JPH03141006A - Composite type magnetic head - Google Patents
Composite type magnetic headInfo
- Publication number
- JPH03141006A JPH03141006A JP22036290A JP22036290A JPH03141006A JP H03141006 A JPH03141006 A JP H03141006A JP 22036290 A JP22036290 A JP 22036290A JP 22036290 A JP22036290 A JP 22036290A JP H03141006 A JPH03141006 A JP H03141006A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- thin film
- magnetic head
- width
- track width
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002131 composite material Substances 0.000 title claims description 15
- 239000010409 thin film Substances 0.000 claims abstract description 57
- 239000000696 magnetic material Substances 0.000 claims abstract description 16
- 230000004907 flux Effects 0.000 claims abstract description 11
- 239000011800 void material Substances 0.000 abstract 2
- 230000002542 deteriorative effect Effects 0.000 abstract 1
- 229910000702 sendust Inorganic materials 0.000 description 28
- 238000005530 etching Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 13
- 230000001105 regulatory effect Effects 0.000 description 9
- 229910000859 α-Fe Inorganic materials 0.000 description 9
- 238000005260 corrosion Methods 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 235000012431 wafers Nutrition 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000003754 machining Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000006060 molten glass Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
本発明は磁気記録再生装置眸用いられる磁気ヘッドに関
する
VTR等の磁気記録再生装置に用いられる磁気ヘッドと
して第6図に示す複合型磁気ヘッドが提案されている(
実開昭56−174119号公報)。これはフェライト
材等の高固有抵抗磁性材によって形成された一対の磁気
ヘッド半体(2)(2)の突き合わせ面に該磁性材より
も更に飽和磁束密度の高い磁性体、例えばセンダスト、
パーマロイ、アモルファス磁性体等の薄膜(3)(3)
を形成して磁気空隙部近傍に於ける飽和磁束密度を高め
たものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic head used in a magnetic recording and reproducing apparatus.A composite magnetic head shown in FIG. 6 has been proposed as a magnetic head for use in a magnetic recording and reproducing apparatus such as a VTR (
Utility Model Application Publication No. 56-174119). This is because the abutting surfaces of a pair of magnetic head halves (2) (2) made of a high resistivity magnetic material such as a ferrite material are coated with a magnetic material having a higher saturation magnetic flux density than the magnetic material, such as sendust.
Thin films such as permalloy and amorphous magnetic materials (3) (3)
This increases the saturation magnetic flux density near the magnetic gap.
従岑の複合型磁気ヘッドに於ては、センダスト等の薄膜
によって飽和磁束密度を高めても、薄膜(3)が磁気ヘ
ッド半体の接合面に接合する幅Tは目的とするトラック
幅と同一とし、且つ磁気ヘッド半体はフェライト材によ
って形成されているので、該接合面で磁気飽和が生ずる
虞れがあった。In the conventional composite magnetic head, even if the saturation magnetic flux density is increased by using a thin film such as sendust, the width T where the thin film (3) joins the bonding surface of the magnetic head half is the same as the target track width. In addition, since the magnetic head half is formed of a ferrite material, there is a risk that magnetic saturation may occur at the bonding surface.
更に従来の複合型磁気ヘッドに於ては、製造方法による
理由から下記の如き構造上の問題があった。即ち、複合
型の磁気ヘッドを製造するには第2図に示す如く、一対
の磁気ヘッドブロック半体(11)(12)の夫々にト
ラック幅規ill用溝(21)を開設し、両ブロック半
体の突き合わせ部に例えばセンダストの薄膜(3)を真
空蒸着或はスパッタリング等の公知の成膜技術によって
厚さ数μmに形成する。Furthermore, conventional composite magnetic heads have had the following structural problems due to manufacturing methods. That is, in order to manufacture a composite magnetic head, as shown in FIG. A thin film (3) of Sendust, for example, is formed to a thickness of several μm on the abutting portion of the halves by a known film forming technique such as vacuum evaporation or sputtering.
