JPH06114828A - Cutting method with wire saw - Google Patents

Cutting method with wire saw

Info

Publication number
JPH06114828A
JPH06114828A JP26481592A JP26481592A JPH06114828A JP H06114828 A JPH06114828 A JP H06114828A JP 26481592 A JP26481592 A JP 26481592A JP 26481592 A JP26481592 A JP 26481592A JP H06114828 A JPH06114828 A JP H06114828A
Authority
JP
Japan
Prior art keywords
cutting
wire
cut
work
wire row
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26481592A
Other languages
Japanese (ja)
Inventor
Masayasu Kojima
正康 小嶋
Takashi Kuboki
孝 久保木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Industries Ltd filed Critical Sumitomo Metal Industries Ltd
Priority to JP26481592A priority Critical patent/JPH06114828A/en
Publication of JPH06114828A publication Critical patent/JPH06114828A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/04Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
    • B28D5/045Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0076Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

(57)【要約】 【目的】切断後のスライス片の採取工数を大幅に減少さ
せると共に採取後の破損を確実に防止する。 【構成】平行に張設されたワイヤ列3を走行させなが
ら、被切断物体5の切断部に砥粒を含む砥液を供給しな
がら複数のスライス片に切断する方法において、切断終
了後、ワイヤ列3が被切断物体5に対して少なくとも入
る側のワイヤ列3に砥粒を含まないでかつ砥液を洗い流
す洗浄液Wを供給しながらワイヤ列3を走行させ、ワイ
ヤ列3と被切断物体5とを相対的に移動させて被切断物
体5の切断溝からワイヤ列3を抜き取る過程で切断溝内
の砥液を洗浄除去する。
(57) [Summary] [Purpose] To significantly reduce the number of man-hours required to collect sliced pieces after cutting and to prevent damage after cutting. A method of cutting a plurality of slice pieces while supplying a polishing liquid containing abrasive grains to a cutting portion of an object to be cut 5 while running a wire row 3 stretched in parallel, and after cutting the wire, The wire row 3 is run at least on the side where the row 3 enters the object to be cut 5 while supplying the cleaning liquid W that does not contain abrasive grains and flushes the abrasive liquid, and the wire row 3 and the object to be cut 5 The abrasive liquid in the cutting groove is washed and removed in the process of moving the and relative to each other to extract the wire row 3 from the cutting groove of the object to be cut 5.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体材料、磁性材
料、セラミックス等の脆性物体をワイヤにより多数の薄
厚のスライス片(ウエハ)に切断する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cutting brittle objects such as semiconductor materials, magnetic materials and ceramics into a large number of thin sliced pieces (wafers) with a wire.

【0002】[0002]

【従来の技術】ワイヤソーは、シリコンインゴットのよ
うな脆性物体を薄厚のウエハに切断する場合に用いら
れ、三角形の各頂点部分に配設された溝付ローラに所定
のピッチで多条掛けされたワイヤ列を走行させ、砥粒を
含む加工液(以下砥液と称する)を供給しながら被切断
物体(ワーク)に押し付けて切断する装置である。この
ワイヤソーは、その他にも半導体材料、磁性材料、セラ
ミックス等の脆性物体を薄厚のウエハ状に切断するのに
汎用されている。
2. Description of the Related Art A wire saw is used for cutting a brittle object such as a silicon ingot into thin wafers, and a grooved roller arranged at each vertex of a triangle is multiply threaded at a predetermined pitch. It is an apparatus that presses and cuts an object to be cut (workpiece) while running a wire row and supplying a working liquid containing abrasive grains (hereinafter referred to as an abrasive liquid). Besides, this wire saw is generally used for cutting brittle objects such as semiconductor materials, magnetic materials, and ceramics into thin wafers.

【0003】図1はその例として挙げられる代表的なワ
イヤソーの斜視図である。1本のワイヤ1が、回転自在
に支持された3本の溝付ローラ2A,2B,2Cに順番
に外接しながら巻き付けられている。3本の溝付ローラ
2A,2B,2Cの外周面には、図2に示すようなリン
グ状の溝2aが形成されており、ワイヤ1はこれらの溝
2aに巻き付けられて所定のピッチpのワイヤ列3が形
成される。このワイヤ列3を走行させる(具体的にはワ
イヤを走行させる)とともに昇降台4によってワーク5
を順次上昇させ、ワーク5をスライス片に切断する。こ
のとき、同時に砥液供給管6A,6Bから、ワーク5の
左右に近接し設置されたスリットノズル7A,7Bに砥
粒を含む砥液を供給し、スリットノズル7A,7B下部
の細長いスリット孔から砥液を、ワイヤ列3に供給す
る。供給された砥液は、ワイヤ列3の走行によってワー
ク5の切断面に引き込まれ、昇降台4の上昇とともに徐
々にワーク5の研削切断が進行する。ワーク5は、脆性
材料性のダミー板8に接着され、ダミー板8はベース9
に接着されている。なお、ベース9は昇降台4に締め付
けネジ10にて脱着自在に取り付けられている。
FIG. 1 is a perspective view of a typical wire saw as an example thereof. One wire 1 is wound around three rotatably supported grooved rollers 2A, 2B, 2C in order while being circumscribed. Ring-shaped grooves 2a as shown in FIG. 2 are formed on the outer peripheral surfaces of the three grooved rollers 2A, 2B, 2C, and the wire 1 is wound around these grooves 2a and has a predetermined pitch p. The wire row 3 is formed. This wire row 3 is made to travel (specifically, the wires are made to run), and the work 5 is moved by the lifting table 4.
Are sequentially raised, and the work 5 is cut into slice pieces. At this time, at the same time, from the abrasive liquid supply pipes 6A and 6B, the abrasive liquid containing abrasive grains is supplied to the slit nozzles 7A and 7B which are installed close to each other on the left and right of the work 5, and the slit nozzles 7A and 7B are provided with elongated slit holes at the bottom. The polishing liquid is supplied to the wire row 3. The supplied abrasive liquid is drawn into the cut surface of the work 5 by the traveling of the wire row 3, and the grinding and cutting of the work 5 gradually progresses as the lift table 4 rises. The work 5 is bonded to a dummy plate 8 made of a brittle material, and the dummy plate 8 is a base 9
Is glued to. The base 9 is detachably attached to the lifting table 4 with a tightening screw 10.

