JPH0564454B2 - - Google Patents

Info

Publication number
JPH0564454B2
JPH0564454B2 JP58177287A JP17728783A JPH0564454B2 JP H0564454 B2 JPH0564454 B2 JP H0564454B2 JP 58177287 A JP58177287 A JP 58177287A JP 17728783 A JP17728783 A JP 17728783A JP H0564454 B2 JPH0564454 B2 JP H0564454B2
Authority
JP
Japan
Prior art keywords
mask
holding
thin film
ray lithography
mask structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58177287A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6068340A (ja
Inventor
Hideo Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58177287A priority Critical patent/JPS6068340A/ja
Priority to DE19843435178 priority patent/DE3435178A1/de
Priority to GB8424302A priority patent/GB2148540A/en
Publication of JPS6068340A publication Critical patent/JPS6068340A/ja
Publication of JPH0564454B2 publication Critical patent/JPH0564454B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58177287A 1983-09-26 1983-09-26 Ｘ線リソグラフィー用マスク構造体の保持方法 Granted JPS6068340A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP58177287A JPS6068340A (ja) 1983-09-26 1983-09-26 Ｘ線リソグラフィー用マスク構造体の保持方法
DE19843435178 DE3435178A1 (de) 1983-09-26 1984-09-25 Gegenstand mit maskenstruktur fuer die lithografie
GB8424302A GB2148540A (en) 1983-09-26 1984-09-26 Lithographic mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58177287A JPS6068340A (ja) 1983-09-26 1983-09-26 Ｘ線リソグラフィー用マスク構造体の保持方法

Publications (2)

Publication Number Publication Date
JPS6068340A JPS6068340A (ja) 1985-04-18
JPH0564454B2 true JPH0564454B2 (2) 1993-09-14

Family

ID=16028384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58177287A Granted JPS6068340A (ja) 1983-09-26 1983-09-26 Ｘ線リソグラフィー用マスク構造体の保持方法

Country Status (1)

Country Link
JP (1) JPS6068340A (2)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07101663B2 (ja) * 1987-02-09 1995-11-01 キヤノン株式会社 マスク保持装置
JPS6351633A (ja) * 1986-08-20 1988-03-04 Nec Corp Ｘ線露光マスク
DE68926373T2 (de) * 1988-09-30 1996-09-26 Canon Kk Verfahren zur Herstellung einer Röntgenstrahlmasken-Struktur

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57132147A (en) * 1981-02-09 1982-08-16 Nec Corp Photomask and its mask handler

Also Published As

Publication number Publication date
JPS6068340A (ja) 1985-04-18

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