JPH0563139A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH0563139A
JPH0563139A JP3221917A JP22191791A JPH0563139A JP H0563139 A JPH0563139 A JP H0563139A JP 3221917 A JP3221917 A JP 3221917A JP 22191791 A JP22191791 A JP 22191791A JP H0563139 A JPH0563139 A JP H0563139A
Authority
JP
Japan
Prior art keywords
substrate
control circuit
capacitance
power chip
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3221917A
Other languages
Japanese (ja)
Inventor
Toru Hosen
徹 宝泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP3221917A priority Critical patent/JPH0563139A/en
Publication of JPH0563139A publication Critical patent/JPH0563139A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/05Insulated conductive substrates, e.g. insulated metal substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/14Structural association of two or more printed circuits
    • H05K1/142Arrangements of planar printed circuit boards in the same plane, e.g. auxiliary printed circuit insert mounted in a main printed circuit
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/531Shapes of wire connectors
    • H10W72/536Shapes of wire connectors the connected ends being ball-shaped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/531Shapes of wire connectors
    • H10W72/5363Shapes of wire connectors the connected ends being wedge-shaped

Landscapes

  • Inverter Devices (AREA)
  • Structures For Mounting Electric Components On Printed Circuit Boards (AREA)

Abstract

(57)【要約】 【目的】同じ基板上にパワーチップ,およびその制御回
路部品を実装してなるパワーデバイスを対象に、ノイズ
耐量の高い半導体装置を提供する。 【構成】金属絶縁基板1を回路基板として、パワーチッ
プ2, およびその制御回路を構成する電子部品3を基板
上に振り分け実装してなる半導体装置に対し、金属絶縁
基板における制御回路部品実装領域での基板絶縁層1b
の厚さDをパワーチップ実装領域の絶縁層厚さdよりも
厚く構成し、基板の絶縁層を誘電体とする金属ベース1
aと導体パターン1cとの間のキャパシタンスについ
て、制御回路部品の実装領域のキャパシタンスをパワー
チップの実装領域のキャパシタンスよりも小さくする。
これにより、外来ノイズに起因して制御回路に流れるパ
ルス電流が低減されてノイズ耐量が向上する。
(57) [Summary] [Object] To provide a semiconductor device having a high noise immunity for a power device in which a power chip and its control circuit component are mounted on the same substrate. [Structure] For a semiconductor device in which a power insulating chip 2 and electronic components 3 constituting a control circuit thereof are distributed and mounted on a substrate using a metal insulating substrate 1 as a circuit substrate, a control circuit component mounting area on the metal insulating substrate is provided. Substrate insulation layer 1b
Of the metal base 1 in which the thickness D of the substrate is thicker than the insulating layer thickness d of the power chip mounting region, and the insulating layer of the substrate is a dielectric.
Regarding the capacitance between a and the conductor pattern 1c, the capacitance in the mounting area of the control circuit component is made smaller than the capacitance in the mounting area of the power chip.
As a result, the pulse current flowing through the control circuit due to the external noise is reduced and the noise immunity is improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、例えばインバータ装置
に使用されるパワートランジスタモジュールなどのパワ
ーデバイスを実施対象とし、特に金属絶縁基板を回路基
板として、その基板上にパワーチップ, およびその制御
回路を構成する電子部品を振り分け実装してなる半導体
装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is applied to a power device such as a power transistor module used in, for example, an inverter device, and in particular, a metal insulating substrate is used as a circuit board, on which the power chip and its control circuit are provided. The present invention relates to a semiconductor device in which electronic components constituting the above are distributed and mounted.

【0002】[0002]

【従来の技術】まず、従来より実施されている頭記半導
体装置の構造を図3に示す。図において、1はアルミな
どの金属ベース1aにエポキシ系樹脂などの絶縁層1b
を成層し、その上に導体パターン(銅箔)1cを形成し
てなる金属絶縁基板、2はパワートランジスタなどのパ
ワーチップ、3はパワーチップ2の制御回路を構成する
各種の電子部品、4はパワーチップ2と導体パターン1
cとの間を接続するボンディングワイヤ、5はパッケー
ジであり、前記のパワーチップ2,電子部品3は一枚の
金属絶縁基板1の上に振り分けて導体パターン1cには
んだ付け接合されている。
2. Description of the Related Art First, the structure of a conventional semiconductor device is shown in FIG. In the figure, reference numeral 1 denotes a metal base 1a such as aluminum and an insulating layer 1b such as epoxy resin.
A metal insulating substrate on which a conductor pattern (copper foil) 1c is formed, 2 is a power chip such as a power transistor, 3 is various electronic parts constituting a control circuit of the power chip 2, and 4 is Power chip 2 and conductor pattern 1
Bonding wires 5 for connecting to the c are packages, and the power chip 2 and the electronic component 3 are distributed on one metal insulating substrate 1 and soldered to the conductor pattern 1c.

