JPH02111700A - Production of silicon carbide whisker - Google Patents
Production of silicon carbide whiskerInfo
- Publication number
- JPH02111700A JPH02111700A JP26387188A JP26387188A JPH02111700A JP H02111700 A JPH02111700 A JP H02111700A JP 26387188 A JP26387188 A JP 26387188A JP 26387188 A JP26387188 A JP 26387188A JP H02111700 A JPH02111700 A JP H02111700A
- Authority
- JP
- Japan
- Prior art keywords
- whiskers
- silica
- silicon carbide
- carbon
- catalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims description 54
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 229910010271 silicon carbide Inorganic materials 0.000 title description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 68
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 47
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 38
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 32
- 239000000203 mixture Substances 0.000 claims abstract description 25
- 239000000843 powder Substances 0.000 claims abstract description 21
- 239000003054 catalyst Substances 0.000 claims abstract description 20
- 239000012535 impurity Substances 0.000 claims abstract description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 8
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims abstract description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 5
- 239000002184 metal Substances 0.000 claims abstract description 4
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 4
- 239000000956 alloy Substances 0.000 claims abstract description 3
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 3
- 229910052742 iron Inorganic materials 0.000 claims abstract description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 15
- 239000001257 hydrogen Substances 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 10
- 239000007789 gas Substances 0.000 abstract description 18
- 238000006243 chemical reaction Methods 0.000 abstract description 14
- 239000011226 reinforced ceramic Substances 0.000 abstract description 5
- 229910052804 chromium Inorganic materials 0.000 abstract description 3
- 239000011261 inert gas Substances 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 28
- 239000002994 raw material Substances 0.000 description 19
- 239000007787 solid Substances 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 238000002441 X-ray diffraction Methods 0.000 description 6
- 239000006229 carbon black Substances 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 238000005755 formation reaction Methods 0.000 description 5
- 229910002804 graphite Inorganic materials 0.000 description 5
- 239000010439 graphite Substances 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 239000000443 aerosol Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 235000013339 cereals Nutrition 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000011031 large-scale manufacturing process Methods 0.000 description 2
- 239000002923 metal particle Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000006230 acetylene black Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005261 decarburization Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 235000013312 flour Nutrition 0.000 description 1
- 238000003306 harvesting Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は炭化珪素ウィスカーの製造方法に関し、より詳
しくはウィスカー強化セラ、ミックスに適した直径の太
い炭化珪素ウィスカーの経済的かつ工業的な製造方法に
関する。[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to a method for producing silicon carbide whiskers, and more specifically to an economical and industrial production of silicon carbide whiskers with a large diameter suitable for whisker-reinforced ceramics and mixes. Regarding the method.
〈従来の技術〉
炭化珪素ウィスカーの製造方法は、気体原料法と固体原
料法とに大別でき、また固体原料法は輸送法とバルク法
に分けられる。<Prior Art> Methods for producing silicon carbide whiskers can be broadly divided into gaseous raw material methods and solid raw material methods, and solid raw material methods can be divided into transportation methods and bulk methods.
気体原料法は、炭素源に炭化水素ガスを、珪素源に5i
C1aなどの珪素含有ガスを原料として使用する方法で
あり、具体的には、加熱された基板上に上述のガスを導
入し、基板上に炭化珪素ウィスカーを成長させる方法で
ある。得られるウィスカーのアスペクト比は大きいとい
う長所があるが、夕晴に収穫しようとすると大面積の基
板が必要であり、また導入ガスの利用皐も低いという欠
点があり、大規模生産には向かない。The gaseous raw material method uses hydrocarbon gas as a carbon source and 5i as a silicon source.
This method uses a silicon-containing gas such as C1a as a raw material, and specifically, it is a method in which the above-mentioned gas is introduced onto a heated substrate to grow silicon carbide whiskers on the substrate. The advantage is that the aspect ratio of the resulting whiskers is large, but harvesting in the evening sun requires a large substrate area, and the disadvantage is that the utilization of introduced gas is low, making it unsuitable for large-scale production. .
固体原料法のうち輸送法は、炭素源として炭素粉などの
固体を、珪素源としてシリカ粉などの固体を使用する方
法で、その原料を加熱し、発生したガスを固体原料充填
層の表面もしくは固体原料が置かれている場所から離れ
た場所に移動させ、そこでウィスカーを生成させる方法
である。この方法では得られたウィスカーのアスペクト
比が大きいという長所があるが、多量に酸相しようとす
ると大面積を必要とするという欠点があり、この方法も
大規模生産には向かない。Among the solid raw material methods, the transportation method uses solids such as carbon powder as a carbon source and solids such as silica powder as a silicon source.The raw materials are heated and the generated gas is transferred to the surface of the solid raw material packed bed or This is a method in which solid materials are moved to a location away from where they are placed and whiskers are generated there. This method has the advantage that the aspect ratio of the resulting whiskers is large, but has the disadvantage that a large area is required to produce a large amount of acid phase, and this method is also not suitable for large-scale production.