【0004】図3および図4には切断終了時の状態が示
されている。ワイヤ列3は、ダミー板8の厚さ途中まで
切り込まれ、ワーク5は完全に切断されている。また、
スライス片5a同士の間の切断溝5bには、砥粒を含む
砥液Lが充満している。
3 and 4 show the state at the end of cutting. The wire row 3 is cut into the dummy plate 8 to the middle thereof, and the work 5 is completely cut. Also,
The cutting groove 5b between the slice pieces 5a is filled with the abrasive liquid L containing abrasive grains.

【0005】従来、切断が終了した後のスライス片5a
を取り出すには、大別して2つの方法がとられていた。
Conventionally, a slice piece 5a after cutting is completed
There were roughly two methods for taking out the food.

【0006】第1の方法は、切断終了後、ワイヤソー装
置内で、ワイヤ列3がダミー板8まで切り込まれたまま
の状態で、ワーク5の手前側のスライス片5aから順番
に、ダミー板8の最終切り込み部分で折り取っていくい
わば装置内採取方法である。
In the first method, after cutting, in the wire saw device, the dummy plate 8 is sequentially cut from the slice piece 5a on the front side of the work 5 while the wire row 3 is still cut to the dummy plate 8. It is a method of collecting in the device, so to speak, breaking off at the final cut portion of 8.

【0007】この方法では、切断溝5b内の砥液Lに起
因して、スライス片同士の吸着力が高いので、薄厚スラ
イス片5aを取り出すにはスライス片5aが割れる危険
性が高いものであった。
In this method, since the slice pieces have a high suction force due to the abrasive liquid L in the cutting groove 5b, there is a high risk that the slice pieces 5a will crack when the thin slice pieces 5a are taken out. It was

【0008】この方法に対して、ワーク5に洗浄液をか
けて切断溝5b内の砥液を洗い流す方法も考えた。すな
わち、洗浄液によって、砥液の吸着力を弱めることによ
り、スライス片5aの破損を防止しようとするものであ
るが、切断溝の幅が高々0.2〜0.3 mmと非常に狭く、洗
浄液が入りにくいため、薄厚なスライス片5aに対して
適用しても大きな効果の得られないものであることを確
認した。
In contrast to this method, a method of applying a cleaning liquid to the work 5 to wash away the abrasive liquid in the cutting groove 5b was also considered. That is, it is intended to prevent the slice piece 5a from being damaged by weakening the suction force of the abrasive liquid by the cleaning liquid, but the width of the cutting groove is very narrow at most 0.2 to 0.3 mm, and the cleaning liquid is difficult to enter. It was confirmed that a large effect cannot be obtained even when applied to the thin slice piece 5a.

【0009】第2の方法は、ワイヤ列3を走行させなが
ら、ワーク5をワイヤ列3から抜き取る方向(図1の例
では、昇降台4を降下させる)に移動させて、ベース9
ごとワーク5を取り外して装置外でスライス片5aを採
取するいわば装置外採取方法である。
The second method is to move the work 5 in a direction for pulling out the work 5 from the wire row 3 (in the example of FIG. 1, lower the elevating table 4) while the wire row 3 is running, and to move the work piece 5 to the base 9.
This is a so-called outside-device sampling method in which the workpiece 5 is removed and the slice piece 5a is collected outside the device.

【0010】この装置外採取方法によると、ワイヤ列3
が再び切断溝5bを通過するため、スライス片5a,5
a同士の吸着力が弱まることでスライス片の採取を容易
にしようとするものである。
According to this outside-device sampling method, the wire array 3
Passes through the cutting groove 5b again, so that the slice pieces 5a, 5
It is intended to facilitate the collection of slice pieces by weakening the suction force between a.

