JPH0453242B2 - - Google Patents
Info
- Publication number
- JPH0453242B2 JPH0453242B2 JP59206415A JP20641584A JPH0453242B2 JP H0453242 B2 JPH0453242 B2 JP H0453242B2 JP 59206415 A JP59206415 A JP 59206415A JP 20641584 A JP20641584 A JP 20641584A JP H0453242 B2 JPH0453242 B2 JP H0453242B2
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- light
- lens
- optical path
- path length
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02062—Active error reduction, i.e. varying with time
- G01B9/02064—Active error reduction, i.e. varying with time by particular adjustment of coherence gate, i.e. adjusting position of zero path difference in low coherence interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/35—Mechanical variable delay line
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/45—Multiple detectors for detecting interferometer signals
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Description
【発明の詳細な説明】
(発明の利用分野)
本発明は、光線を反射する二つの被検面、例え
ばレンズの両面の間の光路長を、光の干渉を利用
して測定する光路長測定装置に関するものであ
る。Detailed Description of the Invention (Field of Application of the Invention) The present invention relates to optical path length measurement, which uses light interference to measure the optical path length between two test surfaces that reflect light rays, such as both surfaces of a lens. It is related to the device.
(発明の背景)
従来、レンズ面の位置やレンズの中心厚を測定
する装置として、リニアエンコーダを内蔵した、
第7図に示されるような測長機がある。1は被検
面であるレンズ面を有するレンズ、2は垂直に移
動可能なスピンドル、3はスピンドル2に取り付
けられた光学的なリニアスケール、4は架台、5
は架台4に取り付けられ、リニアスケール3の変
位量を読み取るセンサ、6はスピンドル3が精度
よく、且つ滑らかに移動できるように支持するベ
アリング、7は載物台面である。なお、リニアス
ケール3、センサ5及びセンサ5の出力を処理
し、リニアスケール3の変位量を表示する電子回
路から成るものをリニアエンコーダと称してい
る。(Background of the Invention) Conventionally, devices with a built-in linear encoder have been used to measure the position of the lens surface and the center thickness of the lens.
There is a length measuring machine as shown in Fig. 7. 1 is a lens having a lens surface that is a surface to be inspected; 2 is a vertically movable spindle; 3 is an optical linear scale attached to the spindle 2; 4 is a mount; 5
A sensor is attached to the pedestal 4 and reads the amount of displacement of the linear scale 3, 6 is a bearing that supports the spindle 3 so that it can move accurately and smoothly, and 7 is a stage surface. Note that the linear encoder is composed of the linear scale 3, the sensor 5, and an electronic circuit that processes the output of the sensor 5 and displays the amount of displacement of the linear scale 3.
レンズ1の上面の位置或いは中心厚を測定する
場合、まず載物台面7にレンズ1が載つていない
状態で、スピンドル2を載物台面7まで下げ、そ
の時のリニアエンコーダの表示値を零にセツトす
る。次にスピンドル2を十分上に上げ、レンズ1
を載物台面7に置き、スピンドル2をレンズ1の
上面まで下げる。その時のリニアエンコーダの表
示値がレンズ1の上面の位置、即ち第7図のよう
に両凸レンズの場合はレンズ1の中心厚を示す。 When measuring the position or center thickness of the upper surface of the lens 1, first lower the spindle 2 to the stage surface 7 with the lens 1 not placed on the stage surface 7, and then set the displayed value of the linear encoder to zero. Set. Next, raise spindle 2 sufficiently high and
is placed on the stage surface 7, and the spindle 2 is lowered to the upper surface of the lens 1. The value displayed by the linear encoder at that time indicates the position of the upper surface of the lens 1, that is, the center thickness of the lens 1 in the case of a biconvex lens as shown in FIG.
第7図図示の測長機の問題点は、接触式である
ため、被検面にきずをつけやすいこと、スピンド
ル2の先端と被検面又は載物台面7との間に接触
圧による弾性変形が生じ、測定誤差を発生するこ
と、更には、被検物の内面が測定不可能のため、
例えば貼り合わせレンズの貼り合わせ面と表面と
の距離、又は複数レンズを組み合わせたレンズ系
での空気間隔を測定することができないこと、な
どである。 The problem with the length measuring machine shown in FIG. 7 is that it is a contact type, so it is easy to scratch the surface to be measured, and there is elasticity due to contact pressure between the tip of the spindle 2 and the surface to be measured or the stage surface 7. Deformation may occur, causing measurement errors, and furthermore, the inner surface of the test object cannot be measured.
For example, it is impossible to measure the distance between the bonded surface and the surface of a bonded lens, or the air gap in a lens system that combines multiple lenses.
一方、非接触方法としては、光切断法、三角測
量法、被検面に焦点を結ぶレンズ位置の移動量を
測る方法があるが、これらはすべて、被検物の内
面を被検面として測定する場合には、常に被検物
の表面の形状に依存し、その形状を正確に知らな
いと、測定できないという大きな問題点をもつて
いる。また、光を利用する測定方法の場合、測定
装置と被検面との間の空気のゆらぎが測定精度に
影響するという問題点もある。 On the other hand, non-contact methods include the light cutting method, the triangulation method, and the method of measuring the amount of movement of the lens position that focuses on the test surface, but all of these methods measure the inner surface of the test object as the test surface. In this case, it always depends on the shape of the surface of the object to be tested, and there is a big problem that measurement cannot be performed unless the shape is accurately known. In addition, in the case of a measurement method that uses light, there is a problem in that fluctuations in the air between the measurement device and the surface to be measured affect measurement accuracy.
(発明の目的)
本発明の目的は、上述した問題点を解決し、被
検面と接触せず、被検面の表面の形状に本質的に
依存せず、しかも測定精度が装置と被検面との間
の空気のゆらぎに影響されない光路長測定装置を
提供することである。(Objective of the Invention) An object of the present invention is to solve the above-mentioned problems, to avoid contact with the test surface, to be essentially independent of the surface shape of the test surface, and to improve measurement accuracy between the device and the test surface. An object of the present invention is to provide an optical path length measuring device that is not affected by air fluctuations between the optical path length and the surface.
