JPH0121260B2 - - Google Patents
Info
- Publication number
- JPH0121260B2 JPH0121260B2 JP57000816A JP81682A JPH0121260B2 JP H0121260 B2 JPH0121260 B2 JP H0121260B2 JP 57000816 A JP57000816 A JP 57000816A JP 81682 A JP81682 A JP 81682A JP H0121260 B2 JPH0121260 B2 JP H0121260B2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- temperature plasma
- low
- sheet
- sheet winding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M10/00—Physical treatment of fibres, threads, yarns, fabrics or fibrous goods made from such materials, e.g. by ultrasonic waves, corona discharge, irradiation, electric currents or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
- D06M10/02—Sonic or ultrasonic waves; Corona discharge
- D06M10/025—Corona discharge or low temperature plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Textile Engineering (AREA)
- Treatment Of Fiber Materials (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Description
【発明の詳細な説明】
本発明は、編物、織物、不織布、樹脂製フイル
ム等を含むシート状物質を低温プラズマ処理する
ための処理装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a processing apparatus for subjecting sheet materials including knitted fabrics, woven fabrics, nonwoven fabrics, resin films, etc. to low-temperature plasma treatment.
従来工業的に織物、編物、不織布など布帛の精
練処理、仕上加工、あるいはフイルムに新しい特
性を付与するためのコーテイング加工は大部分が
水系での処理が行われており、ごく一部に有機溶
剤による処理も行なわれている。 Traditionally, most of the industrial scouring and finishing treatments for fabrics such as woven, knitted, and nonwoven fabrics, as well as coating treatments to impart new properties to films, have been carried out in aqueous systems, with only a small portion using organic solvents. Processing is also being carried out.
しかるに従来から行われているこれらの方法は
水、有機溶剤あるいは精練剤を使用し、かつ処理
浴の昇温、処理物の洗滌次いで乾燥など多量の
水、エネルギー薬剤を使用していた。また処理に
伴う廃水も多量に発生し、公害問題、廃水の処理
によるコストアツプなど、経済性に欠けるもので
あつた。 However, these conventional methods use water, organic solvents, or scouring agents, and also use large amounts of water and energy agents to raise the temperature of the treatment bath, wash the material to be treated, and then dry it. Furthermore, a large amount of wastewater was generated during the treatment, which caused pollution problems and increased costs due to wastewater treatment, making it uneconomical.
このようなことから、最近では布帛等の繊維製
品を低温プラズマ処理して例えば布帛の糊抜、精
練効果を得ること、あるいは染色布帛樹脂フイル
ムあるいは樹脂シートの表面に低温プラズマで処
理して該染色布帛樹脂フイルム又は樹脂シートの
表面改質処理を行なうこと等が提案されている
が、即に提案されているバツチ式の低温プラズマ
処理装置においては、長尺のシート状物をバツチ
内に設置した支軸又はロールに巻きとり、これを
他方の支軸又はロールに巻きとつて移行せしめる
間にシート物に低温プラズマ処理を施しているも
のであるが、運転中は、バツチ内は常に低温プラ
ズマ雰囲気に保持され、しかも該雰囲気中にロー
ル状に巻かれているシート物が位置されているた
めに、ロール状に巻かれているシート物の両端面
部は常に低温プラズマ雰囲気にされされているの
に対し、ロール状となつて重ね合されている部分
は、他方のロールにより引き出されるまでは低温
プラズマの影響を受けないので長尺シート物の両
側端縁部と、そのシート物の幅方向中央部とで
は、低温プラズマによる処理量が異り、処理むら
を生じる問題点があつた。 For this reason, in recent years, textile products such as fabrics have been treated with low-temperature plasma to obtain, for example, desizing and scouring effects, or the surface of dyed fabrics, resin films, or resin sheets has been treated with low-temperature plasma to achieve the desired dyeing effect. It has been proposed to perform surface modification treatment on fabric resin films or resin sheets, but in the batch-type low-temperature plasma processing equipment that is currently being proposed, a long sheet-like material is installed in a batch. The sheet material is subjected to low-temperature plasma treatment while it is being wound around a spindle or roll, wound onto another spindle or roll, and transferred, but during operation, the inside of the batch is always kept in a low-temperature plasma atmosphere. Because the rolled sheet material is held in the atmosphere and the rolled sheet material is located in this atmosphere, both end surfaces of the rolled sheet material are always in a low temperature plasma atmosphere. On the other hand, the parts that are rolled and overlapped are not affected by the low-temperature plasma until they are pulled out by the other roll. There was a problem that the amount of processing by low-temperature plasma was different between the two, resulting in uneven processing.
