JPH0364166B2 - - Google Patents
Info
- Publication number
- JPH0364166B2 JPH0364166B2 JP62117272A JP11727287A JPH0364166B2 JP H0364166 B2 JPH0364166 B2 JP H0364166B2 JP 62117272 A JP62117272 A JP 62117272A JP 11727287 A JP11727287 A JP 11727287A JP H0364166 B2 JPH0364166 B2 JP H0364166B2
- Authority
- JP
- Japan
- Prior art keywords
- arsenic
- adsorbent
- compounds
- present
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 52
- 229910052785 arsenic Inorganic materials 0.000 claims description 51
- 239000003463 adsorbent Substances 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 26
- 239000012530 fluid Substances 0.000 claims description 19
- 239000011148 porous material Substances 0.000 claims description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 9
- 229960004643 cupric oxide Drugs 0.000 claims description 7
- 239000005751 Copper oxide Substances 0.000 claims description 5
- 229910000431 copper oxide Inorganic materials 0.000 claims description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 4
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 21
- 239000007789 gas Substances 0.000 description 18
- 150000001875 compounds Chemical class 0.000 description 15
- 150000001495 arsenic compounds Chemical class 0.000 description 10
- 229940093920 gynecological arsenic compound Drugs 0.000 description 10
- 229930195733 hydrocarbon Natural products 0.000 description 9
- 150000002430 hydrocarbons Chemical class 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 238000001179 sorption measurement Methods 0.000 description 6
- 238000005273 aeration Methods 0.000 description 5
- 239000006227 byproduct Substances 0.000 description 5
- 230000003197 catalytic effect Effects 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000001336 alkenes Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000010779 crude oil Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 150000003839 salts Chemical group 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- XAZAQTBGMXGTBD-UHFFFAOYSA-N tributylarsane Chemical compound CCCC[As](CCCC)CCCC XAZAQTBGMXGTBD-UHFFFAOYSA-N 0.000 description 2
- HTDIUWINAKAPER-UHFFFAOYSA-N trimethylarsine Chemical compound C[As](C)C HTDIUWINAKAPER-UHFFFAOYSA-N 0.000 description 2
- PTKWYSNDTXDBIZ-UHFFFAOYSA-N 9,10-dioxoanthracene-1,2-disulfonic acid Chemical compound C1=CC=C2C(=O)C3=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C3C(=O)C2=C1 PTKWYSNDTXDBIZ-UHFFFAOYSA-N 0.000 description 1