また、固体原料法のうらバルク法は、炭素源として炭素
粉などの固体を、珪素原料としてシリカ粉などの固体を
使用する方法で、この原料中にあらかじめウィスカーが
成長するに十分な空隙を導入し、不活性雰囲気中で加熱
処理することによりバルクに導入した空隙にウィスカー
を成長させる方法である。この方法では固体粉末充填層
中にウィスカーが成長するため、大量生産が容易である
という長所があるが、空隙の大きさを制御し難いために
アスペクト比にばらつきが大きく、かつ平均アスペクト
比が小さいという欠点を有していた。In addition, the back bulk method of the solid raw material method uses a solid such as carbon powder as a carbon source and a solid such as silica powder as a silicon raw material. Sufficient voids are introduced into the raw material in advance to allow whiskers to grow. In this method, whiskers are grown in the voids introduced into the bulk by heat treatment in an inert atmosphere. This method has the advantage of easy mass production because whiskers grow in a solid powder packed bed, but it is difficult to control the size of the voids, so the aspect ratio varies widely and the average aspect ratio is small. It had the following drawback.
また、空隙が十分にないと炭化珪素の粉末が生成し易い
ため、炭化珪素粉末の混在が避は難く、次工程でウィス
カーと粉末との分離が必要となるなどの欠点があった。In addition, if there are insufficient voids, silicon carbide powder is likely to be produced, so it is difficult to avoid the presence of silicon carbide powder, and there are drawbacks such as the need to separate whiskers and powder in the next step.
しかしこのような欠点があるものの現在工業化されてい
る方法はいずれもこの方法である。However, despite these drawbacks, this method is currently industrialized.
一方、Becher等が(Fracture Mech
anics ofCera+5ics、 vol、 ’
L 61−73+ PIenu+* Press (1
986)、〕で、あるいは安田等が〔「セラミックス系
複合材料の製造に関する諸展開J 、 34−37.日
本金属学会シンポジウム(1988) )で報告してい
るごとく、炭化珪素ウィスカー強化セラミックスにおい
てはウィスカーの直径が大きくなるほどセラミックスの
靭性が向上する。しかし、前述の固体原料バルク法で製
造される炭化珪素ウィスカーの直径は0.3〜0.8P
と細く、十分な高靭化をはかることができなかった。On the other hand, Becher et al.
anics ofCera+5ics, vol, '
L 61-73+ PIenu+* Press (1
986),] or as reported by Yasuda et al. [Developments in the Production of Ceramic Composite Materials J, 34-37. Japan Institute of Metals Symposium (1988)], in silicon carbide whisker reinforced ceramics, whisker The toughness of ceramics improves as the diameter of
It was so thin that it was not possible to make it sufficiently tough.
従来、直径が1−より大きい炭化珪素ウィスカーの製造
にはGac等が(J、 Mater、 Sci、 20
.1160−68 (1985) )で、あるいはG、
八、 Bootsma等が(J、 Cryst、 Gr
owth、 11.297−309 (1971) )
で報告しているごとく、輸送法が用いられてきたが、こ
れらの方法は前述のごとく実験室的に製造可能でも工業
的には有利な方法ではなかった。Conventionally, for the production of silicon carbide whiskers with a diameter larger than 1, Gac et al. (J, Mater, Sci, 20
.. 1160-68 (1985)) or G,
8. Bootsma et al. (J, Cryst, Gr.
owth, 11.297-309 (1971))
As reported in , transport methods have been used, but as mentioned above, although these methods can be produced in the laboratory, they are not industrially advantageous.
〈発明が解決しようとする課題〉
先に発明者達は固体原料法−バルク法で炭化珪素ウィス
カーを製造する経済的かつ工業的な方法を開発し、特願
昭63−196195号として出願したが、本発明はそ
の改良になり、直径が1n以上の炭化珪素ウィスカーの
製造方法を提案することを目的とするものである。<Problem to be solved by the invention> Previously, the inventors developed an economical and industrial method for producing silicon carbide whiskers using a solid raw material method/bulk method, and filed the application as Japanese Patent Application No. 196195-1983. The present invention is an improvement on this, and aims to propose a method for producing silicon carbide whiskers having a diameter of 1n or more.
〈課題を解決するための手段〉
本発明はシリカ、カーボン及び触媒からなる嵩密度0.
1g/c4以下の混合物を、水素を含む気流中で加熱反
応させることを特徴とする炭化珪素ウィスカーの製造方
法であり、望ましくはシリカの純度が99.7%以上、
又はさらにカーボン中のH。<Means for Solving the Problems> The present invention comprises silica, carbon, and a catalyst with a bulk density of 0.
A method for producing silicon carbide whiskers, which is characterized by subjecting a mixture of 1 g/c4 or less to a heating reaction in an air flow containing hydrogen, preferably having a purity of silica of 99.7% or more,
Or even more H in carbon.
N、 S、 O以外の不純物が200騨以下、又はさら
に触媒はFe、 Ni、 Co及びCrの1種又は2種
以上を含む金属粉又は合金粉で、その平均粒径が1.5
〜20μ調である炭化珪素ウィスカーの製造方法である
。Impurities other than N, S, and O are 200 or less, or the catalyst is a metal powder or alloy powder containing one or more of Fe, Ni, Co, and Cr, and the average particle size is 1.5
This is a method for producing silicon carbide whiskers having a grain size of ~20μ.