【0011】この第2の方法における機外でのスライス
片5aの採取方法としては、次記の3通りの方法があ
る。(1)第1の方法と同様にワーク5の手前側のスラ
イス片5aから順番に、ダミー板8の最終切り込み部分
で折り取っていく方法である。
There are the following three methods for collecting the sliced pieces 5a outside the machine in the second method. (1) Similar to the first method, it is a method in which the slice pieces 5a on the front side of the work 5 are sequentially cut off at the final cut portion of the dummy plate 8.

【0012】しかし、装置内採取方法に比較して砥液に
よるスライス片5a,5a同士の吸着力が弱まるとして
も、残留砥液により吸着力がゼロとはならず、スライス
片5aの破損の危険性は高い。
However, even if the suction force between the slice pieces 5a, 5a due to the abrasive liquid is weaker than the in-apparatus sampling method, the suction force does not become zero due to the residual abrasive liquid, and there is a risk of damage to the slice pieces 5a. The nature is high.

【0013】(2)ベース9およびダミー板8を加熱さ
せて接着剤の接着強度の低下を図った上で、ワーク5を
ダミー板8から剥がし、次いでスライス片5aを相互に
分離する方法である。しかし、残留砥液によりスライス
片5aを分離するときの破損のトラブルを完全に防止す
ることはできない。
(2) A method of heating the base 9 and the dummy plate 8 to reduce the adhesive strength of the adhesive, peeling the work 5 from the dummy plate 8, and then separating the slice pieces 5a from each other. . However, it is impossible to completely prevent the trouble of breakage when the sliced pieces 5a are separated by the residual abrasive liquid.

【0014】(3)ワーク5をベース9ごと溶剤中に浸
漬して接着剤を溶解除去する方法である。しかしなが
ら、この方法においても、狭い切断溝から残留砥液を完
全に除去し難く、スライス片5aを分離するときの破損
のトラブルを確実に防止することはできない。
(3) A method of immersing the work 5 together with the base 9 in a solvent to dissolve and remove the adhesive. However, even with this method, it is difficult to completely remove the residual abrasive liquid from the narrow cutting groove, and it is not possible to reliably prevent the trouble of breakage when separating the slice pieces 5a.

【0015】この種の問題に対しては、いくつかの改善
方法が提案されている。たとえば、特開平1−2167
59号公報においては、切断されたワークを洗油で浸漬
し、超音波洗浄を行いながらワイヤ列を抜き取る方法
が、また、特開平1−316164号公報においては、
30℃以上の洗油によって洗浄を行った後、ワイヤ列を
抜き取る方法が、それぞれ提案されている。
For this kind of problem, several improvements have been proposed. For example, Japanese Patent Laid-Open No. 1-2167
In Japanese Patent Laid-Open No. 59-164164, there is a method in which the cut work is dipped in washing oil and the wire row is pulled out while performing ultrasonic cleaning.
Methods have been proposed for removing the wire rows after washing with washing oil at 30 ° C. or higher.

【0016】[0016]

【発明が解決しようとする課題】上記のように一般にワ
イヤソーの切断によってできた溝の幅は高々0.2 〜0.3m
mときわめて狭いものである。そこに従来技術としての
超音波洗浄を適用したとしても、切断溝の幅が狭いた
め、洗浄液の振動が砥粒に伝わりにくく、スライス片の
表面積が広くなるにつれて洗浄に要する時間が増加する
ものであった。また、油洗浄を用いる方法においても、
切断溝に充満している砥液を洗い出すには時間がかか
り、ウエハの面積が大きい場合には適用し難い。
As described above, generally, the width of the groove formed by cutting the wire saw is at most 0.2 to 0.3 m.
It is very narrow with m. Even if ultrasonic cleaning as a conventional technique is applied there, since the width of the cutting groove is narrow, the vibration of the cleaning liquid is difficult to be transmitted to the abrasive grains, and the time required for cleaning increases as the surface area of the sliced piece increases. there were. Also, in the method using oil washing,
It takes time to wash out the abrasive liquid filling the cutting grooves, and it is difficult to apply it when the area of the wafer is large.

【0017】そこで、本発明の主たる課題は、切断後の
ワークの切断溝からの砥液の排除を能率的に行い、スラ
イス片を採取する際の破損損を確実に防止することにあ
る。
Therefore, a main object of the present invention is to efficiently remove the polishing liquid from the cutting groove of the work after cutting and surely prevent damage loss when collecting sliced pieces.

【0018】[0018]

【課題を解決するための手段】上記課題は、平行に配設
されたワイヤ列を走行させ被切断物体の切断部に砥粒を
含む砥液を供給しながら複数のスライス片に切断する方
法において、切断終了後、ワイヤ列が被切断物体に対し
て少なくとも入る側のワイヤ列に砥粒を含まないでかつ
前記砥液を洗い流す洗浄液を供給しながらワイヤ列を走
行させ、ワイヤ列と被切断物体とを相対的に移動させて
被切断物体の切断溝からワイヤ列を抜き取ることで解決
できる。
Means for Solving the Problems The above-mentioned problems are solved in a method of cutting a plurality of slice pieces while running a row of wires arranged in parallel and supplying an abrasive containing abrasive grains to a cutting portion of an object to be cut. After cutting, the wire row is run while supplying a cleaning liquid that does not contain abrasive grains to the wire row on which the wire row enters at least the object to be cut and that flushes the abrasive liquid, and the wire row and the object to be cut. This can be solved by relatively moving and to extract the wire row from the cutting groove of the object to be cut.