- JAJIPIAHCFBEPI-UHFFFAOYSA-N 9,10-dioxoanthracene-1-sulfonic acid Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2S(=O)(=O)O JAJIPIAHCFBEPI-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical group [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910000070 arsenic hydride Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- UHZZMRAGKVHANO-UHFFFAOYSA-M chlormequat chloride Chemical compound [Cl-].C[N+](C)(C)CCCl UHZZMRAGKVHANO-UHFFFAOYSA-M 0.000 description 1
- DXCZGVVDXIPLCQ-UHFFFAOYSA-N chloro(dimethyl)arsane Chemical compound C[As](C)Cl DXCZGVVDXIPLCQ-UHFFFAOYSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- -1 cupric oxide Chemical compound 0.000 description 1
- HBNBMOGARBJBHS-UHFFFAOYSA-N dimethylarsane Chemical compound C[AsH]C HBNBMOGARBJBHS-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- IDDBICIFODFKQO-UHFFFAOYSA-N methylarsane Chemical compound [AsH2]C IDDBICIFODFKQO-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 150000004059 quinone derivatives Chemical group 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- JWOWJQPAYGEFFK-UHFFFAOYSA-N trimethylarsine oxide Chemical compound C[As](C)(C)=O JWOWJQPAYGEFFK-UHFFFAOYSA-N 0.000 description 1
- BPLUKJNHPBNVQL-UHFFFAOYSA-N triphenylarsine Chemical compound C1=CC=CC=C1[As](C=1C=CC=CC=1)C1=CC=CC=C1 BPLUKJNHPBNVQL-UHFFFAOYSA-N 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Production Of Liquid Hydrocarbon Mixture For Refining Petroleum (AREA)
- Treating Waste Gases (AREA)
- Separation Of Gases By Adsorption (AREA)
- Removal Of Specific Substances (AREA)
Description
発明の技術分野
本発明は、流体中の砒素除去方法に関し、さら
に詳しくは、とくに石油の流動床式接触分解装置
で副生する軽質炭化水素などに含有される砒化水
素等の砒素またはその化合物を効率よく除去する
方法に関する。
発明の技術的背景ならびにその問題点
近年、原油重質留分の有効利用を目的として、
流動床式接触分解装置(FCC)によるガソリン
の生産が増大している。この際副生するLPG留
分(C3およびC4留分)の有効利用は、コスト面
での競争力を維持するうえで極めて重要である。
しかしながら、このLPG留分、とくにC3留分に
は砒化水素などの砒素化合物が含有されている。
砒化水素などの砒素化合物は微量であつても後の
反応工程において触媒毒となることが知られてお
り、従つてこのC3留分を各種化学反応の原料と
して用いる場合は、予め砒化水素などの砒素化合
物を所定量以下まで除去することが強く望まれて
いる。
ところで従来、流体中の砒素またはその化合物
の除去方法として、以下のようなものが開示され
ている。
(イ) 亜鉛もしくは鉛の塩または酸化物の少くとも
1つを含むアルカリ性水溶液と、アントラキノ
ンスルホン酸またはアントラキノンジスルホン
酸の少くとも1つの塩のアルカリ性水溶液と、
アミンまたはエタノールアミンの存在下にキノ
ン誘導体の少なくとも1つを含む有機溶媒から
成る洗浄用溶液を用いて揮発性砒素誘導体を気
相で除去する方法(特公昭59−33408号公報)。
(ロ) 酸化マンガン、酸化銅およびそれらの混合物
により、気相で砒素またはその化合物を反応吸
着または酸化処理する方法(特公昭60−17772
号公報)。
(ハ) 銅族およびクロム族化合物を担持した活性炭
を用いて、気相で砒化水素類を除去する方法
(特開昭60−238144号公報)。
(ニ) 活性炭を用いて、液相で砒素またはその化合
物を吸着除去する方法(特開昭57−170987号公
報、同57−170988号公報)。
(ホ) 液相で砒素を酸化処理した後、砒素の酸化生