【0003】[0003]

【発明が解決しようとする課題】かかるパワーデバイス
は、インバータ装置などに組み込んで使用する場合に商
用電源などから侵入するノイズに対して誤動作すること
のない高いノイズ耐量が要求される。一方、パワーデバ
イスの製品についてのノイズ耐量を評価する方法として
一般にノイズ試験が実施されている。このノイズ試験は
入力端子とアース間に周波数の高いパルス電圧を印加し
て行われる。
Such a power device is required to have a high noise immunity so that it does not malfunction with respect to noise intruding from a commercial power source or the like when it is used by incorporating it in an inverter device or the like. On the other hand, a noise test is generally carried out as a method for evaluating the noise resistance of a power device product. This noise test is performed by applying a high frequency pulse voltage between the input terminal and ground.

【0004】ところで、図3に示した従来構造の半導体
装置に対しノイズ試験を行った場合には、金属絶縁基板
1の金属ベース1a(アース側) と導体パターン1cと
の間にはパルス電圧の印加に伴い、絶縁層1bを誘電体
とするキャパシタンスCにより、C×dV/dtで表される
パルス電流が流れる。この場合に、前記した金属絶縁基
板1の絶縁層1bには誘電率の高いエポキシ系樹脂が一
般に採用され、かつ絶縁層1bの厚さは高い伝熱性を確
保するために通常は85〜150μm程度と極薄いこと
から、パルス電流も大となる。しかも、このパルス電流
は導体パターン1cを通じて制御回路部を構成する電子
部品にも流れるため、電流が大であると導体パターン1
cの電圧ドロップにより制御回路の電圧バランスが崩れ
て回路が誤動作することがある。
By the way, when a noise test is conducted on the semiconductor device having the conventional structure shown in FIG. 3, a pulse voltage is applied between the metal base 1a (ground side) of the metal insulating substrate 1 and the conductor pattern 1c. Along with the application, a capacitance C having the insulating layer 1b as a dielectric causes a pulse current represented by C × dV / dt to flow. In this case, an epoxy resin having a high dielectric constant is generally used for the insulating layer 1b of the metal insulating substrate 1 described above, and the thickness of the insulating layer 1b is usually about 85 to 150 μm in order to ensure high heat conductivity. Since it is extremely thin, the pulse current also becomes large. Moreover, since this pulse current also flows through the conductor pattern 1c to the electronic components that form the control circuit section, if the current is large, the conductor pattern 1
The voltage drop of c may break the voltage balance of the control circuit and cause the circuit to malfunction.

【0005】本発明は上記の点にかんがみなされたもの
であり、前記の半導体装置を対象に、回路基板の構成を
改良して高いノイズ耐量が確保できるようにした半導体
装置を提供することを目的とする。
The present invention has been made in view of the above points, and it is an object of the present invention to provide a semiconductor device for the above-mentioned semiconductor device, in which the structure of a circuit board is improved to ensure a high noise immunity. And

【0006】[0006]

【課題を解決するための手段】上記目的は、本発明によ
り、基板の絶縁層を誘電体とする金属ベースと導体パタ
ーンとの間のキャパシタンスについて、制御回路部品の
実装領域のキャパシタンスがパワーチップの実装領域の
キャパシタンスよりも小となるように回路基板を構成す
ることにより達成される。ここで、制御回路部品の実装
領域に対するキャパシタンス低減化の具体的な手段とし
て、金属絶縁基板における制御回路部品の実装領域の絶
縁層厚さをパワーチップ実装領域の絶縁層厚さよりも厚
くする。あるいは、制御回路部品をセラミック基板の導
体パターン上に実装し、該セラミック基板をパワーチッ
プと並べて金属絶縁基板上に積層するなどの構成があ
る。
According to the present invention, the capacitance between the metal base having the insulating layer of the substrate as a dielectric and the conductive pattern is the capacitance of the mounting area of the control circuit component of the power chip. This is achieved by configuring the circuit board so that it is smaller than the capacitance of the mounting area. Here, as a specific means for reducing the capacitance with respect to the mounting region of the control circuit component, the insulating layer thickness of the mounting region of the control circuit component on the metal insulating substrate is made thicker than the insulating layer thickness of the power chip mounting region. Alternatively, there is a configuration in which the control circuit component is mounted on a conductor pattern of a ceramic substrate and the ceramic substrate is aligned with the power chip and laminated on a metal insulating substrate.

