JPH03209203A - Color filter manufacturing method - Google Patents
Color filter manufacturing methodInfo
- Publication number
- JPH03209203A JPH03209203A JP2004231A JP423190A JPH03209203A JP H03209203 A JPH03209203 A JP H03209203A JP 2004231 A JP2004231 A JP 2004231A JP 423190 A JP423190 A JP 423190A JP H03209203 A JPH03209203 A JP H03209203A
- Authority
- JP
- Japan
- Prior art keywords
- light
- colored
- color filter
- glass substrate
- shielding film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、液晶カラーディスプレイ等に用いられるカラ
ーフィルターの製造方法、特に着色部(カラーフィルタ
ーII)の間に遣光膜を有する遮光躾付きカラーフィル
ターの製造方法に関するものである。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a method for manufacturing a color filter used for liquid crystal color displays, etc., and particularly a method for producing a color filter with a light-shielding film having a light transmitting film between the colored portions (color filter II). The present invention relates to a method for manufacturing a color filter.
例えば液晶ディスプレイのフルカラー化の一つの手段と
して三原色のカラーフィルターを採用することがある。For example, one way to make a full-color liquid crystal display is to use color filters for three primary colors.
この種のカラーフィルターは、例えば透明な基板(ガラ
ス基板等)上に所要パターンのR.G,B各色の着色部
と、各着色部の問からの光漏れを防止する遮光躾とを形
成した構造とする。その製造に際しては、ガラス基板上
の着色部、遮光膜の順に形成する場合と、ガラス基板上
に遮光膜、着色部の順に形成する場合があり,前者の例
を第6図(A)に、後者の例を第6図(B)にそれぞれ
示す。This type of color filter is manufactured by forming a desired pattern of R. It has a structure in which colored parts of G and B colors and a light shielding part for preventing light leakage from between each colored part are formed. When manufacturing it, there are cases in which a colored part and a light-shielding film are formed on a glass substrate in this order, and there are also cases in which a light-shielding film and a colored part are formed in that order on a glass substrate. An example of the former is shown in FIG. 6(A). Examples of the latter are shown in FIG. 6(B).
即ち、第6図(A)では、まずガラス基板21上に印劇
法、染色法等によりR.G.Bの肴色部22を形成し、
この後、各着色部22の問に遮光lI23を形成する。That is, in FIG. 6(A), R. G. Forming the appetizer color part 22 of B,
After this, a light-shielding lI 23 is formed between each colored portion 22 .
この場合、遮光膜用フォトマスクを用い、連光膜23が
着色部22の端縁部に重なるようにパターニングする。In this case, using a photomask for a light shielding film, patterning is performed so that the continuous light film 23 overlaps the edge of the colored portion 22 .
第6図(B)では、まずガラス基板21上に連光!l2
3’ を連光膜用フォトマスクを用いて形成し、この後
、各色の着色部22′を遮光l9 23’の端縁部に重
なるようにパターニングする,
〔発明が解決とようとする課題〕
しかし、このような方法で製造すると、着色部22(2
2’ )と連光膜23(23’ )が互いに重なるため
、カラーフィルター面に凹凸が生じ、平滑性に欠けるよ
うになる。また、着色部22(22’)と遮光123(
23’ )のアライメントがずれると、光漏れが生じる
。更に、遮光膜用フオトマスクが必要であったり、着色
部と遮光膜用ファトマスクのアライメント工程が必要で
あるため、コストが高くなるといった問題点がある。In FIG. 6(B), first, continuous light is applied onto the glass substrate 21! l2
3' is formed using a continuous light film photomask, and then patterned so that the colored portions 22' of each color overlap with the edge portions of the light shielding 19 23'. [Problem to be solved by the invention] However, when manufactured by such a method, the colored portion 22 (2
2') and the continuous light film 23 (23') overlap each other, so that the color filter surface becomes uneven and lacks smoothness. In addition, the colored part 22 (22') and the light shielding part 123 (
23') is misaligned, light leakage occurs. Furthermore, since a photomask for a light-shielding film is required and a process for aligning the colored portion and a fatmask for a light-shielding film is required, there is a problem that the cost increases.
