JPH0711471Y2 - Dust-free mask storage case for semiconductor manufacturing - Google Patents

Description

[Detailed Description of the Invention] (1) Technical Field to which the Invention belongs The present invention relates to a storage case for a dust-free mask worn to suppress the release of dust and the like from the mouth of a worker during semiconductor manufacturing. is there.

(2) Prior art and its problems FIG. 1 shows a conventional case of this type. Here, 1 is dust floating in the air, 2 is an opening end for inserting a dust-free mask, 3 is an outlet without a mask, 4 is a bottom portion, and 5 is dust or a mask invading from the opening end 2. The dust that has accumulated on the bottom plate 4 is a dust generated from the material or a mixture of dust generated when the mask is taken out.

Conventionally, the bottom portion of this type of case has used a single plate as shown in FIG. When such a case is installed in a so-called clean room where the air cleanliness for semiconductor manufacturing is extremely high, dust generated from the dust-free mask is accumulated on the bottom plate 4 for a long period of time and further circulates in the clean room. Dust 1 contained in the existing air accumulates in the case and becomes a source of dust. Even if the bottom plate 4 is tilted as shown in FIG. 2, the dust 5 is adsorbed to the bottom plate 4 by a complicated mechanism such as static electricity or friction, so that the situation is not necessarily improved. Therefore, the conventional case has a drawback that it cannot be used in a clean room.

(3) Purpose of the Invention An object of the present invention is to provide a dust-free mask storage case in which dust does not accumulate on the bottom of the dust-free mask storage case.

(4) Configuration of the Invention (4-1) Features of the Invention The present invention is characterized mainly by using a slatted bottom plate as the bottom plate of the case. Another main feature is that the shape of the sludge material of the sludge-shaped bottom plate is a roughly triangular prism, or a roughly rhomboidal prism or a roughly elliptic cylinder or a substantially quadrangular prism, and the slender material has a shape in which the width spreads downward from the apex. It is characterized by having a face.

The present invention will be specifically described below with reference to examples.

(4-2) Example FIG. 3 is a view for explaining the schematic structure of the present invention, and is an example in which a sludge-shaped bottom plate 6 using a slender square rod-shaped saw material 7 is used for the bottom plate. By using the slatted bottom plate 6, a mixture 5 of dust floating in the air, dust generated from a dustless mask, and dust generated when the mask is taken out 5
Is almost never deposited on the bottom plate 6, and falls freely through the gap between the saw plates 6. Therefore, it is possible to prevent the case from becoming a dust generation source or a deposition source.

FIG. 4 is a view for explaining the first embodiment of the present invention,
This is an example in which a roughly acute-angled triangular prism [Fig. 4 (a)] or a roughly rhomboid prism [Fig. 4 (b)] is used as the drainboard material 7. According to the present embodiment, since the sludge material 7 has a cross-section having a shape such that the width thereof spreads downward from the apex, dusts falling on the sludge material 7 slip off from the sludge material 7. , No dust will be deposited on the bottom. In this case, it is necessary to install the triangular pillar material and the rhomboid pillar material with their acute corners facing upward.

FIG. 5 is a view for explaining the second embodiment of the present invention, which is a circular column [Fig. 5 (a)] or oval column [Fig. 5 (b) (c)] as the saw blade material 7. ] Is an example using. According to the present embodiment, for the same reason as in the example of FIG. 4, the dust that has fallen onto the slats 7 slides off from the slats, so that the dust does not accumulate on the bottom of the case.

(5) Effects of the Invention As described above with reference to the embodiments, the present invention can prevent the accumulation of dust on the bottom of the dust-free mask storage case as compared with the conventional technique, so that it can be used in a clean room for semiconductor manufacturing. It can withstand the use of.

[Brief description of drawings]

1 and 2 are perspective views showing a structure example of a conventional dust-free mask storage case, FIG. 3 is a perspective view for explaining a schematic structure of a bottom plate of the dust-free mask storage case according to the present invention, and FIG. Figures (a) and (b) are perspective views showing an example of the shape of the sludge material used for the bottom plate of the dust-free mask storage case according to the present invention, and Figures 5 (a), (b) and (c) are dust-free masks according to the present invention. It is a perspective view which shows the other example of a shape of the sludge material used for the bottom plate of a storage case. 1 ... Dust floating in the air, 2 ... Open end for dustless mask loading, 3 ... Dustless mask removal port, 4 ... Dustless mask storage case bottom plate, 5 ... Dust accumulated on dustless mask storage case bottom , 6 ... Sludge-like bottom plate used for the bottom of the dust-free mask storage case, 7 ... Sludge material.

Claims (1)

[Scope of utility model registration request] 1. A case for accommodating a plurality of dust-free masks for semiconductor manufacturing, wherein the bottom of the accommodating case is made of a sludge-shaped bottom plate, and the sludge-shaped material of the sludge-shaped bottom plate has a shape in which the width spreads downward from the top. A dust-free mask storage case for a semiconductor manufacturing seat, which is formed so as to have a cross section.