【0007】[0007]

【作用】上記の構成により、制御回路部品の実装領域で
は回路基板の金属ベースと導体パターンとの間に介在し
ている絶縁層(誘電体)の厚みがパワーチップ実装領域
と比べて厚く、その分だけキャパシタンスが小さくなっ
てパルス電圧の印加時に回路基板を流れる電流が減少す
る。したがって、外来ノイズによる制御回路の誤動作が
発生し難くなり、パワーデバイスのノイズ耐量が向上す
る。なお、制御回路の電子部品はパワーチップと比べて
通電に伴う発熱量が少ないので、回路基板の絶縁層が厚
くても何等支障はない。
With the above structure, the thickness of the insulating layer (dielectric) interposed between the metal base of the circuit board and the conductor pattern is thicker in the mounting area of the control circuit component than in the power chip mounting area. The capacitance is reduced by that amount and the current flowing through the circuit board is reduced when the pulse voltage is applied. Therefore, malfunction of the control circuit due to external noise is less likely to occur, and noise immunity of the power device is improved. Since the electronic components of the control circuit generate less heat when energized as compared with the power chip, there is no problem even if the insulating layer of the circuit board is thick.

【0008】[0008]

【実施例】以下本発明の実施例を図面に基づいて説明す
る。なお、各実施例において、図3に対応する同一部材
には同じ符号が付してある。 実施例1:図1は本発明の請求項2に対応する実施例を
示すものである。この実施例では、金属絶縁基板1につ
いて、パワーチップ2の制御回路を構成する電子部品3
を実装した領域の絶縁層(エポキシ系樹脂)1bの厚み
Dが、パワーチップ2の実装領域の絶縁層の厚みdより
も厚く形成されている。これにより、制御回路の電子部
品3の実装領域では、絶縁層1bを誘電体とした金属ベ
ース1aと導体パターン1cとの間のキャパシタンスが
パワーチップ2の実装領域のキャパシタンスに比べて小
さくなり、外来ノイズに対する耐量が向上する。
Embodiments of the present invention will be described below with reference to the drawings. In each embodiment, the same members corresponding to those in FIG. 3 are designated by the same reference numerals. Embodiment 1: FIG. 1 shows an embodiment corresponding to claim 2 of the present invention. In this embodiment, with respect to the metal insulating substrate 1, an electronic component 3 that constitutes a control circuit of the power chip 2 is used.
The thickness D of the insulating layer (epoxy resin) 1b in the mounting area is larger than the thickness d of the insulating layer in the mounting area of the power chip 2. As a result, in the mounting area of the electronic component 3 of the control circuit, the capacitance between the metal base 1a using the insulating layer 1b as a dielectric and the conductor pattern 1c becomes smaller than the capacitance of the mounting area of the power chip 2, and the external The resistance to noise is improved.

【0009】実施例2:図2は本発明の請求項3に対応
する実施例を示すものである。この実施例では、まず、
パワーデバイスの制御回路を構成する電子部品3が金属
絶縁基板1と別に用意したセラミック基板6の導体パタ
ーン6aに実装され、このセラミック基板6をパワーチ
ップ2に並べて金属絶縁基板1に積層し、接着剤7によ
り固着されている。このように金属絶縁基板1にセラミ
ック基板6を重ねてその上に電子部品3を実装した構成
により、実施例1と同様に制御回路部品3の実装領域の
キャパシタンスがパワーチップ2の実装領域のキャパシ
タンスと比べて小さくなる。
Embodiment 2 FIG. 2 shows an embodiment corresponding to claim 3 of the present invention. In this example, first,
An electronic component 3 forming a control circuit of a power device is mounted on a conductor pattern 6a of a ceramic substrate 6 prepared separately from the metal insulating substrate 1, the ceramic substrate 6 is arranged on the power chip 2 and laminated on the metal insulating substrate 1, and bonded. It is fixed by the agent 7. As described above, the capacitance of the mounting area of the control circuit component 3 is the same as the capacitance of the mounting area of the power chip 2 because the electronic component 3 is mounted on the ceramic substrate 6 on the metal insulating substrate 1. Is smaller than

【0010】[0010]

