JP2009021301A - 電圧非直線性抵抗体磁器組成物、電子部品、及び積層チップバリスタ - Google Patents
電圧非直線性抵抗体磁器組成物、電子部品、及び積層チップバリスタ Download PDFInfo
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Abstract
【解決手段】電圧非直線性抵抗体層11を構成する電圧非直線性抵抗体磁器組成物は、酸化亜鉛を含む主成分と、希土類金属の酸化物を含む第1副成分と、Caの酸化物を含む第2副成分と、Siの酸化物を含む第3副成分と、を有している。主成分100モルに対する第2副成分の比率は、Caに換算して、2原子%≦第2副成分<80原子%である。主成分100モルに対する第3副成分の比率は、Siに換算して、1原子%≦第3副成分<40原子%である。CaとSiとの原子比(Ca/Si)は、1以上である。
【選択図】図1
Description
C=ε0εr(S/d) … (1)
で表される。Cは静電容量、ε0は真空の誘電率、εrは比誘電率、Sは静電容量が発現する対向電極の面積、dは対向電極間の厚みを表している。酸化亜鉛を主成分として含むバリスタ、いわゆる酸化亜鉛系バリスタの場合、厚みdの取り扱いに注意を要する。酸化亜鉛系バリスタは、結晶粒界により特性が発現する。すなわち、粒界の抵抗と粒内の抵抗には、定常状態に於いて大きな差があり、粒界の抵抗は粒内のそれに比較してはるかに大きい。従って、ブレークダウン電圧(立ち上がり電圧)を超えない定常状態では、印加された電界はほぼ全てが粒界にかかっている。したがって、上述した厚みdは、この点を考慮しなければならない。
d=n・2W … (2)
で表される。nは対向電極と平行な粒界数、2Wは1粒界の空乏層幅を表している。
n=V1mA/φ … (3)
の関係が成立する。φは粒界のバリア高さで、1粒界あたりのバリスタ電圧を代表する値である。
C・V1mA=ε0εr・(φ・S/2W) … (4)
となる。φと2Wとは、適正な電圧非直線特性のとき、ある一定の値(例えば、φ=0.8eV、2W=30nmくらい)となるので、対向電極の面積Sが一定の場合、式(4)は一定である。逆に言えば、適正な電圧非直線特性を維持したまま静電容量を低下させるには、対向電極の面積Sを小さくするのが効果的である。
α=log(I10/I1)/log(V10/V1)=1/log(V10/V1)
V10は、積層チップバリスタ試料にI10=10mAの電流を流した場合のバリスタ電圧を意味する。V1は、積層チップバリスタ試料にI1=1mAの電流を流した場合のバリスタ電圧を意味する。非直線係数αが大きいほど、バリスタ特性に優れている。
Claims (13)
- 酸化亜鉛を含む主成分と、
希土類金属の酸化物を含む第1副成分と、
Caの酸化物を含む第2副成分と、
Siの酸化物を含む第3副成分と、を有しており、
前記主成分100モルに対する前記第2副成分の比率が、Caに換算して、2原子%≦第2副成分<80原子%であり、
前記主成分100モルに対する前記第3副成分の比率が、Siに換算して、1原子%≦第3副成分<40原子%であり、
CaとSiとの原子比(Ca/Si)が、1以上である電圧非直線性抵抗体磁器組成物。 - 前記第1副成分に含まれる希土類元素の酸化物が、Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、及びLuから選ばれる少なくとも1種の酸化物であり、
前記主成分100モルに対する前記第1副成分の比率が、希土類元素に換算して、0.01原子%<第1副成分<10原子%である請求項1に記載の電圧非直線性抵抗体磁器組成物。 - 前記第1副成分に含まれる希土類元素の酸化物が、Prの酸化物である請求項1又は2に記載の電圧非直線性抵抗体磁器組成物。
- Coの酸化物を含む第4副成分を更に有しており、
前記主成分100モルに対する前記第4副成分の比率が、Coに換算して、0.05原子%<第4副成分<10原子%である請求項1〜3のいずれか一項に記載の電圧非直線性抵抗体磁器組成物。 - IIIB族元素から選ばれる少なくとも1種の酸化物を含む第5副成分を更に有しており、
前記主成分100モルに対する前記第5副成分の比率が、選ばれたIIIB族元素に換算して、0.0005原子%≦第5副成分≦0.5原子%である請求項1〜4のいずれか一項に記載の電圧非直線性抵抗体磁器組成物。 - IIIB族元素が、B、Al、Ga、及びInである請求項5に記載の電圧非直線性抵抗体磁器組成物。
- IA族元素から選ばれる少なくとも1種の酸化物を含む第6副成分を更に有しており、
前記主成分100モルに対する前記第6副成分の比率が、選ばれたIA族元素に換算して、第6副成分<5原子%である請求項1〜6のいずれか一項に記載の電圧非直線性抵抗体磁器組成物。 - IA族元素が、Na、K、Rb、及びCsである請求項7に記載の電圧非直線性抵抗体磁器組成物。
- Caを除くIIA族元素から選ばれる少なくとも1種の酸化物を含む第7副成分を更に有しており、
前記主成分100モルに対する前記第7副成分の比率が、選ばれたIIA族元素に換算して、第7副成分<1原子%である請求項1〜8のいずれか一項に記載の電圧非直線性抵抗体磁器組成物。 - IIA族元素が、Mg、Sr、及びBaである請求項9に記載の電圧非直線性抵抗体磁器組成物。
- Cr及びMoから選ばれる少なくとも1種の酸化物を含む第8副成分を更に有しており、
前記主成分100モルに対する前記第8副成分の比率が、各Cr及びMoで換算して、第8副成分<10原子%である請求項1〜10のいずれか一項に記載の電圧非直線性抵抗体磁器組成物。 - 電圧非直線性抵抗体層を有する電子部品であって、
前記電圧非直線性抵抗体層が、請求項1〜11のいずれか一項に記載の電圧非直線性抵抗体磁器組成物で構成されている電子部品。 - 電圧非直線性抵抗体層を有する積層チップバリスタであって、
前記電圧非直線性抵抗体層が、請求項1〜11のいずれか一項に記載の電圧非直線性抵抗体磁器組成物で構成されている積層チップバリスタ。
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| TW097124890A TW200916432A (en) | 2007-07-10 | 2008-07-02 | Voltage nonlinear resistor porcelain composition, electronic component and laminated chip varistor |
