JPH0218586B2 - - Google Patents
Info
- Publication number
- JPH0218586B2 JPH0218586B2 JP57160923A JP16092382A JPH0218586B2 JP H0218586 B2 JPH0218586 B2 JP H0218586B2 JP 57160923 A JP57160923 A JP 57160923A JP 16092382 A JP16092382 A JP 16092382A JP H0218586 B2 JPH0218586 B2 JP H0218586B2
- Authority
- JP
- Japan
- Prior art keywords
- photoelectric conversion
- layer
- substrate
- cadmium selenide
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/12—Active materials
- H10F77/123—Active materials comprising only Group II-VI materials, e.g. CdS, ZnS or HgCdTe
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
Description
【発明の詳細な説明】
〔発明の技術分野〕
この発明は光電変換素子に関する。
〔発明の技術的背景〕
光電変換素子は、光電変換層に投射された光量
を、この光電変換層上に並列にあるいは光電変換
層を挾むようにして設けられた電極から、光量に
応じた電気信号量として取出すことができる。こ
のような光電変換素子の用途はフオトダイオー
ド、撮像管、フアクシミリの読取部分等広範囲に
及んでいる。
セレン化カドミウム(CdSe)は可視部に高い
光電変換効率を示す光導電物質で、例えばカルニ
コンの商品名の撮像管に使用されている。第1図
にこのカルニコンについて光電変換素子の簡略断
面図を示す。基板1は透明なガラス板で、この基
板1の一側表面にネサ膜が電極2として形成され
ている。さらにこのネサ電極2の上に光電変換層
3として順にセレン化カドミウム層4、セレン酸
カドミウム層5(CdSeO3)5、三硫化砒素
(As2S3)層6が遂次重畳されて形成されている。
ネサ電極2を一方の電極とするとき他方の電極
は、図示していない電子銃から投射され、三硫化
砒素層6の上表面で焦点を結び遂次走査してゆく
電子ビーム7がその役割を坦う。このような光電
変換素子の基板他側表面に光8を投射するとき光
量に応じて光電変換層3の抵抗が変化し、光が投
射された部分の抵抗値は低くなる。抵抗値の変化
はネサ電極2と電子ビーム7が投射されるカソー
ドとの間に一定の電圧を印加しておき、ネサ電極
2とカソードとの間に流れる電流の値として読み
とることができる。この電流を光電流と呼びIpで
表す。また光の投射をやめた時に流れる電流を暗
電流と呼びIdで表す。光電変換層3の性質として
一定光量の光8を投射した時Ipが大なる程良く、
高感度膜であるという。他方Idは小さい程良い。
例えば1吋の撮像管用光電変換層3に1ルツクス
の光8を投射し、ネサ電極2に25Vの電圧を印加
した時Ipは400nA、Idは1nAである。この光電変
換層3の一部を次のように変更してみる。まずセ
レン化カドミウム層4、セレン酸カドミウム層5
を遂次重畳したあと、セレン酸カドミウム層5上
に第2図上面図に示すように一対の電極9,10
をa辺2mm、b辺5mm、間隔cを0.25mmにとつて
形成するのである。この場合電極9と電極10と
の間に1Vの電圧を印加し、100ルツクスの光を投
射すると、Ip=3×10-7A、Id=3×10-12Aが得
られる。この時セレン化カドミウム層4とセレン
酸カドミウム層5を合せ三硫化砒素層6を欠く光
電変換層の厚さは1μmであるから光を投射した
時の伝導率σp=1.5×10-4/cmであり、光を投
射しない時の伝導率σd=1.5×10-9/cmでもあ
る。
〔背景技術の問題点〕
このような光電変換素子の光を投射した時の伝
導率σpは要請される値、例えば1×10-13/cm
以上に対し数分の一でしかなく、感度を不足して
いる。
〔発明の目的〕
この発明は、前記のような形で使用されるセレ
ン化カドミウムを主層成分とする光電変換素子を
改良し、光感度を従来の数倍乃至数10倍に向上さ
せた新規な光電変換素子を提供するにある。
〔発明の概要〕
即ちこの発明は透明な基板と、この基板の少く
とも一表面に形成され主層成分をセレン化カドミ
ウムとする光電変換層と、この光電変換層の表面
に形成される電極とを備える光電変換素子におい
て、光電変換層は、前記基板とセレン化カドミウ
ム層との間に拡散領域を設けられている光電変換
素子にある。
〔発明の実施例〕
以下実施例について述べる。第3図はこの例の
断面図で、透明な基板1と、この基板の一側表面
に形成された光電変換層11と、光電変換層11
の上に形成された電極9,10とからなつてい
る。但し電極9,10の形状は、第2図に示した
ものと同一である。光電変換層11は、セレン化
カドミウム層4と、このセレン化カドミウム層上
に重畳されて形成されているセレン酸カドミウム
層5と、さらに基板1とセレン化カドミウム層4
との境にある拡散領域12とからなつている。基
板1は、厚さ2mm、直径26mmφの、二酸化珪素と
酸化硼素を主成分とし他の成分として酸化アルミ
ニウム、酸化鉄、酸化カルシウム、酸化マグネシ
ウム、酸化ナトリウム、酸化カリウム、酸化砒素
を含む硼珪酸ガラスから成つている。上記基板1
に形成されるセレン化カドミウム層4の厚さは
0.5μm〜3μm、特に1μmが好ましく、蒸着によつ
て形成してある。セレン酸カドミウム層5は、上
記セレン化カドミウムをセレニウム蒸気を含む酸
素とアルゴン雰囲気中で加熱して得られ、厚さは
例えば0.1μmでよい。基板1とセレン化カドミウ
ム層4との間に形成される拡散領域12も上記雰
囲気処理中に形成される。拡散領域の一万倍拡大
電子顕微鏡写真図を第4図に示す。同図の試料
は、硼珪酸ガラス基板上に直接セレン化カドミウ
ムを被着形成した後、前述の加熱活性化処理を施
し、その後、エツチングによつてセレン化カドミ
ウムの層を除去してガラス基板面を露出させたも
のである。同図はこの基板面の走査型電子顕微鏡
写真である。同図から、ガラス基板の表面部に
は、セレン化カドミウム層の粒子に対応している
島状領域が認められる。この部分はガラス基板材
料とセレン化カドミウムとの相互拡散領域の層で
ある。なお、同図中の白と黒とのコントラストの
強い点状の部分は、複数の粒界の交点に対応し、
主としてガラス質の凹部分である。
このような拡散領域を有する光電変換層11は
特に光に対して強い感度と小さい暗電流を示し、