本発明の目的は、平滑性が良好な遮光膜付き力ラーフィ
ルターを安価に製造できるカラーフィルターの製造方法
を提供することにある。An object of the present invention is to provide a method for manufacturing a color filter that can inexpensively manufacture a color filter with a light-shielding film having good smoothness.
本発明は、透明基板上に所定色、所定パターンの着色部
を形威し、基板及び着色部上に黒色ネガレジストを塗布
した後、透明基板の裏面側からU■光を照射して黒色ネ
ガレジストのパターニングを行い、着色部の間にのみ遮
光膜を形成することを特徴とするものである。In the present invention, a colored portion of a predetermined color and a predetermined pattern is formed on a transparent substrate, a black negative resist is applied on the substrate and the colored portion, and then U light is irradiated from the back side of the transparent substrate to form a black negative resist. This method is characterized by patterning the resist and forming a light-shielding film only between the colored parts.
以下、本発明を図面に基づいて詳細に説明する。 Hereinafter, the present invention will be explained in detail based on the drawings.
本発明は、次のような製造工程を有する。The present invention has the following manufacturing steps.
(1)まず、第1図(A)のように透明な基板(例えば
ガラス基板)1上に印刷法、染色法等によりR.G.B
各色の所定パターンの着色部2を形成する。(1) First, as shown in FIG. 1(A), a transparent substrate (for example, a glass substrate) 1 is coated with R. G. B
Colored portions 2 of predetermined patterns of each color are formed.
(2)次に、第1図(B)のようにガラス基板1及び着
色部2上に黒色フォトレジスト3をスビンコート法、ロ
ールコート法、印刺法等により塗布し、予備乾燥を行う
。(2) Next, as shown in FIG. 1(B), a black photoresist 3 is applied onto the glass substrate 1 and the colored portion 2 by a spin coating method, a roll coating method, a stamping method, etc., and preliminary drying is performed.
(3) Ilfいて、第1図(C)のようにガラス基
板1の裏面側からUV光(紫外線)aを照銅ずる。(3) With Ilf, as shown in FIG. 1(C), UV light (ultraviolet light) a is emitted from the back side of the glass substrate 1.
このUv光のピーク波長は、黒色フォトレジスト3の感
光波長域と互いに重なるか、望まし《は、更に紫外域に
なるように選択する。The peak wavelength of this Uv light is selected so that it overlaps with the sensitive wavelength range of the black photoresist 3, or preferably, it is further in the ultraviolet range.
(4)この後、黒色フォトレジスト3を現像液にて現像
する。この現像により、U■光照射時に着色部自体がマ
スクとなる着色部上面の黒色フォトレジストが除去され
、第1図(D)のように着色部2の間に遮光躾3′が形
成される。この結果、表面が平滑な遣光膜付きカラーフ
ィルターが得られる。(4) After this, the black photoresist 3 is developed with a developer. Through this development, the black photoresist on the top surface of the colored part, which serves as a mask when irradiated with U light, is removed, and a light shielding area 3' is formed between the colored parts 2 as shown in FIG. 1(D). . As a result, a color filter with a light-transmitting film having a smooth surface can be obtained.
なお印刷法等で得られたR.G.B各色の着色部2が第
4図に示すように黒色フォトレジスト3の感光波長域で
の透過率が5%程度ある場合には、第2図のようなU■
フィルター4を用いてガラス基板1の裏面側からU■光
aを照射する。このUvフィルター4は、例えば第5図
に示すような分光透過率のものを使用する。Note that R.O. obtained by printing method etc. G. If the colored portions 2 of each B color have a transmittance of about 5% in the photosensitive wavelength range of the black photoresist 3 as shown in FIG.
Using the filter 4, the glass substrate 1 is irradiated with U light a from the back side. The Uv filter 4 used has a spectral transmittance as shown in FIG. 5, for example.
