JPH07118078B2 - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPH07118078B2 JPH07118078B2 JP1337281A JP33728189A JPH07118078B2 JP H07118078 B2 JPH07118078 B2 JP H07118078B2 JP 1337281 A JP1337281 A JP 1337281A JP 33728189 A JP33728189 A JP 33728189A JP H07118078 B2 JPH07118078 B2 JP H07118078B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- particles
- recording medium
- magnetic recording
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は塗布型磁気記録媒体に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a coating type magnetic recording medium.
[従来の技術] 塗布型磁気記録媒体としては、ポリエステルフィルムに
塗布型磁性層を設けてなる磁気記録媒体が知られている
(たとえば特開昭60−66319号公報)。[Prior Art] As a coating-type magnetic recording medium, there is known a magnetic recording medium in which a coating-type magnetic layer is provided on a polyester film (for example, JP-A-60-66319).
[発明が解決しようとする課題] 磁気記録媒体は高密度記録におけるS/N(シグナル/ノ
イズの比であり高いほど画質が良好となる)を高くする
ため磁性層表面はますます平滑化されている。しかし、
磁性層の表面が平滑になると走行時の摩擦係数が大きく
なりその耐久性が不良となり、使用時の繰返し走行によ
るS/Nの低下が大きくなるという問題点があった。また
磁性層の表面を粗くして耐久性を向上させようとすると
S/Nが低くなるというジレンマを抱えていた。本発明は
かかる課題を改善し、S/Nが高くかつ繰返し走行によるS
/Nの低下の小さい磁気記録媒体を提供することを目的と
する。[Problems to be Solved by the Invention] In a magnetic recording medium, since the S / N (signal / noise ratio is higher and the higher the quality, the better the image quality) in high density recording, the surface of the magnetic layer is further smoothed. There is. But,
When the surface of the magnetic layer becomes smooth, the friction coefficient during running becomes large and its durability becomes poor, and there is a problem that the S / N decreases greatly due to repeated running during use. If you try to improve the durability by roughening the surface of the magnetic layer
I had a dilemma that the S / N would be low. The present invention solves this problem, and has a high S / N and S
An object of the present invention is to provide a magnetic recording medium with a small decrease in / N.
[課題を解決するための手段] 本発明は、基材フィルムの少なくとも片面に塗布型磁性
層を設けてなる磁気記録媒体であって、該磁性層の表面
の凹凸のピーク数(SPc)が100以上、かつ、10点平均粗
さSRzが500nm以下であることを特徴とする磁気記録媒体
としたものである。[Means for Solving the Problems] The present invention is a magnetic recording medium having a coating type magnetic layer provided on at least one surface of a substrate film, wherein the peak number (SPc) of the irregularities on the surface of the magnetic layer is 100. The magnetic recording medium described above is characterized by having a 10-point average roughness SRz of 500 nm or less.
本発明は基材フィルムを構成する熱可塑性樹脂はポリエ
ステル、ポリオレフィン、ポリアミド、ポリフェニレン
スルフィドなど特に限定されることはないが、特に、ポ
リエステル、中でも、エチレンテレフタレート、エチレ
ンα,β−ビス(2−クロルフェノキシ)エタン−4,
4′−ジカルボキシレート、エチレン2,6−ナフタレート
単位から選ばれた少なくとも一種の構造単位を主要構成
成分とする場合に走行性がより一層良好となるので望ま
しい。In the present invention, the thermoplastic resin constituting the base film is not particularly limited to polyester, polyolefin, polyamide, polyphenylene sulfide, etc., but particularly polyester, especially ethylene terephthalate, ethylene α, β-bis (2-chloro) Phenoxy) ethane-4,
When at least one structural unit selected from 4'-dicarboxylate and ethylene 2,6-naphthalate units is the main constituent, the running property is further improved, which is desirable.
