JP2000504668A - 不透明石英ガラス製品および製造方法 - Google Patents
不透明石英ガラス製品および製造方法Info
- Publication number
- JP2000504668A JP2000504668A JP9529093A JP52909397A JP2000504668A JP 2000504668 A JP2000504668 A JP 2000504668A JP 9529093 A JP9529093 A JP 9529093A JP 52909397 A JP52909397 A JP 52909397A JP 2000504668 A JP2000504668 A JP 2000504668A
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- opaque
- products
- silica particles
- additive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 96
- 238000004519 manufacturing process Methods 0.000 title description 16
- 238000000034 method Methods 0.000 claims abstract description 43
- 239000000654 additive Substances 0.000 claims abstract description 32
- 230000000996 additive effect Effects 0.000 claims abstract description 17
- 239000000843 powder Substances 0.000 claims description 30
- 239000005350 fused silica glass Substances 0.000 claims description 23
- 239000002245 particle Substances 0.000 claims description 18
- 239000007788 liquid Substances 0.000 claims description 17
- 239000010453 quartz Substances 0.000 claims description 15
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 10
- 239000013078 crystal Substances 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 2
- 238000004090 dissolution Methods 0.000 claims 1
- 150000003377 silicon compounds Chemical group 0.000 claims 1
- 239000004575 stone Substances 0.000 claims 1
- 238000002844 melting Methods 0.000 abstract description 21
- 230000008018 melting Effects 0.000 abstract description 21
- 230000001965 increasing effect Effects 0.000 abstract description 6
- 239000011521 glass Substances 0.000 description 17
- 239000002994 raw material Substances 0.000 description 15
- 230000005540 biological transmission Effects 0.000 description 11
- 229920001296 polysiloxane Polymers 0.000 description 9
- 239000000377 silicon dioxide Substances 0.000 description 8
- -1 trimethylsiloxy groups Chemical group 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000007822 coupling agent Substances 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 229920002545 silicone oil Polymers 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000009826 distribution Methods 0.000 description 3
- 239000000839 emulsion Substances 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000008240 homogeneous mixture Substances 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000011819 refractory material Substances 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000007569 slipcasting Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- WEEGYLXZBRQIMU-UHFFFAOYSA-N Eucalyptol Chemical compound C1CC2CCC1(C)OC2(C)C WEEGYLXZBRQIMU-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 240000007591 Tilia tomentosa Species 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 238000000563 Verneuil process Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- ASSMBLOISZSMMP-UHFFFAOYSA-N chloro-dimethyl-(3-phenylpropyl)silane Chemical compound C[Si](C)(Cl)CCCC1=CC=CC=C1 ASSMBLOISZSMMP-UHFFFAOYSA-N 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 229960005233 cineole Drugs 0.000 description 1
- RFFOTVCVTJUTAD-UHFFFAOYSA-N cineole Natural products C1CC2(C)CCC1(C(C)C)O2 RFFOTVCVTJUTAD-UHFFFAOYSA-N 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002470 thermal conductor Substances 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
- C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B3/00—Charging the melting furnaces