(発明の特徴)
上記目的を達成するために、本発明は、可干渉
距離の短い光源と、該光源の光束を平行光束とす
るコリメート光学系と、該コリメート光学系の平
行光束を二つの互いに偏光方位の異なる光束に分
割する光束分割手段と、分割された第1の平行光
束の光路長を変化させる光路長可変手段及び第1
の平行光束を第1の被検面上に集光し、第1の被
検面からの反射光束を再び平行光束とするピント
調整可能な第1の対物レンズを有する第1光学系
と、該第1の対物レンズに関してピント状態を確
認するための第1ピント確認手段と、前記光路長
可変手段による光路長の変化量を測長する測長手
段と、分割された第2の平行光束を第2の被検面
上に集光し、第2の被検面からの反射光束を再び
平行光束とするピント調整可能な第2の対物レン
ズを有する第2光学系と、該第2の対物レンズに
関してピント状態を確認するための第2ピント確
認手段と、前記第1光学系から前記第1の被検面
に入射かつ反射した光を前記第1光学系に戻し、
かつ前記第2光学系から前記第2の被検面に入射
かつ反射した光を前記第2光学系に戻すべく、偏
光方位に応じて光束を分離する分離手段と、前記
第1光学系と第2光学系をそれぞれ通つた平行光
束を再び重ね合わせる光束合成手段と、重なり合
つた平行光束の干渉縞の可視度の特定点を見い出
すための干渉縞読取り手段とを備えたことを特徴
としている。(Features of the Invention) In order to achieve the above object, the present invention provides a light source with a short coherence length, a collimating optical system that converts the light beam of the light source into a parallel light beam, and a collimating optical system that converts the parallel light beam of the collimating optical system into two mutually parallel light beams. a beam splitting means for splitting the beam into beams with different polarization directions; an optical path length variable means for changing the optical path length of the divided first parallel beam; and a first
a first optical system having a focus-adjustable first objective lens that focuses a parallel light beam on a first test surface and converts a reflected light flux from the first test surface into a parallel light flux; a first focus confirmation means for confirming the focus state of the first objective lens; a length measurement means for measuring the amount of change in the optical path length by the optical path length variable means; a second optical system having a focus-adjustable second objective lens that focuses light onto the second test surface and converts the reflected light beam from the second test surface into a parallel light beam; and the second objective lens. a second focus confirmation means for confirming a focus state with respect to the first optical system; and returning light that is incident on and reflected from the first optical system to the first test surface to the first optical system;
and a separating means for separating a light beam according to a polarization direction in order to return the light incident on and reflected from the second test surface from the second optical system to the second optical system; It is characterized by comprising a beam combining means for re-superimposing the parallel beams passing through the two optical systems, and an interference fringe reading means for finding a specific point of visibility of the interference fringes of the overlapping parallel beams.
(発明の実施例)
光源の発光スペクトル線の幅の測定方法とし
て、マイケルソンの干渉計により光路差に対する
可視度曲線を得、それから計算により求める方法
は、古くから知られている。本発明はこの原理を
光路長測定に応用できるように工夫したものであ
る。(Embodiments of the Invention) As a method for measuring the width of the emission spectrum line of a light source, a method has long been known in which a visibility curve for optical path difference is obtained using a Michelson interferometer and then calculated. The present invention is devised so that this principle can be applied to optical path length measurement.
第1図Aは本発明の一実施例の光学系を示し、
第1図Bは干渉測長器の1部を第1図Aから90゜
回転した面で示す。偏光方向、移動方向などの説
明上、第1図Aに示した直交座標系を原則的に使
用する。即ち、右をz軸、上をy軸、紙面から下
へx軸とする。但し、光軸がz,y軸の軸上にな
く、斜めになつている干渉縞読取り手段は光軸方
向をy軸、紙面から下へx軸とした。 FIG. 1A shows an optical system according to an embodiment of the present invention,
FIG. 1B shows a portion of the interferometric length measuring device in a plane rotated by 90 degrees from FIG. 1A. In order to explain the polarization direction, movement direction, etc., the orthogonal coordinate system shown in FIG. 1A will be used in principle. That is, the right side is the z-axis, the top is the y-axis, and the bottom from the paper is the x-axis. However, in the interference fringe reading means whose optical axis is not on the z and y axes but is oblique, the optical axis direction is the y axis, and the x axis is downward from the plane of the paper.
8は光源、9は熱線吸収フイルタ、10は集光
レンズ、11はピンホール、12はコリメータ、
13は光源8のスペクトル幅、形状を整えるバン
ドパスフイルタである。光源8、熱線吸収フイル
タ9及びバンドパスフイルタ12は、可干渉距離
の短い、即ち光束のスペクトル幅のある程度広い
光源を構成する。可干渉距離の短い光源とはレー
ザとの対比で表現されたもので、レーザの可干渉
距離が通常100mm以上であるのに対し、本発明に
用いられる光源の可干渉距離は例えば1mm程度以
下、波長との比較でいえば1波長の1000倍程度以
下である。スペクトルがガウス型で、その中心波
長を550nmとした時、可視度が1/2となる光路差
を5μmとするためには、そのスペクトルの半値
幅は27nmとなる。即ち、ハロゲン電球と干渉フ
イルタを使えば、適した光源が簡単に得られる。
しかし、光源の1点しか使用しないため、輝度が
高く、発光効率の高い発光ダイオードを使うのが
好ましい。 8 is a light source, 9 is a heat ray absorption filter, 10 is a condensing lens, 11 is a pinhole, 12 is a collimator,
13 is a bandpass filter that adjusts the spectral width and shape of the light source 8. The light source 8, the heat ray absorption filter 9, and the bandpass filter 12 constitute a light source with a short coherence length, that is, a light beam whose spectral width is wide to some extent. A light source with a short coherence length is expressed in comparison with a laser, and while the coherence length of a laser is usually 100 mm or more, the coherence length of the light source used in the present invention is, for example, about 1 mm or less. In comparison with wavelength, it is about 1000 times or less than one wavelength. When the spectrum is Gaussian and its center wavelength is 550 nm, the half-width of the spectrum is 27 nm in order to set the optical path difference at which the visibility is 1/2 to be 5 μm. In other words, a suitable light source can be easily obtained using a halogen bulb and an interference filter.
However, since only one light source is used, it is preferable to use a light emitting diode with high brightness and high luminous efficiency.