成物を除去する方法(特公昭55−11714号公報、
同60−9549号公報)などである。
しかしながら上記に開示された砒素またはその
化合物の除去方法では、脱砒素能が低く、高濃度
の砒素あるいはその化合物を含有する留分に対し
て多量の脱砒素剤を要し、また設備費および運転
費が高く、しかもLPG留分を取り扱うプロセス
内に含酸素化合物を入れることは安全上の問題が
あるとともにLPG留分中の反応性の高いオレフ
イン類が重合してしまうなどの問題点があつた。
本発明者らは、流体中の砒素またはその化合物
の安価で効率のよい除去方法を種々検討する中
で、銅含有量、吸着剤の細孔半径、細孔容積およ
び比表面積とを特定の範囲に制御した銅系吸着剤
と、砒素を含有する流体とを接触させることによ
り、砒素またその化合物の除去率が著しく改善さ
れることを見い出し、本発明を完成するに至つ
た。
発明の目的
本発明は、流体中の砒素またはその化合物を除
去するに際して、脱砒素能が低く、設備費および
運転費が高いという従来技術に伴う問題点を解決
しようとするものであり、流体中の砒素またはそ
の化合物を効率よくかつ安価に除去するための方
法を提供することを目的としている。
発明の概要
本発明に係る流体中の砒素除去方法は、30〜55
重量%の銅を含有し、細孔半径40〜300Åの細孔
容積が0.12ml/g以上であり、かつ比表面積が
100m2/g以上である、酸化銅が担体に担持され
た吸着剤と、砒素を含有する流体とを接触させる
ことを特徴としている。
発明の具体的説明
以下本発明に係る流体中の砒素またはその化合
物の除去方法について具体的に説明する。
流 体
本発明に用いられる流体は、液体状または気体
状の炭化水素、窒素ガス等の不活性ガス、空気あ
るいは各種排ガスなどである。
本発明において、砒素が除去される液体状また
は気体状の炭化水素としては、具体的には、流動
床式接触分解装置より副生するLPG留分の他、
原油からの常圧蒸留または減圧蒸留により流出す
るナフサ、灯油、軽油などの留分、あるいはエチ
レンプラント、コーカー、ビスブレーカーなど熱
処理によつて生成された軽質留分などの石油留分
なども用いることができる。
このような炭化水素中には、砒素は、通常Ro
AsH3-o(式中Rはアルキル基、フエニル基などで
あり、nは0、1、2、3である)で表わされる
ような水素化物あるいは有機化合物の形態で含有
されている。このような砒素化合物としては具体
的には、アルシン、モノメチルアルシン、ジメチ
ルアルシン、トリメチルアルシン、トリブチルア
ルシン、トリフエニルアルシンなどが挙げられ
る。ハロゲン化された砒素化合物たとえばジメチ
ルクロルアルシンあるいは酸化された砒素化合物
たとえばトリメチルアルシンオキシドなどの形態
で、砒素が炭化水素中に含まれていることもあり
うる。
このような砒素またはその化合物は、炭化水素
の種類によつて異なるが、一般に炭化水素中に数
ppb(重量)から数百ppb(重量)で含まれている
ことが多い。
本発明に係る吸着剤を用いて砒素が除去される
炭化水素以外の流体としては、たとえば半導体電
子工業あるいは他の化学工業で排出される砒素ま
たは砒素化合物を含有する排ガス、あるいは半導
体原料として用いられる砒素水素化物を不純物と
して含有する粗製ホスフインガスなどが挙げられ
る。
吸着剤
本発明で用いられる吸着剤は、酸化銅とくに望
ましくは酸化第二銅を担体に担持した吸着剤であ
る。
担体としては、具体的には、シリカ、アルミ
ナ、シリカ・アルミナ、活性炭、ケイソウ土、活
性白土、マグネシアなどが用いられるが、このう
ちとくにアルミナが好ましい。
このような担体は、細孔半径40〜300Åの細孔
容積が0.20ml/g以上であり、かつ比表面積が
200m2/g以上であることが好ましい。
本発明に係る砒素除去吸着剤では、銅含有量は
30〜55重量%であるが、とくに35〜50重量%が好
ましい。銅含有量が30重量%未満であると脱砒素
能が劣り、また銅含有量が55重量%を超えると、
細孔容積が減少するのみならず吸着剤強度が低下
するため好ましくない。
本発明に係る砒素除去吸着剤は、細孔半径40〜
300Åの細孔容積が0.12ml/g以上であるが、と
くに細孔半径40〜300Åの細孔容積が0.14ml/g
以上であることが好ましい。
また、本発明に係る砒素除去吸着剤は、比表面
積が100m2/g以上であるがとくに120m2/g以上
であることが好ましい。細孔半径40〜300Åの細
孔容積が0.12ml/g未満で且つこの比表面積が
100m2/g未満であると、砒素吸着速度が劣る。
この結果、この吸着剤を流通系で用いた場合、銅
含有量が高くてもその砒素吸着容量が減少するた
め、好ましくない。
このような吸着剤は、たとえば水酸化ナトリウ
ム水溶液に硫酸銅および硝酸銅の水溶液を混合
し、担体を加えて良く撹拌後、濾過により回収し
乾燥、粉砕工程を経た後、成型機を用いて所定の
形状に成型することにより調製される。
接触条件
砒素あるいはその化合物を含有する流体と吸着
剤との接触は、従来から知られている方法の中か
ら適宜選択できる。たとえば、流体と吸着剤と
を、気相または液相にて、固定床方式で接触させ
る方法、移動床方式で接触させる方法、流動床方
式で接触させる方法などを採用することができ
る。また場合によつては、流体と吸着剤を回分方
式で接触させることもできる。
流体と吸着剤との接触時間は、気相で接触させ
る場合にはガス空間速度(G.H.S.V.)で1〜
1000時間-1好ましくは100〜800時間-1程度であ
り、液相で接触させる場合には液空間速度(L.