く作 用〉
発明者等はウィスカー強化セラミックスに適した直径の
太い炭化珪素ウィスカーの成長について鋭意研究した結
果以下の知見を得て本発明に到った。すなわち、■バル
ク法においてもVLS (Vaper−Liquid−
5olid) !a構により炭化珪素ウィスカーは成長
する。■成長するウィスカーの直径と触媒径には一定の
関係がある。■原料中の不純物を触媒として微細なSi
Cウィスカーが成長する。Effect> As a result of intensive research into the growth of silicon carbide whiskers with a large diameter suitable for whisker-reinforced ceramics, the inventors obtained the following knowledge and arrived at the present invention. In other words, VLS (Vaper-Liquid-
5olid)! Silicon carbide whiskers grow according to the a-structure. ■There is a certain relationship between the diameter of the growing whiskers and the diameter of the catalyst. ■ Fine Si using impurities in raw materials as a catalyst
C whiskers grow.
従って固体原料バルク法で直径の太いウィスカーを合成
するためには■原料の嵩密度、■原料の純度、■触媒の
種類と大きさ、■反応の速度などの制御が重要である。Therefore, in order to synthesize whiskers with a large diameter using the solid raw material bulk method, it is important to control the bulk density of the raw material, the purity of the raw material, the type and size of the catalyst, and the rate of reaction.
特に本発明による炭化珪素ウィスカーの製造方法ではシ
リカとカーボンを触媒と共に混合させ、混合物の嵩密度
は0.1 g / cry以下に限定され、これを水素
含有ガス気流中で反応させる0本発明の触媒としてFe
+ Coo Ni、 Crの111または2種以上を含
む金属粉末を使用すると良好な炭化珪素ウィスカーを得
ることが可能となる。具体的には鉄粉。In particular, in the method for producing silicon carbide whiskers according to the present invention, silica and carbon are mixed together with a catalyst, the bulk density of the mixture is limited to 0.1 g/cry or less, and this is reacted in a hydrogen-containing gas stream. Fe as a catalyst
+ Coo If a metal powder containing 111 or more of Ni and Cr is used, it is possible to obtain good silicon carbide whiskers. Specifically, iron powder.
ステンレス銅粉、Ni粉、 Co粉等の金属粒及び反応
温度においては実質的に上記金属粒となる上記元素の酸
化物、塩類などが使用できる。Metal particles such as stainless steel copper powder, Ni powder, and Co powder, and oxides and salts of the above-mentioned elements that substantially become the above-mentioned metal particles at the reaction temperature can be used.
触媒の添加量はシリカ100重Y部に対し0.3重量部
〜lO重量部であることが望ましい、0.3重量部以下
では十分な炭化珪素ウィスカーの生成がみられない、ま
た、10重面部以上ではウィスカーの生成はあるものの
成長が十分でなく、短いウィスカーが多く生成するので
好ましくない。望ましくは0.3〜5重量部である。The amount of catalyst added is preferably 0.3 parts by weight to 10 parts by weight per 100 parts by weight of silica. If it is above the surface area, although whiskers are generated, they do not grow sufficiently and many short whiskers are generated, which is not preferable. The amount is preferably 0.3 to 5 parts by weight.
また触媒の平均粒径は1.5〜2opmが望ましい。Further, the average particle size of the catalyst is preferably 1.5 to 2 opm.
1.5μm以下では0.5pm以下のウィスカーしか生
成しない、 204より大きいとウィスカーの成長が困
難となる。好ましくは3pmからlO#ffiである。If the diameter is less than 1.5 μm, only whiskers of 0.5 pm or less will be generated; if the diameter is greater than 204, it will be difficult to grow whiskers. Preferably from 3 pm to lO#ffi.
これら上記粉末の混合物の嵩密度はQ、1g/c+d以
下に限定される。混合物の嵩密度が0.1g/cJより
大きい場合、炭化珪素ウィスカーは生成しないか、生成
してもアスペクト比が小さくまた炭化珪素わ)末が混入
し、fiJられるウィスカーは劣悪である。好ましくは
、混合物の嵩密度が0.07g/crl以下である。The bulk density of the mixture of these powders is limited to Q, 1 g/c+d or less. When the bulk density of the mixture is greater than 0.1 g/cJ, silicon carbide whiskers are not produced, or even if they are produced, the aspect ratio is small and silicon carbide particles are mixed in, resulting in poor quality whiskers. Preferably, the bulk density of the mixture is 0.07 g/crl or less.
上記珪素含有粉末と炭素質粉末の混合比は炭化珪素ウィ
スカーの生成反応
SiO*+3C→SiC(w)→−2CO・−・・・・
−・−・−(+1で示される当量によって決定される。The mixing ratio of the silicon-containing powder and carbonaceous powder is the silicon carbide whisker formation reaction SiO*+3C→SiC(w)→−2CO・−・・・
−・−・−(Determined by the equivalent weight indicated by +1.
(1)式の当量よりカーボンが少なければ未反応のシリ
カが残留し、また、当量よりカーボンが多ければ未反応
の炭素が残留する。混合比は当量付近が好ましい。If the amount of carbon is less than the equivalent of formula (1), unreacted silica will remain, and if the amount of carbon is more than the equivalent, unreacted carbon will remain. The mixing ratio is preferably around equivalent.
シリカが残留する時は、例えば弗酸での処理によりそれ
を除去することができ、また、炭素が残留する時は、例
えば空気中700°Cに加熱することで酸化脱炭するこ
とができる。それらは工程に応じて使い分けることが可
能である。When silica remains, it can be removed, for example, by treatment with hydrofluoric acid, and when carbon remains, it can be oxidized and decarburized, for example, by heating to 700° C. in air. They can be used properly depending on the process.