14は偏光方位がx軸及びy軸に対して45゜で
ある偏光板、15は光源8の光量変動を監視する
ために且つ被検面からの反射光を検出するために
一部反射させるビームスプリツタ、16はレン
ズ、17は光電素子、18は全反射ミラー、19
は、入射光を偏光方位が直交する二つの偏光光束
に分割し、平行に出射する偏光ビームスプリツ
タ、20a,20bは直交した二面に全反射膜を
つけた直角プリズム型ミラー、21aは、y軸方
向に移動可能に配置され、駆動手段を有するコー
ナキユーブ、21bは、コーナキユーブ21aと
同様にy軸方向に移動可能に配置され、駆動手段
及びその移動量を測長する測長回路を有するか或
いは固定されたコーナキユーブ、22a,22
b,23a,23bはレンズで、レンズ1の被検
面に平行光束をスポツト状に集光する対物レンズ
24a,24bを構成する。レンズ23a,23
bは単独でz軸方向に、レンズ22a,23a及
びレンズ22b,23bは一体となつてz軸方向
に、それぞれ移動可能になつており、被検面上に
ピントが合うように調整される。25は偏光ビー
ムスプリツタ19と同様な偏光ビームスプリツタ
である。直角プリズム型ミラー20a、コーナキ
ユーブ21a、対物レンズ24aにより第1光学
系が構成され、偏光ビームスプリツタ19の一
部、直角プリズム型ミラー20b、コーナキユー
ブ21b、対物レンズ24bにより第2光学系が
構成される。 14 is a polarizing plate whose polarization direction is 45 degrees with respect to the x-axis and y-axis; 15 is a beam beam that is partially reflected in order to monitor the variation in the light intensity of the light source 8 and to detect the reflected light from the test surface. 16 is a lens, 17 is a photoelectric element, 18 is a total reflection mirror, 19
is a polarized beam splitter that splits the incident light into two polarized beams whose polarization directions are orthogonal and outputs them in parallel; 20a and 20b are right-angle prism mirrors with total reflection films on two orthogonal surfaces; 21a is a The corner cube 21b, which is arranged to be movable in the y-axis direction and has a driving means, is arranged to be movable in the y-axis direction similarly to the corner cube 21a, and has a driving means and a length measuring circuit for measuring the length of the movement thereof. or fixed corner cubes, 22a, 22
Lenses b, 23a, and 23b constitute objective lenses 24a and 24b that converge a parallel beam of light onto the surface to be measured of the lens 1 in the form of a spot. Lenses 23a, 23
b is movable individually in the z-axis direction, and lenses 22a, 23a and lenses 22b, 23b are movable together in the z-axis direction, and are adjusted so as to be in focus on the surface to be inspected. 25 is a polarizing beam splitter similar to the polarizing beam splitter 19. A first optical system is constituted by the right-angle prism type mirror 20a, a corner cube 21a, and an objective lens 24a, and a second optical system is constituted by a part of the polarizing beam splitter 19, a right-angle prism type mirror 20b, a corner cube 21b, and an objective lens 24b. Ru.
26は対物レンズ24a,24bにより被検面
上に平行光束がスポツトとなつているかどうかを
監視するモニタ光学系に若干の光束を導くビーム
スプリツタ、27,28,29は前記モニタ光学
系を構成するレンズ、光束折曲げミラー及び接眼
レンズ、30は位相の進む方位をx軸又はz軸に
対して45゜とした1/4波長板、31は集光レンズ、
32はビームスプリツタ、33は偏光ビームスプ
リツタ、34,35は光電素子、36は偏光ビー
ムスプリツタ、37,38は光電素子である。偏
光ビームスプリツタ33及び光電素子34,35
は、一体となつてy軸まわりに回転調整可能にな
つていて、第1光学系の光路長と第2光学系の光
路長とが等しい時に光電素子34の出力信号がピ
ークとなるような回転角に調整され、その位置で
光電素子34は偏光方位0゜の偏光成分を検出し、
光電素子35は偏光方位90゜の偏光成分を検出す
る。偏光ビームスプリツタ36及び光電素子3
7,38は、一体となつてz軸まわりに回転調整
可能になつていて、光電素子38が偏光方位45°
の偏光成分を検出し、光電素子38が偏光方位
135゜の偏光成分を検出するような回転角に調整さ
れる。 Reference numeral 26 denotes a beam splitter that guides some light flux to a monitor optical system that monitors whether or not a parallel light flux forms a spot on the surface to be inspected using objective lenses 24a and 24b, and 27, 28, and 29 constitute the monitor optical system. 30 is a quarter-wave plate with the direction in which the phase advances at 45 degrees with respect to the x-axis or z-axis; 31 is a condenser lens;
32 is a beam splitter, 33 is a polarizing beam splitter, 34 and 35 are photoelectric elements, 36 is a polarizing beam splitter, and 37 and 38 are photoelectric elements. Polarizing beam splitter 33 and photoelectric elements 34, 35
are integrally rotatable around the y-axis, and are rotated such that the output signal of the photoelectric element 34 reaches its peak when the optical path length of the first optical system and the optical path length of the second optical system are equal. The photoelectric element 34 detects a polarized light component with a polarization direction of 0° at that position.
The photoelectric element 35 detects a polarized light component with a polarization direction of 90°. Polarizing beam splitter 36 and photoelectric element 3
7 and 38 are integrated and can be rotated around the z-axis, so that the photoelectric element 38 has a polarization direction of 45°.
The photoelectric element 38 detects the polarization component of
The rotation angle is adjusted to detect a 135° polarization component.
なお、偏光板14の偏光方位について、第1光
学系の全体の透過率と第2光学系の全体の透過率
との比が1の場合は、偏光方位は45゜がよいが、
1以上又は1以下の場合には、第1光学系と第2
光学系の(入射光量×透過率)が等しくなるよう
に、偏光方位を回転できることが好ましい。 Regarding the polarization direction of the polarizing plate 14, if the ratio of the overall transmittance of the first optical system to the entire transmittance of the second optical system is 1, the polarization direction is preferably 45 degrees.
In the case of 1 or more or 1 or less, the first optical system and the second optical system
It is preferable that the polarization direction can be rotated so that (amount of incident light x transmittance) of the optical system becomes equal.