また、上記の基材フイルムが下記特徴を有している場合
に、本発明の磁性層表面を得るのにきわめて有効であ
り、また、S/Nを一層高く、S/N低下を一層小さくできる
ので望ましい。すなわち、 基材フィルムが、その少なくとも片側表層に熱可塑
性樹脂Aと粒子を主成分とする厚さ0.005〜3μm、好
ましくは0.01〜2μm、さらに好ましくは0.03〜0.8μ
mのフィルム層A(A層の表面が特徴面)を有する二軸
配向熱可塑性樹脂フィルムであって、該フィルム層A中
に含有される粒子の平均粒径がフィルム層Aの厚さの0.
1〜10倍、好ましくは0.4〜5倍、さらに好ましくは1.1
〜3倍、該粒子の含有量が1〜30重量%、好ましくは2
〜20重量%、さらに好ましくは3〜15重量%である場
合、 基材フィルムが二軸配向熱可塑性樹脂フィルムであ
り、その少なくとも片面(特徴面)の表面突起の平均高
さがフィルム中の粒子の平均粒径の1/4以上、好ましく
は1/3.5以上、さらに好ましくは1/3以上であり、かつ、
突起個数が1万個/mm2以上、好ましくは5万個/mm2以
上、さらに好ましくは10万個/mm2以上である場合、 基材フィルムが二軸配向熱可塑性樹脂フィルムであ
り、その少なくとも片面の表面(特徴面)について、フ
ィルム中の粒子の平均粒径の1/3以下の高さの突起数が
全突起数の70%以下、好ましくは65%以下、さらに好ま
しくは60%以下である場合、 基材フィルムが二軸配向熱可塑性樹脂フイルムであ
り、その少なくとも片面(特徴面)の表面突起高さ分布
の相対標準偏差が0.60以下、好ましくは0.55以下、さら
に好ましくは0.50以下である場合、 基材フイルムが二軸配向熱可塑性樹脂フイルムであ
り、その長手方向のF5値が15kg/mm2以上、好ましくは18
kg/mm2以上である場合である。Further, when the above-mentioned substrate film has the following characteristics, it is extremely effective for obtaining the magnetic layer surface of the present invention, and the S / N can be further increased and the S / N reduction can be further reduced. So desirable. That is, the base film has a thickness of 0.005 to 3 μm, preferably 0.01 to 2 μm, and more preferably 0.03 to 0.8 μ, whose main component is thermoplastic resin A and particles on at least one surface layer.
A biaxially oriented thermoplastic resin film having a film layer A of m (the surface of the A layer is a characteristic surface), wherein the average particle size of the particles contained in the film layer A is 0 of the thickness of the film layer A. .
1 to 10 times, preferably 0.4 to 5 times, more preferably 1.1
~ 3 times, the content of the particles is 1 to 30% by weight, preferably 2
When the content is from 20 to 20% by weight, more preferably from 3 to 15% by weight, the base film is a biaxially oriented thermoplastic resin film, and the average height of surface protrusions on at least one surface (characteristic surface) of the film is particles in the film. 1/4 or more of the average particle size, preferably 1 / 3.5 or more, more preferably 1/3 or more, and,
When the number of protrusions is 10,000 / mm 2 or more, preferably 50,000 / mm 2 or more, more preferably 100,000 / mm 2 or more, the substrate film is a biaxially oriented thermoplastic resin film, On at least one surface (characteristic surface), the number of protrusions having a height of 1/3 or less of the average particle diameter of the particles in the film is 70% or less of the total number of protrusions, preferably 65% or less, more preferably 60% or less. When the base film is a biaxially oriented thermoplastic resin film, the relative standard deviation of the surface projection height distribution of at least one surface (characteristic surface) is 0.60 or less, preferably 0.55 or less, more preferably 0.50 or less In some cases, the base film is a biaxially oriented thermoplastic resin film, and the F5 value in the longitudinal direction thereof is 15 kg / mm 2 or more, preferably 18
This is the case of kg / mm 2 or more.