本発明でいう水素を含む気流とは、水素ガスとN2ガス
を除く不活性ガスとの混合気流をいう、水素ガスの濃度
は15%以上が良く、好ましくは50%以上である。ま
た純水素ガスが一層好ましい、水素ガス濃度が15%未
満であると反応が十分に進まず、劣悪なウィスカーが生
成したり、あるいは扮末杖の炭化珪素が生成する。The gas flow containing hydrogen in the present invention refers to a mixed gas flow of hydrogen gas and an inert gas excluding N2 gas, and the concentration of hydrogen gas is preferably 15% or more, preferably 50% or more. Further, pure hydrogen gas is more preferable; if the hydrogen gas concentration is less than 15%, the reaction will not proceed sufficiently, resulting in the formation of inferior whiskers or stale silicon carbide.
水素含有ガスは流通していることが必要で、水素含有雰
囲気とするだけでは不」−分である。水素含有ガスの系
内への必要導人里は装入層t4の量に応じて一定の比率
をとる。すなわち、系内への水素ガス導入量V (Nc
艷/分〕と装入層j4W(g)の比r値を定義し、
W (g)
r値が5以上400以下であることが望ましい、r値が
5より小さいと、得られるウィスカーの性状は劣悪とな
る。400より大きいと経済的でなくなる。好ましくは
IO≦r≦300である。It is necessary that the hydrogen-containing gas is circulating, and it is not enough to simply create a hydrogen-containing atmosphere. The amount of hydrogen-containing gas required to be introduced into the system takes a constant ratio depending on the amount of the charging layer t4. That is, the amount of hydrogen gas introduced into the system V (Nc
Define the ratio r value of W (g) and charging layer j4W (g), and it is desirable that the r value is 5 or more and 400 or less. If the r value is less than 5, the properties of the resulting whisker becomes inferior. If it is larger than 400, it becomes uneconomical. Preferably IO≦r≦300.
水素ガス含有気流中で炭化珪素ウィスカーの生成が促進
される理由は必ずしも明らかではないが、次のような理
由が考えられる。Although it is not necessarily clear why the formation of silicon carbide whiskers is promoted in a hydrogen gas-containing air stream, the following reasons may be considered.
ウィスカーの生成反応は気相を介しての反応であると考
えられる。すなわち、固体原料が加熱されたとき、珪素
源としてSiOが蒸発し、それと気相にあるカーボン源
とが反応してウィスカーを成長させる。水素が存在しな
い条件では、SiO(g ) + 2CO→SiC+C
Oz −−−−−(2)の反応が考えられる。それ
に対し水素が存在すると、まわりに存在する炭素と水素
が反応してCI+、。The whisker production reaction is considered to be a reaction via the gas phase. That is, when the solid raw material is heated, SiO as a silicon source evaporates, and it reacts with a carbon source in a gas phase to grow whiskers. In the absence of hydrogen, SiO(g) + 2CO→SiC+C
The reaction of Oz ------(2) is considered. On the other hand, when hydrogen is present, the surrounding carbon and hydrogen react to form CI+.
C211□が生成し、
SiO(g ) + 2C11,→SiC(w) +G
O+ 411z・−・・・−・−(3)
のような反応がおこり、(3)の反応の方が(2)の反
応より効率が良いものと推定される。また、水素を気流
によってCOが系外へ排出されることにより、反応が継
続して起こるものと推定される。C211□ is generated, SiO(g) + 2C11,→SiC(w) +G
A reaction like O+ 411z·-·····-(3) occurs, and the reaction (3) is estimated to be more efficient than the reaction (2). Furthermore, it is presumed that the reaction continues to occur due to the CO being discharged from the system by the hydrogen gas flow.
炭化珪素ウィスカーの製造にあたっては、上記混合物を
炭素質などのるつぼ又は鞘に充填する。In producing silicon carbide whiskers, the above mixture is filled into a crucible or sheath made of carbonaceous material or the like.
充填にあたって通気を確保できる構造とすることが好ま
しい。It is preferable to have a structure that can ensure ventilation during filling.
混合物の加熱反応温度は1300’C以上であることが
必要である。1300°Cより低い温度ではウィスカー
の生成がほとんどみられない、また、1700°C以上
の温度でもウィスカーの生成がみられるが、蒸発による
系外へのロスが多くなり、あまり有益でない、好ましい
加熱反応温度は1400°Cから1650”Cの範囲で
ある。It is necessary that the heating reaction temperature of the mixture is 1300'C or higher. At temperatures lower than 1,300°C, whisker formation is hardly observed, and at temperatures above 1,700°C, whisker formation is observed, but there is a lot of loss to the outside of the system due to evaporation, which is not very beneficial. The reaction temperature ranges from 1400°C to 1650''C.