撮像管に使用した例で先に述べたセレン化カドミ
ウムを主成分とする第1図光電変換層3にくらべ
て60倍高い感度が得られる。
いま第3図に示す光電変換素子の電極9,10
間に1Vの電圧を印加して100ルツクスの光を投射
したとき、Ip=2×10-5A、Id=1.6×10-11Aが得
られ、光を投射した時の伝導率σp=1×10-2/
cm、光を投射しない時の伝導率σd=8×10-9/
cmを示し、第1図光電変換層3にくらべ60倍の光
感度を呈する。このように高い感度が得られる理
由は次の通り説明出来る。基板1の上に、酸化錫
(SnO2)層、五酸化タンタル(Ta2O5)層、又は
二酸化珪素(SiO2)層をそれぞれ形成した各試
料と、基板1のまゝの試料の四種類の試料を用意
する。基板1の上に形成された三通りの各成分は
0.2〜1μmの厚さで透明である。これら各試料上
に実施例で述べたと同じ方法で同時に光電変換層
11および電極9,10を形成する。各試料につ
いてIpおよびIdを測定したのち、光電変換層11
の一部を希硝酸で溶解して除去し、拡散領域12
の有無を検出する。結果を表示する。この表から
拡散領域12の有無とσpの大小は良く一致し、
拡散領域のある試料のみが高い感度と小さい暗電
流を併せて示していることがわかる。このような
拡散領域は、従来の撮像管の場合、ネサ電極2に
形成を妨げられていたことが推定できる。
【表】
拡散領域12の生成は、セレン化カドミウム4
が接する基板の材質に大きく影響を受けるが、他
の要因としてセレン化カドミウム4を熱処理する
時の酸素の有無、温度等があり、処理時の雰囲気
中に酸素を含まない場合、拡散領域12は形成さ
れずσp=2×10-5/cm、σd=1×10-9/cmで
光感度も著しく低い。また酸素とセレニウムの混
合雰囲気中でも500℃以下では拡散領域12は殆
んど形成されず光感度も1/100以下である。
基板との間に拡散領域12を形成して基板上に
分布するセレン化カドミウムを主層成分とする光
電変換素子は、他の利点として第5図に示すよう
に一枚の基板の上に独立した二個以上の光電変換
素子131,132,…13nをエツチングを併
用して形成する場合、基板との結合力が強いため
より微細なパターンを形成できる。
〔発明の効果〕
以上述べたようにセレン化カドミウムを主層成
分とする光電変換素子において、基板とセレン化
カドミウムセレナイド層との間に拡散領域を形成
することにより光に対する感度を大幅に向上させ
るとともに基板との付着強度を向上させ、又同一
基板上に独立した光電変換素子をつくる場合によ
り微細なパターンの形成を可能にするものであ
る。 DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a photoelectric conversion element. [Technical Background of the Invention] A photoelectric conversion element converts the amount of light projected onto a photoelectric conversion layer into an electrical signal amount corresponding to the amount of light from electrodes provided on the photoelectric conversion layer in parallel or sandwiching the photoelectric conversion layer. It can be extracted as The applications of such photoelectric conversion elements are wide-ranging, including photodiodes, image pickup tubes, and facsimile reading parts. Cadmium selenide (CdSe) is a photoconductive material that exhibits high photoelectric conversion efficiency in the visible region, and is used, for example, in image pickup tubes under the trade name Carnicon. FIG. 1 shows a simplified sectional view of the photoelectric conversion element of this carnicon. The substrate 1 is a transparent glass plate, and a NESA film is formed as an electrode 2 on one surface of the substrate 1. Furthermore , a cadmium selenide layer 4, a cadmium selenate layer 5 (CdSeO 3 ) 5, and an arsenic trisulfide (As 2 S 3 ) layer 6 are sequentially superposed on this NESA electrode 2 as a photoelectric conversion layer 3. ing.
When the Nesa electrode 2 is used as one electrode, the other electrode is an electron beam 7 projected from an electron gun (not shown), focused on the upper surface of the arsenic trisulfide layer 6, and successively scanned. Flatten. When light 8 is projected onto the other surface of the substrate of such a photoelectric conversion element, the resistance of the photoelectric conversion layer 3 changes depending on the amount of light, and the resistance value of the portion onto which the light is projected becomes low. The change in resistance value can be read as the value of the current flowing