JP3966370B2 - クライオポンプ - Google Patents

クライオポンプ Download PDF

Info

Publication number: JP3966370B2
Authority: JP; Japan
Prior art keywords: shield; opening; baffle; pump; cryopanel
Prior art date: 1997-12-02
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

JP33189897A

Other languages

English (en)

Japanese (ja)

Other versions

JPH11166477A5 (it

JPH11166477A (ja

Inventor

新治降矢

充級寺島

秀敏森本

勉西橋

和浩樫本

勇蔵桜田

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Ulvac Inc

Ulvac Cryogenics Inc

Original Assignee

Ulvac Inc

Ulvac Cryogenics Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1997-12-02

Filing date

1997-12-02

Publication date

2007-08-29

1997-12-02 Application filed by Ulvac Inc, Ulvac Cryogenics Inc filed Critical Ulvac Inc

1997-12-02 Priority to JP33189897A priority Critical patent/JP3966370B2/ja

1999-06-22 Publication of JPH11166477A publication Critical patent/JPH11166477A/ja

2005-05-19 Publication of JPH11166477A5 publication Critical patent/JPH11166477A5/ja

2007-08-29 Application granted granted Critical

2007-08-29 Publication of JP3966370B2 publication Critical patent/JP3966370B2/ja

2017-12-02 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

239000007789 gas Substances 0.000 description 9
238000009792 diffusion process Methods 0.000 description 5
238000005468 ion implantation Methods 0.000 description 4
150000002500 ions Chemical class 0.000 description 3
238000011109 contamination Methods 0.000 description 2
239000012535 impurity Substances 0.000 description 2
238000010884 ion-beam technique Methods 0.000 description 2
239000000463 material Substances 0.000 description 2
238000006243 chemical reaction Methods 0.000 description 1
239000004020 conductor Substances 0.000 description 1
238000010586 diagram Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
239000001307 helium Substances 0.000 description 1
229910052734 helium Inorganic materials 0.000 description 1
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
230000001771 impaired effect Effects 0.000 description 1
238000002347 injection Methods 0.000 description 1
239000007924 injection Substances 0.000 description 1
238000005259 measurement Methods 0.000 description 1
239000002245 particle Substances 0.000 description 1
238000005086 pumping Methods 0.000 description 1
239000004065 semiconductor Substances 0.000 description 1
239000000758 substrate Substances 0.000 description 1

Images

Landscapes

Compressors, Vaccum Pumps And Other Relevant Systems (AREA)

JP33189897A 1997-12-02 1997-12-02 クライオポンプ Expired - Lifetime JP3966370B2 (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP33189897A JP3966370B2 (ja)	1997-12-02	1997-12-02	クライオポンプ

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP33189897A JP3966370B2 (ja)	1997-12-02	1997-12-02	クライオポンプ

Publications (3)

Publication Number	Publication Date
JPH11166477A JPH11166477A (ja)	1999-06-22
JPH11166477A5 JPH11166477A5 (it)	2005-05-19
JP3966370B2 true JP3966370B2 (ja)	2007-08-29

Family

ID=18248871

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP33189897A Expired - Lifetime JP3966370B2 (ja)	1997-12-02	1997-12-02	クライオポンプ

Country Status (1)

Country	Link
JP (1)	JP3966370B2 (it)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2021171148A1 (en) *	2020-02-25	2021-09-02	Edwards Vacuum Llc	Flange for a vacuum apparatus

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2001194018A (ja) *	1999-10-19	2001-07-17	Aisin Seiki Co Ltd	極低温冷凍装置
JP5090200B2 (ja) *	2007-08-08	2012-12-05	住友重機械工業株式会社	クライオパネル及びこれを用いたクライオポンプ
JP6053552B2 (ja) *	2013-02-18	2016-12-27	住友重機械工業株式会社	クライオポンプ及びクライオポンプ取付構造
JP6348094B2 (ja)	2015-11-11	2018-06-27	アルバック・クライオ株式会社	冷却装置、および、真空処理装置
US20240337265A1 (en) *	2023-04-06	2024-10-10	Taiwan Semiconductor Manufacturing Company, Ltd.	Cryogenic pump for semiconductor processing

1997
- 1997-12-02 JP JP33189897A patent/JP3966370B2/ja not_active Expired - Lifetime

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2021171148A1 (en) *	2020-02-25	2021-09-02	Edwards Vacuum Llc	Flange for a vacuum apparatus
CN115135879A (zh) *	2020-02-25	2022-09-30	爱德华兹真空泵有限责任公司	用于真空设备的凸缘
CN115135879B (zh) *	2020-02-25	2024-09-24	爱德华兹真空泵有限责任公司	用于真空设备的凸缘
US12140131B2 (en)	2020-02-25	2024-11-12	Edward Vacuum LLC	Flange for a vacuum apparatus

Also Published As

Publication number	Publication date
JPH11166477A (ja)	1999-06-22

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