コーナキユーブ21aの移動量は干渉測長器3
9により測長される。干渉測長器39について説
明すると、40は可干渉距離の長いレーザで、コ
ンパクトにする意味で半導体レーザが好ましい
が、He−Neガスレーザ等に置き換えることがで
きる。41はレンズ、42は偏光方位がx軸及び
y軸に45゜にセツトされた偏光板、43は反射光
をコーナキユーブ21bに入射させるように配置
された偏光ビームスプリツタ、44は反射光をコ
ーナキユーブ21aに入射させるように配置され
た全反射ミラーである。コーナキユーブ21a,
21bの入射、出射位置は頂点に対して対称にな
るため、反射光は平行に位置ずれして出射し、第
1図Bに示されるように全反射ミラー44及び偏
光ビームスプリツタ43を通り、全反射ミラー4
5により干渉縞測定光学系に入射する。この干渉
縞測定光学系は1/4波長板46、集光レンズ47、
ビームスプリツタ48、偏光ビームスプリツタ4
9、光電素子50,51、偏光ビームスプリツタ
52、光電素子53,54から成り、干渉縞読取
り手段を構成する1/4波長板30〜光電素子38
と同様である。干渉測長器39は光電素子50,
51,53,54の出力信号を処理する信号処理
回路(図示せず)を備え、この信号処理回路によ
りコーナキユーブ21aの移動量yをレーザ40
の波長の整数分の1の単位で計数する。したがつ
て、この計数値を換算することにより移動量yが
得られる。 The amount of movement of the corner cube 21a is determined by the interferometer 3.
The length is measured by 9. Regarding the interferometric length measuring device 39, 40 is a laser with a long coherence distance, and a semiconductor laser is preferable in terms of compactness, but it can be replaced with a He--Ne gas laser or the like. 41 is a lens; 42 is a polarizing plate whose polarization direction is set at 45 degrees to the x-axis and y-axis; 43 is a polarizing beam splitter arranged to make the reflected light enter the corner cube 21b; and 44 is the polarizing beam splitter that directs the reflected light to the corner cube 21b. This is a total reflection mirror arranged so as to make the light incident on 21a. Corner cube 21a,
Since the input and output positions of 21b are symmetrical with respect to the apex, the reflected light is emitted with a parallel positional shift and passes through the total reflection mirror 44 and the polarizing beam splitter 43 as shown in FIG. 1B. Total reflection mirror 4
5 to enter the interference fringe measurement optical system. This interference fringe measurement optical system includes a 1/4 wavelength plate 46, a condensing lens 47,
Beam splitter 48, polarizing beam splitter 4
9. 1/4 wavelength plate 30 to photoelectric element 38, which consist of photoelectric elements 50, 51, polarizing beam splitter 52, and photoelectric elements 53, 54, and constitute interference fringe reading means.
It is similar to The interferometric length measuring device 39 includes a photoelectric element 50,
A signal processing circuit (not shown) is provided for processing the output signals of the corners 51, 53, and 54, and this signal processing circuit determines the movement amount y of the corner cube 21a by the laser 40.
Count in integer fractions of the wavelength. Therefore, the movement amount y can be obtained by converting this count value.
光電素子17,34,35,37,38及び干
渉測長器39からそれぞれ出力される信号は、信
号処理系により処理されるが、その信号処理系の
一例は第2図に示される通りである。 The signals output from the photoelectric elements 17, 34, 35, 37, 38 and the interferometric length measuring device 39 are processed by a signal processing system, and an example of the signal processing system is shown in FIG. .
レンズ1の両レンズ面間の光路長を測定する場
合の測定手順を説明すると、まず対物レンズ24
a,24bのピントがレンズ1の前側レンズ面に
合うように眼で接眼レンズ29から観測しながら
調整する。次に、コーナキユーブ21aを移動さ
せることにより、第1光学系と第2光学系の光路
長を一致させ、その時のコーナキユーブ21aの
移動量y0を光路長測定の原点とする。その後、対
物レンズ24aのみのピントをレンズ1の後側レ
ンズ面に合わせ、コーナキユーブ21aを移動さ
せ、第1光学系と第2光学系の光路長が一致する
までの移動量y1を測長する。レンズ1の両レンズ
面間の光路長δは|y1−y0|で求まり、また、レ
ンズ1の屈折率をnとすれば、厚さdは|y1−y0
|/nとなる。 To explain the measurement procedure when measuring the optical path length between both lens surfaces of the lens 1, first, the objective lens 24
A, 24b are focused on the front lens surface of the lens 1 by adjusting while observing with the eye through the eyepiece 29. Next, by moving the corner cube 21a, the optical path lengths of the first optical system and the second optical system are made to match, and the amount of movement y 0 of the corner cube 21a at that time is taken as the origin of the optical path length measurement. After that, focus only the objective lens 24a on the rear lens surface of the lens 1, move the corner cube 21a, and measure the amount of movement y 1 until the optical path lengths of the first optical system and the second optical system match. . The optical path length δ between both lens surfaces of the lens 1 is determined by |y 1 −y 0 |, and if the refractive index of the lens 1 is n, the thickness d is |y 1 −y 0
|/n.
次に動作について説明する。 Next, the operation will be explained.
光源8からバンドパスフイルタ13までの構成
によつて、可干渉距離の短い平行光束がつくり出
される。この平行光束は偏光板14によりx軸及
びy軸に対して45゜の方位をもつ偏光光束となる。
偏光ビームスプリツタ19で反射された光束はx
軸方向に偏光方位をもち、直角プリズム型ミラー
20a、コーナキユーブ21a、対物レンズ24
a、偏光ビームスプリツタ25を通つてレンズ1
の被検面で反射し、同じ経路を通つて偏光ビーム
スプリツタ19で反射される。他方、偏光ビーム
スプリツタ19を透過した光束はy軸方向に偏光
方位をもち、直角プリズム型ミラー20b、コー
ナキユーブ21b、対物レンズ24b、偏光ビー
ムスプリツタ25を通つてレンズ1の被検面で反
射し、同じ経路を通つて偏光ビームスプリツタ1
9を透過する。 The configuration from the light source 8 to the bandpass filter 13 creates a parallel light beam with a short coherence distance. This parallel light beam becomes a polarized light beam having an orientation of 45 degrees with respect to the x-axis and the y-axis by the polarizing plate 14.