【0019】[0019]

【作用】本発明の作用を図6により具体的に説明する。
図6は、ワイヤソーによって切断が完了した後、昇降台
4を下降させることで、ワイヤ列3をワーク5から抜き
取っている途中の状態を示した図である。走行している
ワイヤ1には、図5に示すように、ワーク5に進入する
前に(入側に)洗浄液Wがかけられている。洗浄液の選
定は砥液に使用している液によって行われる。それが油
系のものであれば洗浄液としては灯油などの洗油、有機
溶剤がよい。低粘度であれば砥液に使用している油その
ものと同一のものか、水でもよい。ワイヤ列3にかけら
れた洗浄液Wは、ワイヤ1に引きずられて、ワーク5内
の切断溝5b内へと進入し、ワイヤ1の移動によって砥
液が切断溝5bから洗い出される。この過程で、ワーク
5はゆっくりと降下しているので、最終的には切断溝5
b内全域に洗浄液Wが行き渡たり、全ての砥液Lが切断
溝5bから排出される。
The operation of the present invention will be specifically described with reference to FIG.
FIG. 6 is a view showing a state in which the wire row 3 is being extracted from the work 5 by lowering the elevating table 4 after the cutting is completed by the wire saw. As shown in FIG. 5, the running wire 1 is sprayed with the cleaning liquid W before entering the work 5 (on the entrance side). The selection of the cleaning liquid depends on the liquid used for the polishing liquid. If it is oil-based, the washing liquid is preferably washing oil such as kerosene or an organic solvent. As long as it has a low viscosity, it may be the same as the oil itself used in the polishing liquid or water. The cleaning liquid W applied to the wire row 3 is dragged by the wire 1 and enters the cutting groove 5b in the work 5, and the abrasive liquid is washed out from the cutting groove 5b by the movement of the wire 1. During this process, the work 5 is slowly descending, so that the cutting groove 5
The cleaning liquid W is spread all over the inside of b, and all the abrasive liquid L is discharged from the cutting groove 5b.

【0020】その結果、後にスライス片を装置内であ
れ、装置外であれ、分離するときにおいて、残留砥液の
吸着力を要因とする破損の虞れがなくなる。なお、切断
溝5bの幅はワイヤ1の直径より大きく、かつ走行する
ワイヤ1の周囲を洗浄液Wが流れるので、ワイヤ1がス
ライス片5aの面に直接接触することはなく、スライス
片5aの切断面にソーマークを発生することもない。
As a result, at the time of separating the sliced piece inside or outside the apparatus, there is no fear of damage due to the suction force of the residual abrasive liquid. Since the width of the cutting groove 5b is larger than the diameter of the wire 1 and the cleaning liquid W flows around the traveling wire 1, the wire 1 does not come into direct contact with the surface of the slice piece 5a and the slice piece 5a is cut. There is no saw mark on the surface.

【0021】[0021]

【実施例】図5は本発明方法を実施するための装置例を
示したものである。図5の装置例は、基本的には図1お
よび図2に示す装置と同様であり、同部分には同符号を
付すのみで、詳細な説明は省略する。本装置例において
は、砥液供給管6A,6Bに隣接して洗浄液供給管10
A,10Bが設けられている。図5はワーク5の切断が
完了し、昇降台4が降下する前の状態である。切断中に
行われていた砥液供給管6A,6Bからの砥液供給は停
止しており、代わりに洗浄液供給管10A,10Bから
スリットノズル7A,7Bに洗浄液Wが供給される。こ
のとき、切替えバブル等を用いて、砥液供給管6A,6
Bを通して洗浄液Wを流してもよい。洗浄液Wは、スリ
ットノズル7A,7Bの図5の紙面を貫く方向の細長い
スリット孔を通してワイヤ列3全体に交差する水膜状に
供給され、ワイヤ列3の走行によってワーク5の全ての
切断溝に持ち込まれる。そして、ワイヤ列5の走行開始
とともに昇降台4を順次降下させる。
EXAMPLE FIG. 5 shows an example of an apparatus for carrying out the method of the present invention. The device example of FIG. 5 is basically the same as the device shown in FIGS. 1 and 2, and the same portions are denoted by the same reference numerals and detailed description thereof will be omitted. In the present apparatus example, the cleaning liquid supply pipe 10 is provided adjacent to the abrasive liquid supply pipes 6A and 6B.
A and 10B are provided. FIG. 5 shows a state before the work 5 is completely cut and the elevating table 4 is lowered. The polishing liquid supply from the polishing liquid supply pipes 6A and 6B that has been performed during the cutting is stopped, and instead, the cleaning liquid W is supplied from the cleaning liquid supply pipes 10A and 10B to the slit nozzles 7A and 7B. At this time, by using a switching bubble or the like, the abrasive liquid supply pipes 6A, 6A
The cleaning liquid W may be passed through B. The cleaning liquid W is supplied in the form of a water film that intersects the entire wire row 3 through the elongated slit holes of the slit nozzles 7A and 7B in the direction penetrating the paper surface of FIG. Be brought in. Then, when the wire row 5 starts traveling, the elevating table 4 is sequentially lowered.