between the NESA electrode 2 and the cathode by applying a constant voltage between the NESA electrode 2 and the cathode onto which the electron beam 7 is projected. This current is called photocurrent and is expressed as Ip. Also, the current that flows when light projection is stopped is called dark current and is expressed by Id. As a property of the photoelectric conversion layer 3 , when a certain amount of light 8 is projected, the larger Ip is, the better.
It is said to be a highly sensitive membrane. On the other hand, the smaller Id is, the better.
For example, when 1 lux of light 8 is projected onto the 1-inch photoelectric conversion layer 3 for an image pickup tube and a voltage of 25 V is applied to the Nesa electrode 2, Ip is 400 nA and Id is 1 nA. A part of this photoelectric conversion layer 3 will be changed as follows. First, cadmium selenide layer 4, cadmium selenide layer 5
After successively superimposing the cadmium selenate layer 5, a pair of electrodes 9 and 10 are formed on the cadmium selenate layer 5 as shown in the top view of FIG.
The a side is 2 mm, the b side is 5 mm, and the interval c is 0.25 mm. In this case, if a voltage of 1V is applied between electrode 9 and electrode 10 and light of 100 lux is projected, Ip = 3 x 10 -7 A and Id = 3 x 10 -12 A are obtained. At this time, the thickness of the photoelectric conversion layer consisting of the cadmium selenide layer 4 and the cadmium selenate layer 5 and lacking the arsenic trisulfide layer 6 is 1 μm, so the conductivity when light is projected is σp = 1.5×10 -4 /cm , and the conductivity when no light is projected is σd=1.5×10 −9 /cm. [Problems with the background art] The conductivity σp of such a photoelectric conversion element when light is projected is a required value, for example, 1×10 -13 /cm
It is only a fraction of the above, and lacks sensitivity. [Purpose of the Invention] This invention improves the photoelectric conversion element whose main layer is cadmium selenide used in the above-mentioned form, and improves the photosensitivity by several times to several tens of times compared to the conventional one. The object of the present invention is to provide a photoelectric conversion element. [Summary of the Invention] That is, the present invention comprises a transparent substrate, a photoelectric conversion layer formed on at least one surface of this substrate and containing cadmium selenide as a main layer component, and an electrode formed on the surface of this photoelectric conversion layer. In the photoelectric conversion element, the photoelectric conversion layer is provided with a diffusion region between the substrate and the cadmium selenide layer. [Embodiments of the Invention] Examples will be described below. FIG. 3 is a cross-sectional view of this example, showing a transparent substrate 1, a photoelectric conversion layer 11 formed on one side surface of this substrate, and a photoelectric conversion layer 11 formed on one side surface of the substrate.
