JP2000212730A - Thin film forming device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To vacuum-deposit a vapor depositing material on the face to be vapor-deposited to an optional pattern by arranging a forcusing electrode, an acceleration controlling electrode and a deflecting electrode on the space between an electrode in a crucible and an electrifying electrode in the face to be vapor-deposited in a vacuum device. SOLUTION: In an electrode 1 in a crucible having fine pores, a vapor depositing material is evaporated, the pressure at the inside is controlled to the relatively high one, it is blown off from the small pores, is ionized by using a grid 3 and a heat cathode for ionization in the following chamger, is made into the shape of a finer beam by a forcusing electrode 8 and is deflected by deflecting electrodes A, A', B and B', and an optional pattern is crashed into the face 10 to be vapor-deposited to form a thin film.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film manufacturing apparatus capable of vapor-depositing a plurality of vapor-deposited materials on a surface to be vapor-deposited in a desired pattern.

[0002]

2. Description of the Related Art In a vacuum apparatus, a surface to be vapor-deposited is commonly used with an accelerating electrode interposed between an electrode in a crucible and a charging electrode. In a practical deposition surface, the deposition material for the electrode in the crucible must be uniformly deposited, and the space between the electrode surface in the crucible and the deposition surface has a margin. In vacuum equipment, the space between the electrode in the crucible and the surface to be deposited is usually given a margin for the uniform deposition effect of the accelerating electrode. It was practically sufficient to add a plurality of devices.

However, when a thin film manufacturing apparatus is used, it is necessary to exchange the evaporation material of the electrode in the crucible of the thin film manufacturing apparatus in order to realize the deposition of a plurality of layers. In order to ensure a sufficient degree of vacuum in the thin film manufacturing apparatus, the area of the casing of the vapor deposition apparatus becomes large, and it takes time to ensure the degree of vacuum sufficiently.

[0004] In applications where the thin film manufacturing apparatus is used indoors in general, the disadvantage that the area of the housing becomes large is a major obstacle to the selection of the installation location. In particular,
To take an unnecessary place and to secure a sufficient degree of vacuum, struggle with soundproofing of the vacuum device, increase the power consumption of the vacuum device, or take time to maintain the temperature of the deposition material of the electrode in the crucible. There was a problem that the mixing of the surface colors could not be stabilized.

[0005] As a remedy, there is a method of stabilizing the mixing of colors on the surface to be vaporized by taking sufficient time for constant temperature, and increasing the degree of vacuum by increasing the size of a vacuum apparatus. is there. FIG. 3 is an explanatory view showing a mounting mode of a thin film manufacturing apparatus according to this method, and is a cross-sectional view taken on a plane perpendicular to a vacuum deposition surface. In FIG. 3, reference numeral 10 denotes a surface to be vapor-deposited, 1 denotes a vapor deposition material for an electrode in a crucible, and 11 denotes a vacuum device. However, even in this method, it is necessary to secure a sufficient exchange time for the number of times of the number of multilayers that cannot be ignored due to the implementation of the multilayer vacuum deposition.

[0006]

The problem to be solved is that the surface to be deposited itself cannot vacuum deposit the necessary layers in the same process.

[0007]

SUMMARY OF THE INVENTION The present invention provides a focusing electrode, an acceleration control electrode, and a deflection electrode between a deposition material of an electrode in a crucible disposed in a vacuum apparatus and a charging electrode of a substrate (base material) on a deposition surface. The most important feature is that electrodes are arranged and a plurality of layers can be deposited in an arbitrary pattern.

[0008]

BEST MODE FOR CARRYING OUT THE INVENTION The present invention has been realized by reducing the thickness of the housing or the housing as much as possible to reduce the weight and to minimize the number of parts without impairing the performance of the components.

[0009]

FIG. 1 is a plan view of an embodiment of the apparatus of the present invention, and FIG. 2 shows a cross section of a deflection electrode section of a thin film manufacturing apparatus.
FIG. 4 shows a combined manufacturing apparatus of a thin film manufacturing apparatus,
Between the focusing accelerating electrode, the 8 focusing electrodes, the 9 accelerating control electrodes, and the deflecting electrodes A, A 'and B, B', respectively, one electrode in the crucible and three ionizing grids as charging electrodes, four hot cathodes and five accelerating electrodes are provided. A composite thin film is manufactured by having a plurality of pairs of electrodes in a plurality of small rooms.