| DE102008031663A DE102008031663B4 (de) | 2007-07-10 | 2008-07-04 | Keramikverbindung für nichtlineare Widerstände, elektronisches Bauelement und Mehrschicht-Chip-Varistor |
| US12/169,326 US7969277B2 (en) | 2007-07-10 | 2008-07-08 | Nonlinear resistor ceramic composition, electronic component, and multilayer chip varistor |
| CN2008101280517A CN101345105B (zh) | 2007-07-10 | 2008-07-10 | 电压非线性电阻体陶瓷组合物、电子部件和叠层芯片压敏电阻 |
| KR1020080067103A KR100960522B1 (ko) | 2007-07-10 | 2008-07-10 | 전압 비직선성 저항체 자기 조성물, 전자 부품 및 적층 칩배리스터 |
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| JP2011219283A (ja) * | 2010-04-05 | 2011-11-04 | Tdk Corp | 電圧非直線性抵抗体磁器組成物および電子部品 |
| JP2012516824A (ja) * | 2009-02-03 | 2012-07-26 | エプコス アクチエンゲゼルシャフト | バリスタセラミック、バリスタセラミックを含む多層構成要素、バリスタセラミックの製造方法 |
| JP2013503474A (ja) * | 2009-08-27 | 2013-01-31 | アモテック・カンパニー・リミテッド | ZnO系バリスタ組成物 |
| JP2023094418A (ja) * | 2021-12-23 | 2023-07-05 | パナソニックIpマネジメント株式会社 | 積層バリスタ |
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| JP5088029B2 (ja) * | 2007-07-19 | 2012-12-05 | Tdk株式会社 | バリスタ |
| DE102009023846B4 (de) * | 2009-02-03 | 2024-02-01 | Tdk Electronics Ag | Varistorkeramik, Vielschichtbauelement umfassend die Varistorkeramik, Herstellungsverfahren für die Varistorkeramik |
| US9242902B2 (en) * | 2010-04-05 | 2016-01-26 | Tdk Corporation | Nonlinear resistor ceramic composition and electronic component |
| CN103896575B (zh) * | 2010-04-05 | 2015-09-30 | Tdk株式会社 | 电压非线性电阻陶瓷组合物以及电子元件 |
| KR101124109B1 (ko) * | 2010-08-24 | 2012-03-21 | 삼성전기주식회사 | 적층형 세라믹 캐패시터 |
| TW201221501A (en) * | 2010-11-26 | 2012-06-01 | Sfi Electronics Technology Inc | Process for producing ZnO varistor particularly having internal electrode composed of pure silver and sintered at a lower sintering temperature |
| TWI605029B (zh) | 2016-10-12 | 2017-11-11 | 不含銻的壓敏電阻組成物及積層式壓敏電阻器 |
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| JP2012516824A (ja) * | 2009-02-03 | 2012-07-26 | エプコス アクチエンゲゼルシャフト | バリスタセラミック、バリスタセラミックを含む多層構成要素、バリスタセラミックの製造方法 |
| JP2013503474A (ja) * | 2009-08-27 | 2013-01-31 | アモテック・カンパニー・リミテッド | ZnO系バリスタ組成物 |
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| JP2011219283A (ja) * | 2010-04-05 | 2011-11-04 | Tdk Corp | 電圧非直線性抵抗体磁器組成物および電子部品 |
| JP2023094418A (ja) * | 2021-12-23 | 2023-07-05 | パナソニックIpマネジメント株式会社 | 積層バリスタ |
| JP7811736B2 (ja) | 2021-12-23 | 2026-02-06 | パナソニックIpマネジメント株式会社 | 積層バリスタ |
Also Published As
| Publication number | Publication date |
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| DE102008031663A1 (de) | 2009-01-29 |
| DE102008031663B4 (de) | 2012-07-26 |
| JP4888260B2 (ja) | 2012-02-29 |
| TW200916432A (en) | 2009-04-16 |
| KR20090006017A (ko) | 2009-01-14 |
| US7969277B2 (en) | 2011-06-28 |
| TWI375665B (ja) | 2012-11-01 |
| US20090015367A1 (en) | 2009-01-15 |
| CN101345105A (zh) | 2009-01-14 |
| CN101345105B (zh) | 2012-11-28 |
| KR100960522B1 (ko) | 2010-06-03 |
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