本発明はかかる問題点を解消するためになされ
たもので、バツチ式の低温プラズマ処理装置にお
いて、シート物の全面に亘つて均一なる低温プラ
ズマ処理ができる処理装置を提供することを目的
とするものである。 The present invention has been made to solve these problems, and an object of the present invention is to provide a batch-type low-temperature plasma processing apparatus that can perform uniform low-temperature plasma treatment over the entire surface of a sheet object. It is.
以下に本発明を図面に示す実施例に基いて詳細
に説明する。 The present invention will be explained in detail below based on embodiments shown in the drawings.
1は反応器であつて、この反応器1には処理す
べきシート物(布帛、樹脂シート等)を出入れす
るための開口部2,3が設けられており、更にこ
れらの開口部2,3は蓋4によつて密閉されるよ
うになつている。この反応器1の内部は、第1の
シート巻取室5、第1の減圧室6、低温プラズマ
処理室7、第2の減圧室8、第2のシート巻取室
9の順で区分形成されており、各室を区分してい
る隔壁10には、シート物11を通過することは
できるが、隣設された室間の通気性を妨げること
ができるシールロール12が設けられている。こ
のシールロール12の気密性は、左程高いもので
なくてよく、若干の通気性は許されるものであつ
てもよい。またシールロール12の代りにリツプ
シールを使つてもよい。そして第1のシート巻取
室5及び第2のシート巻取室9内にはシート巻取
軸13が架設され、第1の減圧室6及び第2の減
圧室8内にはシート物をタイミング移行せしめる
ためのガイドロール群14が配設され、更に低温
プラズマ処理室7内においても同様のガイドロー
ル群15が配設されている。16は第1の減圧室
6及び第2の減圧室8に接続されているバキユー
ムパイプであつてこのバキユームパイプ16は図
示しない真空ポンプに接続されている。17は低
温プラズマ処理室7に接続されているガス供給口
であつて、このガス供給口17は反応器1外で発
生せしめた低温プラズマにより活性化されたガス
をこのガス供給口17を介して低温プラズマ処理
室7内へ供給するように本実施例では構成してい
るが、他の実施例として図示しないが低温プラズ
マ処理室7内に、シート物の移行を妨げない位置
に2極の電極体を配置して、その電極体に高周波
(長波長から短波長まで使用できるが望ましくは
1kHz〜300MHzの範囲)をかけ、更にガス供給口
17より該処理室7内に気体を供給することによ
り該低温プラズマ処理室7内に低温プラズマが発
生されるようにしてもよい。 Reference numeral 1 denotes a reactor, and this reactor 1 is provided with openings 2 and 3 through which sheet materials to be treated (fabrics, resin sheets, etc.) are taken in and out; 3 is designed to be sealed by a lid 4. The interior of this reactor 1 is divided into a first sheet winding chamber 5, a first decompression chamber 6, a low temperature plasma processing chamber 7, a second decompression chamber 8, and a second sheet winding chamber 9. A sealing roll 12 is provided on the partition wall 10 separating each chamber, which allows the sheet material 11 to pass through but prevents air permeability between adjacent chambers. The airtightness of this seal roll 12 does not have to be as high as shown in the figure, and some degree of air permeability may be allowed. Moreover, a lip seal may be used instead of the seal roll 12. A sheet winding shaft 13 is installed in the first sheet winding chamber 5 and the second sheet winding chamber 9, and a sheet material is transported in the first decompression chamber 6 and the second decompression chamber 8 at a timing. A guide roll group 14 is provided for the movement, and a similar guide roll group 15 is also provided within the low temperature plasma processing chamber 7. Reference numeral 16 denotes a vacuum pipe connected to the first reduced pressure chamber 6 and the second reduced pressure chamber 8, and this vacuum pipe 16 is connected to a vacuum pump (not shown). 17 is a gas supply port connected to the low-temperature plasma processing chamber 7, and this gas supply port 17 supplies gas activated by low-temperature plasma generated outside the reactor 1 through the gas supply port 17. In this embodiment, the plasma is supplied into the low-temperature plasma processing chamber 7, but as another embodiment, two electrodes (not shown) are installed in the low-temperature plasma processing chamber 7 at a position that does not interfere with the movement of the sheet material. The body is placed in the electrode body, and a high frequency (from long wavelength to short wavelength can be used, but it is preferable to use
1 kHz to 300 MHz) and further supplying gas into the processing chamber 7 from the gas supply port 17 to generate low-temperature plasma within the low-temperature plasma processing chamber 7.