【0022】ワイヤ列3をワーク5から抜き取った後
は、ベース9ごと昇降台4から取り外し、外側より順番
にスライス片5aの採取を行うことができる。このと
き、前述のように、切断溝5b内に砥液の残留がないの
で、スライス片5aの採取に際して、破損が生じない。
After the wire row 3 has been extracted from the work 5, the base 9 and the lift table 4 can be removed and the slice pieces 5a can be sequentially sampled from the outside. At this time, as described above, since the abrasive liquid does not remain in the cutting groove 5b, no damage occurs when the slice piece 5a is sampled.

【0023】また、切断溝5bの洗浄を完全に行えば、
スライス片5aを採取した後の仕上洗浄を省略すること
も可能となる。その上、本発明法では、切断溝5b内の
砥液が既に除去されているので、切断後に超音波洗浄を
行うにしても、それに要する時間がきわめて短くなる。
If the cutting groove 5b is completely cleaned,
It is also possible to omit finishing washing after collecting the slice pieces 5a. Moreover, in the method of the present invention, since the abrasive liquid in the cutting groove 5b has already been removed, even if ultrasonic cleaning is performed after cutting, the time required for it is extremely short.

【0024】さらに、洗浄液Wのワイヤ1への供給によ
り、溝付ローラの溝2aの洗浄も行うことができる。溝
5aが洗浄されることは、たとえばワイヤを交換して再
び溝付ローラに巻き付ける場合に、溝2aの底にワイヤ
1を密着させて正確なピッチのワイヤ列3を形成のため
の、別途の洗浄操作が不要とする。
Further, by supplying the cleaning liquid W to the wire 1, the groove 2a of the grooved roller can be cleaned. The cleaning of the groove 5a means that, for example, when the wire is replaced and wound again on the grooved roller, the wire 1 is closely attached to the bottom of the groove 2a to form the wire row 3 having an accurate pitch. No cleaning operation is required.

【0025】ワイヤ列3がたとえば矢印Aの示す向きに
一方向走行する場合、ワーク5への入側に位置するスリ
ットノズル7aから流下する洗浄液は、溝付ローラ2
c,2a,2bの順番にローラ溝を洗浄し、同様にワー
ク5から出側のスリットノズル7bから流下される洗浄
液も溝付ローラ2c,2a,2bのローラ溝を洗浄す
る。もちろん溝付ローラの洗浄が不要な場合は、スリッ
トノズル7bから洗浄液を流下させる必要はない。ワイ
ヤ列3が往復走行をする場合、スリットノズル7A,7
Bから流下される洗浄液は、切断溝5bと溝付ローラ2
のローラ溝の洗浄を交互に行うこととなる。
When the wire row 3 travels in one direction, for example, in the direction indicated by the arrow A, the cleaning liquid flowing down from the slit nozzle 7a located on the inlet side of the work 5 flows into the grooved roller 2.
The roller grooves are cleaned in the order of c, 2a and 2b, and similarly, the cleaning liquid flowing down from the work 5 from the slit nozzle 7b on the outlet side also cleans the roller grooves of the grooved rollers 2c, 2a and 2b. Of course, if the cleaning of the grooved roller is not necessary, it is not necessary to let the cleaning liquid flow down from the slit nozzle 7b. When the wire row 3 travels back and forth, the slit nozzles 7A, 7A
The cleaning liquid flowing down from B is cut groove 5b and grooved roller 2
The cleaning of the roller groove is alternately performed.

【0026】なお、洗浄液Wはスリットノズル7Aのみ
から供給することでもよい。
The cleaning liquid W may be supplied only from the slit nozzle 7A.

【0027】以下、本発明の実施例を挙げて、その効果
を明らかにする。 (実施例1)図5に示したワイヤソーと同形のものでワ
ークの切断を行った。ワイヤソーのワイヤ列として直径
0.16mmのピアノ線を0.7mmピッチで張設し
た。ワークには、断面寸法125mm×125mm、長
さ200mmの石英インゴット用いた。ワークはその下
側をガラス製ダミー板に接着され、ダミー板の下側は、
ベースに接着した。ベースは締め付けネジによって昇降
台に固定されている。
The effects of the present invention will be described below with reference to examples of the present invention. (Example 1) A work was cut with a wire saw having the same shape as that shown in FIG. A piano wire having a diameter of 0.16 mm was stretched at a pitch of 0.7 mm as a wire row of the wire saw. A quartz ingot having a cross-sectional size of 125 mm × 125 mm and a length of 200 mm was used for the work. The lower side of the work is glued to the glass dummy plate, and the lower side of the dummy plate is
I glued it to the base. The base is fixed to the lifting table by tightening screws.

