JPH0316286Y2 - - Google Patents

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Publication number
JPH0316286Y2
JPH0316286Y2 JP1989145906U JP14590689U JPH0316286Y2 JP H0316286 Y2 JPH0316286 Y2 JP H0316286Y2 JP 1989145906 U JP1989145906 U JP 1989145906U JP 14590689 U JP14590689 U JP 14590689U JP H0316286 Y2 JPH0316286 Y2 JP H0316286Y2
Authority
JP
Japan
Prior art keywords
carrier
wafer
receiver
tilting table
shaft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1989145906U
Other languages
Japanese (ja)
Other versions
JPH0288238U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989145906U priority Critical patent/JPH0316286Y2/ja
Publication of JPH0288238U publication Critical patent/JPH0288238U/ja
Application granted granted Critical
Publication of JPH0316286Y2 publication Critical patent/JPH0316286Y2/ja
Expired legal-status Critical Current

Links

Description

【考案の詳細な説明】 〔産業上の利用分野〕 本考案は、キヤリヤの中に収容されたウエハー
を他のキヤリヤに移載するウエハー移載装置に関
するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a wafer transfer device that transfers a wafer housed in a carrier to another carrier.

〔従来の技術〕[Conventional technology]

一般に、ウエハーは多くの処理工程を経て処理
されるが、その間に最も留意せねばならないのが
塵などの異物の付着或いは汚染の防止と、破損の
防止である。ウエハーが或る処理工程から次の処
理工程に移るときに他のキヤリヤに移載する必要
がある場合がある。例えば各工程で用いる処理液
の相互の混入を防ぐため、或いは、処理液に対し
適切な材質のキヤリヤを用いるため、などの場合
にはウエハーを移載せねばならない。
Generally, wafers are processed through many processing steps, and the most important things during these steps are to prevent the attachment of foreign matter such as dust or contamination, and to prevent damage. Wafers may need to be transferred to another carrier as they move from one processing step to the next. For example, it is necessary to transfer the wafer in order to prevent the processing liquids used in each process from mixing with each other, or to use a carrier made of an appropriate material for the processing liquids.

これらの移載に当たつて従来においては、例え
ば、第1図aに示す如くウエハー1を収容した第
一のキヤリヤ2の上に、空の第二のキヤリヤ3を
かぶせ、同図bの如くさかさにすればウエハー1
は落下して第二のキヤリヤ3の中に入り移載され
る。しかしこれでは衝撃により割れ、欠けなどの
破損を生じ易い。また、一対のキヤリヤホルダー
を向かい合わせて当接し、ウエハーが一方から他
方に移し替えられる手作業のもの(実開昭53−
24248号公報)も提案されているが、キヤリヤ内
での移動がキヤリヤの回動でころがつて行われて
損傷しやすく問題があつた。
Conventionally, for these transfers, for example, an empty second carrier 3 is placed over the first carrier 2 containing the wafer 1 as shown in FIG. Wafer 1 when upside down
falls into the second carrier 3 and is transferred. However, this tends to cause damage such as cracking and chipping due to impact. There is also a manual method in which a pair of carrier holders are placed facing each other and the wafer is transferred from one to the other.
24248) has also been proposed, but there was a problem in that the movement within the carrier was caused by the rotation of the carrier, causing it to roll and be easily damaged.

そこで、第2図の如くゴムベルト4を用い、第
一のキヤリヤ2の下降と第二のキヤリヤ3の上昇
とを同時に行いながらウエハー1を1枚ずつ移載
する方法も見られるが時間がかるばかりか、ゴム
ベルトの摩耗粉などが付着し障害を伴うものであ
つた。
Therefore, there is a method of transferring wafers 1 one by one while simultaneously lowering the first carrier 2 and raising the second carrier 3 using a rubber belt 4 as shown in FIG. 2, but this is not only time consuming but also This was accompanied by problems due to the adhesion of abrasion powder from the rubber belt.