以上が本実施例の構成であるが次にその作用に
ついて述べる。 The configuration of this embodiment has been described above, and its operation will now be described.
先ず第1のシート巻取室5内に長尺シート物1
1を巻き取つたシート巻取軸13をセツトし、そ
の長尺シート物11の先端を各室を通して第2の
シート巻取室9内に架設したシート巻取軸13に
巻きつけて、そのシート巻取軸13にシート物を
巻替ることができるように準備し、更に蓋4を閉
めて反応器1を密閉する。次に真空ポンプを駆動
してバキユームパイプ16を負圧となし低温プラ
ズマ処理室7内の真空度が0.5Torr以下になつた
時点でガス供給口17より低温プラズマ処理室7
内に低温プラズマを供給するか、あるいはガス供
給口17より酸素又は酸素を含む混合ガスあるい
はその他のガスを室7内に供給して、この低温プ
ラズマ処理室7内の真空度が0.5〜10Torrとなる
ように調整した上で高周波電源より高周波例えば
13.56MHzを電極板に給電して、低温プラズマ処
理室7内を低温プラズマの雰囲気とさせる。次い
で第2のシート巻取室9内の巻取り軸13を駆動
してシート物11を減圧室及び低温プラズマ処理
室を移行させる。かくしてシート物11を低温プ
ラズマ処理室7内の低温プラズマ雰囲気中に移行
せしめることにより、該シート物11が布帛であ
る場合はこの布帛の繊維自体に含有されている夾
雑物及び繊維に付与されている糊剤の一部は、分
解し又一部は親水化されて、水に容易に溶解する
様になる。またシート物が染色布帛、フイルム樹
脂シートである場合は該シートの表面改質加工が
できる。 First, a long sheet object 1 is placed in the first sheet winding chamber 5.
The sheet winding shaft 13 on which the long sheet material 1 has been wound is set, and the tip of the long sheet object 11 is passed through each chamber and wound around the sheet winding shaft 13 installed in the second sheet winding chamber 9, and the sheet is Preparations are made so that the sheet material can be re-wound onto the winding shaft 13, and the lid 4 is further closed to seal the reactor 1. Next, the vacuum pump is driven to create a negative pressure in the vacuum pipe 16, and when the degree of vacuum in the low temperature plasma processing chamber 7 becomes 0.5 Torr or less, the low temperature plasma processing chamber 7 is connected to the gas supply port 17.
By supplying low-temperature plasma into the chamber 7 or by supplying oxygen, a mixed gas containing oxygen, or other gas from the gas supply port 17 into the chamber 7, the degree of vacuum in the low-temperature plasma processing chamber 7 is maintained at 0.5 to 10 Torr. For example, if the high frequency power is adjusted so that
13.56MHz is supplied to the electrode plate to create a low-temperature plasma atmosphere in the low-temperature plasma processing chamber 7. Next, the winding shaft 13 in the second sheet winding chamber 9 is driven to move the sheet material 11 between the decompression chamber and the low-temperature plasma processing chamber. In this way, by transferring the sheet object 11 into the low temperature plasma atmosphere in the low temperature plasma processing chamber 7, when the sheet object 11 is a fabric, the impurities contained in the fibers of the fabric itself and the impurities added to the fibers are removed. A part of the glue in the container is decomposed and a part becomes hydrophilic and becomes easily soluble in water. Furthermore, when the sheet material is a dyed fabric or a film resin sheet, the surface of the sheet can be modified.