The luminous flux reflected by the polarizing beam splitter 19 is x
It has a polarization direction in the axial direction, a right-angle prism type mirror 20a, a corner cube 21a, and an objective lens 24.
a, through the polarizing beam splitter 25 to the lens 1
The beam is reflected by the surface to be inspected, and is reflected by the polarizing beam splitter 19 through the same path. On the other hand, the light beam transmitted through the polarizing beam splitter 19 has a polarization direction in the y-axis direction, passes through the right-angle prism type mirror 20b, the corner cube 21b, the objective lens 24b, and the polarizing beam splitter 25, and is reflected on the test surface of the lens 1. and polarizing beam splitter 1 through the same path.
Transmits 9.
偏光ビームスプリツタ19から出射される二つ
の直交する直線偏光の光束は、1/4波長板30に
入ると、右回り及び左回りの二つの円偏光とな
り、その合成は単に直線偏光となり、その方位が
第1光学系と第2光学系の光路差により変化す
る。そして、全光量に対する直線偏光の割合(強
度)は可視度に比例し、したがつて、光路差によ
り変化する。この直線偏光の強度及び方位は光電
素子34,35,37,38により検出される。
なお、偏光方位0゜と180゜とは全く同一方向を示す
ため、光電素子34などの出力信号の位相は偏光
方位の2倍となる。例えば、偏光方位180゜が信号
位相の360゜に対応する。したがつて、光電素子3
4,35の出力信号の位相差及び光電素子37,
38の出力信号の位相差は180゜、光電素子34,
37の出力信号の位相差及び光電素子35,38
の出力信号の位相差は90゜である。 When the two orthogonal linearly polarized beams emitted from the polarizing beam splitter 19 enter the quarter-wave plate 30, they become two clockwise and counterclockwise circularly polarized beams, and their combination simply becomes linearly polarized light. The orientation changes depending on the optical path difference between the first optical system and the second optical system. The ratio (intensity) of linearly polarized light to the total amount of light is proportional to visibility, and therefore changes depending on the optical path difference. The intensity and orientation of this linearly polarized light are detected by photoelectric elements 34, 35, 37, and 38.
Note that since the polarization directions of 0° and 180° indicate exactly the same direction, the phase of the output signal from the photoelectric element 34 etc. is twice the polarization direction. For example, a polarization direction of 180° corresponds to a signal phase of 360°. Therefore, photoelectric element 3
4, 35 output signal phase difference and photoelectric element 37,
The phase difference of the output signal of 38 is 180°, and the photoelectric element 34,
37 output signal phase difference and photoelectric elements 35, 38
The phase difference of the output signals is 90°.
第2図に示される信号処理系において、光電素
子17は光源8の光量変動モニタ信号Cを、光電
素子34は0゜相の偏光強度信号A1を、光電素子3
5は180゜相の偏光強度信号A2を、光電素子37は
90゜相の偏光強度信号B1を、光電素子38は270゜
相の偏光強度信号B2を、それぞれ出力し、干渉
測長器39はコーナキユーブ21aの移動量yを
測長し、出力する。 In the signal processing system shown in FIG. 2, the photoelectric element 17 receives the light amount fluctuation monitor signal C of the light source 8, the photoelectric element 34 receives the 0° phase polarization intensity signal A1 , and the photoelectric element 34 receives the 0° phase polarization intensity signal A1.
5 is a 180° phase polarized light intensity signal A2 , and a photoelectric element 37 is
The photoelectric element 38 outputs a polarized light intensity signal B 1 of 90° phase and the polarized light intensity signal B 2 of 270° phase, respectively, and the interferometric length measuring device 39 measures and outputs the moving amount y of the corner cube 21a.
各信号は増幅器55〜59によりオフセツト及
びゲイン調整をされる。その結果、増幅器56に
より増幅された偏光強度信号A1の電圧Vを縦軸
にとり、コーナキユーブ21aの移動量y或いは
コーナキユーブ21aを等速度で移動させた時は
時間tを横軸にとると、第3図のようになる。振
幅の一番大きい移動量y0(y1)が光路差零の時で、
可視度のピークに一致する。一方、オシロスコー
プで横軸に正弦波、縦軸に余弦波を入れると、そ
の軌跡が第4図のように円を描くことはよく知ら
れている。正弦波と余弦波は90゜位相がずれたも
のであるから、偏光強度信号A1の振幅を求める
方法としては、偏光強度信号A1と90゜位相のずれ
た偏光強度信号B1とを使い、それぞれを2乗し
て加算すれば、振幅の2乗が得られる。 Each signal is offset and gain adjusted by amplifiers 55-59. As a result, if we take the voltage V of the polarized light intensity signal A 1 amplified by the amplifier 56 on the vertical axis, and take the amount of movement y of the corner cube 21a or the time t when the corner cube 21a is moved at a constant speed on the horizontal axis, then It will look like Figure 3. When the movement amount y 0 (y 1 ) with the largest amplitude is zero optical path difference,
Coincident with peak visibility. On the other hand, it is well known that when an oscilloscope is used to plot a sine wave on the horizontal axis and a cosine wave on the vertical axis, the locus will draw a circle as shown in Figure 4. Since the sine wave and the cosine wave are out of phase by 90 degrees, the method to find the amplitude of the polarization intensity signal A 1 is to use the polarization intensity signal A 1 and the polarization intensity signal B 1 which are out of phase by 90 degrees. , respectively, and add them to obtain the square of the amplitude.