該薄膜(3)の上面には更にS iO*の非磁性体層(
4)を同様の成膜技術によって厚さ約0.1μmに形成
し、その後両ブロック半体を第3図に示す如く突き合わ
せてトラック幅規制用溝(5)に溶融ガラスを充填し、
両ブロック半体を一体化する。The top surface of the thin film (3) is further coated with a non-magnetic layer of SiO* (
4) was formed to a thickness of about 0.1 μm using the same film-forming technique, and then the two block halves were butted together as shown in FIG. 3, and the track width regulating grooves (5) were filled with molten glass.
Combine both block halves.
そして、これを第4図に示す如く適当な厚さにスライス
すれば、上記の非磁性体層(4)を磁気空隙部とする磁
気ヘッド(1)が得られる。Then, by slicing this to an appropriate thickness as shown in FIG. 4, a magnetic head (1) having the above-described non-magnetic layer (4) as a magnetic gap can be obtained.
ところが上述の製造方法の成膜工程に於ては、両ブロッ
ク半体の突き合わせ部にスリット状の開口を有するマス
クを介してセンダストの真空蒸着或はスパッタリングを
施すので、センダストの粒子の付着状態がマスクの開口
縁付近と開口中央部とで異なったり、或はセンダストの
粒子がマスクの裏側にも侵入して、均一な厚さの膜が形
成されず、第6図に示す如く製品となった複合型磁気ヘ
ッドのセンダストの薄膜(3)には両端になで肩部(3
1)(31)が生じる。この様な磁気ヘッドに於てはト
ラック幅Wを正確に規定することが出来ないので、製品
間に記録再生性能のバラツキを引き起こしていた。However, in the film forming process of the above-mentioned manufacturing method, since sendust is vacuum-deposited or sputtered through a mask having slit-shaped openings at the abutting portions of both block halves, the state of adhesion of sendust particles is There was a difference between the area near the edge of the opening of the mask and the center of the opening, or the sendust particles entered the back side of the mask, resulting in an uneven film thickness, resulting in a product as shown in Figure 6. The Sendust thin film (3) of the composite magnetic head has rounded shoulders (3) at both ends.
1) (31) occurs. In such magnetic heads, the track width W cannot be accurately defined, which causes variations in recording and reproducing performance between products.
又、上記の問題を解決する為に、両ブロック半体にトラ
ック幅規制用溝を開設する前に接合面全面にセンダスト
及びSin、の膜を形成し、その後これらの膜と7エラ
イトウエハとに同時にダイヤモンドブレード或はCBN
ブレードによる機械加工を施して、トラック幅規制用溝
(5)及び非磁性体層(4)を形成する方法も採用出来
るが、この方法によるセンダストの薄膜が加工の際に剥
離することがあった。剥離部分が大きければ製品として
使用することが出来ないのは勿論であるが、剥離が軽微
であっても第6図に示す如く欠は部(32)が生じてい
ることがあり、前述したなで肩部(31)と同様、磁気
ヘッドの実質的なトラック幅Wを不確定なものとしてい
た。In addition, in order to solve the above problem, before forming track width regulating grooves in both block halves, films of sendust and sin were formed on the entire bonding surface, and then these films and the 7-elite wafer were simultaneously coated. Diamond blade or CBN
A method of forming the track width regulating groove (5) and the non-magnetic layer (4) by machining with a blade can also be adopted, but the thin film of sendust produced by this method sometimes peeled off during processing. . Of course, if the peeling area is large, it cannot be used as a product, but even if the peeling is slight, there may be a chipped part (32) as shown in Figure 6, and the above-mentioned flat shoulder Similar to section (31), the substantial track width W of the magnetic head is uncertain.
本発明の目的は、磁気飽和が生じ難く、然もトラック幅
の不確定による製品間の記録再生性能のバラツキを低減
することが可能な構造の複合型磁気ヘッドを提供するこ
とである。SUMMARY OF THE INVENTION An object of the present invention is to provide a composite magnetic head having a structure in which magnetic saturation is less likely to occur and variation in recording and reproducing performance between products due to uncertain track width can be reduced.