第3図は別の従来例であり、第一のキヤリヤ2
の中のウエハー1をシリンダ5により突き上げて
ホルダー6に保持せしめ、シリンダ5を引込めて
第一のキヤリヤ2を除き、新たに第二のキヤリヤ
3を移し、シリンダ5を再び伸ばしてホルダー6
からウエハー1を受取り第二のキヤリヤ3に移載
する方法も見られる。しかし、この方法において
もホルダー6にて挾持するとき破損し易く、ま
た、ホルダー6が上方にあるのでホルダー6から
の塵が落下してウエハー1に付着するおそれがあ
つた。
Figure 3 shows another conventional example, in which the first carrier 2
The wafer 1 inside is pushed up by the cylinder 5 and held in the holder 6, the cylinder 5 is retracted to remove the first carrier 2, the second carrier 3 is newly transferred, and the cylinder 5 is extended again to hold the holder 6.
There is also a method of receiving the wafer 1 from a carrier and transferring it to the second carrier 3. However, even in this method, the wafer is easily damaged when it is held in the holder 6, and since the holder 6 is located above, there is a risk that dust from the holder 6 may fall and adhere to the wafer 1.

〔考案が解決しようとする課題〕[The problem that the idea attempts to solve]

これら従来のものではいずれもウエハー1には
結晶軸の方向を明確にするため、或いは処理に当
たつての位置合わせのためにオリエンテーシヨン
フラツトなる直線の切欠部7を有しており、この
切欠部7をパターン焼付処理などの処理に当たつ
ては同じ向きにそろえる必要があるが、そのため
の整列装置を特に必要とし、構造が複雑になる欠
点があつた。
In all of these conventional products, the wafer 1 has a straight notch 7, which is an orientation flat, for clarifying the direction of the crystal axis or for positioning during processing. It is necessary to align the notches 7 in the same direction during processing such as pattern printing, but this requires a special alignment device for this purpose, which has the disadvantage of complicating the structure.

本考案は、従来の欠点を除き、塵の付着や汚染
のおそれがなく、かつ破損を防止するウエハーの
移載を可能にし、特別な整列装置を用いずに、移
載動作と同時にウエハーの切欠部の整列を行うこ
とができるウエハー移載装置を提供することを目
的としている。
The present invention eliminates the drawbacks of the conventional method, enables wafer transfer without the risk of dust adhesion or contamination, and prevents damage. The object of the present invention is to provide a wafer transfer device capable of aligning parts.

〔課題を解決するための手段〕[Means to solve the problem]

本考案は、ウエハー1を収容し、開放口24の
ある第一キヤリヤ22を受ける第一キヤリヤ受け
20と、前記ウエハー1が移載される開放口25
のある第二キヤリヤ23を受ける第二キヤリヤ受
け21とを備え、キヤリヤ22,23の一方から
他方へウエハーを移動できるようにそれぞれのキ
ヤリヤ22,23の開放口24,25をほぼ上方
に向けて保持する位置と、それぞれのキヤリヤ開
放口24,25を向かい合わせて当接する位置と
の間に変位させるキヤリヤ移動機構を有するウエ
ハー移載装置において、前記両キヤリヤ受け2
0,21をそれぞれ支軸17,18で回動自在に
傾動台10上に設け、該支軸17,18を異方向
に回動する伝動部材を介して連絡した正逆回転用
の駆動機構のモータ12を備えると共に、前記傾
動台10が水平面に対して傾斜するように軸9で
回動自在に支えられ、該軸9を中心として傾動台
10の一端を昇降動する昇降機構11と、前記第
一キヤリヤ22内のウエハー1を第二キヤリヤ2
3に移送する移載駆動機構39とを配備し、さら
に前記第二キヤリヤ受けに回動軸を介してキヤリ
ヤ押えを設け、該キヤリヤ押えをバネで附勢して
キヤリヤに形成した溝に係脱自在に装備したこと
を特徴とするウエハー移載装置である。
The present invention includes a first carrier receiver 20 that accommodates a wafer 1 and receives a first carrier 22 having an opening 24, and an opening 25 to which the wafer 1 is transferred.
a second carrier receiver 21 for receiving a second carrier 23, and the openings 24, 25 of each carrier 22, 23 are directed substantially upward so that the wafer can be transferred from one of the carriers 22, 23 to the other. In the wafer transfer device having a carrier moving mechanism for displacing the carriers between a holding position and a position where the carrier opening openings 24 and 25 face each other and abut each other, both carrier receivers 2
0 and 21 are mounted on a tilting table 10 so as to be rotatable by support shafts 17 and 18, respectively, and the support shafts 17 and 18 are connected via transmission members that rotate in different directions. an elevating mechanism 11 including a motor 12, rotatably supported by a shaft 9 such that the tilting table 10 is inclined with respect to a horizontal plane, and raising and lowering one end of the tilting table 10 about the shaft 9; The wafer 1 in the first carrier 22 is transferred to the second carrier 2.
A transfer drive mechanism 39 is provided for transferring the carrier to the second carrier receiver, and a carrier holder is provided on the second carrier holder via a rotating shaft, and the carrier holder is biased with a spring to engage and disengage from a groove formed in the carrier. This is a wafer transfer device that is characterized by being freely equipped.