しかし、第3図から分かるように、偏光強度信
号A1及びB1は振動の中心が0ではなく、V0にな
つている。光量は負のエネルギをもたないからで
ある。直流分V0を0にする方法として簡単なの
が偏光強度信号A1,B1から一定電圧V0を引くこ
とであるが、直流分V0は、光源8の光量変動だ
けでなしに、対物レンズ24a,24bのピント
調整や被検面の反射率等にも依存するため、この
方法は賢明ではない。そこで、第2図では、偏光
強度信号A1から180゜位相のずれた偏光強度信号
A2を減算回路60により減算する。同様に、偏
光強度信号B1から180゜位相のずれた偏光強度信号
B2を減算回路61により減算する。次に、割算
回路62,63により(A1−A2)、(B1−B2)を
それぞれ光量変動モニタ信号Cで割算し、光量変
動を補正する。割算回路62,63の出力信号を
A,Bとする。信号A,Bをそれぞれ乗算回路6
4,65により2乗してから加算回路66により
加えると、第5図に示されるように、光路差が零
となる移動量y0(y1)のところにピークをもつ山
型の曲線が得られる。これが可視度曲線を2乗し
たものに対応する。 However, as can be seen from FIG. 3, the center of vibration of the polarized light intensity signals A 1 and B 1 is not at 0 but at V 0 . This is because the amount of light does not have negative energy. A simple way to reduce the DC component V 0 to 0 is to subtract a constant voltage V 0 from the polarized light intensity signals A 1 and B 1 . This method is not wise because it depends on the focus adjustment of the lenses 24a and 24b, the reflectance of the surface to be measured, and the like. Therefore, in Figure 2, the polarized light intensity signal is 180° out of phase from the polarized light intensity signal A1 .
A 2 is subtracted by the subtraction circuit 60. Similarly, the polarization intensity signal is 180° out of phase from the polarization intensity signal B 1 .
B 2 is subtracted by the subtraction circuit 61. Next, the division circuits 62 and 63 divide (A 1 -A 2 ) and (B 1 -B 2 ) by the light amount fluctuation monitor signal C, respectively, to correct the light amount fluctuation. Let A and B be the output signals of the division circuits 62 and 63. Multiplying circuit 6 for signals A and B respectively
4,65 and then added by the addition circuit 66 , as shown in FIG . can get. This corresponds to the visibility curve squared.
信号(A2+B2)はノイズ除去のためのフイル
タ67を通つた後、微分回路68により第6図A
のような波形に微分される。t0は移動量y0(y1)
に相当する時間であり、ゼロクロス点である。パ
ルス発生回路69は時間t0で第6図Bに示される
パルスP0を発生する。一方、波形整形回路70
は信号(A2+B2)のレベルがしきい値Lt以上の
時にハイレベルの信号をゲート71に送り、これ
を開く。これにより、パルスP0はゲート71を
通る。 After the signal (A 2 +B 2 ) passes through a filter 67 for removing noise, it is converted to the signal A in FIG. 6 by a differentiating circuit 68.
It is differentiated into a waveform like . t 0 is the amount of movement y 0 (y 1 )
This is the time corresponding to , and is the zero crossing point. Pulse generating circuit 69 generates pulse P 0 shown in FIG. 6B at time t 0 . On the other hand, the waveform shaping circuit 70
sends a high level signal to the gate 71 to open it when the level of the signal (A 2 +B 2 ) is above the threshold Lt. This causes the pulse P 0 to pass through the gate 71.
測定動作中、コーナキユーブ21aは第1光学
系と第2光学系の光路差を零にする方向に移動さ
れ、その移動量yが干渉測長器39によつて測長
されて、出力されているが、通常はゲート72が
閉じているので、メモリ73には入力されない。
第1光学系と第2光学系の光路差が零になると、
パルスP0が発生し、このパルスP0がゲート72
を開くので、その時の移動量y0又はy1がメモリ7
3に入力し、光路長測定の原点又は光路長として
記憶される。 During the measurement operation, the corner cube 21a is moved in a direction that makes the optical path difference between the first optical system and the second optical system zero, and the length y of the movement is measured by the interference length measuring device 39 and output. However, since the gate 72 is normally closed, the signal is not input to the memory 73.
When the optical path difference between the first optical system and the second optical system becomes zero,
A pulse P 0 is generated, and this pulse P 0 is applied to the gate 72.
Since it is opened, the amount of movement y 0 or y 1 at that time is stored in memory 7.
3 and is stored as the origin or optical path length of optical path length measurement.
以上説明したのは、可視度のピークを検出した
時の移動量y0又はy1を測定するものであるが、可
視度曲線の変曲点を利用して移動量y0又はy1を測
定することもできる。第5図に示される可視度の
2乗曲線を2回微分する。第6図Cに示される曲
線となり、可視度の2乗曲線の二つの変曲点でゼ
ロクロスする。このゼロクロス点t01,t02でパル
スP01,P02を発生させ、それぞれの時点での移動
量y01,y02を記憶し、y0=(y01+y02)/2を計算
すれば、移動量y0が得られる。また、同様にして
移動量y1が得られる。 The method explained above measures the amount of movement y 0 or y 1 when the peak of visibility is detected, but the amount of movement y 0 or y 1 is measured using the inflection point of the visibility curve. You can also. The squared visibility curve shown in FIG. 5 is differentiated twice. The curve becomes the one shown in FIG. 6C, which crosses zero at two inflection points of the visibility squared curve. Generate pulses P 01 and P 02 at these zero cross points t 01 and t 02 , memorize the movement amounts y 01 and y 02 at each time, and calculate y 0 = (y 01 + y 02 )/2. , the amount of movement y 0 is obtained. Further, the movement amount y 1 can be obtained in the same manner.
本実施例によれば、被検面にスポツト光を当て
る非接触式であるから、非検面にきずをつけた
り、弾性変形を生じさせたりすることを防ぐこと
ができる。また、貼り合わせレンズの貼り合わせ
面と表面との距離や複数レンズの空気間隔を測定
することができる。更に、被検面がレンズの内面
のような場合でも、第1及び第2光学系の光路長
はレンズ表面の曲率半径により影響を受けること
はないので、測定を簡単にすることができる。 According to this embodiment, since it is a non-contact method in which the spot light is applied to the surface to be inspected, it is possible to prevent the surface not to be inspected from being scratched or elastically deformed. Furthermore, it is possible to measure the distance between the bonded surface and the surface of a bonded lens and the air spacing between multiple lenses. Furthermore, even when the surface to be measured is the inner surface of a lens, the optical path lengths of the first and second optical systems are not affected by the radius of curvature of the lens surface, making the measurement simple.
第1光学系と第2光学系の光路中に共に本装置
と被検面の間の空間が含まれるので、該空間での
空気のゆらぎによる影響を相殺することができ
る。 Since the space between the present apparatus and the surface to be inspected is included in the optical paths of both the first optical system and the second optical system, the influence of air fluctuations in the space can be canceled out.
