JPH0249128U - - Google Patents

Info

Publication number
JPH0249128U
JPH0249128U JP12774988U JP12774988U JPH0249128U JP H0249128 U JPH0249128 U JP H0249128U JP 12774988 U JP12774988 U JP 12774988U JP 12774988 U JP12774988 U JP 12774988U JP H0249128 U JPH0249128 U JP H0249128U
Authority
JP
Japan
Prior art keywords
wafer
piping
cvd apparatus
checked
outer peripheral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12774988U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12774988U priority Critical patent/JPH0249128U/ja
Publication of JPH0249128U publication Critical patent/JPH0249128U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、この考案の一実施例を示すCVD装
置の要部概略図である。第2図は、従来のCVD
装置を説明するための概念図である。 1a……ボツクス、1b……小ボツクス(CV
D成長域)、2……回転棒、3a,3b,3c…
…保持棒、4a,4c……ウエーハ保持ピンセツ
ト、5a,5b,5c……ウエーハ、6a,6b
……ウエーハ出入口、7a,7b……ガス配管、
8……ガス排出口、9a,9b……ウエーハ置き
台。
FIG. 1 is a schematic diagram of the main parts of a CVD apparatus showing an embodiment of this invention. Figure 2 shows conventional CVD
FIG. 2 is a conceptual diagram for explaining the device. 1a...Box, 1b...Small box (CV
D growth area), 2...rotating rod, 3a, 3b, 3c...
...Holding rod, 4a, 4c...Wafer holding tweezers, 5a, 5b, 5c...Wafer, 6a, 6b
...Wafer entrance/exit, 7a, 7b...Gas piping,
8...Gas exhaust port, 9a, 9b...Wafer stand.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体ウエーハの外周端を、回転中心に設けた
回転棒に取付けられた保持棒にてチヤツクし、ウ
エーハ両面へ反応ガスを導く配管を設けたことを
特徴とするCVD装置。
A CVD apparatus characterized in that the outer peripheral edge of a semiconductor wafer is checked by a holding rod attached to a rotating rod provided at the center of rotation, and piping is provided for guiding reactive gas to both surfaces of the wafer.
JP12774988U 1988-09-29 1988-09-29 Pending JPH0249128U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12774988U JPH0249128U (en) 1988-09-29 1988-09-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12774988U JPH0249128U (en) 1988-09-29 1988-09-29

Publications (1)

Publication Number Publication Date
JPH0249128U true JPH0249128U (en) 1990-04-05

Family

ID=31380457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12774988U Pending JPH0249128U (en) 1988-09-29 1988-09-29

Country Status (1)

Country Link
JP (1) JPH0249128U (en)

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