〔実施例〕〔Example〕

本考案の実施例を第4〜6図例で説明すると、
ベースフレーム8に、軸9により支えられて傾動
台10が水平面に対して逆の向きの傾斜がとれる
よう往復傾動可能に支えられ、シリンダ11或い
はカム機構、リンク機構などにより駆動される。
An example of the present invention will be explained with reference to FIGS. 4 to 6.
A tilting table 10 is supported by a shaft 9 on a base frame 8 so as to be tiltable in a reciprocating manner so as to be tilted in the opposite direction with respect to a horizontal plane, and is driven by a cylinder 11, a cam mechanism, a link mechanism, or the like.

この傾動台10の上にキヤリヤ移動機構が配設
されている。即ち、ウエハー1を収容し、開放口
24のある第一キヤリヤ22を受ける第一キヤリ
ヤ受け20と、前記ウエハー1が移載される開放
口25のある第二キヤリヤ23を受ける第二キヤ
リヤ受け21とを備え、キヤリヤ22,23の一
方から他方へウエハーを移動できるようにそれぞ
れのキヤリヤ22,23の開放口24,25をほ
ぼ上方に向けて保持する位置と、それぞれのキヤ
リヤ開放口24,25を向かい合わせて当接する
位置との間に変位させるキヤリヤ移動機構が配備
される。
A carrier moving mechanism is disposed on this tilting table 10. That is, a first carrier receiver 20 that accommodates the wafer 1 and receives a first carrier 22 with an opening 24, and a second carrier receiver 21 that receives a second carrier 23 with an opening 25 into which the wafer 1 is transferred. a position in which the openings 24, 25 of each carrier 22, 23 are held substantially upward so that the wafer can be moved from one of the carriers 22, 23 to the other; A carrier moving mechanism is provided for displacing the carriers between the opposing and abutting positions.

12はモータであり、ピニオン13、ギヤ1
4,15,16を介して支軸17,18とを、互
いに逆向きに、同時に往復回動せしめるようにな
つている。支軸17,18とにはアーム19を介
してそれぞれ第一キヤリヤ受け20と第二キヤリ
ヤ受け21とが取付けられている。第一キヤリヤ
受け20は、ウエハー1を収容した第一キヤリヤ
22を受け、第二キヤリヤ受け21は、ウエハー
1が移載されるべき第二キヤリヤ23を受けてい
る。
12 is a motor, a pinion 13, a gear 1
4, 15, and 16, the support shafts 17 and 18 are simultaneously reciprocated in opposite directions. A first carrier receiver 20 and a second carrier receiver 21 are attached to the support shafts 17 and 18 via arms 19, respectively. The first carrier receiver 20 receives the first carrier 22 containing the wafer 1, and the second carrier receiver 21 receives the second carrier 23 onto which the wafer 1 is to be transferred.

モータ12による支軸17,18の往復回動に
より、第一キヤリヤ22と第二キヤリヤ23と
は、開放口24,25をほぼ上方に向けて保持さ
れた第一位置(第4図実線)と、第一キヤリヤ2
2と第二キヤリヤ23とが開放口24と25とが
向かい合つて当接し、両キヤリヤの中心線26と
27とがほぼ一つの直線28上になるように保持
された第二位置(第4図二点鎖線)との間をA及
びBの回動範囲で同時に回動するようになつてい
る。
Due to the reciprocating rotation of the support shafts 17 and 18 by the motor 12, the first carrier 22 and the second carrier 23 are moved to the first position (solid line in FIG. 4) where the openings 24 and 25 are held substantially upward. , First Carrier 2
2 and the second carrier 23 are held in a second position (fourth (two-dot chain line) in the rotation ranges A and B at the same time.

