JPH0418408B2 - - Google Patents

Info

Publication number
JPH0418408B2
JPH0418408B2 JP56137962A JP13796281A JPH0418408B2 JP H0418408 B2 JPH0418408 B2 JP H0418408B2 JP 56137962 A JP56137962 A JP 56137962A JP 13796281 A JP13796281 A JP 13796281A JP H0418408 B2 JPH0418408 B2 JP H0418408B2
Authority
JP
Japan
Prior art keywords
cathode
torr
crystal
electron gun
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56137962A
Other languages
Japanese (ja)
Other versions
JPS5840729A (en
Inventor
Ryuichi Shimizu
Hirotoshi Hagiwara
Masaji Ishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP56137962A priority Critical patent/JPS5840729A/en
Publication of JPS5840729A publication Critical patent/JPS5840729A/en
Publication of JPH0418408B2 publication Critical patent/JPH0418408B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02Main electrodes
    • H01J1/13Solid thermionic cathodes
    • H01J1/15Cathodes heated directly by an electric current
    • H01J1/16Cathodes heated directly by an electric current characterised by the shape

Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Solid Thermionic Cathode (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Description

【発明の詳細な説明】 この発明は、単結晶ランタンボライド陰極とし
て備えた電子銃において、特定の結晶面からの高
輝度電子ビームを利用する電子銃の処理方法に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron gun processing method using a high-intensity electron beam from a specific crystal plane in an electron gun equipped with a single crystal lanthanum boride cathode.

単結晶ランタンボライドは、結晶の方位によつ
て仕事関数が異なることが知られており、仕事関
数の低い結晶面からの熱電子放射を有効に利用す
できであることが提唱されていた。しかし、先端
を尖がらせた単結晶ランタンボライド陰極チツプ
の軸方位を、仕事関数の低いと言われている<
210><110>方位などにして輝度測定を行つてみ
ると、<100>方位の輝度に比べて若干低い値しか
得られていない。
It is known that single-crystal lanthanum bolide has a work function that differs depending on the crystal orientation, and it has been proposed that thermionic radiation from crystal planes with a low work function can be effectively utilized. However, it is said that the axial orientation of the single crystal lanthanum boride cathode chip, which has a pointed tip, has a low work function.
When we measure the brightness in the 210><110> direction, we get a slightly lower value than the brightness in the <100> direction.

本発明は、電子銃を使用する都度予め単結晶ラ
ンタンボライド陰極をある一定の条件で真空熱処
理を行うことによつて、この処理条件に応じた特
定の結晶面からの放射電流が強大になることを知
見したことに基くものである。
In the present invention, each time an electron gun is used, a single-crystal lanthanum boride cathode is subjected to vacuum heat treatment under certain conditions, thereby increasing the radiation current from a specific crystal plane according to the treatment conditions. This is based on the knowledge that

即ち、電子銃に配設された単結晶ランタンボラ
イド陰極を使用前において、1×10-7Torr以下
の真空度で1500℃、60秒以上加熱処理を施すこと
によりその後210面からの電子放射を利用する
こと、同様に2×10-7Torr以上5×10-6Torr以
下の範囲の真空度で1500℃60秒以上加熱処理する
ことによつて310面からの電子放射を利用する
こと、及び5×10-6Torr以上で1000℃以上の使
用温度に加熱することによつて110面からの電
子放射を利用すようにした電子銃に関するもので
ある。
That is, by heating the single crystal lanthanum boride cathode installed in the electron gun at 1500°C for 60 seconds or more in a vacuum of 1×10 -7 Torr or less before use, electron emission from the 210 plane is eliminated. Similarly, using electron emission from the 310 plane by heat treatment at 1500°C for 60 seconds or more at a degree of vacuum in the range of 2 × 10 -7 Torr to 5 × 10 -6 Torr, The present invention also relates to an electron gun that utilizes electron radiation from the 110 plane by heating to a working temperature of 1000° C. or higher at 5×10 −6 Torr or higher.

以下に実施例をもとにして詳細に説明する。 A detailed explanation will be given below based on examples.

