JPH02184907A - Liquid temperature adjusting method - Google Patents

Liquid temperature adjusting method

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Publication number
JPH02184907A
JPH02184907A JP364289A JP364289A JPH02184907A JP H02184907 A JPH02184907 A JP H02184907A JP 364289 A JP364289 A JP 364289A JP 364289 A JP364289 A JP 364289A JP H02184907 A JPH02184907 A JP H02184907A
Authority
JP
Japan
Prior art keywords
liquid
water
tanks
pure water
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP364289A
Other languages
Japanese (ja)
Other versions
JP2755262B2 (en
Inventor
Fumio Yokoyama
横山 史夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Organo Corp
Original Assignee
Organo Corp
Japan Organo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Organo Corp, Japan Organo Co Ltd filed Critical Organo Corp
Priority to JP364289A priority Critical patent/JP2755262B2/en
Publication of JPH02184907A publication Critical patent/JPH02184907A/en
Application granted granted Critical
Publication of JP2755262B2 publication Critical patent/JP2755262B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Control Of Temperature (AREA)

Abstract

PURPOSE:To perform the rise or fall of a liquid temperature gradually for constant time by accommodating liquid with different temperatures in two tanks in which the liquid can flow from one side to the other side mutually, and discharging the liquid accommodated in both tanks from either of the tanks. CONSTITUTION:The tanks 6 and 7 in which the liquid with different temperatures are accommodated, respectively, are communicated in such a way that the liquid can flow from the tank on one side to the tank on the other side. And pure water with different temperatures accommodated in both tanks is discharged with a flow rate set in advance only from the tank on one side i.e. the tank 7 in which the pure water is accommodated by communicating the tanks 6 and 7 with each other by opening a valve 14, and opening a valve 11 simultaneously, and driving a liquid sending pump 13. In such a way, the pure water whose temperature can be increased gradually can be obtained from the discharging side of the liquid sending pump 13.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は液温上昇または液温下降を、一定の時間をかけ
て徐々に、かつ連続的に行いたい場合に適用する、極め
て簡便な液温調節方法に関するものである。
[Detailed Description of the Invention] <Industrial Application Field> The present invention is an extremely simple liquid solution that is applied when it is desired to gradually and continuously raise or lower the liquid temperature over a certain period of time. The present invention relates to a temperature control method.

〈従来の技術〉 近年、LSIや超LSIを生産する電子工業分野や医薬
、製薬工業の分野等において、微粒子、コロイダル物質
、高分子有機物、発熱性物質等を可及的に除去した、い
わゆる超純水が用いられている。
<Conventional technology> In recent years, so-called ultra-large-scale integrated circuits, which remove as much as possible fine particles, colloidal substances, high-molecular organic substances, pyrogenic substances, etc., have been used in the fields of the electronic industry, medicine, and pharmaceutical industry, etc., where LSIs and VLSIs are produced. Pure water is used.

たとえば、電子工業において用いられる超純水は通常、
次のような方法で製造される。
For example, ultrapure water used in the electronics industry is typically
It is manufactured by the following method.

すなわち、原水を凝集沈殿装置、砂濾過器、活性炭濾過
器、逆浸透膜装置、2床3塔式純水製造装置、混床式ポ
リシャー、精密フィルター等からなる一次側給水装置で
処理していわゆる一次純水を得、当該−次純水を更に温
床式ポリシャー、紫外線照射装置、精密濾過膜装置や超
濾過膜装置等の膜装置からなる二次側給水装置で処理し
て超純水とするものである。得られた超純水は配管によ
ってユースポイント(使用箇所)に送られ、そこで半導
体ウェハーまたはチップの洗浄用水として使用される。
That is, raw water is treated with a primary water supply system consisting of a coagulation sedimentation device, a sand filter, an activated carbon filter, a reverse osmosis membrane device, a two-bed three-column pure water production device, a mixed bed polisher, a precision filter, etc. Primary pure water is obtained, and the secondary pure water is further processed in a secondary water supply system consisting of membrane devices such as a hotbed polisher, ultraviolet irradiation device, precision filtration membrane device, and super filtration membrane device to produce ultrapure water. It is something. The obtained ultrapure water is sent via piping to the point of use, where it is used for cleaning semiconductor wafers or chips.