加熱処理体から炭化珪素ウィスカーを回収するにあたっ
ては、前述のように原料のsio、、/c比に応じて公
知の方法を取ることができる0例えば、珪素含有粉末が
過剰の場合、弗酸処理して残留するSiO□分を溶解除
去して炭化珪素ウィスカーを得ることができる。また、
炭素過剰の場合、酸化雰囲気中700’C付近の温度で
残留した過剰の炭素質粉末を酸化脱炭する方法、もしく
は水・灯油混合液中に混合分散させ、水側に移行したウ
ィスカーを濾過回収する方法などを取ることができる。In recovering silicon carbide whiskers from the heat-treated body, known methods can be used depending on the sio, /c ratio of the raw materials as described above. For example, if silicon-containing powder is in excess, hydrofluoric acid treatment By dissolving and removing the remaining SiO□, silicon carbide whiskers can be obtained. Also,
In the case of excess carbon, the remaining carbonaceous powder can be oxidized and decarburized at a temperature of around 700'C in an oxidizing atmosphere, or it can be mixed and dispersed in a water/kerosene mixture, and the whiskers that have migrated to the water side can be collected by filtration. There are many ways to do this.
本発明による炭化珪素ウィスカーの製造方法に用いるシ
リカの純度は99.7%以上が望ましい、シリカの純度
が99.7%より悪いとシリカ中に含まれる不純物を触
媒としてウィスカーが成長するため、直径の微細なウィ
スカーが生成する。The purity of the silica used in the method for producing silicon carbide whiskers according to the present invention is preferably 99.7% or higher. If the purity of silica is lower than 99.7%, the whiskers will grow using impurities contained in the silica as a catalyst. minute whiskers are generated.
シリカとしては、シリカフラワー、ホワイトカーボン、
無水珪酸、シリカゲル、シリカゾルなどが使用できる。Examples of silica include silica flower, white carbon,
Silicic anhydride, silica gel, silica sol, etc. can be used.
またカーボンとしてはII、N、O,S以外の不純物が
200−以下の純度の高いカーボン粉が望ましい、上記
不純物が200Fより多いと、カーボンに含まれる不純
物を触媒として直径の微細なウィスカーが成長する。カ
ーボン源としては、カーボンブラック、アセチレンブラ
ック、有機物の不完全燃焼ずす、有機物の不完全燃焼残
炭物などの粉末が使用できる。In addition, as carbon, it is desirable to use highly pure carbon powder with impurities other than II, N, O, and S of 200 F or less. If the above impurities are more than 200 F, whiskers with a fine diameter will grow using the impurities contained in the carbon as a catalyst. do. As the carbon source, powders such as carbon black, acetylene black, incomplete combustion of organic matter, incomplete combustion residual carbon of organic matter, etc. can be used.
シリカの不純物量に比べてカーボンの不純物量がより微
細なウィスカーの成長に敏感な理由は必ずしも明らかで
ないが、次のようにtit定される。The reason why the amount of carbon impurities is more sensitive to the growth of fine whiskers than the amount of silica impurities is not necessarily clear, but tit is determined as follows.
すなりち、シリカは前述した処理温度に近い1000°
C付近から焼結をおこしシリカ自体の表面積は減少する
ため、不純物は焼結したシリカ粒内に封じ込められるの
に対し、カーボンの場合、焼結をおこさないため少量の
不純物でもそのまま触媒として使用するものと考えられ
る。Sunarichi, silica is heated to 1000°, which is close to the processing temperature mentioned above.
Sintering occurs from around C and the surface area of the silica itself decreases, so impurities are confined within the sintered silica grains, whereas in the case of carbon, even a small amount of impurities can be used as a catalyst as it does not cause sintering. considered to be a thing.
〈実施例〉 以下実施例に従い、本発明を更に詳しく説明する。<Example> The present invention will be described in more detail below with reference to Examples.
実施例1
シリカ源として純度99.8%のシリカのアニロゾル1
00重量部、カーボン源としてH,N、O,S以外の不
純物50−のカーボンブラック60重量部及び粒径2.
5〜6pmのステンレス鋼粉を2重量部混合し、嵩密度
0.049g/caの混合物を得た。この混合物3gを
黒鉛るつぼに入れ、11□ガス1oONcffl/分の
気流中1500°C,2時間焼成した。Example 1 Anilosol 1 of 99.8% pure silica as a silica source
00 parts by weight, 60 parts by weight of carbon black containing 50 parts of impurities other than H, N, O, and S as a carbon source, and a particle size of 2.
Two parts by weight of 5-6 pm stainless steel powder were mixed to obtain a mixture having a bulk density of 0.049 g/ca. 3 g of this mixture was placed in a graphite crucible and fired at 1500° C. for 2 hours in an 11□ gas flow of 10 ON cffl/min.
生成物は緑灰色で、X線回折分析ではSiCのピークの
みが認められた。()られた生成物を空気中650°C
で焼成し、若干残留したカーボンを酸化脱炭し、炭化珪
素ウィスカーを得た。得られたウィスカーの直径は1.
0〜2.5pffi+ 平均直径1.7ttm。The product was greenish-gray in color, and only a SiC peak was observed in X-ray diffraction analysis. () in air at 650°C.
The remaining carbon was oxidized and decarburized to obtain silicon carbide whiskers. The diameter of the obtained whisker is 1.
0-2.5pffi+ Average diameter 1.7ttm.
長さ20〜2004.アスペクト比20〜100であり
、径が太くそろった、細いウィスカーの混入しない、折
曲りの少ない炭化珪素ウィスカーであった。またウィス
カーの収率は原料の珪素源から換算し、92%と高かっ
た。Length 20-2004. The silicon carbide whiskers had an aspect ratio of 20 to 100, had uniform diameters, were free of thin whiskers, and had little bending. Furthermore, the yield of whiskers was as high as 92%, calculated from the silicon source of the raw material.
