JP3792379B2 - 湾曲荷電粒子通路の真空排気方法 - Google Patents

湾曲荷電粒子通路の真空排気方法 Download PDF

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Publication number: JP3792379B2
Authority: JP; Japan
Prior art keywords: passage; cryopump; shield; curved; end station
Prior art date: 1997-12-02
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

JP33190097A

Other languages

English (en)

Japanese (ja)

Other versions

JPH11162700A (ja

JPH11162700A5 (2

Inventor

新治降矢

充級寺島

秀敏森本

勉西橋

和浩樫本

勇蔵桜田

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Ulvac Inc

Ulvac Cryogenics Inc

Original Assignee

Ulvac Inc

Ulvac Cryogenics Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1997-12-02

Filing date

1997-12-02

Publication date

2006-07-05

1997-12-02 Application filed by Ulvac Inc, Ulvac Cryogenics Inc filed Critical Ulvac Inc

1997-12-02 Priority to JP33190097A priority Critical patent/JP3792379B2/ja

1999-06-18 Publication of JPH11162700A publication Critical patent/JPH11162700A/ja

2005-05-19 Publication of JPH11162700A5 publication Critical patent/JPH11162700A5/ja

2006-07-05 Application granted granted Critical

2006-07-05 Publication of JP3792379B2 publication Critical patent/JP3792379B2/ja

2017-12-02 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

239000002245 particle Substances 0.000 title claims description 15
238000000034 method Methods 0.000 title claims description 7
230000002093 peripheral effect Effects 0.000 claims 1
150000002500 ions Chemical class 0.000 description 12
238000010926 purge Methods 0.000 description 8
239000000758 substrate Substances 0.000 description 8
238000005192 partition Methods 0.000 description 6
238000010884 ion-beam technique Methods 0.000 description 5
230000001771 impaired effect Effects 0.000 description 3
238000005468 ion implantation Methods 0.000 description 3
230000007423 decrease Effects 0.000 description 2
239000012535 impurity Substances 0.000 description 2
230000008929 regeneration Effects 0.000 description 2
238000011069 regeneration method Methods 0.000 description 2
238000009792 diffusion process Methods 0.000 description 1
238000009826 distribution Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
230000001747 exhibiting effect Effects 0.000 description 1
238000000605 extraction Methods 0.000 description 1
-1 for example Substances 0.000 description 1
238000002513 implantation Methods 0.000 description 1
238000002347 injection Methods 0.000 description 1
239000007924 injection Substances 0.000 description 1
230000009191 jumping Effects 0.000 description 1
238000005086 pumping Methods 0.000 description 1
238000000926 separation method Methods 0.000 description 1
238000001179 sorption measurement Methods 0.000 description 1

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JP33190097A 1997-12-02 1997-12-02 湾曲荷電粒子通路の真空排気方法 Expired - Lifetime JP3792379B2 (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP33190097A JP3792379B2 (ja)	1997-12-02	1997-12-02	湾曲荷電粒子通路の真空排気方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP33190097A JP3792379B2 (ja)	1997-12-02	1997-12-02	湾曲荷電粒子通路の真空排気方法

Publications (3)

Publication Number	Publication Date
JPH11162700A JPH11162700A (ja)	1999-06-18
JPH11162700A5 JPH11162700A5 (2)	2005-05-19
JP3792379B2 true JP3792379B2 (ja)	2006-07-05

Family

ID=18248892

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP33190097A Expired - Lifetime JP3792379B2 (ja)	1997-12-02	1997-12-02	湾曲荷電粒子通路の真空排気方法

Country Status (1)

Country	Link
JP (1)	JP3792379B2 (2)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2010019584A1 (en) *	2008-08-11	2010-02-18	Ion Beam Applications S.A.	High-current dc proton accelerator

1997
- 1997-12-02 JP JP33190097A patent/JP3792379B2/ja not_active Expired - Lifetime

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Publication number	Publication date
JPH11162700A (ja)	1999-06-18

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