本発明の構成は、高固有抵抗磁性材よりなる1組の磁気
ヘッド半体(2)(2)のうち少なくとも一方の磁気ヘ
ッド半体(2)の突き合わせ部に前記磁性材よりも更に
高い飽和磁束密度を有する磁性材の薄膜(3)を設け、
該薄膜と他方の磁気ヘッド半体との間に前記突き合すせ
部と平行である磁気空隙部を形成する。前記薄膜(3)
は磁気空隙部に対向する上面が高い平面度を有して所定
のトラック幅Wと厳密に一致する幅に形成され、前記薄
膜の両側面(30)(30)は前記上面の両端から幅を
次第に拡げながら下方へ伸びて前記一方の磁気ヘッド半
体(2)との接合面に到り、前記薄膜が前記一方の磁気
ヘッド半体(2)の接合面に接合する幅は該薄膜の前記
上面より大なることを特徴とする。The structure of the present invention is such that at least one of a pair of magnetic head halves (2) (2) made of a high resistivity magnetic material has a higher saturation than that of the magnetic material. A thin film (3) of a magnetic material having a magnetic flux density is provided,
A magnetic gap parallel to the abutting portion is formed between the thin film and the other magnetic head half. Said thin film (3)
The upper surface facing the magnetic gap has a high flatness and is formed to have a width that exactly matches the predetermined track width W, and both side surfaces (30) (30) of the thin film have a width that is smaller than the width from both ends of the upper surface. The thin film gradually expands and extends downward until it reaches the bonding surface with the one magnetic head half (2), and the width of the thin film bonding to the bonding surface of the one magnetic head half (2) is equal to the width of the thin film. It is characterized by being larger than the top surface.
薄膜(3)の磁気空隙部に対向する上面の幅を狭くして
トラック幅Wを小さくしても、該薄膜は高飽和磁束密度
材によって形成されているので、該薄膜の上面に於て磁
気飽和が生じる虞れは極めて少ない。又、薄膜(3)が
磁気ヘッド半体の接合面に接合する輻Tはトラック幅W
よりも大きく形成されているので、前記の薄膜上面に於
ける磁束密度を低下せしめることなく、磁気ヘッド半体
には有効に磁路が形成される。Even if the width of the upper surface of the thin film (3) facing the magnetic gap is narrowed to reduce the track width W, the magnetic field on the upper surface of the thin film is small because the thin film is made of a high saturation magnetic flux density material. There is very little chance of saturation occurring. Also, the radius T where the thin film (3) joins the bonding surface of the magnetic head half is the track width W.
Since the magnetic head half is formed larger than the above-mentioned thin film, a magnetic path is effectively formed in the magnetic head half without reducing the magnetic flux density on the upper surface of the thin film.
更に薄膜(3)は、上面が高い平面度を有し且つ両側面
が該上面に対しで略垂直方向に伸びているので、トラッ
ク幅Wを正確に規定することが出来る。Further, since the thin film (3) has a high flatness at the upper surface and both side surfaces extend substantially perpendicularly to the upper surface, the track width W can be accurately defined.
本発明に係る複合型磁気ヘッドに於ては、磁路が有効に
形成されるので磁気飽和が生じ難く、然もトラック幅を
正確に規定することが出来るので製品間の記録再生性能
のバラツキが低減する。In the composite magnetic head according to the present invention, since the magnetic path is effectively formed, magnetic saturation is less likely to occur, and since the track width can be accurately defined, variations in recording and reproducing performance between products can be avoided. reduce
以下図示する実施例に基づき本発明を詳述する。The present invention will be described in detail below based on the illustrated embodiments.