実施例2
シリカ源として純度99,8%のシリカのアエロゾル1
0Offl量部、カーボン源としてIT、 N、 O
,S以外の不純物20rmのカーボンブラック100重
量部および粒径4〜8−の鉄粉1重量部を混合し、嵩密
度0.054の混合物を得た。この混合物10gを黒鉛
るつぼに入れ、11才ガス50ONcj/分の気流中1
550”C2時間焼成した。Example 2 Aerosol 1 of 99.8% pure silica as a silica source
0 Offl parts, IT, N, O as carbon sources
, 100 parts by weight of carbon black containing 20 rm of impurities other than S and 1 part by weight of iron powder having a particle size of 4 to 8- were mixed to obtain a mixture having a bulk density of 0.054. 10g of this mixture was placed in a graphite crucible and placed in an air flow of 50ONcj/min.
Fired at 550"C for 2 hours.
生成物は緑灰色で、X線回折分析ではSiCのピークの
みが認められた。得られた生成物を空気中700°Cで
焼成し、残留したカーボンを酸化脱炭し、炭化珪素ウィ
スカーを得た。得られたウィスカーの直径は1.9〜3
.9−+平均直径2 、8 rrm 、長さ25〜20
0 pll、アスペクト比20〜100であり、径が太
(そろった、細いウィスカーの混入しない、折れ曲りの
少ない炭化珪素ウィスカーであった。ウィスカーの収率
も90%と高かった。The product was greenish-gray in color, and only a SiC peak was observed in X-ray diffraction analysis. The obtained product was fired in air at 700°C, and the remaining carbon was oxidized and decarburized to obtain silicon carbide whiskers. The diameter of the obtained whiskers is 1.9-3
.. 9-+ average diameter 2,8 rrm, length 25-20
The silicon carbide whiskers had a diameter of 0 pll, an aspect ratio of 20 to 100, a uniform diameter, no thin whiskers mixed in, and few bends. The whisker yield was also as high as 90%.
実施例3
シリカ源として純度99.8%のシリカのアエロツル1
00重量部、カーボン源としてIl、 N、 O,S
以外の不純物30−のカーボンブラック100重量部及
び粒径2.5〜6Inaの鉄粉1重量部を混合し、嵩密
度0.044g/c++Iの混合物を得た。この混合物
300gを黒鉛るつぼに入れ、11.ガス2ONl1分
の気流中1550°C2時間焼成した。Example 3 Aerosol 1 of 99.8% pure silica as a silica source
00 parts by weight, Il, N, O, S as carbon sources
100 parts by weight of carbon black containing 30 - of impurities other than the above and 1 part by weight of iron powder having a particle size of 2.5 to 6 Ina were mixed to obtain a mixture having a bulk density of 0.044 g/c++I. Put 300g of this mixture into a graphite crucible, 11. It was fired at 1550° C. for 2 hours in a gas flow of 2ONl for 1 minute.
生成物は緑灰色で、X線回折分析ではSiCのピークの
みが認められた。得られた生成物を空気中650°C″
c焼成し、残留したカーボンを酸化脱炭し、炭化珪素ウ
ィスカーを得た。得られた炭化珪素ウィスカーは、直径
が0.9〜2.6,11111.平均直径1.6n、長
さ25〜200μ、アスペクト比25〜100であり、
径が太くそろって、細いウィスカーが混入しない、かつ
折曲りの少ない炭化珪素ウィスカーであった。ウィスカ
ーの収率も92%と高かった。The product was greenish-gray in color, and only a SiC peak was observed in X-ray diffraction analysis. The obtained product was heated at 650°C'' in air.
The remaining carbon was oxidized and decarburized to obtain silicon carbide whiskers. The obtained silicon carbide whiskers have a diameter of 0.9 to 2.6,11111. The average diameter is 1.6n, the length is 25-200μ, and the aspect ratio is 25-100.
The silicon carbide whiskers had a uniform diameter, were not mixed with thin whiskers, and were less likely to bend. The whisker yield was also as high as 92%.
比較例1
実施例1で用いたシリカとカーボンを用い、シリカ10
0重量部、カーボン60重量部の触媒を含まない二者だ
けの嵩密度0.048 B/cJの混合物を得た。この
混合物3gを黒鉛るつぼに入れ、実施例1と同一条件で
熱処理した。Comparative Example 1 Using the silica and carbon used in Example 1, silica 10
A mixture of the two, containing no catalyst and 60 parts by weight of carbon and having a bulk density of 0.048 B/cJ, was obtained. 3 g of this mixture was placed in a graphite crucible and heat treated under the same conditions as in Example 1.
生成物は灰黒色であり、X線回折ではSiC単相であっ
たが、得られた生成物を空気中650°Cで焼成し、若
干残留したカーボンを酸化脱炭したあと顕微鏡観察をし
たところ、0.2〜o、sμsの粒子の生成が認められ
るのみで、炭化珪素ウィスカーの生成は認められなかっ
た。The product was grayish black, and X-ray diffraction showed it to be a single phase of SiC, but when the product was calcined in air at 650°C and some remaining carbon was oxidized and decarburized, microscopic observation showed that , 0.2 to 0, s μs was observed, and no silicon carbide whiskers were observed.