直径2mm、長さ10mmの単結晶ランタンボライド
の長手方向を<110>方位にして、先端を半球状
に機械研磨して、半球部分を陰極尖端として配置
し1、タンタルコイル2で間接的に加熱した。第
1カバー3、第2カバー4はタンタルコイルから
漏れる光及び熱電子を防いでエミツシヨンパター
ンを観察しやすくしたものである。ガラス製の半
球ドーム5の内側には導電性の螢光塗料6を塗布
して放射された電子ビームのパターンが観察でき
る様にされている。この装置によつてガラス球面
上に投影されたスポツトの中心角とステレオ投影
図のそれにあたる角度を比較することにより、ス
ポツトがどの電子銃に対応するものか判定でき
る。この装置を使つて真空度と加熱処理条件を変
えて実験を行つた結果、真空熱処理条件とその後
の高輝度ビームの放射面との関係は以下のようで
あつた。
The longitudinal direction of a single crystal lanthanum boride with a diameter of 2 mm and a length of 10 mm is set in the <110> direction, the tip is mechanically polished into a hemispherical shape, and the hemispherical part is placed as a cathode tip. Heated. The first cover 3 and the second cover 4 prevent light and thermoelectrons from leaking from the tantalum coil, making it easier to observe the emission pattern. The inside of the hemispherical dome 5 made of glass is coated with conductive fluorescent paint 6 so that the pattern of the emitted electron beam can be observed. By comparing the central angle of the spot projected onto the glass spherical surface by this device with the corresponding angle in the stereo projection view, it is possible to determine which electron gun the spot corresponds to. As a result of conducting experiments using this apparatus while varying the degree of vacuum and heat treatment conditions, the relationship between the vacuum heat treatment conditions and the subsequent radiation surface of the high-intensity beam was as follows.

実施例 1 1×10-7Torr以下の真空度で1500℃、60秒間
加熱して単結晶ランタンボライド表面の不純物を
除去してから、90分後1050℃に保つと、第2図の
ステレオ投影図に示すように210面に相当する
個所に輝度の高い点が現われた。これは何回繰返
しても同様のエミツシヨンパターンが得られるこ
とから、1×10-7Torr以下の真空度で1500℃60
秒間以上加熱することにより210面からの電子
放射を利用することが有利であることが判る。
Example 1 When impurities on the surface of single crystal lanthanum boride are removed by heating at 1500°C for 60 seconds in a vacuum below 1×10 -7 Torr, and after 90 minutes, the temperature is kept at 1050°C, the stereo as shown in Figure 2 is produced. As shown in the projection diagram, a point with high brightness appeared at a location corresponding to the 210th plane. Since the same emission pattern can be obtained no matter how many times this is repeated, it is possible to obtain the same emission pattern no matter how many times it is repeated.
It turns out that it is advantageous to utilize the electron emission from the 210 plane by heating for more than a second.

上記以外の条件、例えば真空度が10-6Torr程
度、または真空度が1×10-7Torrであつても陰
極温度が1400℃であるとき、更に処理時間が60秒
に満たない場合は210面に相当する箇所に輝度
の高い点は現れないことが確認された。
Under conditions other than the above, for example, when the degree of vacuum is around 10 -6 Torr, or when the degree of vacuum is 1 x 10 -7 Torr but the cathode temperature is 1400°C, and if the processing time is less than 60 seconds, It was confirmed that no high brightness points appeared in the area corresponding to the surface.

実施例 2 2×10-7Torr以上、5×10-6Torr以下の範囲
の真空度で1500℃、60秒加熱してから、2×
10-5Torrの真空度にして1050℃に保つと、第3
図のステレオ投影図に示すように輝度の高い点は
310面と固定できた。
Example 2 Heating at 1500°C for 60 seconds at a vacuum level of 2×10 -7 Torr or more and 5×10 -6 Torr or less, then 2×
When the vacuum level is 10 -5 Torr and the temperature is kept at 1050℃, the third
As shown in the stereo projection diagram in the figure, the points with high brightness could be fixed at 310 planes.

真空度を1×10-7Torr、又は1×10-5Torrと
し、或は陰極温度だけを1400℃とすると、310
面からの強いエミツシヨンは得られなかつた。
If the degree of vacuum is 1×10 -7 Torr or 1×10 -5 Torr, or if only the cathode temperature is 1400℃, then 310
I couldn't get a strong emission from the front.