ここで上記の場合の熱可塑性樹脂Aの種類は特に限定
されないが、ポリエステル、ポリオレフィン、ポリアミ
ド、ポリフェニレンスルフィドなど結晶性の熱可塑性樹
脂、中でもポリエステル、ポリフェニレンスルフィド、
特にポリエステルが好ましく用いられる。また、ポリエ
ステルの中でも、エチレンテレフタレート、エチレン
α,β−ビス(2−クロルフェノキシ)エタン−4,4′
−ジカルボキシレート、エチレン2,6−ナフタレート単
位から選ばれた少なくとも一種の構造単位を主要構成成
分とするものが本発明範囲の表面形態を得るのに望まし
い。ここでいう結晶性とはいわゆる非晶質ではないこと
を示すものであり、定量的には示差走査熱量計(DSC)
による昇温速度10℃/分の熱分析によって融点が検出さ
れ、好ましくは結晶化パラメータΔTcgが150℃以下のも
のである。さらに、示差走査熱量計で測定された融解熱
(融解エンタルピー変化)が7.5cal/g以上の結晶性を示
す場合にS/Nがより一層良好となるのできわめて望まし
い。Here, the kind of the thermoplastic resin A in the above case is not particularly limited, but a crystalline thermoplastic resin such as polyester, polyolefin, polyamide, polyphenylene sulfide, among others, polyester, polyphenylene sulfide,
Particularly, polyester is preferably used. Among the polyesters, ethylene terephthalate, ethylene α, β-bis (2-chlorophenoxy) ethane-4,4 ′
A polymer having at least one structural unit selected from dicarboxylate and ethylene 2,6-naphthalate units as a main constituent is desirable for obtaining the surface morphology within the scope of the present invention. The crystallinity here means that it is not so-called amorphous, and quantitatively, it is a differential scanning calorimeter (DSC).
The melting point is detected by thermal analysis at a temperature rising rate of 10 ° C./min., And the crystallization parameter ΔTcg is preferably 150 ° C. or less. Furthermore, when the heat of fusion (change in enthalpy of fusion) measured by a differential scanning calorimeter shows a crystallinity of 7.5 cal / g or more, the S / N becomes even better, which is highly desirable.
またフィルム層A中の粒子は、特に限定されないが、粒
径比(粒子の長径/短径)が1.0〜1.3の球形状の粒子の
場合に本発明の磁性層表面形態が得られやすく、また、
S/Nを一層高く、S/N低下を一層小さくできるので望まし
い。In addition, the particles in the film layer A are not particularly limited, but in the case of spherical particles having a particle size ratio (major axis / minor axis of particles) of 1.0 to 1.3, the magnetic layer surface morphology of the present invention is easily obtained, and ,
It is desirable because the S / N can be made higher and the S / N reduction can be made smaller.
またフィルム層A中の粒子の相対標準偏差が0.6以下、
好ましくは0.5以下の場合に本発明の磁性層表面形態が
得られやすく、また、S/Nを一層高く、S/N低下を一層小
さくできるので望ましい。The relative standard deviation of the particles in the film layer A is 0.6 or less,
A ratio of 0.5 or less is preferable because the surface morphology of the magnetic layer of the present invention can be easily obtained, and the S / N can be further increased and the S / N reduction can be further reduced.
粒子の種類として、上記の望ましい特性を満足するには
コロイダルシリカに起因する実質的に球形のシリカ粒
子、架橋高分子による粒子(たとえば架橋ポリスチレ
ン、シリコーン、ポリイミド等)などがあるが、これら
に限定されるわけではなく、製膜方法の工夫により他の
粒子、例えば二酸化チタン、アルミナ、炭酸カルシウ
ム、カオリナイトなど従来公知の粒子でも使いこなし得
るものである。Examples of the types of particles include substantially spherical silica particles derived from colloidal silica and particles formed by a crosslinked polymer (for example, crosslinked polystyrene, silicone, polyimide, etc.) in order to satisfy the above desired characteristics, but are not limited to these. However, other particles, for example, titanium dioxide, alumina, calcium carbonate, kaolinite, and other conventionally known particles can be used by devising the film forming method.
粒子の大きさは、特に限定されないが平均粒径(直径)
が5〜2000nm、特に10〜1500nm、さらに10〜500nmの場
合に本発明の磁性層表面形態が得られやすく、また、S/
Nを一層高く、S/N低下を一層小さくできるので望まし
い。Particle size is not particularly limited, but average particle size (diameter)
Of 5 to 2000 nm, particularly 10 to 1500 nm, and more preferably 10 to 500 nm, the magnetic layer surface morphology of the present invention is easily obtained, and S /
It is desirable because N can be made higher and S / N reduction can be made smaller.