【0028】このワイヤ列を毎分400mの速さで一方
向に走行させ、GC♯600砥粒をラッピングオイルに
混合した砥液をスリットノズルよりワイヤ列上に流下
し、毎分0.4mmの速度でワークを押し上げて、厚さ
0.45mmのスライス片278枚に切断した。切断終
了後、砥液にかえてスリットノズルから洗浄液として灯
油を流下しながらワイヤ列を毎分400mで一方向走行
させ、昇降台を毎分5mmの速度で降下して、ワークか
らワイヤ列を抜き取った。その後、ワークをベースごと
昇降台から取り外し、ホットプレート上でベースとガラ
ス製ダミー板を加熱し、接着剤を軟化させて、スライス
片を50〜70枚づつまとめてダミー板からはがしたの
ち、灯油に浸漬してスライス片1枚づつに分離し、洗浄
した。全スライス片を処理するのに要した時間は、切断
終了後2時間であり、スライス片の破損は皆無であっ
た。
This wire row was run in one direction at a speed of 400 m / min, and a grinding liquid in which GC # 600 abrasive grains were mixed with lapping oil was made to flow down from the slit nozzle onto the wire row, and 0.4 mm / min was applied. The work was pushed up at a speed and cut into 278 slice pieces having a thickness of 0.45 mm. After cutting, while moving kerosene as a cleaning liquid from the slit nozzle instead of the abrasive liquid, the wire row is run at 400 m / min in one direction, and the lifting platform is lowered at a speed of 5 mm / min to pull out the wire row from the work. It was After that, the work is removed from the lift together with the base, the base and the glass dummy plate are heated on the hot plate to soften the adhesive, and 50 to 70 slice pieces are collectively peeled off from the dummy plate. It was immersed in kerosene, separated into slices, and washed. The time required to process all slice pieces was 2 hours after the completion of cutting, and there was no breakage of the slice pieces.

【0029】これに対し、切断終了後、洗浄液を流下せ
ずスリットノズルから砥液を流下させながら同一の条件
でワークをワイヤ列から抜取り、同様の方法でスライス
片をダミー板からはがし、灯油に浸漬してスライス片1
枚づつに分離洗浄を行った。
On the other hand, after cutting, the work is pulled out from the wire row under the same conditions while flowing the polishing liquid from the slit nozzle without flowing down the cleaning liquid, and the slice pieces are peeled off from the dummy plate by the same method to make kerosene. Dip and slice 1
Separate cleaning was performed for each sheet.

【0030】その場合には、全スライス片の処理に切断
終了後5時間を要し、スライス片の破損率は、6%であ
った。
In this case, the processing of all slice pieces required 5 hours after the completion of cutting, and the breakage rate of the slice pieces was 6%.

【0031】なお、ワイヤ交換のための溝付ローラの洗
浄に1時間を要したが、前記本発明の方法の場合には、
溝付ローラの洗浄は、全く不要であった。
It took 1 hour to clean the grooved roller for wire replacement, but in the case of the method of the present invention,
No cleaning of the grooved roller was necessary.

【0032】(実施例2)図5に示したワイヤソーと同
形のものでワークの切断を行った。ワイヤソーのワイヤ
列として直径0.16mmのピアノ線を0.55mmピ
ッチで張設した。
(Example 2) A work was cut with the same shape as the wire saw shown in FIG. A piano wire having a diameter of 0.16 mm was stretched at a pitch of 0.55 mm as a wire row of the wire saw.

【0033】ワークには、断面寸法100mm×100
mm、長さ220mmの多結晶シリコンインゴット用い
た。ワークはその下側をガラス製ダミー板に接着され、
ダミー板の下側は、ベースに接着した。締め付けネジに
よって昇降台にベースを固定した。
The workpiece has a cross-sectional size of 100 mm × 100.
A polycrystalline silicon ingot having a length of mm and a length of 220 mm was used. The work is adhered to the glass dummy plate on the lower side,
The lower side of the dummy plate was bonded to the base. The base was fixed to the lift with the tightening screw.

【0034】このワイヤ列を毎分400mの速さで一方
向に走行させ、GC♯1000砥粒を水溶性研剤液に混
合した砥液をスリットノズルよりワイヤ列上に流下し、
毎分0.5mmの速度でワークを押し上げて、厚さ0.
35mmのスライス片390枚にワークを切断した。切
断終了後、砥液にかえてスリットノズルから洗浄液とし
て水を流下しながらワイヤ列を毎分400mで一方向走
行させ、昇降台を毎分5mmの速度で降下して、ワーク
からワイヤ列を抜き取った。その後、ワークをベースご
と昇降台から取り外し、超音波洗浄槽内の灯油に浸漬
し、10分間の超音波洗浄の後、ホットプレート上でベ
ースとガラス製ダミー板を加熱し、接着剤を軟化させ
て、スライス片を70〜100枚づつまとめてダミー板
からはがした。スライス片面からは砥粒は完全に除去さ
れており、スライス片1枚づつ容易にはがすことができ
た。また、仕上洗浄は全く不要であり、スライス片の破
損は、皆無であった。
This wire row was run in one direction at a speed of 400 m / min, and a grinding liquid containing GC # 1000 abrasive grains mixed with a water-soluble polishing agent was made to flow down from the slit nozzle onto the wire row.
The work is pushed up at a speed of 0.5 mm per minute to obtain a thickness of 0.
The work was cut into 390 35 mm slices. After cutting, run the wire row at 400 m / min in one direction while flowing water as the cleaning fluid from the slit nozzle instead of the abrasive fluid, and lower the elevator table at a speed of 5 mm / min to remove the wire row from the work. It was After that, the work together with the base is removed from the lift, immersed in kerosene in the ultrasonic cleaning tank, ultrasonically cleaned for 10 minutes, and then the base and the glass dummy plate are heated on the hot plate to soften the adhesive. Then, 70 to 100 slice pieces were collected and peeled off from the dummy plate. The abrasive grains were completely removed from one side of the slice, and each slice piece could be easily peeled off. Further, finishing washing was not necessary at all, and the slice pieces were not damaged at all.