H.S.V.)で0.01〜20時間-1好ましくは1〜10時間
-1程度である。また接触時の温度は0〜100℃程
度である。
発明の効果
本発明の方法により、流体中の高濃度の砒素を
少量の吸着剤にて高い除去率で除去することがで
きる。また除去に際して前処理設備を特に必要と
せず、しかもストレーナー以外の後処理設備を必
要としない。その上砒素または砒素化合物が除去
される炭化水素中に反応性の高いオレフイン類が
含まれていても、砒素または砒素化合物の除去時
にこれらオレフイン類が重合したりするトラブル
が発生しないという効果が得られる。
以下本発明を実施例により説明するが、本発明
はこれら実施例に限定されるものではない。
なお実施例中の%はとくに断わりがない限り重
量基準である。
実施例 1
吸着剤の銅含有量が41%であり、細孔半径40〜
300Åの細孔容積が0.140ml/gであり、かつ比表
面積が140m2/gである砒素除去吸着剤を調製し
た。
上記の吸着剤5を、固定床反応器(8mmφ×
100mm)に充填し、砒素が220ppb含まれたナフサ
に、さらにトリブチルアルシンを砒素量として
1000ppb添加して液空間速度(L.H.S.V.)5時間
-1常温で通油した。
このようにして砒素の除去処理がなされた後の
ナフサ中には、通算の通油量が、20000/−
吸着剤の時点で砒素が24ppb含まれており、砒素
の除去率は98%であつた。
実施例 2
流動床式接触分解装置より副生する下記組成の
C3留分からなる原料ガスを用いて砒化水素の除
去を行つた。
プロピレン 69.4モル%
プロパン 30.2 〃
C2留分 0.2 〃
C4留分 0.2 〃
砒化水素 500ppb
実施例1で使用した吸着剤2mlを固定床反応器
(7mmφ×46mm)に充填した。上記の原料ガスを
常温、常圧にてガス空間速度(G.H.S.V.)500時
間-1で流通した。
このようにして砒化水素の除去処理がなされた
後の原料ガス中には、通算の通気量が1×107
/−吸着剤の時点で、砒化水素が10ppb含ま
れており、砒化水素の除去率は98%であつた。
実施例 3
原料ガスを流動床式接触分解装置より副生する
C3留分に代えて、1.07容量%の砒化水素を含む窒
素ガスを用いた以外は、実施例2と同様にして砒
化水素の除去処理を行つた。
固定床反応器出口ガス中の砒化水素濃度が5モ
ルppmに達した時点で、砒化水素含有ガスの通気
を止め(貫流破過点)、以下の式により砒素吸着
容量を求めた。
砒素吸着容量(%)=吸着剤中の砒素含有
(%)×通気後の吸着剤量(%)/通気前の吸着剤量(
%)
第1表に結果を示す。
比較例 1
市販吸着剤である日揮化学(株)製 商品名N−
202Dを用いた以外は、実施例2と同様にして砒
化水素の除去処理を行つた。
このようにして砒化水素の除去処理がなされた
後の原料ガス中には通算の通気量が5×106/
−吸着剤の時点で砒化水素が10ppb含まれてお
り、砒化水素の除去率は98%であつた。ただし通
算の通気量が1×107/−吸着剤の時点で砒
化水素が500ppb含まれており、砒化水素の破過
が認められた。
比較例 2
市販吸着剤(13種類)を用いた以外は、実施例
3と同様にして砒化水素の除去処理を行つた。
第1表に、吸着剤名、吸着剤の銅含有量、細孔
半径40〜300Åの細孔容積、吸着剤の比表面積、
吸着剤組成および砒素吸着容量を示す。
Technical Field of the Invention The present invention relates to a method for removing arsenic from a fluid, and more particularly, the present invention relates to a method for removing arsenic from a fluid, and more particularly, to remove arsenic such as hydrogen arsenide or its compounds contained in light hydrocarbons produced by-product in a fluidized bed catalytic cracker for petroleum. Concerning how to remove it efficiently. Technical background of the invention and its problems In recent years, with the aim of effectively utilizing heavy fractions of crude oil,
Gasoline production using fluidized bed catalytic crackers (FCC) is increasing. Effective use of the by-product LPG fractions (C 3 and C 4 fractions) is extremely important in maintaining cost competitiveness.
However, this LPG fraction, especially the C3 fraction, contains arsenic compounds such as hydrogen arsenide.