また、ガラス基板1の周縁部に遮光膜を形成したくない
場合には、第3図(A)のようにガラス基板1の裏面に
簡素な構造のフォトマスク5を重ね、裏面側からUV光
aを照射すれば、第3図(8}のような遮光膜付きカラ
ーフィルターが得られる。In addition, if it is not desired to form a light-shielding film on the peripheral edge of the glass substrate 1, a photomask 5 with a simple structure is stacked on the back surface of the glass substrate 1 as shown in FIG. By irradiating with light a, a color filter with a light-shielding film as shown in FIG. 3 (8) can be obtained.
次に、具体例を挙げる。Next, a specific example will be given.
(1) フジハントエレクトロニクステクノロジー株
式会社製のカラーモザイクを用いて着色部を形成した。(1) A colored portion was formed using a color mosaic manufactured by Fuji Hunt Electronics Technology Co., Ltd.
この時の分光透過率は第5図の通りであった。The spectral transmittance at this time was as shown in FIG.
(2} この上に同社製のカラーモザイクCKをスビ
ンナー法により塗布した。予備乾燥は、100℃で5
sin行った。(2) Color Mosaic CK manufactured by the same company was applied on top of this using the Svinner method. Pre-drying was performed at 100°C for 5 minutes.
I went to sin.
(3)続いて、超高圧水銀ランプを用い、365nmに
ピークを有するUv光をガラス基板の裏面側から照射し
た。照射エネルギーは、501J/ cdであった。(3) Subsequently, using an ultra-high pressure mercury lamp, UV light having a peak at 365 nm was irradiated from the back side of the glass substrate. The irradiation energy was 501 J/cd.
(4) この後、同社製現像液を用いて現像を行った
後、水洗、乾燥を行い、完成品を得た。(4) Thereafter, development was performed using a developer manufactured by the same company, followed by washing with water and drying to obtain a finished product.
このようにして得られた完成品(カラーフィルター)は
、着色部(カラーフィルターH)と遮光膜が互いに重な
ることはなく、平滑なものであった。また、その遮光膜
は、十分な遮光機能を持つものであった。The finished product (color filter) thus obtained was smooth, with the colored portion (color filter H) and the light-shielding film not overlapping each other. Moreover, the light-shielding film had a sufficient light-shielding function.
以上のように本発明によれば、各色の着色部自体をUv
光に対するマスクとして活用するため、遮光膜形成時に
専用の遣光膜用フォトマスクを使用したり、遮光膜と着
色部のアライメント操作を行う必要がなくなり、工程が
単純となってコストの低減が図れる。しかも、着色部を
マスクとして活用するため、その上面の黒色フォトレジ
ストは現像時に除去されて、遮光膜が着色部の間の領域
にのみ形威されるようになり、表面が平滑な遮光躾付き
カラーフィノレターを得ることができる。また、適宜の
U■フィルターを用いれば、十分な分光特性を持たない
着色部の場合にも、遮光膜の着色部への重なりを確実に
防止することができる。As described above, according to the present invention, the colored portion itself of each color is
Since it is used as a mask against light, there is no need to use a dedicated light-transmitting film photomask when forming a light-shielding film or to perform alignment operations between the light-shielding film and the colored part, simplifying the process and reducing costs. . Moreover, since the colored areas are used as masks, the black photoresist on the top surface is removed during development, leaving the light-shielding film only visible in the areas between the colored areas, resulting in a smooth surface. You can obtain colored fino letters. Furthermore, by using an appropriate U-filter, even in the case of a colored portion that does not have sufficient spectral characteristics, it is possible to reliably prevent the light-shielding film from overlapping the colored portion.
更に、黒色フォトレジストを遮光膜として使用するため
、フォトリソグラフィー工程の終rと同時に遮光膜が形
成されることになり、可染性フォトレジストを用いて遮
光膜を形成する方法(パターン形成後に黒色染料による
染色工程を必要とする)よりも簡便である。Furthermore, since a black photoresist is used as a light-shielding film, the light-shielding film is formed at the same time as the end of the photolithography process. (requiring a dyeing process).