ところが本発明においては、密閉することがで
きる反応器内を、第1のシート巻取室、第1の減
圧室、低温プラズマ処理室、第2の減圧室、第2
のシート巻取室の順で区分形成し、更に各室相互
間は、シール機構を介してシート物の通過可能に
連通せしめると共に、第1の減圧室及び第2の減
圧室には真空ポンプに通じるバキユームパイプを
接続せしめ、更に、低温プラズマ処理室には低温
プラズマにより活性化されたガスの供給口又はガ
ス供給口と電極体を設け、第1のシート巻取室及
び第2のシート巻取室にはシート巻取軸を配置せ
しめたことを特徴とするシート状物質の低温プラ
ズマ処理装置であるから、シート巻取室5及び9
が低温プラズマ処理室7と区分されて、それらの
シート巻取室内には低温プラズマにより活性化さ
れたガスが流入されないように形成されているか
ら、そのシート巻取室内にあるシート物に低温プ
ラズマが作用することがない。従つて巻取軸13
に巻かれているシート物11へ両端縁部に過度な
低温プラズマ処理がなされることがなく、従つて
シート物11の全面に亘つて均一な低温プラズマ
処理ができる効果がある。更に本発明では低温プ
ラズマ処理室7とシート巻取室5及び9との間に
減圧室6及び8が形成されていることから、この
減圧室において、低温プラズマ処理室7内に供給
される直前の該シート物に含有される揮撥成分
(水分)等が除去されるので、低温プラズマ処理
室7内の真空度を良好に保つことができる。更に
シート巻取室と低温プラズマ処理室との間に減圧
室が設けられていることからそのシート巻取室内
へ、低温プラズマ処理室内の低温プラズマが全く
流入されることがなく、前述の均一処理が効果的
になされる特長もある。 However, in the present invention, the inside of the reactor which can be sealed is divided into a first sheet winding chamber, a first reduced pressure chamber, a low temperature plasma processing chamber, a second reduced pressure chamber, and a second reduced pressure chamber.
The sheet winding chambers are divided in this order, and each chamber is communicated with each other via a sealing mechanism so that the sheet material can pass therethrough.The first vacuum chamber and the second vacuum chamber are connected to a vacuum pump. A vacuum pipe is connected thereto, and the low temperature plasma processing chamber is further provided with a gas supply port or a gas supply port and an electrode body activated by the low temperature plasma, and the first sheet winding chamber and the second sheet winding chamber are connected to each other. Since this is a low-temperature plasma processing apparatus for a sheet-like material characterized in that a sheet winding shaft is arranged, the sheet winding chambers 5 and 9 are
is separated from the low-temperature plasma processing chamber 7, and the sheet winding chambers are formed so that the gas activated by the low-temperature plasma does not flow into the sheet winding chamber. does not work. Therefore, the winding shaft 13
Excessive low-temperature plasma treatment is not performed on both edges of the sheet material 11 wound around the sheet material 11, and therefore, there is an effect that uniform low-temperature plasma treatment can be performed over the entire surface of the sheet material 11. Furthermore, in the present invention, since the decompression chambers 6 and 8 are formed between the low temperature plasma processing chamber 7 and the sheet winding chambers 5 and 9, in the decompression chambers, immediately before being supplied into the low temperature plasma processing chamber 7, Since volatile components (moisture) contained in the sheet material are removed, the degree of vacuum in the low-temperature plasma processing chamber 7 can be maintained at a good level. Furthermore, since a decompression chamber is provided between the sheet winding chamber and the low-temperature plasma processing chamber, the low-temperature plasma in the low-temperature plasma processing chamber does not flow into the sheet winding chamber at all, resulting in the above-mentioned uniform processing. It also has the advantage of being effective.
図面は本発明よりなる装置の実施例を示した断
面説明図である。
1……反応器、2,3……開口部、4……蓋、
5……第1のシート巻取室、6……第1の減圧
室、7……低温プラズマ処理室、8……第2の減
圧室、9……第2のシート巻取室、10……隔
壁、11……シート物、12……シールロール、
13……シート巻取軸、14……ガイドロール
群、15……ガイドロール群、16……バキユー
ムパイプ、17……ガス供給口。
The drawing is an explanatory cross-sectional view showing an embodiment of the device according to the present invention. 1... Reactor, 2, 3... Opening, 4... Lid,
5... First sheet winding chamber, 6... First reduced pressure chamber, 7... Low temperature plasma processing chamber, 8... Second reduced pressure chamber, 9... Second sheet winding chamber, 10... ...Partition wall, 11...Sheet material, 12...Seal roll,
13... Sheet winding shaft, 14... Guide roll group, 15... Guide roll group, 16... Vacuum pipe, 17... Gas supply port.