第一及び第二キヤリヤ22,23相互、第一及
び第一キヤリヤ受け20,21相互は同一の或い
は対称の構造であるので第一キヤリヤ22及び第
二キヤリヤ受け21について説明すると、第一キ
ヤリヤ22の一対の壁29の内側には、第6図に
示す如く多数のリブ30が設けられ、リブ30の
間に、溝底46がテーパー状をなしている案内溝
31が形成されている。この案内溝31の下方に
は底部47が設けられウエハー1を受けて支えて
いる。案内溝31の溝底46は、ウエハー1が底
部に当たつた位置においてウエハー1の外周との
間に僅かな隙間を残す。
Since the first and second carriers 22 and 23 and the first and first carrier receivers 20 and 21 have the same or symmetrical structure, the first carrier 22 and the second carrier receiver 21 will be explained. As shown in FIG. 6, a large number of ribs 30 are provided inside the pair of walls 29, and between the ribs 30, a guide groove 31 having a groove bottom 46 tapered is formed. A bottom portion 47 is provided below the guide groove 31 to receive and support the wafer 1. The groove bottom 46 of the guide groove 31 leaves a slight gap between it and the outer periphery of the wafer 1 at the position where the wafer 1 touches the bottom.

前記溝底46はテーパー状でなく、中心線26
と平行でもよいが、テーパー状とした方がウエハ
ー1の出し入れが容易である。
The groove bottom 46 is not tapered, but is aligned with the center line 26.
The wafer 1 may be parallel to the wafer 1, but it is easier to take the wafer 1 in and out if it is tapered.

第二位置において第一と第二のキヤリヤ22,
23の案内溝31は突き合わされウエハー1の移
送通路が形成される。
first and second carriers 22 in a second position;
The 23 guide grooves 31 are butted against each other to form a transfer path for the wafer 1.

第二キヤリヤ受け21にはキヤリヤ押え32が
回動軸33に設けられ、バネ34により、キヤリ
ヤ押え32の頭が第二キヤリヤ23の溝35に入
り込むよう力が与えられ、第二キヤリヤ23が第
二キヤリヤ受け21から外れるのを防いでいる。
しかし、第一位置にあるときは、回動軸33に設
けられたアーム36の先のローラ37がストツパ
38に当たりキヤリヤ押え32を溝35から外
し、第二キヤリヤ23を自由に取出せるようにな
つている。
A carrier presser 32 is provided on a rotating shaft 33 of the second carrier receiver 21, and force is applied by a spring 34 so that the head of the carrier presser 32 enters the groove 35 of the second carrier 23, and the second carrier 23 is moved to the second carrier 23. This prevents it from coming off from the secondary carrier receiver 21.
However, when it is in the first position, the roller 37 at the end of the arm 36 provided on the rotating shaft 33 hits the stopper 38 and removes the carrier presser 32 from the groove 35, allowing the second carrier 23 to be taken out freely. ing.

39はシリンダであり、ロツド40を伸長せし
めて、第二位置にある第一キヤリヤ22の中のウ
エハー1を、ローラ41又はバーにより押し進め
ながら案内溝31により移送経路に沿つて駆動
し、第二キヤリヤ23の中に収容せしめて移載を
行う駆動機構である。シリンダ39の代わりにネ
ジ軸、ボールスクリユー軸などにより駆動を行つ
てもよい。また、このシリンダ39などの駆動機
構は傾動台10上でなく、固定のベースフレーム
8上に設けてもよい。
Reference numeral 39 denotes a cylinder, which extends the rod 40 and drives the wafer 1 in the first carrier 22 in the second position along the transfer path through the guide groove 31 while pushing it forward with the roller 41 or the bar. This is a drive mechanism that is housed in the carrier 23 and performs transfer. Instead of the cylinder 39, a screw shaft, a ball screw shaft, or the like may be used for driving. Further, the drive mechanism such as the cylinder 39 may be provided on the fixed base frame 8 instead of on the tilting table 10.

〔作用〕[Effect]