実施例 3 5×10-6Torr以上の真空条件で1050℃、10時
間加熱した後1×10-7Torr以下の真空下で使用
温度1050℃に保つとエミツシヨンパターンが変
り、輝度の高い点は第4図のステレオ投影図に示
すように110面と同定された。
Example 3 After heating at 1050℃ for 10 hours under a vacuum condition of 5×10 -6 Torr or more, the emission pattern changes and the luminance becomes high when the temperature is kept at 1050℃ under a vacuum of 1×10 -7 Torr or less. The point was identified as plane 110, as shown in the stereo projection diagram of FIG.

上記以外の処理条件では110面の高輝度ビー
ムは得られなかつた。
Under processing conditions other than the above, a high-intensity beam of 110 planes could not be obtained.

以上の各々の実験において、エミツシヨンパタ
ーンを観察する時の陰極温度を1050℃に設定した
理由は螢光面の輝き具合が最も適当であつて、観
察しやすかつたからでありもつと陰極温度を高く
した場合でも各々の真空熱処理条件に対応した結
晶面からの電子放射が観察された。
In each of the above experiments, the cathode temperature was set at 1050°C when observing the emission pattern because the brightness of the fluorescent surface was most appropriate and it was easy to observe. Even when the temperature was increased, electron emission from the crystal planes corresponding to each vacuum heat treatment condition was observed.

実施例1、2、3に示した様な真空熱処理を行
つたものは、未処理のものに比べて全放射電流が
10倍以上になつた。この様な放射電流の増加は陰
極表面に吸着した気体分子によるものと考えられ
る。
Those subjected to vacuum heat treatment as shown in Examples 1, 2, and 3 have a lower total radiation current than those without treatment.
It has increased more than 10 times. This increase in radiation current is thought to be due to gas molecules adsorbed on the cathode surface.

実施例1の場合には210面に、実施例2は3
10面に、実施例3は110面に各々水素、ヘリ
ウム、酸素の吸着が認められた。すなわち、これ
らの吸着した気体分子が放射電流の増加に寄与し
ていることは明らかである。
In the case of Example 1, there are 210 faces, and in Example 2, there are 3 faces.
Adsorption of hydrogen, helium, and oxygen was observed on the 10th surface, and on the 110th surface of Example 3, respectively. That is, it is clear that these adsorbed gas molecules contribute to an increase in the radiation current.

以上に明らかな如く、事前処理操作によつて高
輝度ビームを放射する結晶面を特定することが可
能であり、これにより利用する結晶面を陰極チツ
プの実質面に電子放射する部分の一部に存在する
ように構成した電子銃を提供できるのである。
As is clear from the above, it is possible to specify the crystal plane that emits a high-intensity beam through pre-processing operations, and this allows the crystal plane to be used to be part of the part that emits electrons onto the substantial surface of the cathode chip. Therefore, it is possible to provide an electron gun configured to exist.

例えば軸方位が<210>で先端を円錐状に尖が
らせたチツプや角錐面の一部に210面が存在す
るチツプの場合は1×10-7Torr以下の真空度で
1500℃、60秒間加熱する事前処理操作によつて従
来法では得られなかつた高輝度電子ビームを発生
させこれを利用することができるのである。
For example, in the case of a chip with an axial orientation of <210> and a conically pointed tip, or a chip with a 210 facet on a part of the pyramidal surface, a vacuum of 1×10 -7 Torr or less is required.
By pre-treatment heating at 1500°C for 60 seconds, it is possible to generate and utilize a high-intensity electron beam that cannot be obtained using conventional methods.

また、例えば先端に310結晶平面を形成させ
たものは実施例2のような処理条件の操作を施す
ことによつて電子ビーム溶接機など真空度の良く
ない装置でも陰極温度を低くして高電流密度のビ
ームが得られるから陰極の寿命を長く使用できる
のである。
In addition, for example, a device with a 310 crystal plane formed at the tip can lower the cathode temperature and produce high current even in equipment with poor vacuum, such as an electron beam welder, by manipulating the processing conditions as in Example 2. Since a high-density beam can be obtained, the cathode can be used for a long time.

なお、本発明における事前加熱処理の効果は永
久に維持される効果ではない。
Note that the effect of the preheating treatment in the present invention is not an effect that is maintained forever.