第1図は本発明に係る複合型磁気ヘッドの磁気空隙部付
近の拡大平面図であって、トラック幅規制用溝(5)が
開設されたフェライト材よりなる1対の磁気ヘッド半体
(2)(2)の突き合わせ部に高飽和磁気密度材となる
センダスト(Fe−AX −Si系合金)の薄膜(3)
(3)を設け、更に両薄膜間にはSiO,の非磁性体層
(4)を設けて前記突き合わせ部に平行である磁気空隙
部を形成してる。又、トラック幅規制用溝(5)にはガ
ラスが充填されている。上記のセンダストの薄膜(3)
及び非磁性体層(4)は後記の如く工、ツチングにより
成形され、本発明に係る目的の形状を実現している。FIG. 1 is an enlarged plan view of the vicinity of the magnetic gap of the composite magnetic head according to the present invention, showing a pair of magnetic head halves (2) made of ferrite material with track width regulating grooves (5). ) A thin film of Sendust (Fe-AX-Si alloy), which is a high saturation magnetic density material, is placed on the butt part of (2) (3)
(3) is provided, and a non-magnetic layer (4) of SiO is further provided between both thin films to form a magnetic gap parallel to the abutting portion. Further, the track width regulating groove (5) is filled with glass. The above Sendust thin film (3)
The non-magnetic layer (4) is formed by machining and stitching as described later to achieve the desired shape according to the present invention.
第2図乃至第5図は本発明に係る複合型磁気ヘッドを製
造する工程を示している。2 to 5 show the steps for manufacturing a composite magnetic head according to the present invention.
第2図はトラック幅規制用溝となるU字状溝(21)が
開設された1対のフェライトウェハ(20)(20)の
突き合わせ部にセンダストの薄膜(3)(3)を設けて
ブロック半体(11)(12)が形成されている状況を
示している。尚、一方の7エライトウエハ(20)には
後にコイル巻装孔(8)となるコイル溝(13)が開設
されている。Figure 2 shows a block in which sendust thin films (3) (3) are provided at the abutting portions of a pair of ferrite wafers (20) (20) in which U-shaped grooves (21) are formed to serve as track width regulating grooves. A situation in which halves (11) and (12) are formed is shown. Note that a coil groove (13), which will later become a coil winding hole (8), is formed in one of the 7-elite wafers (20).
第5図はフェライトウェハ(20)にセンダストの薄膜
(3)を公知技術であるエツチングによって形成する手
順を示し、先ず第5図(a)に示す如くフェライトウェ
ハ(20)の表面全面にセンダストの![(3)をスパ
ッタリング等の成膜方法によって厚さ約1乃至lOμm
に形成し、その上面にトラック幅Wによって規定される
幅W、の帯状耐蝕層(6)を一定のピッチで繰り返し形
成する。帯状耐蝕層(6)は例えば重クロム酸塩系の感
光液をセンダストの薄膜表面に厚さ約1μmにコーティ
ングして乾燥の後、幅W、のスリット状開口を有する7
オトマスクをその上にのせ、紫外線を照射する露光工程
と、現像液によって前記原版に覆われない部分を除去す
る現像工程を経て形成される。FIG. 5 shows the procedure for forming a thin film (3) of sendust on a ferrite wafer (20) by etching, which is a known technique. First, as shown in FIG. ! [(3) is formed to a thickness of about 1 to 10 μm by a film forming method such as sputtering.
A band-shaped corrosion-resistant layer (6) having a width W defined by the track width W is repeatedly formed on the top surface at a constant pitch. The strip-shaped corrosion-resistant layer (6) is formed by coating a dichromate-based photosensitive liquid on the surface of a thin film of Sendust to a thickness of about 1 μm and drying it, and then forming a slit-like opening with a width W.
It is formed through an exposure process in which an otomask is placed on it and irradiated with ultraviolet rays, and a development process in which the portions not covered by the original plate are removed using a developer.
次に第5図(b)に示す如く、センダストの薄膜(3)
の耐蝕層(6)に覆われない部分をエツチング液で溶解
させる。本実施例ではエツチング液として30%の硝酸
液を25℃で使用した。この際。Next, as shown in Figure 5(b), a thin film of sendust (3)
The portions not covered by the corrosion-resistant layer (6) are dissolved with an etching solution. In this example, a 30% nitric acid solution was used at 25° C. as an etching solution. On this occasion.