本実施例では、コーナキユーブ21aの移動量
yを測長するのに干渉測長器39を用いているの
で、下記の利点がある。 In this embodiment, since the interferometric length measuring device 39 is used to measure the moving amount y of the corner cube 21a, there are the following advantages.
(1) コーナキユーブ21aによる光路長変化の移
動軸と測長軸とが同一であるから、コーナキユ
ーブ21aの移動量にアツベエラーが生じな
い。(1) Since the axis of movement of the optical path length change by the corner cube 21a and the length measurement axis are the same, no Atsube error occurs in the amount of movement of the corner cube 21a.
(2) 干渉測長器39も光路長変化を測定してお
り、外乱即ち空気の温度、気圧変化による空気
の屈折率変化が可視度測定と共通であるから、
光路長変化そのものを正確に測定することがで
きる。(2) The interferometric length measuring device 39 also measures changes in optical path length, and changes in the refractive index of the air due to disturbances, that is, changes in air temperature and pressure, are common to visibility measurements.
The optical path length change itself can be measured accurately.
(3) コンパクトになる。(3) Become more compact.
(発明と実施例の対応)
光源8、熱線吸収フイルタ9及びバンドパスフ
イルタ13が本発明の可干渉距離の短い光源に相
当し、集光レンズ10、ピンホール11及びコリ
メータ13がコリメート光学系に相当し、偏光ビ
ームスプリツタ19が光束分割手段及び光束合成
手段に相当し、コーナキユーブ21aが光路長可
変手段に相当し、偏光ビームスプリツタ25が分
離手段に相当し、ビームスプリツタ26、レンズ
27、光束折曲げミラー28及び接眼レンズ29
が第1及び第2ピント確認手段に相当し、干渉測
長器39が測長手段に相当し、1/4波長板30か
ら光電素子38まで及び増幅器55からゲート7
1までが干渉縞読取り手段に相当する。(Correspondence between the invention and the embodiments) The light source 8, heat ray absorption filter 9, and bandpass filter 13 correspond to a light source with a short coherence length of the present invention, and the condenser lens 10, pinhole 11, and collimator 13 correspond to a collimating optical system. The polarizing beam splitter 19 corresponds to the beam splitting means and the beam combining means, the corner cube 21a corresponds to the optical path length variable means, the polarizing beam splitter 25 corresponds to the separating means, the beam splitter 26, and the lens 27. , a light beam bending mirror 28 and an eyepiece lens 29
correspond to the first and second focus confirmation means, the interferometric length measuring device 39 corresponds to the length measuring means, and the distance from the 1/4 wavelength plate 30 to the photoelectric element 38 and from the amplifier 55 to the gate 7
1 corresponds to the interference fringe reading means.
(変形例)
干渉縞読取り手段としては、図示実施例のもの
に限定されるものではなく、公知の種々の手段に
代えることができる。(Modification) The interference fringe reading means is not limited to that shown in the illustrated embodiment, and may be replaced by various known means.
また、可視度のピークを見い出すのは人間の眼
で行うようにしてもよい。その場合、光電素子3
4の代わりに人間の眼を置き、コーナキユーブ2
1aをy方向に移動させながら一番可視度がよく
なつた時の干渉測長器39の測長値を読み取る。
精度向上、自動化に対しては得策ではないが、簡
単で、安価な装置となる利点がある。 Alternatively, finding the peak visibility may be performed using the human eye. In that case, the photoelectric element 3
Place human eyes in place of 4, corner cube 2
While moving 1a in the y direction, the length value measured by the interferometric length measuring device 39 is read when the visibility is the best.
Although it is not a good idea for accuracy improvement or automation, it has the advantage of being a simple and inexpensive device.
図示実施例では、光の波長があるスペクトル幅
をもつた一つのみであるホモダイン干渉式となつ
ているが、第1光学系と第2光学系とで若干波長
を変化させるヘテロダイン干渉式にすることがで
きる。 In the illustrated embodiment, a homodyne interference type is used in which the wavelength of light is only one with a certain spectral width, but a heterodyne interference type is used in which the wavelength is slightly changed between the first optical system and the second optical system. be able to.
第1及び第2光学系にコーナキユーブ21a,
21bを用いているが、レンズと凹面又は凸面か
ら構成されるキヤツツアイなどに代えることがで
きる。 Corner cube 21a in the first and second optical systems,
21b, but it can be replaced with a cat's eye made of a lens and a concave or convex surface.
第1光学系の光路長を変化させるために、光路
中の媒質の屈折率を変えるようにしてもよい。特
に、ガラス厚を測定する場合、標準の厚みのガラ
スをそのまま入れることにより、光路長を機械的
に変化させる量を減らすことができる。 In order to change the optical path length of the first optical system, the refractive index of the medium in the optical path may be changed. In particular, when measuring glass thickness, by inserting glass of standard thickness as is, it is possible to reduce the amount of mechanical change in the optical path length.
偏光ビームスプリツタ19が光束分割手段と光
束合成手段を兼用しているが、別々の手段を用い
ることができる。 Although the polarizing beam splitter 19 serves both as a beam splitting means and a beam combining means, separate means can be used.
図示実施例では、ピント調整可能な対物レンズ
24a,24bを光軸方向にのみ移動させて被検
面に集光させることによつて、装置側の第1及び
第2光学系の光路長を変化させないようにしてい
るが、光路長の既知な他の対物レンズに交換し、
それによる光路長の変化を計算により補正するよ
うにしてもよい。対物レンズ24a,24bに自
動焦点機構を備えることが可能である。 In the illustrated embodiment, the optical path lengths of the first and second optical systems on the apparatus side are changed by moving the focus-adjustable objective lenses 24a and 24b only in the optical axis direction and focusing the light on the test surface. However, I replaced it with another objective lens with a known optical path length.
The resulting change in optical path length may be corrected by calculation. It is possible to provide the objective lenses 24a, 24b with an automatic focusing mechanism.
(発明の効果)
以上説明したように、本発明によれば、被検面
と接触せずに、且つ被検面の表面の形状に本質的
に依存せずに、光路長を測定することができる。
しかも、測定精度を装置と被検面との間の空気の
ゆらぎに影響されないようにすることができる。(Effects of the Invention) As explained above, according to the present invention, it is possible to measure the optical path length without contacting the surface to be measured and essentially independent of the shape of the surface of the surface to be measured. can.