先ず、第一キヤリヤ受け20及び第二キヤリヤ
受け21を第一位置に置き、それぞれにウエハー
1を収容した第一キヤリヤ22と、空の第二キヤ
リヤ23を支える。その後、或いは当初に、傾動
台10を左方に傾けて第4図の如くなす。次にモ
ータ12を駆動して第一及び第一キヤリヤ受け2
0,21を第二位置に位置せしめる。このとき、
傾動台10は左に傾いており、この状態で第一キ
ヤリヤ22、第二キヤリヤ23の下側の案内溝3
1の溝底46は水平線42よりも左下がりになる
ようにしてあるので、ウエハー1は重力により第
一キヤリヤ22の底部47に当接したままであり
開放口24の方に転がり出すことなく保持されて
いる。
First, the first carrier receiver 20 and the second carrier receiver 21 are placed in the first position to support the first carrier 22 containing the wafer 1 and the empty second carrier 23, respectively. After that, or initially, the tilting table 10 is tilted to the left as shown in FIG. Next, the motor 12 is driven to drive the first and first carrier receivers 2.
0 and 21 are placed in the second position. At this time,
The tilting table 10 is tilted to the left, and in this state, the guide groove 3 on the lower side of the first carrier 22 and the second carrier 23 is tilted to the left.
Since the groove bottom 46 of the first carrier 22 is oriented downward to the left of the horizontal line 42, the wafer 1 remains in contact with the bottom 47 of the first carrier 22 due to gravity and is held without rolling toward the opening 24. has been done.

次にシリンダ39を作動せしめてローラ41に
よりウエハー1を右方に押し進める。水平線42
に対する第一、第二キヤリヤ22,23の案内溝
31の溝底46の上り勾配は小さいので、ローラ
41とウエハー1との接触圧力は小である。押さ
れたウエハー1は移送通路としての案内溝31を
転がりながら右方に移動する。
Next, the cylinder 39 is activated and the roller 41 pushes the wafer 1 to the right. horizontal line 42
Since the upward slope of the groove bottom 46 of the guide groove 31 of the first and second carriers 22 and 23 is small, the contact pressure between the roller 41 and the wafer 1 is small. The pushed wafer 1 moves to the right while rolling in the guide groove 31 serving as a transfer path.

シリンダ39の伸長につれウエハー1は第二キ
ヤリヤ23の中に入る。ウエハー1が第二キヤリ
ヤ23の底部47に当たる直前にシリンダ39の
ストロークを停止する。
As the cylinder 39 extends, the wafer 1 enters the second carrier 23. Just before the wafer 1 hits the bottom 47 of the second carrier 23, the stroke of the cylinder 39 is stopped.

次に、シリンダ11を伸長せしめて傾動台10
を逆に右下がりに傾動せしめ、第一キヤリヤ22
及び第二キヤリヤ23の下側の案内溝31の溝底
46の水平線42に対する勾配を右下がりとな
す。するとウエハー1は、自重により僅かすべつ
て移動して底部47に当たり停止する。この転動
距離を僅かとすれば、衝撃はなく破損のおそれは
ない。
Next, the cylinder 11 is extended and the tilting table 10 is
Conversely, tilt the first carrier 22 downward to the right.
The slope of the groove bottom 46 of the lower guide groove 31 of the second carrier 23 with respect to the horizontal line 42 is downward to the right. Then, the wafer 1 slides slightly due to its own weight, hits the bottom portion 47, and stops. If this rolling distance is short, there will be no impact and there is no risk of damage.

次にシリンダ39を引込めたる後、モータ12
を逆転せしめて第一及び第二キヤリヤ受け20,
21を第一位置に戻す。このときストツパ38に
ローラ37が当たつてキヤリヤ押え32がゆる
み、空になつた第一キヤリヤ22を外し、ウエハ
ー1が移載された第二キヤリヤ23を外して次の
工程へ持ち去ることができる。
Next, after retracting the cylinder 39, the motor 12
by reversing the first and second carrier receivers 20,
21 back to the first position. At this time, the roller 37 hits the stopper 38, loosening the carrier presser 32, and the empty first carrier 22 can be removed, and the second carrier 23, on which the wafer 1 has been transferred, can be removed and carried away to the next process. .

次に、ウエハー1を収容した第一キヤリヤ2
2、及び空の第二キヤリヤ23を装着し当初の状
態に戻し、これを繰り返して順次ウエハー1の移
載を行う。
Next, the first carrier 2 containing the wafer 1
2 and an empty second carrier 23 are installed to return to the initial state, and this is repeated to sequentially transfer the wafers 1.

本実施例は以上の如く構成され作用するので、
全く自動化され、作動中はカバーで密閉すること
ができて他からの塵の付着や汚染を受けることな
く、また動作中も摩耗粉がウエハー1に落下する
ようなことはなく、清浄を保つことができ、さら
にウエハー1に力や衝撃を加えることが殆どない
ので破損を生ずるおそれもない。
Since this embodiment is configured and operates as described above,
It is completely automated and can be sealed with a cover during operation, so it is not exposed to dust or contamination from other sources, and wear powder does not fall onto the wafer 1 during operation, so it can be kept clean. Furthermore, since almost no force or impact is applied to the wafer 1, there is no risk of damage.