腐蝕は深さ方向のみならず、横方向即ち耐蝕層(6)の
下方にも進行し、所謂サイドエッチが生じるが、サイド
エッチ量Rはセンダストの薄膜(3)が10μm以下の
厚さであれば再現性が良いことが確かめられている。従
って予めサイドエッチ量を予測して、目的のトラック幅
Wが得られる耐蝕層(6)の幅W、を決めることが可能
である。例えばセンダストの薄膜(3)の厚さが10μ
mであって、上記のエツチング液を使用して6分30秒
のエツチングを行うと、サイドエッチ量は約8μmとな
る。本実施例の場合、トラック幅Wを24±。Corrosion progresses not only in the depth direction but also in the lateral direction, that is, below the corrosion-resistant layer (6), resulting in so-called side etching. It has been confirmed that the reproducibility is good. Therefore, it is possible to predict the amount of side etching in advance and determine the width W of the corrosion-resistant layer (6) that will provide the desired track width W. For example, the thickness of Sendust thin film (3) is 10μ
m, and if etching is performed for 6 minutes and 30 seconds using the above etching solution, the side etching amount will be about 8 μm. In the case of this embodiment, the track width W is 24±.
2μmとする必要があり、この為には耐蝕層(6)の幅
W、を40μmとすれば良い。It is necessary to set the width W to 2 μm, and for this purpose, the width W of the corrosion-resistant layer (6) may be set to 40 μm.
本実施例ではこのサイドエッチを利用してセンダストの
薄1!(3)を目的の断面形状としている。In this example, this side etching is used to make Sendust thin 1! (3) is the desired cross-sectional shape.
即ち、サイドエッチはセンダスト膜の耐蝕層(6)に近
い部分がより遠く進行し、この結果図示の如く成形後の
薄膜(3)のフェライトウェハ(20)との接合面の輻
Tは上面の輻Wよりも大きくなる。That is, the side etching progresses further in the part of the sendust film near the corrosion-resistant layer (6), and as a result, as shown in the figure, the radius T of the bonding surface of the thin film (3) with the ferrite wafer (20) after molding is lower than that of the upper surface. It becomes larger than the radius W.
又、該薄膜(3)の側面(30)は上面に対して略90
度をなす。Also, the side surface (30) of the thin film (3) is approximately 90 degrees from the top surface.
Be moderate.
エツチングが終了した後、第5図(C)に示す如くフェ
ライトウェハ(20)にトラック幅規制用溝となるU字
状溝(21)をダイヤモンドブレードを用いて開設する
。この場合、ブレードをセンダストの薄11!(3)に
接触しなi範囲で可及的に接近させる必要があるが、機
械加工のみでセンダストの薄膜やフェライトウェハを成
形する場合に比べて、粗い加工で可い、センダストの薄
膜(3)の上面には更に前記同様の成膜技術によってS
t Osの薄い膜を形成し、ギャップ長を規定する為
の非磁性体層(4)とする、尚、非磁性体層(4)を第
5図(a)に示す段階でセンダストの薄111(3)の
上面に全面に形成し、第5図(b)に示す段階で先ずこ
の非磁性体層にふり酸等によるウェットエツチング或は
ドライエツチングを施すことにより、非磁性体層の所定
の形状に成形しても可い。After the etching is completed, as shown in FIG. 5(C), a U-shaped groove (21) which will become a track width regulating groove is formed in the ferrite wafer (20) using a diamond blade. In this case, the blade is Sendust Thin 11! (3) It is necessary to form the Sendust thin film (3) as close as possible within the i range without touching it, but compared to forming a Sendust thin film or ferrite wafer only by machining, it is possible to form a Sendust thin film (3) with rough processing. ) is further coated with S by the same film-forming technique as described above.