【0035】これに対し、切断終了後、洗浄液を流下せ
ずスリットノズルから砥液を流下させながら同一の条件
でワークをワイヤ列から抜取り水に浸漬して超音波洗浄
を3時間実施したが、ダミー板に近い部位に砥粒が残留
しており、砥粒が除去されたスライス片の面積率は約7
0%であった。その後、ホットプレート上でベースとダ
ミー板を加熱して、接着剤を軟化させて、スライス片を
70〜100枚づつまとめてダミー板からはがし、水に
浸漬してスライス片を1枚づつに分離洗浄した。全スラ
イス片の処理工数は加熱終了後6時間を要し、スライス
片の破損率は、取扱いに注意したにもかかわらず11%
であった。
On the other hand, after cutting, the work was taken out from the wire row under the same conditions while the abrasive was allowed to flow down from the slit nozzle while the cleaning liquid was not allowed to flow down, and the work was immersed in water for ultrasonic cleaning for 3 hours. Abrasive grains remain in the area close to the dummy plate, and the area ratio of the slice pieces from which the abrasive grains have been removed is about 7
It was 0%. Then, heat the base and the dummy plate on the hot plate to soften the adhesive, collect 70 to 100 slice pieces together, peel off the dummy plate, and soak in water to separate the slice pieces one by one. Washed. The processing time for all slices required 6 hours after heating, and the damage rate of slices was 11% despite careful handling.
Met.

【0036】[0036]

【発明の効果】以上の説明から明らかな如く、半導体材
料、磁性材料、セラミックス等の脆性物体を平行に張設
されたワイヤ列によって多数の薄厚スライス片に切断す
る際、本発明の方法によれば、スライス片の採取工数が
大幅に減少できると共に、スライス片の破損を確実に防
止することができるなどの利点がもたらされる。
As is apparent from the above description, when a brittle object such as a semiconductor material, a magnetic material, or a ceramics is cut into a large number of thin slice pieces by a wire string stretched in parallel, the method of the present invention is used. In this case, the number of man-hours for collecting sliced pieces can be significantly reduced, and the sliced pieces can be reliably prevented from being damaged.

【図面の簡単な説明】[Brief description of drawings]

【図1】従来より使用されているワイヤソーの斜視図で
ある。
FIG. 1 is a perspective view of a wire saw conventionally used.

【図2】図1に示したワイヤソーにおける溝付ローラの
要部拡大図である。
FIG. 2 is an enlarged view of a main part of a grooved roller in the wire saw shown in FIG.

【図3】ワイヤソーで切断された直後の状態を示す斜視
図である。
FIG. 3 is a perspective view showing a state immediately after being cut with a wire saw.

【図4】ワイヤソーで切断された直後のワークの拡大側
面図である。
FIG. 4 is an enlarged side view of a work immediately after being cut with a wire saw.

【図5】本発明例によるワイヤソーの正面図である。FIG. 5 is a front view of a wire saw according to an example of the present invention.

【図6】本発明方法によりワイヤ列をワークから抜き取
っている過程を示す側面図である。
FIG. 6 is a side view showing a process of extracting a wire row from a work by the method of the present invention.

【符号の説明】[Explanation of symbols]

1…ワイヤ、2…溝付ローラ、3…ワイヤ列、5…ワー
ク、5a…スライス片、5b…切断溝、6…砥液供給
管、7…スリットノズル、8…ダミー板、9…昇降台、
L…砥液、W…洗浄液。
1 ... Wire, 2 ... Grooved roller, 3 ... Wire row, 5 ... Work piece, 5a ... Slice piece, 5b ... Cutting groove, 6 ... Abrasive liquid supply pipe, 7 ... Slit nozzle, 8 ... Dummy plate, 9 ... Elevating table ,
L ... Abrasive liquid, W ... Cleaning liquid.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】平行に張設されたワイヤ列を走行させ、ワ
イヤ列に被切断物を押付けながら切断するに際し、被切
断物体の切断部に砥粒を含む砥液を供給しながら複数の
スライス片に切断する方法において、 切断終了後、ワイヤ列が被切断物体に対して少なくとも
入る側のワイヤ列に砥粒を含まないでかつ前記砥液を洗
い流す洗浄液を供給しながらワイヤ列を走行させ、被切
断物体の切断溝からワイヤ列を抜き取ることを特徴とす
るワイヤソーによる切断方法。
1. A plurality of slices are provided by feeding an abrasive liquid containing abrasive grains to a cutting portion of an object to be cut when cutting the object while the wires are stretched in parallel and pressed against the wire to be cut. In the method of cutting into pieces, after the completion of cutting, the wire row is run while supplying a cleaning liquid that does not contain abrasive particles and does not contain abrasive grains in the wire row on which the wire row at least enters the object to be cut, A method for cutting with a wire saw, comprising extracting a wire row from a cutting groove of an object to be cut.
JP26481592A 1992-10-02 1992-10-02 Cutting method with wire saw Pending JPH06114828A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26481592A JPH06114828A (en) 1992-10-02 1992-10-02 Cutting method with wire saw