またフィルム層A以外の熱可塑性樹脂部分にも本発明に
支障のない範囲で、好ましくは1重量%以下の範囲で、
フィルム層Aの粒子より大きい粒子、同じ大きさの粒
子、小さい粒子、あるいはそれらの混合物を含有しても
良い。Further, in the thermoplastic resin portion other than the film layer A, within a range not hindering the present invention, preferably within a range of 1% by weight or less,
Particles larger than the particles of the film layer A, particles of the same size, particles of a small size, or a mixture thereof may be contained.
また本発明の基材フイルムは熱可塑性樹脂と粒子からな
る組成物を主要成分とするが、本発明の目的を阻害しな
い範囲内で、多種ポリマをブレンドしてもよいし、また
酸化防止剤、熱安定剤、滑剤、紫外線吸収剤などの有機
添加剤が通常添加される程度添加されていてもよい。Further, the base film of the present invention has a composition comprising a thermoplastic resin and particles as a main component, but may be blended with various polymers within a range not impairing the object of the present invention, and an antioxidant, Organic additives such as heat stabilizers, lubricants, and ultraviolet absorbers may be added to the extent that they are usually added.
また本発明を構成する基材フィルムの特徴面(フィルム
層A面、あるいは表面形態が本願発明で規定する特定の
特性を有する面)の全反射ラマン結晶化指数は、20cm-1
以下の場合に本発明の磁性層表面形態が得られやすく、
また、S/Nを一層高く、S/N低下を一層小さくできるので
望ましい。Further, the total reflection Raman crystallization index of the characteristic surface of the substrate film constituting the present invention (the surface of the film layer A, or the surface whose surface morphology has the specific characteristics defined in the present invention) is 20 cm -1.
The magnetic layer surface morphology of the present invention is easily obtained in the following cases,
Further, it is desirable because the S / N can be further increased and the S / N reduction can be further reduced.
本発明を構成する基材フィルムの上記特徴面の2次イオ
ンマススペクトルによって測定される表層粒子濃度比は
特に限定されないが、表層粒子濃度比が1/10以下、特に
1/50以下である場合に走行性、出力特性がより一層良好
となるので特に望ましい。この表層粒子濃度比は従来の
塗布法あるいは塗布・延伸法よっては得られないもので
あり、表層粒子濃度比をこの範囲にしておくことにより
本発明の磁性層表面形態が得られやすく、また、S/Nを
一層高く、S/N低下を一層小さくできるので望ましく、
また、フイルム表面の耐削れ性が向上し、製膜工程、磁
性層塗布やカレンダー等の加工工程での粒子脱落による
トラブルが大きく改善されるものである。The surface layer particle concentration ratio measured by the secondary ion mass spectrum of the above-mentioned characteristic surface of the substrate film constituting the present invention is not particularly limited, but the surface layer particle concentration ratio is 1/10 or less, particularly
When it is 1/50 or less, the running property and the output property are further improved, which is particularly desirable. This surface layer particle concentration ratio is not obtained by the conventional coating method or coating / stretching method, and by setting the surface layer particle concentration ratio within this range, the magnetic layer surface morphology of the present invention can be easily obtained, and Higher S / N and smaller S / N reduction are desirable,
Further, the abrasion resistance of the film surface is improved, and troubles due to particles falling off in the film forming process, the magnetic layer coating process and the processing process such as calendering are greatly improved.
