP0026211A1 (en) 1981-04-08
DE3067809D1 (en) 1984-06-20
US4504529A (en) 1985-03-12
EP0026211B1 (en) 1984-05-16
JPH0210593B2 (it) 1990-03-08
NO154370C (no) 1986-09-03
DK150779A (da) 1980-10-12
CA1162778A (en) 1984-02-28
IT1128410B (it) 1986-05-28
JPS56500435A (it) 1981-04-02
IL59807A (en) 1983-11-30
DK153337B (da) 1988-07-04
NO154370B (no) 1986-05-26
ZA802121B (en) 1981-04-29
IE800732L (en) 1980-10-11
NO803710L (no) 1980-12-09
IE49192B1 (en) 1985-08-21

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