第7図は他の実施例のキヤリヤ移動機構であ
り、第二位置におけるウエハー1の移送通路の一
部を溝底46を有する案内溝48を備えた中間移
送通路43にて形成せしめたものであり、その両
側に第一キヤリヤ22と第二キヤリヤ23を向か
い合わせて当接せしめるようにしてあり、ウエハ
ー1の移送距離Lがウエハー1の円周長さより長
くなるようになつている。44,45はチエーン
である。
FIG. 7 shows a carrier moving mechanism of another embodiment, in which a part of the transfer path for the wafer 1 at the second position is formed by an intermediate transfer path 43 provided with a guide groove 48 having a groove bottom 46. On both sides thereof, a first carrier 22 and a second carrier 23 are brought into contact with each other facing each other, so that the transfer distance L of the wafer 1 is longer than the circumferential length of the wafer 1. 44 and 45 are chains.

第一キヤリヤ22の中においてはウエハー1の
オリエンテーシヨンフラツトとしての切欠部7
は、必ずしも方向がそろつておらず、通常は不一
致である。その状態のまま第二位置において、傾
動台10が左下がりの位置で、第一、第二キヤリ
ヤ22,23、中間移送通路の溝底46が左下が
り勾配になるように保ちシリンダ39によりウエ
ハー1を駆動して転動せしめる。ウエハー1は案
内溝48の中を転動し、切欠部7も回転するが、
移送距離Lは円周長さよりも長いので、最終位置
に至る前に、どのウエハー1の切欠部7も必ず下
向きになり、溝底46に接する。ウエハー1と溝
底46間の滑に摩擦、ウエハー1とローラ41と
の間の転がり摩擦(固定バーの場合は滑り摩擦)
を小になるように材質や構造を選べば、切欠部7
が溝底46に当接した後はウエハー1はもはや転
動せず、そのまま滑つて移送される。そして第二
キヤリヤ23に収容されるときには全てのウエハ
ー1の切欠部7は一方の溝底46に当接され向き
がそろえられ整列している。
In the first carrier 22 there is a recess 7 as an orientation flat for the wafer 1.
are not necessarily aligned in direction and are usually inconsistent. In this state, in the second position, the tilting table 10 is in the left-down position, and the first and second carriers 22, 23, and the groove bottom 46 of the intermediate transfer passage are kept at a left-down slope, and the cylinder 39 moves the wafer Drive and make it roll. The wafer 1 rolls in the guide groove 48, and the notch 7 also rotates.
Since the transfer distance L is longer than the circumferential length, the notch 7 of any wafer 1 always faces downward and contacts the groove bottom 46 before reaching the final position. Sliding friction between the wafer 1 and the groove bottom 46, rolling friction between the wafer 1 and the roller 41 (sliding friction in the case of a fixed bar)
If the material and structure are selected to make the notch 7 small,
After the wafer 1 comes into contact with the groove bottom 46, the wafer 1 no longer rolls, but is simply slid and transferred. When the wafers 1 are housed in the second carrier 23, the notches 7 of all the wafers 1 are brought into contact with one of the groove bottoms 46 and aligned in the same direction.

本実施例により、特に切欠部7の向きの整列機
構を必要とせず、移載工程の途中で同時に切欠部
7の向きの整列を行うことができ、簡単な構造に
よりコンバクトな装置とすることができる。
According to this embodiment, it is possible to simultaneously align the directions of the notches 7 during the transfer process without requiring a mechanism for aligning the directions of the notches 7, and a compact device can be achieved with a simple structure. can.

〔考案の効果〕[Effect of idea]