- C03B3/02—Charging the melting furnaces combined with preheating, premelting or pretreating the glass-making ingredients, pellets or cullet
- C03B3/026—Charging the melting furnaces combined with preheating, premelting or pretreating the glass-making ingredients, pellets or cullet by charging the ingredients into a flame, through a burner or equivalent heating means used to heat the melting furnace
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/10—Melting processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/08—Quartz
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.シリカ粒子の融解によって製造される不透明石英ガラス製品であって、融 解工程の間の有機ケイ素添加剤の反応によって製品の不透明性が高められている 不透明石英ガラス製品。 2.上記添加剤が、室温で液体の有機ケイ素化合物である請求項1の不透明石 英ガラス製品。 3.上記有機ケイ素化合物が、上記シリカ粒子の表面に化学的に結合した層を 形成している請求項2の不透明石英ガラス製品。 4.上記添加剤が、上記シリカ粒子と均一に混合された超微細粉末である請求 項1の不透明石英ガラス製品。 5.上記シリカ粒子が石英結晶粒子から得られる請求項1〜4のいずれか1つ の不透明石英ガラス製品。 6.上記シリカ粒子が非結晶シリカ粒子である請求項1〜4のいずれか1つの 不透明石英ガラス製品。 7.超微細無機粉末の形で第二の添加剤を取り込むことによって不透明性を更 に高められた請求項1〜6のいずれか1つの不透明石英ガラス製品。 8.上記超微細無機粉末が非結晶シリカ粉末である請求項7の不透明石英ガラ ス製品。 9.実質的に前記の例のいずれか1つで先に説明されたように製造された不透 明石英製品。 10.不透明性を高める添加剤の存在下でシリカ粒子を融解して石英ガラス製 品の不透明性を向上させる方法であって、上記添加剤が有機ケイ素化合物である 石英ガラス製品の不透明性向上方法。 11.上記添加剤が、室温で液体の有機ケイ素化合物である請求項10の方法 。 12.上記有機ケイ素化合物が、上記シリカ粒子の表面に化学的に結合した層 を形成する請求項11の方法。 13.融解される上記シリカ粒子を、石英結晶粒子から得る請求項10〜12 のいずれか1つの方法。 14.超微細無機粉末の形の第二の添加剤を取り入れて、不透明性を更に高め る請求項10〜13のいずれか1つの方法。 15.上記超微細無機粉末が非結晶シリカ粉末である請求項14の方法。 16.請求項1〜9のいずれかの石英ガラス製品から作られた、または請求項 10〜15のいずれか1つの方法で作られたインゴット、板、ディスク、棒、チ ューブ、るつぼ、フランジまたは他の二次加工品。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9603128.1 | 1996-02-15 | ||
| GBGB9603128.1A GB9603128D0 (en) | 1996-02-15 | 1996-02-15 | Improved vitreous silica product and method of manufacture |
| PCT/GB1997/000398 WO1997030000A1 (en) | 1996-02-15 | 1997-02-13 | Opaque quartz glass product and method of manufacture |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000504668A true JP2000504668A (ja) | 2000-04-18 |
| JP2000504668A5 JP2000504668A5 (ja) | 2004-11-18 |
| JP4118952B2 JP4118952B2 (ja) | 2008-07-16 |
Family
ID=10788758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52909397A Expired - Lifetime JP4118952B2 (ja) | 1996-02-15 | 1997-02-13 | 不透明石英ガラス製品および製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US5985779A (ja) |
| EP (1) | EP0880479B1 (ja) |
| JP (1) | JP4118952B2 (ja) |
| AU (1) | AU1800797A (ja) |
| DE (1) | DE69703091T2 (ja) |
| GB (1) | GB9603128D0 (ja) |
| TW (1) | TW420654B (ja) |
| WO (1) | WO1997030000A1 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015151320A (ja) * | 2014-02-17 | 2015-08-24 | 東ソー株式会社 | 不透明石英ガラスおよびその製造方法 |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5900381A (en) * | 1997-08-26 | 1999-05-04 | General Electric Company | Opaque silica composition |
| GB9722020D0 (en) * | 1997-10-17 | 1997-12-17 | Tsl Group Plc | Production of quartz glass articles having high surface purity |
| DE19936478A1 (de) * | 1999-08-03 | 2001-02-15 | Degussa | Sinterwerkstoffe |
| GB0605461D0 (en) * | 2006-03-17 | 2006-04-26 | Saint Gobain Quartz Plc | Manufacture of large articles in synthetic vitreous silica |
| DE102006052512A1 (de) * | 2006-11-06 | 2008-05-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von opakem Quarzglas, nach dem Verfahren erhaltenes Halbzeug sowie daraus hergestelltes Bauteil |
| GB2478307A (en) | 2010-03-02 | 2011-09-07 | Heraeus Quartz Uk Ltd | Manufacture of silica glass |
| WO2012137714A1 (ja) | 2011-04-04 | 2012-10-11 | ローム株式会社 | 半導体装置および半導体装置の製造方法 |
| GB201106015D0 (en) | 2011-04-08 | 2011-05-25 | Heraeus Quartz Uk Ltd | Production of silica soot bodies |