上述のような二次側給水装置では、その被処理水が一次
側給水装置で得られる純水であるにも拘わらず、またユ
ースポイント直前で紫外線照射を行っているにも拘わら
ず、長時間の超純水製造を続行するうちに、超純水中に
生菌や微粒子の漏洩量が増加し許容限度を超えてしまう
In the above-mentioned secondary water supply system, even though the water to be treated is pure water obtained from the primary water supply system, and despite the fact that ultraviolet rays are applied just before the point of use, it cannot be used for a long time. As the production of ultrapure water continues, the amount of viable bacteria and particles leaking into the ultrapure water increases and exceeds the permissible limit.

この原因は超純水中に僅かに存在し、紫外線に耐性を有
する一般細菌が前記膜装置や以後のユースポイント配管
等の二次側給水系路の内部に次第に繁殖してくるためと
考えられる。
The cause of this is thought to be that a small amount of general bacteria that exist in ultrapure water and are resistant to ultraviolet rays gradually breeds inside the secondary water supply system channels such as the membrane device and subsequent use point piping. .

膜装置やユースポイント配管等の二次側給水系路が細菌
で汚染された場合は、得られる超純水が洗浄用水として
不適となるため、何らかの殺菌処理を施す必要が生ずる
が、その一方法として従来から二次側給水系路内に熱水
を流入させて殺菌する方法が行われている。
If the secondary water supply system, such as a membrane device or point-of-use piping, is contaminated with bacteria, the ultrapure water obtained will be unsuitable as water for cleaning, so some kind of sterilization treatment will be required. Conventionally, a method of sterilizing the secondary water supply system by flowing hot water into the secondary water supply system has been used.

当該熱水殺菌処理には通常、用水として前記−次側給水
装置で得た常温の純水が使用され、当該純水をたとえば
第2図に示したような装置で加熱して二次側給水系路に
供給していた。すなわち、図示しないポンプ等の送水手
段により、配管1を介して常温の純水を熱交換器2に導
入するとともに、当該熱交換器2にスチームまたは温水
のような熱媒を、熱媒供給管3を介して供給し、前記純
水を所定の温度、通常70℃以上に加熱して熱純水とな
し、当該熱線水を配管4を介して二次側給水系路に供給
して熱水殺菌を行う。
Normally, the hot water sterilization treatment uses room-temperature pure water obtained from the above-mentioned secondary side water supply device as water, and the purified water is heated with a device such as the one shown in Fig. 2 to supply the secondary side water supply. It was being supplied to the network. That is, pure water at room temperature is introduced into the heat exchanger 2 through the pipe 1 by a water supply means such as a pump (not shown), and a heat medium such as steam or hot water is introduced into the heat exchanger 2 through the heat medium supply pipe. 3, the pure water is heated to a predetermined temperature, usually 70°C or higher, to produce hot pure water, and the hot wire water is supplied to the secondary water supply system line through piping 4 to produce hot water. Sterilize.

また、このような熱水殺菌処理が終了したら前記熱交換
器2への熱媒の供給を停止し、二次側給水系路に再び常
温の純水を供給して超純水の製造を開始する。
Furthermore, when such hot water sterilization treatment is completed, the supply of the heat medium to the heat exchanger 2 is stopped, and the pure water at normal temperature is supplied to the secondary water supply line again to start producing ultrapure water. do.

〈発明が解決しようとする問題点〉 上述の如く、熱水殺菌処理においては今まで常温の純水
を処理していた二次側給水系路中に、熱交換器等で70
℃以上に加熱された熱純水を供給し、また熱水殺菌終了
後は当該二次側給水系路中に再び常温の純水を供給する
のであるが、従来はこの時の温度管理をオペレータによ
る手動操作によって行っていた。
<Problems to be solved by the invention> As mentioned above, in hot water sterilization treatment, a heat exchanger etc.
Thermal pure water heated to above ℃ is supplied, and after the hot water sterilization is completed, room temperature pure water is supplied again into the secondary water supply system, but conventionally, temperature control at this time was performed by the operator. This was done by manual operation.