A thin film of tOs is formed as a non-magnetic layer (4) for defining the gap length.The non-magnetic layer (4) is made of Sendust thin film 111 at the stage shown in FIG. 5(a). (3) is formed on the entire surface of the non-magnetic layer, and at the stage shown in FIG. It can also be molded into any shape.
上記の如く形成された2つのブロック半体(11)(1
2)を第3図に示す如く非磁性体層(4)にて当接せし
め、トラック幅規制用溝(5)には溶融ガラスを充填し
、両ブロック半体を接着一体化すると、非磁性体層(4
)からなる磁気空隙部、トラック幅規制用溝(5)及び
コイル巻装孔(8)を有する磁気ヘッドブロック(10
)が出来上がる。これを適当な厚さにスライスすれば、
第4図に示す複合型磁気ヘッド(1)が複数個得られる
。Two block halves (11) (1) formed as above
2) are brought into contact with a non-magnetic material layer (4) as shown in Fig. 3, the track width regulating groove (5) is filled with molten glass, and both block halves are bonded and integrated. Body layer (4
), a track width regulating groove (5), and a coil winding hole (8).
) is completed. If you slice this into appropriate thickness,
A plurality of composite magnetic heads (1) shown in FIG. 4 are obtained.
この様にして製作された磁気ヘッド(1)のセンダスト
の薄膜(3)は第1図に示す如く、高い平面度を有する
上面と、該上面から略垂直方向に伸びた側面(30)と
、前記上面より大なる幅を有する磁気ヘッド半体との接
合面を具備し、不均一な成膜に基づくなで肩部や機械加
工に基づく欠は部は無い。As shown in FIG. 1, the sendust thin film (3) of the magnetic head (1) manufactured in this manner has an upper surface with high flatness, a side surface (30) extending approximately perpendicularly from the upper surface, and It has a joint surface with the magnetic head half having a width larger than the upper surface, and there are no rounded shoulders due to non-uniform film formation or gaps due to machining.
尚、上述の実施例ではセンダストの薄膜を全てエツチン
グによって成形しているが、該薄膜の上層部のみをエツ
チングによって成形し、残りの下層部を0字状溝と共に
機械加工で同時に成形しても良く、下層部の厚さが1μ
m程度であれば、機械加工による剥離は殆んど生じない
ことが実験的に確かめられている。In the above-mentioned embodiment, all of the sendust thin film is formed by etching, but it is also possible to form only the upper layer of the thin film by etching and simultaneously form the remaining lower layer along with the 0-shaped groove by machining. Good, the thickness of the lower layer is 1μ
It has been experimentally confirmed that peeling due to machining hardly occurs when the thickness is about m.
又、本実施例ではケミカルエツチングによってセンダス
トの薄膜を成形しているが、他の周知のエツチング方法
を用いて可いのは勿論であって、例えばイオンビームエ
ツチングによっても可い。Further, in this embodiment, the sendust thin film is formed by chemical etching, but it goes without saying that other well-known etching methods may be used, such as ion beam etching.
更に、高飽和磁束密度の薄膜の材質としてセンダスト以
外にパーマロイやアモルファス磁性体を用いても本実施
例と同様の効果が得られる。Furthermore, the same effect as in this embodiment can be obtained by using permalloy or an amorphous magnetic material other than sendust as the material of the thin film having a high saturation magnetic flux density.
本発明に係る磁気ヘッドの製造に於ては、高飽和磁束密
度の薄膜をフェライトウェハの突き合わせ部全面につい
て同時に成形することが出来、然も0字状溝は比較的粗
い精度で加工出来るので、従来の製造方法に比べて高い
生産性が得られる。In manufacturing the magnetic head according to the present invention, a thin film with a high saturation magnetic flux density can be simultaneously formed on the entire surface of the abutting portion of the ferrite wafer, and the 0-shaped groove can be processed with relatively rough precision. Higher productivity can be obtained compared to conventional manufacturing methods.