放射電流の増加に寄与している水素、ヘリウ
ム、酸素などの気体分子の吸着が何らかの原因で
失なわれたとき、即ち電子ビームの出力が弱くな
つたときには再度同様の条件での処理が必要であ
る。
When the adsorption of gas molecules such as hydrogen, helium, and oxygen that contribute to the increase in radiation current is lost for some reason, that is, when the output of the electron beam becomes weak, it is necessary to repeat the process under the same conditions. be.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の特定結晶面の変化に基くエミ
ツシヨンパターンを観察した装置。第2図乃至第
4図は夫々高輝度スポツトのステレオ投影図であ
る。 1は単結晶ランタンボライド陰極、5は螢光塗
料を塗布したガラスドーム。
FIG. 1 is an apparatus for observing emission patterns based on changes in specific crystal planes according to the present invention. FIGS. 2 to 4 are stereo projection diagrams of high-intensity spots, respectively. 1 is a single crystal lanthanum boride cathode, and 5 is a glass dome coated with fluorescent paint.

Claims (1)

【特許請求の範囲】 1 単結晶ランタンボライド陰極を備えた電子銃
を使用するに当り、前記陰極を予め1×
10-7Torr以下、1500℃、60秒以上で真空熱処理
し210の結晶面からの電子放射のみを利用する
ようにしたことを特徴とする単結晶ランタンボラ
イド陰極を備えた高輝度電子銃の処理方法。 2 単結晶ランタンボライド陰極を備えた電子銃
を使用するに当り、前記陰極を予め2×
10-7Torr以上、5×10-6Torr以下で1500℃、60
秒以上で真空熱処理し、310の結晶面からの電
子放射のみを利用するようにしたことを特徴とす
る単結晶ランタンボライド陰極を備えた高輝度電
子銃の処理方法。 3 単結晶ランタンボライド陰極を備えた電子銃
を使用するに当り、前記陰極を予め5×
10-6Torr以上、1000℃以上の温度で10時間以上
真空熱処理し110の結晶面からの電子放射のみ
を利用するようにしたことを特徴とする単結晶ラ
ンタンボライド陰極を備えた高輝度電子銃の処理
方法。
[Claims] 1. When using an electron gun equipped with a single-crystal lanthanum boride cathode, the cathode must be
A high-brightness electron gun equipped with a single-crystal lanthanum boride cathode characterized by being vacuum heat-treated at 10 -7 Torr or less at 1500°C for 60 seconds or more to utilize only electron emission from 210 crystal planes. Processing method. 2. When using an electron gun equipped with a single-crystal lanthanum bolide cathode, the cathode must be
1500℃, 60 at 10 -7 Torr or more and 5 × 10 -6 Torr or less
A method for processing a high-intensity electron gun equipped with a single-crystal lanthanum boride cathode, characterized in that vacuum heat treatment is performed for more than a second, and only electron emission from 310 crystal planes is used. 3. When using an electron gun equipped with a single-crystal lanthanum bolide cathode, the cathode must be
High brightness electrons equipped with a single-crystal lanthanum boride cathode characterized by being subjected to vacuum heat treatment at a temperature of 10 -6 Torr or higher and 1000°C or higher for 10 hours or more to utilize only electron emission from 110 crystal planes. How to dispose of guns.
JP56137962A 1981-09-02 1981-09-02 High brightness utilizing method from single crystal lanthanum boride cathode Granted JPS5840729A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56137962A JPS5840729A (en) 1981-09-02 1981-09-02 High brightness utilizing method from single crystal lanthanum boride cathode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56137962A JPS5840729A (en) 1981-09-02 1981-09-02 High brightness utilizing method from single crystal lanthanum boride cathode

Publications (2)

Publication Number Publication Date
JPS5840729A JPS5840729A (en) 1983-03-09
JPH0418408B2 true JPH0418408B2 (en) 1992-03-27

Family

ID=15210789

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56137962A Granted JPS5840729A (en) 1981-09-02 1981-09-02 High brightness utilizing method from single crystal lanthanum boride cathode

Country Status (1)

Country Link
JP (1) JPS5840729A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001325910A (en) * 2000-05-16 2001-11-22 Denki Kagaku Kogyo Kk Electron gun and how to use it

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5684841A (en) * 1979-12-13 1981-07-10 Denki Kagaku Kogyo Kk Electron gun
JPS5686433A (en) * 1979-12-17 1981-07-14 Denki Kagaku Kogyo Kk High brightness electron gun
JPS5691363A (en) * 1979-12-26 1981-07-24 Toshiba Corp Use of electron gun and electron beam device

Also Published As

Publication number Publication date
JPS5840729A (en) 1983-03-09

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