第1図(A)〜(D)は本発明に係るカラーフィルター
の製造方法の一実施例を示す各製造工程における断面図
、第2図及び第3図(A),(B)は本発明の他の実施
例を示す断面図、第4図はR.G,81色部の着色材料
の分光特性図、第ら図はR,G,Bの着色材料とUVフ
ィルターの波長と透過率の関係を示す分光特性図、第6
図(A),(B)は従来例を示す断面図である。
1・・・ガラス基板
2・・・R,G,B各色の着色部
3・・・黒色フォトレジスト 3′・・・遮光膜4・・
・Uvフィルター 5・・・フォトマスクa・・・
UV光FIGS. 1(A) to (D) are cross-sectional views of each manufacturing process showing an example of the method for manufacturing a color filter according to the present invention, and FIGS. 2 and 3 (A) and (B) are sectional views of the present invention. FIG. 4 is a sectional view showing another embodiment of the R. Figure 6 is a spectral characteristic diagram of the coloring material of G, 81 color part, and Figure 6 is a spectral characteristic diagram showing the relationship between the wavelength and transmittance of the coloring material of R, G, and B and the UV filter.
Figures (A) and (B) are cross-sectional views showing a conventional example. 1...Glass substrate 2...R, G, B colored parts 3...Black photoresist 3'...Light shielding film 4...
・Uv filter 5...Photomask a...
UV light
Claims (1)
基板及び着色部上に黒色ネガレジストを塗布した後、透
明基板の裏面側からUV光を照射して黒色ネガレジスト
のパターニングを行い、着色部の間にのみ遮光膜を形成
することを特徴とするカラーフィルターの製造方法。Forming a colored part of a predetermined color and a predetermined pattern on a transparent substrate,
After applying a black negative resist on the substrate and the colored parts, UV light is irradiated from the back side of the transparent substrate to pattern the black negative resist, and a light-shielding film is formed only between the colored parts. Method of manufacturing color filters.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004231A JPH03209203A (en) | 1990-01-11 | 1990-01-11 | Color filter manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004231A JPH03209203A (en) | 1990-01-11 | 1990-01-11 | Color filter manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03209203A true JPH03209203A (en) | 1991-09-12 |
Family
ID=11578795
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004231A Pending JPH03209203A (en) | 1990-01-11 | 1990-01-11 | Color filter manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03209203A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1996036903A1 (en) * | 1995-05-16 | 1996-11-21 | Citizen Watch Co., Ltd. | Liquid crystal display, method of manufacturing active substrate, and method of manufacturing color filter substrate |
| US5693436A (en) * | 1994-12-08 | 1997-12-02 | Fuji Photo Film Co., Ltd. | Method for forming a color filter |
| JP2006317983A (en) * | 2006-08-30 | 2006-11-24 | Sharp Corp | Liquid crystal display |
| JP2008134435A (en) * | 2006-11-28 | 2008-06-12 | Toppan Printing Co Ltd | Color filter for liquid crystal display device and liquid crystal display device using the same |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01293306A (en) * | 1988-05-20 | 1989-11-27 | Matsushita Electric Ind Co Ltd | Manufacture of color filter |
| JPH02277005A (en) * | 1989-04-19 | 1990-11-13 | Matsushita Electric Ind Co Ltd | Production of color filter |
-
1990
- 1990-01-11 JP JP2004231A patent/JPH03209203A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01293306A (en) * | 1988-05-20 | 1989-11-27 | Matsushita Electric Ind Co Ltd | Manufacture of color filter |
| JPH02277005A (en) * | 1989-04-19 | 1990-11-13 | Matsushita Electric Ind Co Ltd | Production of color filter |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5693436A (en) * | 1994-12-08 | 1997-12-02 | Fuji Photo Film Co., Ltd. | Method for forming a color filter |
| WO1996036903A1 (en) * | 1995-05-16 | 1996-11-21 | Citizen Watch Co., Ltd. | Liquid crystal display, method of manufacturing active substrate, and method of manufacturing color filter substrate |
| JP2006317983A (en) * | 2006-08-30 | 2006-11-24 | Sharp Corp | Liquid crystal display |
| JP2008134435A (en) * | 2006-11-28 | 2008-06-12 | Toppan Printing Co Ltd | Color filter for liquid crystal display device and liquid crystal display device using the same |
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