[0010] The vapor deposition material is evaporated in one crucible electrode having a small hole to make the inside relatively high in pressure, and is blown out from the small hole. Then, the beam is made thinner by the eight focusing electrodes, deflected by the deflecting electrodes A and A 'and B and B', and an arbitrary pattern is made to collide with the surface to be vapor-deposited to form a thin film. Since the subject of the present invention lies in the mounting method of the engineering system, the description of the electronic and mechanical systems is omitted.

In general, it has been mathematically known that the evaporation rate m ₀ from the unit area can be obtained by the following equation (1), and the half width is approximately expressed by the following equation (2). Is shown.

[0012]

(Equation 1)

[0013]

(Equation 2)

In the above formulas, as shown, P is the vapor pressure, M is the molecular weight, T is the temperature of the gas, and R is the deflection electrodes A, A ', B', and B ' In the deflection distance, r ₀ is the Rama radius.

Since such an engineering mounting mode is adopted, a vapor deposition material can be vapor-deposited on an arbitrary number of substrates from one crucible electrode to ten substrates without effectively deteriorating characteristics in vacuum vapor deposition. Therefore, in the production, an arbitrary pattern can be formed on the surface to be vapor-deposited by switching the vapor-deposition sample evaporation block and deflecting by the deflection electrodes A, A 'and B, B', and the positioning at the vapor deposition position or in the vicinity thereof can be easily performed. Become. Furthermore, the capacity of the vacuum vessel 11 can be reduced, and the manufacturing equipment, especially the clean room equipment, can be reduced in size, which has the effect of reducing power and manufacturing time.

In the embodiment shown in FIG. 4, the vapor deposition layer can be vapor-deposited in multiple layers by installing and switching the vapor deposition sample vapor block attached to the vacuum vessel as needed, so that, for example, a transparent electrode is vapor-deposited first and then When manufacturing the dielectric film, the insulating film, and the like in this order, the evaporation sample evaporation blocks are switched and used in the order of the evaporation material. In order to ensure the accuracy of vapor deposition, it is necessary that the degree of vacuum in the vacuum vessel is good, so this switching function is useful for improving the operability of thin film production and expanding the range of production targets.

[0017]

Since the present invention is configured as described above, it has the following effects. The thin film manufacturing equipment can be switched for mounting vacuum evaporation of multiple layers and the exchange time for the number of multilayers can be done in a short time just by switching the electrodes in the crucible in the same evaporation apparatus, and it can be set as desired by operating the deflection electrode The pattern can be deposited, and it can be easily manufactured with a small-scale thin-film manufacturing equipment like a large-scale facility.

[Brief description of the drawings]

FIG. 1 is an explanatory view showing a method for implementing a thin film manufacturing apparatus. (Example 1)

FIG. 2 is an explanatory diagram showing a cross section of a deflection electrode unit of the thin film manufacturing apparatus.

FIG. 3 is an explanatory view showing a method for implementing a conventional thin film manufacturing apparatus.

FIG. 4 is an explanatory view showing a method for implementing a composite manufacturing apparatus for a thin film. (Example 2)

FIG. 5 is an explanatory diagram showing a deflection focusing unit of the thin film manufacturing apparatus. (Example 3)

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Crucible electrode 2 Heater 3 Ionization grid 4 Hot cathode 5 Acceleration electrode 6 Focusing acceleration electrode 7 Ion beam 8 Focusing electrode 9 Acceleration control electrode 10 Substrate 11 Vacuum container 12 Deflection signal 13 Deflection signal A, A 'Deflection electrode B, B' Deflection electrode C Evaporation sample heating small room D Ionization small room Cn Evaporation sample evaporation block

 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Shoichi Yamauchi 1-118-505, Omorikita, Ota-ku, Tokyo F-term (reference) 4K029 BB02 BB03 CA03 DD04

Claims (3)

[Claims] 1. A focusing electrode, an acceleration control electrode, and a deflection electrode are arranged between an electrode in a crucible arranged in a vacuum device and a charging electrode on a surface to be vapor-deposited. Thin film production equipment characterized by being capable of vapor deposition. 2. An apparatus for manufacturing a thin film, wherein a plurality of electrodes in a crucible, a focusing electrode, and an acceleration control electrode are arranged as a pair, and a plurality of layers of an evaporation material for an arbitrary electrode in a crucible can be deposited on a surface to be deposited. 3. A thin film manufacturing apparatus characterized in that a vapor deposition material in a crucible can be focused in a narrow beam shape by a ground electrode, a focusing electrode, and an acceleration control electrode of electrodes in the crucible.