たとえば、第2図における熱媒供給管3に弁5を付設し
、当該弁5の開度を手動で徐々に大きくすることによっ
て熱交換器2に供給する熱媒の流量を徐々に増大させ、
このような操作によって熱交換器2に導入した常温の純
水の温度を徐々に上昇させるというような方法であり、
従って操作が極めて煩雑であるとともに、どうしても急
激な温度上昇や下降が生じ易く、そのため配管類や機器
類等に過度な膨張、収縮が加わるほか、急激な温度上昇
に伴う管内圧力の上昇等により配管類の耐久性を悪くす
るという問題点があった。
For example, by attaching a valve 5 to the heat medium supply pipe 3 in FIG. 2 and gradually increasing the opening degree of the valve 5 manually, the flow rate of the heat medium supplied to the heat exchanger 2 is gradually increased.
This is a method in which the temperature of the room-temperature pure water introduced into the heat exchanger 2 is gradually raised by such an operation.
Therefore, operations are extremely complicated, and the temperature tends to rise or fall rapidly, which causes excessive expansion and contraction of piping and equipment, as well as increases in pressure inside the pipes due to rapid temperature rises. There was a problem that the durability of the product was deteriorated.

このように、系内に通流させる液体を低温のものからこ
れよりはるかに高温のものに切り換えたり、あるいはこ
の逆に高温液体から低温液体に切り換えたりすることは
工業的によく行われることであるがこのような場合は使
用している配管類や機器類に与える、温度変化に伴うダ
メージを少なくするために、急激な温度上昇あるいは下
降を出来るだけ避け、一定の時間をかけてゆっくりと液
温を上昇あるいは下降させることが肝要である。
In this way, it is common industrial practice to switch the liquid flowing through a system from a low-temperature liquid to a much higher-temperature liquid, or vice versa. However, in such cases, in order to reduce damage caused by temperature changes to the piping and equipment being used, avoid sudden temperature rises or falls as much as possible, and slowly drain the liquid over a certain period of time. It is essential to raise or lower the temperature.

このような目的を達成することは、たとえば第2図にお
いて熱媒供給管3に付設する弁を、その開度を機械的ま
たは電気的に調節可能なコントロール弁となし、当該コ
ントロール弁の開度をたとえばマイクロコンピュータ等
を利用した制御手段によって制御するようにすれば可能
である。すなわち、当該コントロール弁を、その開度が
一定の時間をかけて段階的に大きくなるように制御する
ことにより、熱交換器2に供給される熱媒の流量を徐々
に増大させ、それに応じて熱交換器2に一定流量で導入
される純水の温度を徐々に上昇させることが出来る。
To achieve this purpose, for example, the valve attached to the heat medium supply pipe 3 in FIG. 2 is made into a control valve whose opening degree can be adjusted mechanically or electrically, and This can be done by controlling, for example, a control means using a microcomputer or the like. That is, by controlling the control valve so that its opening degree increases stepwise over a certain period of time, the flow rate of the heat medium supplied to the heat exchanger 2 is gradually increased, and the flow rate of the heat medium supplied to the heat exchanger 2 is increased accordingly. The temperature of pure water introduced into the heat exchanger 2 at a constant flow rate can be gradually increased.

しかしながら、この場合には計装的に非常に複雑で、か
つ高価な制御機構を必要とするという問題点がある。
However, in this case, there is a problem that the instrumentation is extremely complicated and requires an expensive control mechanism.

本発明は上述のような事情に漏みてなされたものであり
、液温上昇あるいは下降を、一定の時間をかけて徐々に
行うことが出来る、極めて簡便で、かつ安価に実施し得
る液温調節方法を提供することを目的とするものである
The present invention has been made in view of the above-mentioned circumstances, and provides an extremely simple and inexpensive liquid temperature control that can gradually raise or lower the liquid temperature over a certain period of time. The purpose is to provide a method.

〈問題点を解決するための手段〉 上記目的を達成するためになされた本発明は、液体が相
互に通流可能に連通してなる2つの槽に互いに温度の異
なる液体をそれぞれ収容し、これら両槽内に収容した液
体をいずれか一方の槽のみから排出させることを特徴と
する液温調節方法である。
<Means for Solving the Problems> The present invention, which has been made to achieve the above object, stores liquids having different temperatures in two tanks in which the liquids communicate with each other so that they can flow, and This liquid temperature regulating method is characterized in that the liquid contained in both tanks is discharged from only one of the tanks.

〈作用〉 以下に本発明を図面を用いて詳細に説明する。<Effect> The present invention will be explained in detail below using the drawings.