Claims (1)
ート巻取室、第1の減圧室、低温プラズマ処理
室、第2の減圧室、第2のシート巻取室の順で区
分形成し、更に、各室相互間は、シール機構を介
してシート物の通過可能に連通せしめ、前記第1
の減圧室及び第2の減圧室には、これらの減圧室
内を通過するシート物の通過タイミングを確保す
るためのガイドロール群を配設すると共に真空ポ
ンプに通じるバキユームパイプを接続せしめ、更
に、低温プラズマ処理室には低温プラズマにより
活性化されたガスの供給口又はガス供給口と電極
体を設け、第1のシート巻取室及び第2のシート
巻取室にはシート巻取軸を配置せしめたことを特
徴とするシート状物質の低温プラズマ処理装置。1 The inside of the reactor which can be sealed is divided into a first sheet winding chamber, a first decompression chamber, a low temperature plasma processing chamber, a second decompression chamber, and a second sheet winding chamber, Further, each chamber is communicated with each other via a sealing mechanism so that a sheet object can pass therethrough, and the first
The decompression chamber and the second decompression chamber are provided with a group of guide rolls to ensure the timing of passage of the sheet material passing through these decompression chambers, and are connected to a vacuum pipe leading to a vacuum pump. The processing chamber was provided with a gas supply port or a gas supply port and an electrode body activated by low-temperature plasma, and sheet winding shafts were arranged in the first sheet winding chamber and the second sheet winding chamber. A low-temperature plasma processing apparatus for sheet-like materials characterized by:
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP81682A JPS58120860A (en) | 1982-01-06 | 1982-01-06 | Low temperature plasma treating apparatus of sheet-like substance |
| DE19833300097 DE3300097A1 (en) | 1982-01-06 | 1983-01-04 | Installation for treating materials which are like plates or webs with a low-temperature plasma |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP81682A JPS58120860A (en) | 1982-01-06 | 1982-01-06 | Low temperature plasma treating apparatus of sheet-like substance |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58120860A JPS58120860A (en) | 1983-07-18 |
| JPH0121260B2 true JPH0121260B2 (en) | 1989-04-20 |
Family
ID=11484193
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP81682A Granted JPS58120860A (en) | 1982-01-06 | 1982-01-06 | Low temperature plasma treating apparatus of sheet-like substance |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS58120860A (en) |
| DE (1) | DE3300097A1 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3312307A1 (en) * | 1983-04-06 | 1984-10-11 | Sando Iron Works Co., Ltd., Wakayama, Wakayama | Device for the treatment of a textile material |
| JPS60228673A (en) * | 1984-04-25 | 1985-11-13 | Hitachi Ltd | Control device for plasma processing equipment |
| DE4313284A1 (en) * | 1993-04-23 | 1994-10-27 | Leybold Ag | Slot lock for introducing or discharging substrates from one treatment chamber into an adjacent one |
| DE19540255A1 (en) * | 1995-10-28 | 1997-04-30 | Leybold Ag | Apparatus for film coating a substrate |
| DE19540053A1 (en) * | 1995-10-27 | 1997-04-30 | Leybold Ag | Substrate coating device for application of non-conductive layers using magnetron sputtering |
| EP0783174B1 (en) | 1995-10-27 | 2006-12-13 | Applied Materials GmbH & Co. KG | Apparatus for coating a substrate |
| JP2010228180A (en) * | 2009-03-26 | 2010-10-14 | Ube Ind Ltd | Rewinding polyimide film roll and manufacturing method thereof |
| FR2975308B1 (en) * | 2011-05-16 | 2015-06-26 | Valeo Systemes Dessuyage | SEALING DEVICE FOR THE VACUUM TREATMENT OF A SURFACE OF AN OBJECT |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53121469A (en) * | 1977-03-31 | 1978-10-23 | Toshiba Corp | Gas etching unit |
| JPS5583735U (en) * | 1978-12-06 | 1980-06-09 | ||
| JPS5814452B2 (en) * | 1978-12-28 | 1983-03-19 | 東レ株式会社 | Low temperature plasma treatment method for base material |
| JPS5718737A (en) * | 1980-06-21 | 1982-01-30 | Shin Etsu Chem Co Ltd | Apparatus for continuous plasma treatment |
-
1982
- 1982-01-06 JP JP81682A patent/JPS58120860A/en active Granted
-
1983
- 1983-01-04 DE DE19833300097 patent/DE3300097A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58120860A (en) | 1983-07-18 |
| DE3300097A1 (en) | 1983-08-04 |
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