JPH0350056U - - Google Patents
Info
- Publication number
- JPH0350056U JPH0350056U JP10815989U JP10815989U JPH0350056U JP H0350056 U JPH0350056 U JP H0350056U JP 10815989 U JP10815989 U JP 10815989U JP 10815989 U JP10815989 U JP 10815989U JP H0350056 U JPH0350056 U JP H0350056U
- Authority
- JP
- Japan
- Prior art keywords
- holes
- slits
- substrate holder
- view
- movable substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000009529 body temperature measurement Methods 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 239000013307 optical fiber Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
第１図はこの考案による熱プラズマトーチ用測
温装置の１実施態様を高周波プラズマに適用した
状態を示す断面図、第２図は第１図の可動基体ホ
ルダー部分を拡大図示したもので、アは縦断面図
、イは底面図である。第３図は別の実施態様の可
動基体ホルダー部分を拡大図示したもので、アは
縦断面図、イは底面図である。
１……ノズル筒、２……反応ガス供給器、３，
４，５……バルブ、６……プラズマ発生室、７…
…高周波電源、８……ワークコイル、９……生成
チヤンバー、１０……排気装置、１１……基体、
１２……駆動手段、１３……可動基体ホルダー、
１４……貫通穴、１５……検温センサー、１６…
…水冷ジヤケツト、１７……光センサー、１８…
…光フアイバー、１９……計測器、２０……スリ
ツト。
Fig. 1 is a cross-sectional view showing an embodiment of the temperature measurement device for a thermal plasma torch according to this invention applied to high-frequency plasma, and Fig. 2 is an enlarged view of the movable substrate holder portion of Fig. 1. 1 is a vertical sectional view, and 1 is a bottom view. FIG. 3 is an enlarged view of the movable substrate holder portion of another embodiment, in which A is a longitudinal sectional view and B is a bottom view. 1... Nozzle tube, 2... Reaction gas supply device, 3,
4, 5... Valve, 6... Plasma generation chamber, 7...
... High frequency power supply, 8 ... Work coil, 9 ... Generation chamber, 10 ... Exhaust device, 11 ... Substrate,
12...driving means, 13...movable base holder,
14...Through hole, 15...Temperature sensor, 16...
...Water cooling jacket, 17...Light sensor, 18...
...Optical fiber, 19...Measuring instrument, 20...Slit.
Claims (1)
ルダー１３の同心円面に複数個の貫通穴１４もし
くはスリツト２０を穿設し、前記貫通穴もしくは
スリツトが通過する下面に水冷ジヤケツト１６に
挿着した検温センサー１５を近接固定してなる熱
プラズマトーチ用測温装置。 A plurality of through holes 14 or slits 20 are formed in the concentric circular surface of a movable substrate holder 13 that rotates and/or moves horizontally, and a temperature sensor 15 is inserted into a water cooling jacket 16 on the lower surface through which the through holes or slits pass. Temperature measurement device for thermal plasma torch that is fixed in close proximity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10815989U JPH06458Y2 (en) | 1989-09-14 | 1989-09-14 | Temperature measuring device for thermal plasma torch |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10815989U JPH06458Y2 (en) | 1989-09-14 | 1989-09-14 | Temperature measuring device for thermal plasma torch |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0350056U true JPH0350056U (en) | 1991-05-15 |
| JPH06458Y2 JPH06458Y2 (en) | 1994-01-05 |
Family
ID=31656815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10815989U Expired - Lifetime JPH06458Y2 (en) | 1989-09-14 | 1989-09-14 | Temperature measuring device for thermal plasma torch |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06458Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003197535A (en) * | 2001-12-21 | 2003-07-11 | Sumitomo Mitsubishi Silicon Corp | Vapor growth device, method for detecting temperature of vapor growth device, and method for controlling temperature of vapor growth device |
-
1989
- 1989-09-14 JP JP10815989U patent/JPH06458Y2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003197535A (en) * | 2001-12-21 | 2003-07-11 | Sumitomo Mitsubishi Silicon Corp | Vapor growth device, method for detecting temperature of vapor growth device, and method for controlling temperature of vapor growth device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06458Y2 (en) | 1994-01-05 |
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