It consists of electrodes 9 and 10 formed on top of the electrodes 9 and 10. However, the shapes of the electrodes 9 and 10 are the same as those shown in FIG. The photoelectric conversion layer 11 includes a cadmium selenide layer 4 , a cadmium selenide layer 5 formed on the cadmium selenide layer, and a substrate 1 and the cadmium selenide layer 4 .
and a diffusion region 12 at the border. The substrate 1 is made of borosilicate glass having a thickness of 2 mm and a diameter of 26 mmφ and containing silicon dioxide and boron oxide as main components and containing aluminum oxide, iron oxide, calcium oxide, magnesium oxide, sodium oxide, potassium oxide, and arsenic oxide as other components. It consists of Above board 1
The thickness of the cadmium selenide layer 4 formed in
The thickness is preferably 0.5 μm to 3 μm, particularly 1 μm, and is formed by vapor deposition. The cadmium selenide layer 5 is obtained by heating the cadmium selenide in an oxygen and argon atmosphere containing selenium vapor, and may have a thickness of, for example, 0.1 μm. The diffusion region 12 formed between the substrate 1 and the cadmium selenide layer 4 is also formed during the above atmospheric treatment. A 10,000 times magnified electron micrograph of the diffusion region is shown in FIG. In the sample shown in the figure, cadmium selenide was deposited directly on a borosilicate glass substrate, then subjected to the heat activation treatment described above, and then the cadmium selenide layer was removed by etching to form a layer on the glass substrate. is exposed. The figure is a scanning electron micrograph of the surface of this substrate. From the figure, island-like regions corresponding to particles of the cadmium selenide layer can be seen on the surface of the glass substrate. This part is a layer of interdiffused regions of glass substrate material and cadmium selenide. Note that the dotted areas with strong contrast between white and black in the same figure correspond to the intersections of multiple grain boundaries.
It is mainly a concave part made of glass. The photoelectric conversion layer 11 having such a diffusion region exhibits particularly strong sensitivity to light and small dark current,
When used in an image pickup tube, the sensitivity is 60 times higher than that of the photoelectric conversion layer 3 shown in FIG. 1 whose main component is cadmium selenide. Electrodes 9 and 10 of the photoelectric conversion element shown in FIG.
When a voltage of 1V is applied between them and 100 lux of light is projected, Ip = 2 × 10 -5 A, Id = 1.6 × 10 -11 A are obtained, and the conductivity when light is projected is σp = 1 ×10 -2 /
cm, conductivity when no light is projected σd=8×10 -9 /
cm, and exhibits a photosensitivity 60 times that of the photoelectric conversion layer 3 in FIG. The reason why such high sensitivity is obtained can be explained as follows. Each sample had a tin oxide (SnO 2 ) layer, a tantalum pentoxide (Ta 2 O 5 ) layer, or a silicon dioxide (SiO 2 ) layer formed on the substrate 1, and a sample with the substrate 1 as it was. Prepare different types of samples. Each of the three components formed on the substrate 1 is
It is transparent with a thickness of 0.2-1 μm. A photoelectric conversion layer 11 and electrodes 9 and 10 are simultaneously formed on each of these samples by the same method as described in the example. After measuring Ip and Id for each sample, the photoelectric conversion layer 11
A part of the diffusion region 12 is removed by dissolving it with dilute nitric acid.