【発明の効果】以上述べたように本発明の構成によれ
ば、半導体装置の回路基板について、制御回路部品の実
装領域での基板絶縁層の層厚をパワーチップの実装領域
よりも厚くして構成したことにより、パワーチップに対
する高い放熱性を確保しつつ、しかも制御回路部品の実
装領域では、絶縁層を誘電体とした金属ベースと導体パ
ターンとの間のキャパシタンスが従来構造のものと比べ
て小さくなるので、外来ノイズに対する耐量を改善して
動作特性に対する信頼性の向上化が図れる。
As described above, according to the configuration of the present invention, in the circuit board of the semiconductor device, the layer thickness of the board insulating layer in the mounting area of the control circuit component is made thicker than the mounting area of the power chip. With this configuration, while ensuring high heat dissipation to the power chip, in the mounting area of the control circuit parts, the capacitance between the metal base with the insulating layer as a dielectric and the conductor pattern is better than that of the conventional structure. Since the size becomes smaller, the resistance to external noise can be improved and the reliability of the operating characteristics can be improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例1の構成断面図FIG. 1 is a configuration cross-sectional view of a first embodiment of the present invention.

【図2】本発明の実施例2の構成断面図FIG. 2 is a sectional view showing the configuration of a second embodiment of the present invention.

【図3】従来における半導体装置の構成断面図FIG. 3 is a sectional view showing the configuration of a conventional semiconductor device.

【符号の説明】[Explanation of symbols]

1 金属絶縁基板 1a 金属ベース 1b 絶縁層 1c 導体パターン 2 パワーチップ 3 電子部品 6 セラミック基板 1 Metal Insulation Substrate 1a Metal Base 1b Insulation Layer 1c Conductor Pattern 2 Power Chip 3 Electronic Component 6 Ceramic Substrate

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 H02M 7/48 Z 9181−5H H05K 1/18 S 9154−4E ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI Technical display location H02M 7/48 Z 9181-5H H05K 1/18 S 9154-4E

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】金属絶縁基板を回路基板として、パワーチ
ップ, およびその制御回路を構成する電子部品を基板上
に振り分け実装してなる半導体装置において、基板の絶
縁層を誘電体とする金属ベースと導体パターンとの間の
キャパシタンスについて、制御回路部品の実装領域のキ
ャパシタンスがパワーチップの実装領域のキャパシタン
スよりも小となるように回路基板を構成したことを特徴
とする半導体装置。
1. A semiconductor device in which a metal insulating substrate is used as a circuit substrate and electronic components constituting a power chip and its control circuit are distributed and mounted on the substrate, and a metal base having an insulating layer of the substrate as a dielectric is provided. A semiconductor device, wherein a circuit board is configured such that a capacitance in a mounting area of a control circuit component is smaller than a capacitance in a mounting area of a power chip with respect to a capacitance between the conductor pattern.
【請求項2】金属絶縁基板における制御回路部品の実装
領域の絶縁層厚さをパワーチップ実装領域の絶縁層厚さ
よりも厚くして構成したことを特徴とする請求項1記載
の半導体装置。
2. The semiconductor device according to claim 1, wherein the thickness of the insulating layer in the mounting region of the control circuit component on the metal insulating substrate is larger than the thickness of the insulating layer in the power chip mounting region.
【請求項3】制御回路部品をセラミック基板の導体パタ
ーン上に実装し、該セラミック基板をパワーチップと並
べて金属絶縁基板上に積層して構成したことを特徴とす
る請求項1記載の半導体装置。
3. The semiconductor device according to claim 1, wherein the control circuit component is mounted on a conductor pattern of a ceramic substrate, and the ceramic substrate is arranged side by side with a power chip and laminated on a metal insulating substrate.
JP3221917A 1991-09-03 1991-09-03 Semiconductor device Pending JPH0563139A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3221917A JPH0563139A (en) 1991-09-03 1991-09-03 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3221917A JPH0563139A (en) 1991-09-03 1991-09-03 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH0563139A true JPH0563139A (en) 1993-03-12

Family

ID=16774186

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3221917A Pending JPH0563139A (en) 1991-09-03 1991-09-03 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH0563139A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008112828A (en) * 2006-10-30 2008-05-15 Mitsubishi Electric Corp Semiconductor device using backside high voltage integrated circuit
JP2012156215A (en) * 2011-01-24 2012-08-16 Toyota Motor Corp Semiconductor element device
WO2023175701A1 (en) * 2022-03-15 2023-09-21 三菱電機株式会社 Semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008112828A (en) * 2006-10-30 2008-05-15 Mitsubishi Electric Corp Semiconductor device using backside high voltage integrated circuit
JP2012156215A (en) * 2011-01-24 2012-08-16 Toyota Motor Corp Semiconductor element device
WO2023175701A1 (en) * 2022-03-15 2023-09-21 三菱電機株式会社 Semiconductor device

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