第1図は本発明の実施態様の一例を示すフローの説明図
であり、図中6および7は互いに温度の異なる液体をそ
れぞれ収容するための楢を示しており、これら両槽は連
通管8により、一方の槽から他方の槽へ液体が通流可能
に連通されている。
FIG. 1 is a flow explanatory diagram showing an example of an embodiment of the present invention. In the figure, 6 and 7 indicate oaks for respectively storing liquids having different temperatures, and these two tanks are connected to a communication pipe 8. This allows liquid to flow from one tank to the other tank.

また、槽6には弁9を介して排出管10が、槽7には弁
11を介して排出管12がそれぞれ接続されており、こ
れら再排出管は前記弁9および弁11のそれぞれ下流側
で合流し、その後送液ポンプ13の吸い込み側に接続さ
れている。
Further, a discharge pipe 10 is connected to the tank 6 via a valve 9, and a discharge pipe 12 is connected to the tank 7 via a valve 11, and these re-discharge pipes are connected to the downstream side of the valve 9 and the valve 11, respectively. After that, it is connected to the suction side of the liquid feeding pump 13.

また、第1図において14は前記連通管8に付設した弁
を、15.16はそれぞれ槽6内、および槽7内に所定
温度の液体を供給するための供給管を示している。
Further, in FIG. 1, reference numeral 14 indicates a valve attached to the communication pipe 8, and reference numerals 15 and 16 indicate supply pipes for supplying liquid at a predetermined temperature into the tank 6 and the tank 7, respectively.

第1図に示したようなフローによって、たとえば前述し
た超純水製造装置の二次側給水系路の熱水殺菌処理を行
うには、以下のようにして行う。
For example, hot water sterilization of the secondary water supply system of the ultrapure water production apparatus described above can be carried out in the following manner using the flow shown in FIG.

なお、以下の説明では、今まで一次側給水装置から得た
常温(仮に20℃とする)の純水を処理していた二次側
給水系路に、最終的に80℃の熱純水を供給して熱水殺
菌を行う場合であって、かつこの間に供給する純水の温
度を20℃から80℃に15分かけて徐々に上昇させる
場合を例にして説明する。
In addition, in the following explanation, thermally purified water at 80 degrees Celsius will finally be added to the secondary water supply system, which has been treating pure water at room temperature (temporarily 20 degrees Celsius) obtained from the primary water supply system. An example will be explained in which the temperature of the supplied pure water is gradually increased from 20° C. to 80° C. over 15 minutes during hot water sterilization.

先ず、弁9.11.14をすべて閉じた状態で、槽6内
に供給管15を介して、熱交換器等によって80℃に加
熱した熱純水を供給し、当該槽6内に所定量の熱純水を
予め収容する。一方、もう一つの槽7内に、供給管16
を介して20℃の純水(以下冷純水という)を供給し、
当該槽7内に所定量の冷純水を予め収容する。この際、
両槽の水面レベルがほぼ同一のレベルとなるように両線
水を収容する。また、送液ポンプ13の吐出量を、前記
両槽に収容した液体のほぼ全量に近い量を、15分間で
排出できるように予め設定しておく。
First, with all the valves 9, 11, and 14 closed, hot pure water heated to 80°C by a heat exchanger or the like is supplied into the tank 6 through the supply pipe 15, and a predetermined amount of water is supplied into the tank 6. of hot pure water is stored in advance. On the other hand, in the other tank 7, there is a supply pipe 16.
20°C pure water (hereinafter referred to as cold pure water) is supplied through the
A predetermined amount of cold pure water is stored in the tank 7 in advance. On this occasion,
Both lines of water are stored so that the water surface levels of both tanks are approximately at the same level. Further, the discharge amount of the liquid pump 13 is set in advance so that almost the entire amount of the liquid contained in the two tanks can be discharged in 15 minutes.

次いで、この状態から弁14を開いて槽6と槽7とを連
通させ、同時に弁11を開き、送液ポンプ13を駆動さ
せて前記両槽内に収容した温度の異なる両線水を、一方
の槽、つまり冷純水を収容した槽7のみから予め設定し
た流量で排出させる。
Next, from this state, the valve 14 is opened to communicate the tanks 6 and 7, and at the same time, the valve 11 is opened, and the liquid feed pump 13 is driven to transfer the two lines of water at different temperatures stored in the two tanks to one side. Only the tank 7 containing cold pure water is discharged at a preset flow rate.

このような方法により、送液ポンプ13の吐出側から温
度が20℃から約80℃に、15分かかって徐々に上昇
する純水を得ることが出来る。
By such a method, it is possible to obtain pure water whose temperature gradually rises from 20° C. to about 80° C. over a period of 15 minutes from the discharge side of the liquid pump 13.