実施例4
シリカ源として純度99.5%のシリカゲル粉末100
IItft部、カーボン源として実施例1と同一のカー
ボンブラック60重量部、及び粒径2.5〜6−のステ
ンレス鋼粉2重量部を混合し、嵩密度0.053g/c
dの混合物を得、この混合物を実施例1と同様に熱処理
した。Example 4 Silica gel powder 100 with a purity of 99.5% as a silica source
Part IItft, 60 parts by weight of the same carbon black as in Example 1 as a carbon source, and 2 parts by weight of stainless steel powder with a particle size of 2.5 to 6- were mixed to obtain a bulk density of 0.053 g/c.
A mixture of d was obtained, and this mixture was heat-treated in the same manner as in Example 1.
生成物は緑灰色でありX線回折ではSiCの単相であっ
た。実施例1と同様に脱炭し炭化珪素ウィスカーを得た
。しかし、得られたウィスカーは長さおよ・びアスペク
ト比は良好だったものの、直径が0.2〜2.5pII
と広く分布し、直径の細いウィスカーが混入していた。The product was greenish-gray and X-ray diffraction showed it to be a single phase of SiC. Decarburization was performed in the same manner as in Example 1 to obtain silicon carbide whiskers. However, although the obtained whiskers had good length and aspect ratio, they had a diameter of 0.2 to 2.5 pII.
It was widely distributed, and whiskers with a small diameter were mixed in.
ウィスカーの収率は90%と高かったが、lp−以上の
ウィスカーは64%であった。The yield of whiskers was as high as 90%, but the yield of lp- or higher whiskers was 64%.
実施例5
シリカ源として純度99.8%のシリカのアエロゾル1
00重量部、カーボン源として11. N、 O,S
以外の不純物300−のカーボンブラック100重量部
、および粒径2.5〜64の鉄粉を混合し、嵩密度0.
047g/clのγn合物を得た。この混合物を実施例
3と同一条件で熱処理した。Example 5 Aerosol 1 of 99.8% pure silica as silica source
00 parts by weight, 11.0 parts by weight as a carbon source. N, O, S
100 parts by weight of carbon black containing 300 parts of impurities other than 300 parts by weight and iron powder having a particle size of 2.5 to 64 mm were mixed to give a bulk density of 0.
047 g/cl of γn compound was obtained. This mixture was heat treated under the same conditions as in Example 3.
生成物は緑灰色でありX線回折ではSiC単相であった
。実施例2と同様に脱戻し炭化珪素ウィスカーを得た。The product was green-gray in color and X-ray diffraction showed it to be a single phase of SiC. In the same manner as in Example 2, released silicon carbide whiskers were obtained.
しかし、得られたウィスカーの長さおよびアスペクト比
は良好だったものの、直径が0.15〜2.4μmと広
く分布し、直径の細いウィスカーが混入していた。ウィ
スカーの収率は91%と高かったが、Ipm以上のウィ
スカーは59%であった。However, although the length and aspect ratio of the obtained whiskers were good, the diameters were widely distributed from 0.15 to 2.4 μm, and whiskers with small diameters were mixed in. The whisker yield was as high as 91%, but the whisker yield of Ipm or higher was 59%.
実施例6
シリカ源として純度99.8%のシリカのアエロゾル、
カーボン源としてH,N、O,S以外の不純物1000
pのカーボンブラックを使用し、実施例5と同一条件で
SiCウィスカーを合成したところ、実施例5とほぼ同
様の結果をi:)だ。ウィスカーの収率は89%と高か
ったが、18m以上のウィスカーは47%であった。Example 6 Aerosol of 99.8% pure silica as a silica source,
1000 impurities other than H, N, O, and S as a carbon source
When SiC whiskers were synthesized using p carbon black under the same conditions as in Example 5, the results were almost the same as in Example 5 (i:). The yield of whiskers was as high as 89%, but the yield of whiskers of 18 m or more was 47%.
実施例7
実施例1と同一のシリカ100重量部と同一のカーボン
60重量部、触媒として粒径3.2〜6.3μmのCo
粉り重量部を混合し、嵩密度0.048g/cdの混合
物を得た。この混合物3gを黒鉛るつぼに入れ、!11
ガス100Ncd/分の気流中1500°C12時間焼
成した。Example 7 100 parts by weight of the same silica and 60 parts by weight of the same carbon as in Example 1, and Co with a particle size of 3.2 to 6.3 μm as a catalyst.
Parts by weight of the flour were mixed to obtain a mixture having a bulk density of 0.048 g/cd. Put 3g of this mixture into a graphite crucible and! 11
It was fired at 1500° C. for 12 hours in a gas flow of 100 Ncd/min.
生成物は緑黒色で、xvA回折分析ではSiCのピーク
のみがLこめられた。得られた生成物を空気中650℃
で焼成し、若干残留したカーボンを酸化脱炭し、炭化珪
素ウィスカーを得た。得られたウィスカーの直径は1.
0〜2.8 ttm、平均1.9n、長さ25〜200
1111.アスペクト比20〜100であり、径の太く
そろった、細いウィスカーの混入しない、折曲りの少な
い炭化珪素ウィスカーであった。またウィスカーの回収
率は93%であった。The product was green-black in color, and xvA diffraction analysis showed only the peak of SiC. The obtained product was heated at 650°C in air.