本発明は上記の二軸配向熱可塑性樹脂フィルムの少なく
とも片面に塗布型磁性層を設けてなる磁気記録媒体であ
る。用いられる磁性粉末は特に限定されないが、酸化
鉄、酸化クロム、Co被着酸化鉄などの酸化物、あるい
は、Fe、Co、Fe−Co、Fe−Co−Ni、Co−Ni等の金属また
は合金、これらとAl、Cr、Si等との合金等が用いられる
が、特に実質的に酸化物ではない金属単体(合金も含
む)、すなわち磁性層がメタル塗布型である場合に本発
明の磁性層表面形態が得られやすく、また、S/Nを一層
高く、S/N低下を一層小さくできるので望ましい。The present invention is a magnetic recording medium comprising a coating type magnetic layer provided on at least one surface of the above biaxially oriented thermoplastic resin film. The magnetic powder used is not particularly limited, but iron oxide, chromium oxide, oxides such as Co-adhered iron oxide, or metals or alloys such as Fe, Co, Fe-Co, Fe-Co-Ni, and Co-Ni. , Alloys of these with Al, Cr, Si, etc. are used, but in particular, a simple metal (including an alloy) that is not substantially an oxide, that is, the magnetic layer of the present invention when the magnetic layer is a metal coating type. It is desirable because the surface morphology can be easily obtained, the S / N can be further increased, and the S / N reduction can be further reduced.
磁性粉は各種バインダーを用いて磁性塗料とすることが
できるが、一般には熱硬化性樹脂系バインダーおよび放
射線硬化系バインダーが好ましく、その他添加剤として
分散剤、潤滑剤、帯電防止剤を常法に従って用いてもよ
い。例えば塩化ビニル・酢酸ビニル・ビニルアルコール
共重合体、ポリウレタンプレポリマおよびポリイソシア
ネートよりなるバインダーなどを用いることができる。The magnetic powder can be made into a magnetic coating using various binders, but in general, thermosetting resin-based binders and radiation-curable binders are preferable, and other additives such as dispersants, lubricants, and antistatic agents are used according to a conventional method. You may use. For example, a binder made of vinyl chloride / vinyl acetate / vinyl alcohol copolymer, polyurethane prepolymer and polyisocyanate can be used.
磁性層の厚さは特に限定されないが、0.5〜5μmの範
囲としておくことが本発明の磁性層表面形態が得られや
すく、また、S/Nを一層高く、S/N低下を一層小さくでき
るので望ましい。The thickness of the magnetic layer is not particularly limited, but it is easy to obtain the surface morphology of the magnetic layer of the present invention by setting it in the range of 0.5 to 5 μm, and the S / N can be further increased and the S / N reduction can be further reduced. desirable.
本発明の磁気記録媒体の磁性層の表面のピークカウント
SPcは100以上、好ましくは150以上、さらに好ましくは2
00以上であることが必要である。SPcが上記の範囲より
小さいと繰り返し走行によるS/Nの低下が大きくなり耐
久性が不良となるので好ましくない。SPcの上限は特に
限定されないが通常5000程度が製造上の限界である。Peak count of the surface of the magnetic layer of the magnetic recording medium of the present invention
SPc is 100 or more, preferably 150 or more, more preferably 2
It must be at least 00. If the SPc is smaller than the above range, the S / N ratio will decrease due to repeated running and the durability will be poor, such being undesirable. The upper limit of SPc is not particularly limited, but usually about 5000 is a manufacturing limit.
また磁性層の表面のSRzは500nm以下、好ましくは400nm
以下、さらに好ましくは200nm以下であることが必要で
ある。SRzが上記の範囲より大きいとS/Nが低くなり画質
が不良となり、またS/N低下も大きくなりやすいので好
ましくない。SRzの下限は特に限定されないが通常5nm程
度が製造上の限界である。The SRz of the surface of the magnetic layer is 500 nm or less, preferably 400 nm.
Hereafter, it is necessary that the thickness be 200 nm or less. When SRz is larger than the above range, the S / N is lowered, the image quality is deteriorated, and the S / N deterioration is apt to be large, which is not preferable. The lower limit of SRz is not particularly limited, but usually about 5 nm is the manufacturing limit.
また本発明の磁気記録媒体は、磁性層が片面のみの場合
にはその反対側にいわゆるバックコート処理が施されて
いてもよい。この場合のバックコート層の厚さは0.1〜
1.5μm、表面平均粗さRaは5〜200nm、好ましくは10〜
100nmの範囲の場合に本発明の磁性層表面形態が得られ
やすく、また、S/Nを一層高く、S/N低下を一層小さくで
きるので望ましい。Further, in the magnetic recording medium of the present invention, when the magnetic layer has only one surface, the opposite side may be subjected to so-called back coating treatment. The thickness of the back coat layer in this case is 0.1 ~
1.5 μm, average surface roughness Ra is 5-200 nm, preferably 10-
A range of 100 nm is desirable because the surface morphology of the magnetic layer of the present invention can be easily obtained, the S / N can be further increased, and the S / N reduction can be further reduced.