It is known that even trace amounts of arsenic compounds such as hydrogen arsenide can act as catalyst poisons in subsequent reaction steps. Therefore, when using this C3 fraction as a raw material for various chemical reactions, it is necessary to pre-mix hydrogen arsenide, etc. It is strongly desired to remove the arsenic compounds to a predetermined amount or less. Heretofore, the following methods have been disclosed as methods for removing arsenic or its compounds from fluids. (a) an alkaline aqueous solution containing at least one salt or oxide of zinc or lead; and an alkaline aqueous solution of at least one salt of anthraquinone sulfonic acid or anthraquinone disulfonic acid;
A method for removing volatile arsenic derivatives in a gas phase using a cleaning solution consisting of an organic solvent containing at least one quinone derivative in the presence of an amine or ethanolamine (Japanese Patent Publication No. 33408/1983). (b) A method of reactive adsorption or oxidation treatment of arsenic or its compounds in the gas phase using manganese oxide, copper oxide, and mixtures thereof (Japanese Patent Publication No. 60-17772)
Publication No.). (c) A method of removing hydrogen arsenides in a gas phase using activated carbon supporting copper group and chromium group compounds (Japanese Patent Application Laid-Open No. 60-238144). (d) A method of adsorbing and removing arsenic or its compounds in a liquid phase using activated carbon (Japanese Unexamined Patent Publications Nos. 170-170-1987 and 170-170-88). (e) A method of removing arsenic oxidation products after oxidizing arsenic in a liquid phase (Japanese Patent Publication No. 11714/1983,
Publication No. 60-9549). However, the method for removing arsenic or its compounds disclosed above has a low arsenic removal ability, requires a large amount of arsenic removal agent for a fraction containing a high concentration of arsenic or its compounds, and also requires high equipment costs and operational costs. In addition to being expensive, there are safety issues with introducing oxygen-containing compounds into the process that handles LPG fractions, as well as problems such as the highly reactive olefins in LPG fractions polymerizing. . While investigating various inexpensive and efficient methods for removing arsenic or its compounds from fluids, the present inventors set the copper content, pore radius, pore volume, and specific surface area of the adsorbent within specific ranges. The present inventors have discovered that the removal rate of arsenic and its compounds can be significantly improved by bringing a controlled copper adsorbent into contact with a fluid containing arsenic, leading to the completion of the present invention. Purpose of the Invention The present invention aims to solve the problems associated with the prior art, such as low arsenic removal ability and high equipment and operating costs, when removing arsenic or its compounds from a fluid. The purpose of the present invention is to provide a method for efficiently and inexpensively removing arsenic or its compounds. Summary of the Invention The method for removing arsenic from a fluid according to the present invention comprises
Contains % copper by weight, has a pore volume of 0.12 ml/g or more with a pore radius of 40 to 300 Å, and has a specific surface area of
The method is characterized in that an adsorbent in which copper oxide is supported on a carrier in an amount of 100 m 2 /g or more is brought into contact with a fluid containing arsenic. DETAILED DESCRIPTION OF THE INVENTION The method for removing arsenic or its compounds from a fluid according to the present invention will be specifically described below. Fluid The fluid used in the present invention is a liquid or gaseous hydrocarbon, an inert gas such as nitrogen gas, air, or various exhaust gases. In the present invention, the liquid or gaseous hydrocarbons from which arsenic is removed include LPG fraction produced as a by-product from a fluidized bed catalytic cracker,
Distillates such as naphtha, kerosene, and light oil that flow out from crude oil through atmospheric distillation or vacuum distillation, or petroleum fractions such as light fractions produced by heat treatment in ethylene plants, cokers, and visbreakers, etc., may also be used. I can do it. In such hydrocarbons, arsenic is usually present in R o
It is contained in the form of a hydride or an organic compound represented by AsH 3-o (wherein R is an alkyl group, phenyl group, etc., and n is 0, 1, 2, or 3). Specific examples of such arsenic compounds include arsine, monomethylarsine, dimethylarsine, trimethylarsine, tributylarsine, and triphenylarsine. Arsenic can also be present in the hydrocarbon in the form of halogenated arsenic compounds such as dimethylchloroarsine or oxidized arsenic compounds such as trimethylarsine oxide. Arsenic or its compounds vary depending on the type of hydrocarbon, but in general, arsenic or its compounds are present in a large number in hydrocarbons.
It is often contained in ppb (by weight) to several hundred ppb (by weight). Fluids other than hydrocarbons from which arsenic is removed using the adsorbent according to the present invention include, for example, exhaust gas containing arsenic or arsenic compounds discharged from the semiconductor electronics industry or other chemical industries, or exhaust gases used as raw materials for semiconductors. Examples include crude phosphine gas containing arsenic hydride as an impurity. Adsorbent The adsorbent used in the present invention is an adsorbent in which copper oxide, particularly cupric oxide, is supported on a carrier. Specific examples of the carrier used include silica, alumina, silica-alumina, activated carbon, diatomaceous earth, activated clay, and magnesia, among which alumina is particularly preferred. Such a carrier has a pore volume of 0.20 ml/g or more with a pore radius of 40 to 300 Å, and a specific surface area of 40 to 300 Å.