The remaining carbon was oxidized and decarburized to obtain silicon carbide whiskers. The diameter of the obtained whisker is 1.
0-2.8 ttm, average 1.9n, length 25-200
1111. The silicon carbide whiskers had an aspect ratio of 20 to 100, had uniform diameters, were free of thin whiskers, and had little bending. The whisker recovery rate was 93%.
〈発明の効果〉
以上のように本発明方法によれば、ウィスカー強化セラ
ミックスに通ずる直径の太いウィスカーの均一合成、ず
なわら、細いウィスカーのtR人および炭化珪素粉末の
混入の少ない合成、が可能となる。また、それは効率的
かつ工業的規模で行うことができ、製造コストの低減が
はかれるので、セラミックス複合材料のこれからの発展
に大きく寄与するものである。<Effects of the Invention> As described above, according to the method of the present invention, it is possible to uniformly synthesize whiskers with a large diameter that lead to whisker-reinforced ceramics, as well as to synthesize thin whiskers with less contamination of tR and silicon carbide powder. becomes. In addition, it can be carried out efficiently and on an industrial scale, reducing manufacturing costs, and will greatly contribute to the future development of ceramic composite materials.
Claims (1)
/cm^2以下の混合物を、水素を含む気流中で加熱反
応させることを特徴とする炭化珪素ウィスカーの製造方
法。 2、請求項1記載のシリカの純度が99.7%以上であ
ることを特徴とする炭化珪素ウィスカーの製造方法。 3、請求項1又は2記載のカーボン中のH、N、S、O
以外の不純物が200ppm以下であることを特徴とす
る炭化珪素ウィスカーの製造方法。 4、請求項1、2又は3記載の触媒はFe、Ni、Co
及びCrの1種又は2種以上を含む金属粉又は合金粉で
、その平均粒径が1.5〜20μmであることを特徴と
する炭化珪素ウィスカーの製造方法。[Claims] 1. Bulk density 0.1g consisting of silica, carbon and catalyst
1. A method for producing silicon carbide whiskers, which comprises heating and reacting a mixture with a diameter of /cm^2 or less in an air flow containing hydrogen. 2. A method for producing silicon carbide whiskers, characterized in that the silica according to claim 1 has a purity of 99.7% or more. 3. H, N, S, O in the carbon according to claim 1 or 2
A method for producing silicon carbide whiskers, characterized in that the content of impurities other than 200 ppm or less is 200 ppm or less. 4. The catalyst according to claim 1, 2 or 3 contains Fe, Ni, Co
A method for producing silicon carbide whiskers, characterized in that the metal powder or alloy powder contains one or more of the following: and Cr, and has an average particle size of 1.5 to 20 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26387188A JPH02111700A (en) | 1988-10-21 | 1988-10-21 | Production of silicon carbide whisker |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26387188A JPH02111700A (en) | 1988-10-21 | 1988-10-21 | Production of silicon carbide whisker |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02111700A true JPH02111700A (en) | 1990-04-24 |
Family
ID=17395401
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26387188A Pending JPH02111700A (en) | 1988-10-21 | 1988-10-21 | Production of silicon carbide whisker |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02111700A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04133791U (en) * | 1991-05-31 | 1992-12-11 | 株式会社カンセイ | liquid supply device |
-
1988
- 1988-10-21 JP JP26387188A patent/JPH02111700A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04133791U (en) * | 1991-05-31 | 1992-12-11 | 株式会社カンセイ | liquid supply device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4849196A (en) | Process for producing silicon carbide whiskers | |
| US5221526A (en) | Production of silicon carbide whiskers using a seeding component to determine shape and size of whiskers | |
| JPH02111700A (en) | Production of silicon carbide whisker | |
| JPH0476359B2 (en) | ||
| JPH03232800A (en) | Production of silicon carbide whisker | |
| CN1055324C (en) | Amorphous in-situ synthesized nm silicon nitride crystal whisker | |
| JPS5820799A (en) | Preparation of silicon carbide whisker | |
| JP2004161507A (en) | Silicon carbide nanorods and method for producing the same | |
| JPH02180710A (en) | Preparation of finely powdered alpha- or beta- silicon carbide | |
| RU2789998C1 (en) | Method for obtaining silicon carbide | |
| JPS61242905A (en) | Production of alpha-silicon nitride powder | |
| JPH0248499A (en) | Production of silicon carbide whisker | |
| JP2639687B2 (en) | Method for producing acicular silicon nitride | |
| JPS6126600A (en) | Method for producing β-type silicon carbide whiskers | |
| JP2645724B2 (en) | β-Si lower 3 N lower 4 whisker manufacturing method | |
| JPS63248798A (en) | Production of silicon carbide whisker | |
| JP2604753B2 (en) | Method for producing silicon carbide whiskers | |
| JPS60195099A (en) | Production of silicon nitride whisker | |
| JPH10203818A (en) | Low oxygen silicon granules, method for producing the same, and method for producing silicon nitride | |
| JPH0331679B2 (en) | ||
| JPS6227400A (en) | Production of silicon nitride whisker | |
| JPS63201099A (en) | Production of silicon carbide whisker | |
| JPH055799B2 (en) | ||
| JPH0121090B2 (en) | ||
| JPH02217400A (en) | Production of silicon carbide whisker |