本考案は、両キヤリヤ受け20,21をそれぞ
れ支軸17,18で回動自在に傾動台10上に設
け、該支軸17,18を異方向に回動する伝動部
材を介して連絡した正逆回転用の駆動機構のモー
タ12を備えると共に、前記傾動台10が水平面
に対して傾斜するように軸9で回動自在に支えら
れ、該軸9を中心として傾動台10の一端を昇降
動する昇降機構11と、前記第一キヤリヤ22内
のウエハー1を第二キヤリヤ23に移送する移載
駆動機構39とを配備し、さらに前記第二キヤリ
ヤ受けに回動軸を介してキヤリヤ押えを設け、該
キヤリヤ押えをバネで附勢してキヤリヤに形成し
た溝に係脱自在に装備したことにより、ウエハー
の移載が全自動化され、ウエハーの作動中は塵の
付着や汚染がなく正確安全に行われ、塵や汚染に
よるトラブルを防ぎ、かつ破損のおそれのない安
定したウエハー移送が可能であり、しかもそのウ
エハーの移動が傾斜された下がり勾配の案内経路
によつて行われるのでウエハーでキヤリヤを摩耗
して削り粉を発生することなく、容易に移し替え
ができ、かつ移載駆動機構とのコンビネーシヨン
でウエハーがキヤリヤ底部に衝撃なく納まり破損
のおそれがないと共に、キヤリヤの一方から他方
に往復動する移載駆動機構があることで傾動台と
の相互関係でウエハーの向きの整列も容易に可能
でウエハー事後処理を著しく簡易化できるし、ま
た、キヤリヤがキヤリヤ受けから外れることなく
安全に動作でき、がたつきなく支軸を中心に回動
する自動操作を安定して行えさらに移送距離をウ
エハー円周長さよりも長くすることにより特に整
列装置を設けずに切欠部の向きの整列を移載と同
時に行うことができるなど、実用上極めて大なる
効果を奏する。
In the present invention, both carrier receivers 20 and 21 are provided on a tilting table 10 so as to be rotatable by support shafts 17 and 18, respectively, and the support shafts 17 and 18 are connected to each other via a transmission member that rotates in different directions. A motor 12 of a drive mechanism for reverse rotation is provided, and the tilting table 10 is rotatably supported by a shaft 9 so as to be inclined with respect to a horizontal plane, and one end of the tilting table 10 is moved up and down about the shaft 9. and a transfer drive mechanism 39 for transferring the wafer 1 in the first carrier 22 to the second carrier 23, and further a carrier presser is provided on the second carrier receiver via a rotation shaft. By equipping the carrier holder with a spring bias so that it can be freely engaged and detached from the groove formed in the carrier, wafer transfer is fully automated, and wafers can be transferred accurately and safely without dust or contamination during wafer operation. This method prevents troubles caused by dust and contamination, and enables stable wafer transfer without the risk of damage.Furthermore, since the wafer movement is carried out by a downwardly sloped guide path, the wafer carrier can be easily transported. The wafer can be easily transferred without causing wear and shavings, and in combination with the transfer drive mechanism, the wafer can be placed at the bottom of the carrier without impact, eliminating the risk of damage, and it can be moved back and forth from one side of the carrier to the other. The moving transfer drive mechanism makes it easy to align the orientation of the wafers in relation to the tilting table, which greatly simplifies post-processing of wafers, and also allows safe operation without the carrier coming off the carrier holder. The automatic operation that rotates around the spindle without rattling can be performed stably, and by making the transfer distance longer than the wafer circumference, it is possible to transfer the alignment of the notch without using a special alignment device. It can be carried out at the same time as printing, which has extremely great practical effects.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図a,b、第2図、第3図は従来例の説明
図、第4図は本考案の実施例の一部断面正面図、
第5図はその右方側面図、第6図は第4図の−
線における第一キヤリヤの断面平面図、第7図
は他の実施例の一部断面正面図である。 1……ウエハー、2,22……第一キヤリヤ、
3,23……第二キヤリヤ、4……ゴムベルト、
5,11,39……シリンダ、6……ホルダー、
7……切欠部、8……ベースフレーム、9……
軸、10……傾動台、12……モータ、13……
ピニオン、14,15,16……ギヤ、17,1
8……支軸、19,36……アーム、20……第
一キヤリヤ受け、21……第二キヤリヤ受け、2
4,25……開放口、26,27……中心線、2
8……直線、29……壁、30……リブ、31,
48……案内溝、32……キヤリヤ押え、33…
…回動軸、34……バネ、35……溝、37,4
1……ローラ、38……ストツパ、40……ロツ
ド、42……水平線、43……中間移送通路、4
4,45……チエーン、46……溝底、47……
底部。
1a, b, 2, and 3 are explanatory diagrams of the conventional example, and FIG. 4 is a partially sectional front view of the embodiment of the present invention,
Figure 5 is the right side view, Figure 6 is the − of Figure 4.
FIG. 7 is a partially sectional front view of another embodiment. 1... Wafer, 2, 22... First carrier,
3, 23...Second carrier, 4...Rubber belt,
5, 11, 39...Cylinder, 6...Holder,
7... Notch, 8... Base frame, 9...
Axis, 10...Tilt table, 12...Motor, 13...
Pinion, 14, 15, 16... Gear, 17, 1
8... Support shaft, 19, 36... Arm, 20... First carrier receiver, 21... Second carrier receiver, 2
4, 25...Open opening, 26, 27...Center line, 2
8... Straight line, 29... Wall, 30... Rib, 31,
48... Guide groove, 32... Carrier presser, 33...
...Rotation axis, 34...Spring, 35...Groove, 37,4
1...Roller, 38...Stopper, 40...Rod, 42...Horizontal line, 43...Intermediate transfer passage, 4
4, 45...Chain, 46...Groove bottom, 47...
bottom.