すなわち、上記操作の開始直後は、槽7内に収容した冷
純水を排出する関係から、送液ポンプ13の吐出側より
温度20℃の純水が得られる。冷純水の排出によって槽
7丙の水面レベルが下降し、当該レベルが槽6内に収容
した熱純水の水面レベルより低くなると、槽6と槽7と
が弁14を介して連通管8によって連通しているために
槽6と槽7の水面レベルは常に同じレベルを維持しよう
とし、その結果槽6から槽7へ80℃の熱純水が連通管
8を介して連続的に流入するようになり、かつ両槽の水
面は常にほぼ同じレベルを保ちながら下降する。当該熱
純水の流入によって槽7内の純水の温度は徐々に上昇し
、よって送液ポンプ13の吐出側から温度が20℃から
徐々に、かつ連続的に上昇する純水を得ることが出来る
。そして、両槽内に当初収容した両線水がほぼなくなる
15分後には、送液ポンプ13の吐出側から約80℃の
純水を得ることが出来る。
That is, immediately after the start of the above operation, pure water at a temperature of 20° C. is obtained from the discharge side of the liquid pump 13 because the cold pure water stored in the tank 7 is discharged. When the water level of tank 7 C falls due to the discharge of cold pure water and becomes lower than the water level of the hot pure water stored in tank 6 , tanks 6 and 7 are connected via valve 14 to communication pipe 8 . Because they are in communication with each other, the water levels in tanks 6 and 7 always try to maintain the same level, and as a result, hot pure water at 80°C continuously flows from tank 6 to tank 7 via communication pipe 8. The water level in both tanks always stays at almost the same level and falls. The temperature of the pure water in the tank 7 gradually rises due to the inflow of the hot pure water, so that it is possible to obtain pure water from the discharge side of the liquid pump 13 whose temperature gradually and continuously rises from 20°C. I can do it. Then, 15 minutes after the water initially stored in both tanks is almost completely exhausted, pure water at about 80° C. can be obtained from the discharge side of the liquid feed pump 13.

上述のようにして送液ポンプ13の吐出側から得られる
、温度が20℃から約80℃に徐々に上昇する純水は、
そのまま二次側給水系路に供給する。なお、送液ポンプ
13の吐出側から得られる純水の温度がほぼ80℃に達
した時点、すなわち両槽内に当初収容した純水がなくな
る直前に、供給管15を介しての槽6内への80℃の熱
純水の供給を開始し、同時に弁11.14を閉じて弁9
を開き当該槽6内に連続的に供給する熱純水を今度は弁
9、排出管10および送液ポンプ13を介して排出させ
る。このような操作により、引き続き80℃の熱純水を
二次側給水系路に供給することが出来、二次側給水系路
の熱水殺菌処理を滞りなく行うことが出来る。
The pure water obtained from the discharge side of the liquid pump 13 as described above and whose temperature gradually rises from 20°C to about 80°C is
The water is directly supplied to the secondary water supply system. Note that when the temperature of the pure water obtained from the discharge side of the liquid sending pump 13 reaches approximately 80°C, that is, immediately before the pure water initially stored in both tanks runs out, the water in the tank 6 via the supply pipe 15 is At the same time, valves 11 and 14 are closed, and valve 9 is closed.
The tank 6 is opened and the hot pure water continuously supplied into the tank 6 is then discharged via the valve 9, the discharge pipe 10, and the liquid pump 13. With this operation, 80° C. hot pure water can be continuously supplied to the secondary water supply system, and the hot water sterilization process of the secondary water supply system can be performed without any problem.

上述した一連の操作は、たとえば両槽にレベルスイッチ
を付設し、また使用する弁を通常の自動開閉弁とし、こ
れらレベルスイッチと自動弁と前記送液ポンプ13とを
計装的に連結することによって容易に自動ヰすることが
出来る。
The above-mentioned series of operations can be carried out by, for example, attaching level switches to both tanks, using normal automatic opening/closing valves as the valves, and connecting these level switches, automatic valves, and the liquid sending pump 13 with instrumentation. This can be easily done automatically.