第1図は本発明に係る複合磁気ヘッドの拡大部分平面図
、第2図は1対のブロック半体の斜視図、第3図は磁気
ヘッドブロックの斜視図、第4図は完成した磁気ヘッド
の斜視図、第5図(a)(b)(c)はエツチングによ
る薄膜の成形方法を示す説明図、第6図は従来の複合型
磁気ヘッドの拡大部分平面図を示す。
(2)・・・磁気ヘッド半体、(3)・・・センダスト
の薄膜、(30)・・・側面、(4)・・・非磁性体層
、(5)・・・トラック幅規IlI用溝、W・・・トラ
ック幅。
第1図FIG. 1 is an enlarged partial plan view of a composite magnetic head according to the present invention, FIG. 2 is a perspective view of a pair of block halves, FIG. 3 is a perspective view of a magnetic head block, and FIG. 4 is a completed magnetic head. FIGS. 5(a), 5(b), and 5(c) are explanatory diagrams showing a method of forming a thin film by etching, and FIG. 6 is an enlarged partial plan view of a conventional composite magnetic head. (2)...Magnetic head half, (3)...Sendust thin film, (30)...Side surface, (4)...Nonmagnetic layer, (5)...Track width ruler IlI Groove, W...Track width. Figure 1
Claims (1)
のうち少なくとも一方の磁気ヘッド半体の突き合わせ部
に前記磁性材よりも更に高い飽和磁束密度を有する磁性
材の薄膜を設け、該薄膜と他方の磁気ヘッド半体との間
に前記突き合わせ部と平行である磁気空隙部を形成した
複合型磁気ヘッドに於て、前記薄膜は磁気空隙部に対向
する上面が高い平面度を有して所定のトラック幅Wと厳
密に一致する幅に形成され、前記薄膜の両側面は前記上
面の両端から幅を次第に拡げながら下方へ伸びて前記一
方の磁気ヘッド半体との接合面に到り、前記薄膜が前記
一方の磁気ヘッド半体の接合面に接合する幅は該薄膜の
前記上面より大なることを特徴とする複合型磁気ヘッド
。(1) A thin film of a magnetic material having a saturation magnetic flux density higher than that of the magnetic material is provided at the abutting portion of at least one of the magnetic head halves of a pair of magnetic head halves made of a high resistivity magnetic material; In a composite magnetic head in which a magnetic gap parallel to the abutting portion is formed between the thin film and the other magnetic head half, the thin film has a top surface facing the magnetic gap having a high flatness. The thin film is formed to have a width that exactly matches a predetermined track width W, and both side surfaces of the thin film extend downward from both ends of the upper surface while gradually increasing in width, and reach the bonding surface with the one magnetic head half. . A composite magnetic head, wherein the width of the thin film bonded to the bonding surface of the one magnetic head half is larger than the upper surface of the thin film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22036290A JPH03141006A (en) | 1990-08-21 | 1990-08-21 | Composite type magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22036290A JPH03141006A (en) | 1990-08-21 | 1990-08-21 | Composite type magnetic head |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22036390A Division JPH03237605A (en) | 1990-08-21 | 1990-08-21 | Production of composite type magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03141006A true JPH03141006A (en) | 1991-06-17 |
| JPH054722B2 JPH054722B2 (en) | 1993-01-20 |
Family
ID=16749950
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22036290A Granted JPH03141006A (en) | 1990-08-21 | 1990-08-21 | Composite type magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03141006A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58175122A (en) * | 1982-04-07 | 1983-10-14 | Hitachi Ltd | Magnetic head and its manufacturing method |
| JPS58179925A (en) * | 1982-04-14 | 1983-10-21 | Pioneer Electronic Corp | Magnetic head and its production |
-
1990
- 1990-08-21 JP JP22036290A patent/JPH03141006A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58175122A (en) * | 1982-04-07 | 1983-10-14 | Hitachi Ltd | Magnetic head and its manufacturing method |
| JPS58179925A (en) * | 1982-04-14 | 1983-10-21 | Pioneer Electronic Corp | Magnetic head and its production |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH054722B2 (en) | 1993-01-20 |
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