次に本発明の磁気記録媒体の製造方法について説明す
る。Next, a method of manufacturing the magnetic recording medium of the present invention will be described.
まず、基材に望ましい、特徴面を有する二軸配向熱可塑
性樹脂フイルムの製法を説明する。First, a method for producing a biaxially oriented thermoplastic resin film having a characteristic surface, which is desirable for a substrate, will be described.
熱可塑性樹脂に粒子を含有せしめる方法としては、粒子
をエチレングリコールのスラリーとし、重合時に添加す
るかまたはベント方式の2軸混練押出機を用いて熱可塑
性樹脂に添加する方法が、延伸破れなく、本発明に望ま
しい基材フイルムを得るのにきわめて有効である。As a method of incorporating particles into a thermoplastic resin, a method of adding the particles to a thermoplastic resin by using ethylene glycol slurry as a slurry or using a vent-type twin-screw kneading extruder without stretching breakage, It is extremely effective in obtaining the base film desired in the present invention.
粒子の含有量を調節する方法としては、上記方法で高濃
度マスターを作っておき、それを製膜時に粒子を実質的
に含有しない熱可塑性樹脂で希釈して粒子の含有量を調
節する方法が有効である。As a method of adjusting the content of particles, a method of preparing a high-concentration master by the above method and diluting it with a thermoplastic resin that does not substantially contain particles during film formation is a method of adjusting the content of particles. It is valid.
次に、粒子を含有する熱可塑性樹脂Aのペレットを必要
に応じて乾燥したのち、公知の溶融積層用押出装置に供
給し、スリット状のダイからシート状に押出し、キャス
ティングロール上で冷却固化せしめて、A層の厚さがA
層に含有される粒子の平均粒径の0.8〜80倍である未延
伸フィルムを作る。すなわち、2または3台の押出し
機、2または3層のマニホールドまたは合流ブロックを
用いて、熱可塑性樹脂A、Bを積層し、口金から2また
は3層のシートを押し出し、キャスティングロールで冷
却して未延伸フィルムを作る。この場合、熱可塑性樹脂
Aのポリマ流路に、スタティックミキサー、ギヤポンプ
を設置する方法は延伸破れなく、本発明に望ましい基材
フイルムを得るのにきわめて有効である。Next, the pellets of the thermoplastic resin A containing particles are dried, if necessary, and then supplied to a known melt laminating extruder, extruded into a sheet from a slit die, and cooled and solidified on a casting roll. And the thickness of the A layer is A
Make an unstretched film that is 0.8 to 80 times the average particle size of the particles contained in the layer. That is, using two or three extruders, a two- or three-layer manifold or a merging block, thermoplastic resins A and B are laminated, two or three-layer sheets are extruded from a die, and cooled by a casting roll. Make an unstretched film. In this case, a method of installing a static mixer and a gear pump in the polymer channel of the thermoplastic resin A is extremely effective for obtaining a base film which is desirable for the present invention without stretching breakage.
また、合流ブロックとして合流部断面が矩形のフィード
ブロックを用いるのが本発明に望ましい基材フイルムを
得るのにきわめて有効である。Further, it is extremely effective to use a feed block having a rectangular confluent section as the confluent block in order to obtain the base film desired in the present invention.