Furthermore, measurement accuracy can be made unaffected by fluctuations in the air between the device and the surface to be measured.
第1図A,Bは本発明の一実施例の光学系を示
す平面図及びその干渉測長器の一部の正面図、第
2図は本発明の一実施例の信号処理系を示すブロ
ツク図、第3図は偏光強度信号の波形を示す図、
第4図は偏光強度信号の振幅を示す図、第5図は
可視度の2乗曲線を示す図、第6図は信号処理中
の波形を示す図、第7図は従来の測長機を示す図
である。
1……レンズ、8……光源、9……熱線吸収フ
イルタ、10……集光レンズ、11……ピンホー
ル、12……コリメータ、13……バンドパスフ
イルタ、14……偏光板、17,34,35,3
7,38……光電素子、19,25,35,36
……偏光ビームスプリツタ、20a,20b……
直角プリズム型ミラー、21a,21b……コー
ナキユーブ、24a,24b……対物レンズ、2
6……ビームスプリツタ、27……レンズ、28
……光束折曲げミラー、29……接眼レンズ、3
0……1/4波長板、32……ビームスプリツタ、
39……干渉測長器。
1A and 1B are a plan view showing an optical system according to an embodiment of the present invention and a front view of a part of the interferometer, and FIG. 2 is a block diagram showing a signal processing system according to an embodiment of the present invention. Figure 3 is a diagram showing the waveform of the polarized light intensity signal,
Figure 4 shows the amplitude of the polarized light intensity signal, Figure 5 shows the visibility squared curve, Figure 6 shows the waveform during signal processing, and Figure 7 shows a conventional length measuring machine. FIG. 1... Lens, 8... Light source, 9... Heat ray absorption filter, 10... Condensing lens, 11... Pinhole, 12... Collimator, 13... Band pass filter, 14... Polarizing plate, 17, 34, 35, 3
7, 38...Photoelectric element, 19, 25, 35, 36
...Polarizing beam splitter, 20a, 20b...
Right angle prism type mirror, 21a, 21b...corner cube, 24a, 24b...objective lens, 2
6... Beam splitter, 27... Lens, 28
...Light beam bending mirror, 29...Eyepiece, 3
0...1/4 wavelength plate, 32...beam splitter,
39...Interferometric length measuring device.
Claims (1)
行光束とするコリメート光学系と、該コリメート
光学系の平行光束を二つの互いに偏光方位の異な
る光束に分割する光束分割手段と、分割された第
1の平行光束の光路長を変化させる光路長可変手
段及び第1の平行光束を第1の被検面上に集光
し、第1の被検面からの反射光束を再び平行光束
とするピント調整可能な第1の対物レンズを有す
る第1光学系と、該第1の対物レンズに関してピ
ント状態を確認するための第1ピント確認手段
と、前記光路長可変手段による光路長の変化量を
測長する測長手段と、分割された第2の平行光束
を第2の被検面上に集光し、第2の被検面からの
反射光束を再び平行光束とするピント調整可能な
第2の対物レンズを有する第2光学系と、該第2
の対物レンズに関してピント状態を確認するため
の第2ピント確認手段と、前記第1光学系から前
記第1の被検面に入射かつ反射した光を前記第1
光学系に戻し、かつ前記第2光学系から前記第2
の被検面に入射かつ反射した光を前記第2光学系
に戻すべく、偏光方位に応じて光束を分離する分
離手段と、前記第1光学系と第2光学系をそれぞ
れ通つた平行光束を再び重ね合わせる光束合成手
段と、重なり合つた平行光束の干渉縞の可視度の
特定点を見い出すための干渉縞読取り手段とを備
えた光路長測定装置。 2 前記第1及び第2ピント確認手段は共通の接
眼レンズを有する特許請求の範囲第1項記載の光
路長測定装置。[Claims] 1. A light source with a short coherence length, a collimating optical system that converts the light beam of the light source into a parallel beam, and a beam splitting system that divides the parallel beam of the collimating optical system into two beams with different polarization directions. means, an optical path length variable means for changing the optical path length of the divided first parallel light beam, and a means for condensing the first parallel light beam onto a first test surface, and a light beam reflected from the first test surface. a first optical system having a focus-adjustable first objective lens that converts the beam into a parallel beam of light again; a first focus confirmation means for confirming the focus state of the first objective lens; a length measuring means for measuring the amount of change in the optical path length; and a length measuring means for condensing the divided second parallel light beam onto a second test surface, and converting the reflected light flux from the second test surface into a parallel light flux again. a second optical system having a second objective lens whose focus is adjustable;
a second focus confirmation means for confirming the focus state of the objective lens; and a second focus confirmation means for confirming the focus state of the objective lens;
back to the optical system, and from the second optical system to the second optical system.
In order to return the light incident on and reflected on the test surface to the second optical system, a separating means separates the light beam according to the polarization direction, and a parallel light beam that passes through the first optical system and the second optical system, respectively. An optical path length measuring device comprising a light beam combining means for re-superimposing the light beams, and an interference fringe reading means for finding a specific point of visibility of the interference fringes of the overlapping parallel light beams. 2. The optical path length measuring device according to claim 1, wherein the first and second focus confirmation means have a common eyepiece.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59206415A JPS6184506A (en) | 1984-10-03 | 1984-10-03 | Optical path length measuring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59206415A JPS6184506A (en) | 1984-10-03 | 1984-10-03 | Optical path length measuring device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6184506A JPS6184506A (en) | 1986-04-30 |
| JPH0453242B2 true JPH0453242B2 (en) | 1992-08-26 |
Family
ID=16522986
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59206415A Granted JPS6184506A (en) | 1984-10-03 | 1984-10-03 | Optical path length measuring device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6184506A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4233336C2 (en) * | 1992-10-05 | 2001-08-23 | Zeiss Carl | Method and device for detecting focus deposits |
| JP5188127B2 (en) * | 2007-09-14 | 2013-04-24 | キヤノン株式会社 | Absolute position measuring apparatus and measuring method |
-
1984
- 1984-10-03 JP JP59206415A patent/JPS6184506A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6184506A (en) | 1986-04-30 |
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