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26481592A JPH06114828A (en) 1992-10-02 1992-10-02 Cutting method with wire saw

Publications (1)

Publication Number Publication Date
JPH06114828A true JPH06114828A (en) 1994-04-26

Family

ID=17408601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26481592A Pending JPH06114828A (en) 1992-10-02 1992-10-02 Cutting method with wire saw

Country Status (1)

Country Link
JP (1) JPH06114828A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0767035A1 (en) * 1995-10-04 1997-04-09 Nippei Toyama Corporation Slurry managing system and slurry managing method for wire saws
US6161533A (en) * 1996-10-01 2000-12-19 Nippei Toyoma Corp. Slurry managing system and slurry managing method
WO2009075062A1 (en) * 2007-12-11 2009-06-18 Shin-Etsu Handotai Co., Ltd. Method for cutting work by wire saw and wire saw
CN103963182A (en) * 2013-01-29 2014-08-06 应用材料瑞士有限责任公司 Device and method for cleaning the wire of a wire saw
CN104552627A (en) * 2013-10-25 2015-04-29 应用材料瑞士有限责任公司 Semiconductor wire saw including a nozzle for generating a fluid jet
CN104760147A (en) * 2015-04-23 2015-07-08 唐山晶玉科技有限公司 Composite mortar blasting and spraying device for multi-wire sawing machine
CN106313352A (en) * 2016-11-21 2017-01-11 宁晋松宫电子材料有限公司 Method for improving silicon slice cutting thickness uniformity
CN107553763A (en) * 2016-06-30 2018-01-09 广东先导先进材料股份有限公司 A kind of method and cutter device of multi-wire saw chip
TWI784096B (en) * 2018-01-22 2022-11-21 日商信越半導體股份有限公司 Workpiece cutting method and wire saw
CN118769404A (en) * 2024-08-08 2024-10-15 深圳市惠存半导体有限公司 A production cutting process for wafers

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01316164A (en) * 1988-06-13 1989-12-21 Osaka Titanium Co Ltd Manufacture of cut product and wire saw machine

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01316164A (en) * 1988-06-13 1989-12-21 Osaka Titanium Co Ltd Manufacture of cut product and wire saw machine

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0767035A1 (en) * 1995-10-04 1997-04-09 Nippei Toyama Corporation Slurry managing system and slurry managing method for wire saws
US5799643A (en) * 1995-10-04 1998-09-01 Nippei Toyama Corp Slurry managing system and slurry managing method for wire saws
US6053158A (en) * 1995-10-04 2000-04-25 Nippei Toyoma Corp. Slurry managing system and slurry managing method for wire saws
US6161533A (en) * 1996-10-01 2000-12-19 Nippei Toyoma Corp. Slurry managing system and slurry managing method
US8037878B2 (en) 2007-12-11 2011-10-18 Shin-Etsu Handotai Co., Ltd. Method for slicing workpiece by using wire saw and wire saw
JP2009142912A (en) * 2007-12-11 2009-07-02 Shin Etsu Handotai Co Ltd Method of cutting workpiece by wire saw and wire saw
WO2009075062A1 (en) * 2007-12-11 2009-06-18 Shin-Etsu Handotai Co., Ltd. Method for cutting work by wire saw and wire saw
CN103963182A (en) * 2013-01-29 2014-08-06 应用材料瑞士有限责任公司 Device and method for cleaning the wire of a wire saw
CN104552627A (en) * 2013-10-25 2015-04-29 应用材料瑞士有限责任公司 Semiconductor wire saw including a nozzle for generating a fluid jet
CN104760147A (en) * 2015-04-23 2015-07-08 唐山晶玉科技有限公司 Composite mortar blasting and spraying device for multi-wire sawing machine
CN107553763A (en) * 2016-06-30 2018-01-09 广东先导先进材料股份有限公司 A kind of method and cutter device of multi-wire saw chip
CN106313352A (en) * 2016-11-21 2017-01-11 宁晋松宫电子材料有限公司 Method for improving silicon slice cutting thickness uniformity
TWI784096B (en) * 2018-01-22 2022-11-21 日商信越半導體股份有限公司 Workpiece cutting method and wire saw
CN118769404A (en) * 2024-08-08 2024-10-15 深圳市惠存半导体有限公司 A production cutting process for wafers

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