It is preferable that it is 200 m 2 /g or more. In the arsenic removal adsorbent according to the present invention, the copper content is
The content is 30 to 55% by weight, particularly preferably 35 to 50% by weight. If the copper content is less than 30% by weight, the arsenic removal ability will be poor, and if the copper content exceeds 55% by weight,
This is not preferable because not only the pore volume decreases but also the strength of the adsorbent decreases. The arsenic removal adsorbent according to the present invention has a pore radius of 40 to
The pore volume of 300 Å is 0.12 ml/g or more, especially the pore volume of 40 to 300 Å radius is 0.14 ml/g.
It is preferable that it is above. Further, the arsenic removal adsorbent according to the present invention has a specific surface area of 100 m 2 /g or more, and preferably 120 m 2 /g or more. The pore volume with a pore radius of 40 to 300 Å is less than 0.12 ml/g, and this specific surface area is
If it is less than 100 m 2 /g, the arsenic adsorption rate will be poor.
As a result, when this adsorbent is used in a flow system, its arsenic adsorption capacity decreases even if the copper content is high, which is not preferable. Such an adsorbent is produced by, for example, mixing an aqueous solution of copper sulfate and copper nitrate with an aqueous sodium hydroxide solution, adding a carrier, stirring well, recovering by filtration, drying, and pulverizing processes, and then molding it into a predetermined shape using a molding machine. It is prepared by molding it into the shape of. Contact Conditions The contact between the fluid containing arsenic or its compound and the adsorbent can be appropriately selected from conventionally known methods. For example, a method in which the fluid and the adsorbent are brought into contact in a gas phase or a liquid phase using a fixed bed method, a moving bed method, a fluidized bed method, etc. can be employed. In some cases, the fluid and adsorbent can also be brought into contact in a batch manner. The contact time between the fluid and adsorbent is 1 to 1 in gas hourly space velocity (GHSV) when contacting in the gas phase.
1000 hours -1 is preferably about 100 to 800 hours -1 , and when contact is made in the liquid phase, the liquid hourly space velocity (L.
HSV) from 0.01 to 20 hours -1 preferably from 1 to 10 hours
It is about -1 . Moreover, the temperature at the time of contact is about 0 to 100°C. Effects of the Invention According to the method of the present invention, highly concentrated arsenic in a fluid can be removed with a high removal rate using a small amount of adsorbent. Moreover, no pre-treatment equipment is particularly required for removal, and furthermore, no post-treatment equipment other than a strainer is required. Furthermore, even if highly reactive olefins are contained in the hydrocarbon from which arsenic or arsenic compounds are removed, problems such as polymerization of these olefins will not occur during the removal of arsenic or arsenic compounds. It will be done. EXAMPLES The present invention will be explained below with reference to Examples, but the present invention is not limited to these Examples. Note that the percentages in the examples are based on weight unless otherwise specified. Example 1 The adsorbent has a copper content of 41% and a pore radius of 40~
An arsenic removal adsorbent having a pore volume of 300 Å of 0.140 ml/g and a specific surface area of 140 m 2 /g was prepared. The above adsorbent 5 was transferred to a fixed bed reactor (8 mmφ×
100mm), naphtha containing 220ppb arsenic, and tributylarsine as the arsenic amount.
Add 1000ppb and liquid hourly space velocity (LHSV) for 5 hours
-1 Oil passed at room temperature. After arsenic has been removed in this way, the naphtha has a total oil flow rate of 20,000/-
The adsorbent contained 24 ppb of arsenic, and the arsenic removal rate was 98%. Example 2 The following composition was produced as a by-product from a fluidized bed catalytic cracker.