Claims (1)

【実用新案登録請求の範囲】 ウエハー1を収容し、開放口24のある第一キ
ヤリヤ22を受ける第一キヤリヤ受け20と、前
記ウエハー1が移載される開放口25のある第二
キヤリヤ23を受ける第二キヤリヤ受け21とを
備え、両キヤリヤ22,23の一方から他方へウ
エハーを移動できるように、それぞれのキヤリヤ
22,23の開放口24,25をほぼ上方に向け
て保持する位置と、それぞれのキヤリヤ開放口2
4,25を向かい合わせて当接する位置とに変位
させるキヤリヤ移動機構を有するウエハー移載装
置において、 前記キヤリヤ受け20,21をそれぞれ支軸1
7,18で回動自在に傾動台10上に設け、該支
軸17,18を異方向に回動する伝動部材を介し
て連絡した正逆回転用の駆動機構のモータ12を
備えると共に、前記傾動台10が水平面に対して
傾斜するように軸9で回動自在に支えられ、該軸
9を中心として傾動台10の一端を昇降動する昇
降機能11と、前記第一キヤリヤ22内のウエハ
ー1を第二キヤリヤ23に移送する移載駆動機構
39とを配備し、さらに前記第二キヤリヤ受け2
0,21に回動軸33を介してキヤリヤ押え32
を設け、該キヤリヤ押え32をバネ34で附勢し
てキヤリヤ22,23に形成した溝35に係脱自
在に装備したことを特徴とするウエハー移載装
置。
[Claims for Utility Model Registration] A first carrier receiver 20 that accommodates a wafer 1 and receives a first carrier 22 having an opening 24, and a second carrier 23 having an opening 25 into which the wafer 1 is transferred. a second carrier receiver 21 to receive the wafer, and a position where the openings 24, 25 of each carrier 22, 23 are held substantially upward so that the wafer can be moved from one of the carriers 22, 23 to the other; Each carrier opening 2
In the wafer transfer device having a carrier moving mechanism for displacing the carrier receivers 20 and 25 to positions where they face each other and come into contact with each other, the carrier receivers 20 and 21 are respectively moved to the support shaft 1
7 and 18 are rotatably provided on the tilting table 10, and are provided with a motor 12 of a drive mechanism for forward and reverse rotation, which is connected via a transmission member that rotates the support shafts 17 and 18 in different directions. The tilting table 10 is rotatably supported by a shaft 9 so as to be inclined with respect to a horizontal plane, and an elevating function 11 for raising and lowering one end of the tilting table 10 about the shaft 9; and a wafer in the first carrier 22. 1 to the second carrier 23, and a transfer drive mechanism 39 for transferring the second carrier receiver 2
0,21 via the rotation shaft 33 to the carrier presser 32.
A wafer transfer device characterized in that the carrier presser 32 is biased by a spring 34 and is detachably attached to grooves 35 formed in the carriers 22 and 23.
JP1989145906U 1989-12-20 1989-12-20 Expired JPH0316286Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989145906U JPH0316286Y2 (en) 1989-12-20 1989-12-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989145906U JPH0316286Y2 (en) 1989-12-20 1989-12-20

Publications (2)

Publication Number Publication Date
JPH0288238U JPH0288238U (en) 1990-07-12
JPH0316286Y2 true JPH0316286Y2 (en) 1991-04-08

Family

ID=31414909

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989145906U Expired JPH0316286Y2 (en) 1989-12-20 1989-12-20

Country Status (1)

Country Link
JP (1) JPH0316286Y2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5324248U (en) * 1976-08-05 1978-03-01

Also Published As

Publication number Publication date
JPH0288238U (en) 1990-07-12

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