Detect the presence or absence of. View results. From this table, the presence or absence of the diffusion region 12 and the size of σp match well,
It can be seen that only the sample with a diffused region shows both high sensitivity and small dark current. It can be inferred that formation of such a diffusion region was prevented by the NESA electrode 2 in the case of the conventional image pickup tube. [Table] The diffusion region 12 is generated using cadmium selenide 4
is greatly influenced by the material of the substrate with which it comes in contact, but other factors include the presence or absence of oxygen and the temperature when heat-treating cadmium selenide 4. If the atmosphere during treatment does not contain oxygen, the diffusion region 12 No formation occurs, σp = 2×10 -5 /cm, σd = 1×10 -9 /cm, and the photosensitivity is also extremely low. Further, even in a mixed atmosphere of oxygen and selenium, at temperatures below 500° C., the diffusion region 12 is hardly formed and the photosensitivity is 1/100 or less. A photoelectric conversion element whose main layer component is cadmium selenide, which is distributed on the substrate by forming a diffusion region 12 between it and the substrate, has another advantage that it can be independently mounted on a single substrate as shown in FIG. When two or more of the photoelectric conversion elements 131 , 132 , . [Effects of the Invention] As described above, in a photoelectric conversion element whose main layer component is cadmium selenide, the sensitivity to light is significantly improved by forming a diffusion region between the substrate and the cadmium selenide layer. It also improves the adhesion strength to the substrate, and enables the formation of finer patterns when independent photoelectric conversion elements are formed on the same substrate.
第1図はセレン化カドミウムを主層成分とする
従来の光電変換素子断面図、第2図は測定に使用
した電極の形状図、第3図はこの発明の光電変換
素子断面図、第4図は拡散領域を拡大して示す電
子顕微鏡写真図、第5図はこの発明の光電変換素
子群の断面図である。
1……基板、2……電極ネサ膜、3……光電変
換層、4……セレン化カドミウム層、5……セレ
ン酸カドミウム層、6……三硫化砒素層、7……
電子ビーム、8……光、9……電極、10……電
極、11……光電変換層、12……拡散領域、1
31〜13n……光電変換素子。
Figure 1 is a cross-sectional view of a conventional photoelectric conversion element whose main layer component is cadmium selenide, Figure 2 is a diagram of the shape of the electrode used for measurement, Figure 3 is a cross-sectional view of the photoelectric conversion element of the present invention, and Figure 4. 5 is an electron micrograph showing an enlarged diffusion region, and FIG. 5 is a sectional view of a photoelectric conversion element group of the present invention. DESCRIPTION OF SYMBOLS 1... Substrate, 2... Electrode Nesa film, 3 ... Photoelectric conversion layer, 4... Cadmium selenide layer, 5... Cadmium selenite layer, 6... Arsenic trisulfide layer, 7...
Electron beam, 8... Light, 9... Electrode, 10... Electrode, 11 ... Photoelectric conversion layer, 12... Diffusion region, 1
31-13n ...Photoelectric conversion element.
Claims (1)
れ主層成分をセレン化カドミウムとする光電変換
層と、この光電変換層の表面に形成される電極と
を備える光電変換素子において、上記透明基板は
酸化珪素と酸化硼素とを主成分とする硼珪酸ガラ
スからなり、前記基板とセレン化カドミウム層と
の間に前記透明基板材料とセレン化カドミウムと
の相互拡散領域が形成されている事を特徴とする
光電変換素子。1. A photoelectric conversion element comprising a transparent substrate, a photoelectric conversion layer formed directly on the surface of the substrate and having cadmium selenide as a main layer component, and an electrode formed on the surface of the photoelectric conversion layer. The substrate is made of borosilicate glass containing silicon oxide and boron oxide as main components, and an interdiffusion region of the transparent substrate material and cadmium selenide is formed between the substrate and the cadmium selenide layer. Features of photoelectric conversion elements.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57160923A JPS5950578A (en) | 1982-09-17 | 1982-09-17 | Photoelectric conversion element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57160923A JPS5950578A (en) | 1982-09-17 | 1982-09-17 | Photoelectric conversion element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5950578A JPS5950578A (en) | 1984-03-23 |
| JPH0218586B2 true JPH0218586B2 (en) | 1990-04-26 |
Family
ID=15725202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57160923A Granted JPS5950578A (en) | 1982-09-17 | 1982-09-17 | Photoelectric conversion element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5950578A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0764471B2 (en) * | 1989-02-07 | 1995-07-12 | 日立電線株式会社 | Wire rod winding device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5723433B2 (en) * | 1974-08-29 | 1982-05-18 | ||
| JPS5293285A (en) * | 1976-02-02 | 1977-08-05 | Hitachi Ltd | Structure for semiconductor device |
| JPS54102990A (en) * | 1978-01-31 | 1979-08-13 | Nippon Telegr & Teleph Corp <Ntt> | Optical sensor array and its manufacture |
-
1982
- 1982-09-17 JP JP57160923A patent/JPS5950578A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5950578A (en) | 1984-03-23 |
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