| GB2514118B (en) | 2013-05-13 | 2015-11-11 | Heraeus Quartz Uk Ltd | Froth floatation separation and analysis |
| CN105210173A (zh) * | 2013-05-23 | 2015-12-30 | 应用材料公司 | 用于半导体处理腔室的经涂布的衬里组件 |
| US9957431B2 (en) * | 2013-11-11 | 2018-05-01 | Heraeus Quarzglas Gmbh & Co. Kg | Composite material, heat-absorbing component, and method for producing the composite material |
| CN106082603A (zh) * | 2016-06-20 | 2016-11-09 | 湖北菲利华石英玻璃股份有限公司 | 一种不透明石英玻璃锭的制造方法 |
| RU2643532C1 (ru) * | 2017-01-09 | 2018-02-02 | Автономная некоммерческая организация высшего образования "Белгородский университет кооперации, экономики и права" | Способ получения блочного пеностекла |
| CN111233309B (zh) * | 2020-04-02 | 2022-02-22 | 湖北菲利华石英玻璃股份有限公司 | 一种高质量不透明石英玻璃锭的生产方法 |
| CN114644441B (zh) * | 2022-04-27 | 2023-05-26 | 中建材衢州金格兰石英有限公司 | 一种不透明石英粉的混料方法及其混料装置 |
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| JPH0465328A (ja) * | 1990-07-06 | 1992-03-02 | Nippon Sekiei Glass Kk | 不透明石英ガラスの製造法 |
| JPH05254882A (ja) * | 1992-03-12 | 1993-10-05 | Nippon Sekiei Glass Kk | 不透明石英ガラス |
| EP0647600A1 (en) * | 1993-10-08 | 1995-04-12 | Tosoh Corporation | High-purity, opaque quartz glass, method for producing same and use thereof |
| JPH07267724A (ja) * | 1993-11-12 | 1995-10-17 | Heraeus Quarzglas Gmbh | 高含量の二酸化珪素を有する造形物およびその製造法 |
| JPH07300341A (ja) * | 1994-04-28 | 1995-11-14 | Shinetsu Quartz Prod Co Ltd | 不透明石英ガラスおよびその製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01317155A (ja) * | 1988-03-04 | 1989-12-21 | Mitsubishi Kasei Corp | セラミック成形体の製造法 |
| EP0653613B1 (de) * | 1993-11-12 | 1997-11-26 | Xenotest Gesellschaft für die Herstellung von Materialprüfgeräten mbH | UV-Sensor |
-
1996
- 1996-02-15 GB GBGB9603128.1A patent/GB9603128D0/en active Pending
-
1997
- 1997-02-13 WO PCT/GB1997/000398 patent/WO1997030000A1/en not_active Ceased
- 1997-02-13 DE DE69703091T patent/DE69703091T2/de not_active Expired - Fee Related
- 1997-02-13 US US09/125,240 patent/US5985779A/en not_active Expired - Lifetime
- 1997-02-13 JP JP52909397A patent/JP4118952B2/ja not_active Expired - Lifetime
- 1997-02-13 AU AU18007/97A patent/AU1800797A/en not_active Abandoned
- 1997-02-13 EP EP97903450A patent/EP0880479B1/en not_active Expired - Lifetime
- 1997-02-15 TW TW086102181A patent/TW420654B/zh not_active IP Right Cessation
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0465328A (ja) * | 1990-07-06 | 1992-03-02 | Nippon Sekiei Glass Kk | 不透明石英ガラスの製造法 |
| JPH05254882A (ja) * | 1992-03-12 | 1993-10-05 | Nippon Sekiei Glass Kk | 不透明石英ガラス |
| EP0647600A1 (en) * | 1993-10-08 | 1995-04-12 | Tosoh Corporation | High-purity, opaque quartz glass, method for producing same and use thereof |
| JPH07267724A (ja) * | 1993-11-12 | 1995-10-17 | Heraeus Quarzglas Gmbh | 高含量の二酸化珪素を有する造形物およびその製造法 |
| JPH07300341A (ja) * | 1994-04-28 | 1995-11-14 | Shinetsu Quartz Prod Co Ltd | 不透明石英ガラスおよびその製造方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015151320A (ja) * | 2014-02-17 | 2015-08-24 | 東ソー株式会社 | 不透明石英ガラスおよびその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW420654B (en) | 2001-02-01 |
| US5985779A (en) | 1999-11-16 |
| JP4118952B2 (ja) | 2008-07-16 |
| EP0880479B1 (en) | 2000-09-13 |
| DE69703091T2 (de) | 2001-05-03 |
| EP0880479A1 (en) | 1998-12-02 |
| DE69703091D1 (de) | 2000-10-19 |
| GB9603128D0 (en) | 1996-04-17 |
| WO1997030000A1 (en) | 1997-08-21 |
| AU1800797A (en) | 1997-09-02 |
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