以上のような熱水殺菌処理が終了したら、今度は二次側
給水系路に温度が80℃から20℃に徐々に下降する純
水を供給して二次側給水系路を徐kに冷却するが、この
場合には上述しだ液温上昇の場合とは逆に弁11を閉じ
、弁14および弁9を開けて両槽内に収容した純水を、
熱純水を収容した槽6の方からのみ排出させるか、ある
いは両槽内に収容する純水を相互に入れ換えて槽6内に
冷純水を、槽7内に熱純水を収容し、前述の場合と全く
同じ操作を行えばよく、詳しい説明は省略する。
Once the above hot water sterilization process is completed, the secondary water supply system is then supplied with pure water whose temperature gradually drops from 80°C to 20°C to gradually cool the secondary water supply system. However, in this case, contrary to the above-mentioned case of rising liquid temperature, valve 11 is closed, valve 14 and valve 9 are opened, and the pure water contained in both tanks is
Only the tank 6 containing the thermally purified water is discharged, or the pure water contained in both tanks is mutually exchanged so that the cold purified water is stored in the tank 6 and the thermally purified water is stored in the tank 7. It is sufficient to perform exactly the same operations as in the above case, and detailed explanation will be omitted.

なお、上述の実施態様では本発明を超純水製造装置の二
次側給水系路の熱水殺菌処理に適用した例を示したが、
本発明はこれに限定されるものではなく、液温上昇ある
いは下降を一定の時間をかけて徐々に行いたい場合はい
かなる場合にも適用することが出来るのは言うまでもな
いことである。
In addition, in the above-mentioned embodiment, an example was shown in which the present invention was applied to hot water sterilization treatment of the secondary water supply line of an ultrapure water production device,
It goes without saying that the present invention is not limited to this, and can be applied to any case where it is desired to gradually raise or lower the liquid temperature over a certain period of time.

〈効果〉 以上説明した如く、本発明によれば連通管によって連通
させた2つの槽に、それぞれ温度の異なる液体を収容し
、一方の槽のみから液体を排出させるという極めて簡単
な方法によって、一方の槽に収容した液体の温度から他
方の槽に収容した液体の温度まで、温度が徐々にかつ連
続的に上昇あるいは下降する液体を容易に得ることが出
来、従ってたとえば系内に通流させる液体を、比較的低
温のものから高温のものに切り換えるような場合の液温
調節方法として極めて便利であり、また安価に実施し得
るという利点を有する。
<Effects> As explained above, according to the present invention, liquids having different temperatures are stored in two tanks connected by a communication pipe, and the liquid is discharged from only one tank. A liquid whose temperature gradually and continuously increases or decreases from the temperature of the liquid stored in one tank to the temperature of the liquid stored in the other tank can be easily obtained, and therefore, for example, the liquid can be passed through the system. This method is extremely convenient as a method for adjusting the liquid temperature when switching from a relatively low temperature to a high temperature, and has the advantage that it can be carried out at low cost.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施態様の一例を示すフローの説明図
であり、第2図は従来技術の例を示すフローの説明図で
ある。
FIG. 1 is a flow explanatory diagram showing an example of an embodiment of the present invention, and FIG. 2 is a flow explanatory diagram showing an example of a conventional technique.

Claims (1)

【特許請求の範囲】[Claims] 液体が相互に通流可能に連通してなる2つの槽に互いに
温度の異なる液体をそれぞれ収容し、これら両槽内に収
容した液体をいずれか一方の槽のみから排出させること
を特徴とする液温調節方法。
A liquid characterized by containing liquids having different temperatures in two tanks in which the liquids communicate with each other so that they can flow, and in which the liquid contained in both tanks is discharged from only one of the tanks. Temperature control method.
JP364289A 1989-01-12 1989-01-12 Liquid temperature adjustment method Expired - Fee Related JP2755262B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP364289A JP2755262B2 (en) 1989-01-12 1989-01-12 Liquid temperature adjustment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP364289A JP2755262B2 (en) 1989-01-12 1989-01-12 Liquid temperature adjustment method

Publications (2)

Publication Number Publication Date
JPH02184907A true JPH02184907A (en) 1990-07-19
JP2755262B2 JP2755262B2 (en) 1998-05-20

Family

ID=11563137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP364289A Expired - Fee Related JP2755262B2 (en) 1989-01-12 1989-01-12 Liquid temperature adjustment method

Country Status (1)

Country Link
JP (1) JP2755262B2 (en)

Also Published As

Publication number Publication date
JP2755262B2 (en) 1998-05-20

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