Hydrogen arsenide was removed using a raw material gas consisting of C3 fraction. Propylene 69.4 mol% Propane 30.2 C 2 fraction 0.2 C 4 fraction 0.2 Hydrogen arsenide 500 ppb 2 ml of the adsorbent used in Example 1 was packed into a fixed bed reactor (7 mmφ x 46 mm). The above raw material gas was circulated at room temperature and pressure at a gas hourly space velocity (GHSV) of 500 hours -1 . After hydrogen arsenide has been removed in this way, the total aeration amount in the raw gas is 1×10 7
/- adsorbent contained 10 ppb of hydrogen arsenide, and the removal rate of hydrogen arsenide was 98%. Example 3 Raw material gas is produced as a by-product from a fluidized bed catalytic cracker
Hydrogen arsenide removal treatment was carried out in the same manner as in Example 2, except that nitrogen gas containing 1.07% by volume of hydrogen arsenide was used instead of the C 3 fraction. When the hydrogen arsenide concentration in the fixed bed reactor outlet gas reached 5 mol ppm, ventilation of the hydrogen arsenide-containing gas was stopped (throughflow breakthrough point), and the arsenic adsorption capacity was determined using the following formula. Arsenic adsorption capacity (%) = Arsenic content in adsorbent (%) x Amount of adsorbent after aeration (%) / Amount of adsorbent before aeration (
%) The results are shown in Table 1. Comparative Example 1 Commercially available adsorbent manufactured by JGC Chemical Co., Ltd., product name N-
Hydrogen arsenide removal treatment was carried out in the same manner as in Example 2 except that 202D was used. After hydrogen arsenide has been removed in this way, the total aeration amount in the raw gas is 5×10 6 /
- The adsorbent contained 10 ppb of hydrogen arsenide, and the removal rate of hydrogen arsenide was 98%. However, when the total aeration amount was 1×10 7 /− adsorbent, 500 ppb of hydrogen arsenide was contained, and hydrogen arsenide breakthrough was observed. Comparative Example 2 Hydrogen arsenide was removed in the same manner as in Example 3, except that commercially available adsorbents (13 types) were used. Table 1 shows the name of the adsorbent, the copper content of the adsorbent, the pore volume with a pore radius of 40 to 300 Å, the specific surface area of the adsorbent,
The adsorbent composition and arsenic adsorption capacity are shown.
【表】
第1表より本発明に係る砒素の除去方法は安価
でしかも効率よく砒素化合物を除去できるととも
に、吸着剤寿命が長いことがわかる。Table 1 shows that the arsenic removal method according to the present invention can remove arsenic compounds at low cost and efficiently, and has a long adsorbent life.
Claims (1)
300Åの細孔容積が0.12ml/g以上であり、かつ
比表面積が100m2/g以上である、酸化銅が担体
に担持された吸着剤と、砒素を含有する流体と
を、接触させることを特徴とする流体中の砒素除
去方法。 2 酸化銅が酸化第二銅である特許請求の範囲第
1項に記載の方法。 3 担体がアルミナである特許請求の範囲第1項
または第2項に記載の方法。[Claims] 1. Contains 30 to 55% by weight of copper and has a pore radius of 40 to 55% by weight.
A fluid containing arsenic is brought into contact with an adsorbent in which copper oxide is supported on a carrier and has a pore volume of 300 Å of 0.12 ml/g or more and a specific surface area of 100 m 2 /g or more. Characteristic methods for removing arsenic from fluids. 2. The method according to claim 1, wherein the copper oxide is cupric oxide. 3. The method according to claim 1 or 2, wherein the support is alumina.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62117272A JPS63283725A (en) | 1987-05-14 | 1987-05-14 | Removing method for arsenic in fluid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62117272A JPS63283725A (en) | 1987-05-14 | 1987-05-14 | Removing method for arsenic in fluid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63283725A JPS63283725A (en) | 1988-11-21 |
| JPH0364166B2 true JPH0364166B2 (en) | 1991-10-04 |
Family
ID=14707651
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62117272A Granted JPS63283725A (en) | 1987-05-14 | 1987-05-14 | Removing method for arsenic in fluid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63283725A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2004274472B2 (en) * | 2003-09-19 | 2010-07-08 | University Of Wyoming | System and method for removing arsenite and arsenate from water |
| JP4909614B2 (en) * | 2006-03-28 | 2012-04-04 | 大陽日酸株式会社 | Method and apparatus for analyzing trace impurities in hydride gas |
-
1987
- 1987-05-14 JP JP62117272A patent/JPS63283725A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63283725A (en) | 1988-11-21 |
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