上記の説明は構成として、主としてA/B、A/B/Aについて
述べたが(A層面が特徴面)、A/B/Cの構成の場合は3
台の押出機を用いて同様に、3層のマニホールドまたは
合流ブロックを用いて、熱可塑性樹脂A、B、Cを積層
し、口金から3層のシートを押し出し、キャスティング
ロールで冷却して未延伸フィルムを作る。いずれの場合
もA、B、Cは同じ熱可塑性樹脂でも異なっていてもよ
い(A、C層の面が特徴面)。In the above description, A / B and A / B / A were mainly described as the configuration (a characteristic surface is the layer A surface), but in the case of the configuration of A / B / C, 3
Similarly, using a three-stage extruder or a three-layer manifold or confluent block, the thermoplastic resins A, B, and C are laminated, the three-layer sheet is extruded from the die, cooled by a casting roll, and unstretched. Make a film. In any case, A, B, and C may be the same thermoplastic resin or different (the surfaces of the A and C layers are characteristic surfaces).
次にこの未延伸フィルムを二軸延伸し、二軸配向せしめ
る。延伸方法としては、公知の縦→横または横→縦の順
で行なう逐次二軸延伸法または同時二軸延伸法を用いる
ことができる。延伸条件は熱可塑性樹脂の種類により一
概には言えないが、延伸倍率としては縦倍率と横倍率の
積を8倍以上にすることが望ましい粒径と積層厚さの関
係を得て表面形態を最適化し、特徴面近傍のポリマ分子
を二軸配向させ、かつフイルム全体の望ましい機械特性
を得るのに有効である。特徴面近傍のポリマ分子が二軸
配向していることが本フイルムが塗布法あるいは塗布・
延伸法によって作られるフイルムと大きく異なる点であ
り、本発明の磁性層表面形態が得られやすく、また、S/
Nを一層高く、S/N低下を一層小さくできるので望まし
く、また、フイルム表面の耐削れ性が向上し、製膜工
程、磁性層塗布やカレンダー等の加工工程での粒子脱落
によるトラブルが大きく改善されるものである。Next, this unstretched film is biaxially stretched and biaxially oriented. As the stretching method, a known biaxial stretching method or a simultaneous biaxial stretching method, which is performed in the order of longitudinal → horizontal or lateral → vertical, can be used. The stretching conditions cannot be generally stated depending on the type of thermoplastic resin, but it is desirable that the product of the longitudinal ratio and the lateral ratio is 8 times or more as the stretching ratio. It is effective in optimizing and biaxially orienting polymer molecules near the characteristic surface, and obtaining desired mechanical properties of the entire film. The fact that the polymer molecules in the vicinity of the characteristic surface are biaxially oriented means that this film has a coating method or coating
This is a point greatly different from the film produced by the stretching method, and the surface morphology of the magnetic layer of the present invention is easily obtained, and S /
N is higher and S / N lowering can be further reduced, which is desirable. Also, the abrasion resistance of the film surface is improved, and troubles due to particles falling off during the film forming process, magnetic layer coating, calendering, and other processing processes are greatly reduced. It is what is done.
また上記二軸配向フイルムをさらに少なくとも一方向に
再延伸する方法が望ましい機械特性を得るのに有効であ
る。次にこの延伸フィルムを熱可塑性樹脂樹脂の融点〜
融点−100℃の温度範囲で0.5〜60秒行なうのが好適であ
る。Further, a method of re-stretching the biaxially oriented film in at least one direction is effective for obtaining desired mechanical properties. Then, this stretched film is
It is preferable to carry out the reaction in the temperature range of -100 ° C for 0.5 to 60 seconds.
次に、この基材フィルムに所定の磁性層を塗布する。磁
性層を塗布する方法は公知の方法で行なうことができる
が、グラビヤロールやギーサで塗布する方法が本発明の
磁性層表面形態が得られやすく、また、S/Nを一層高
く、S/N低下を一層小さくできるので望ましい。Next, a predetermined magnetic layer is applied to this base film. The method of applying the magnetic layer can be carried out by a known method, but the method of applying with a gravure roll or giesa is easy to obtain the magnetic layer surface morphology of the present invention, and the S / N is higher and the S / N is higher. This is desirable because the reduction can be further reduced.
塗布後の乾燥工程は、温度を90〜120℃とするのが好ま
しい。The temperature of the drying step after coating is preferably 90 to 120 ° C.
また、カレンダー工程は、ポリアミド系樹脂またはポリ
エステル系樹脂を弾性ロールに用い、25〜90℃の温度範
囲で行なうのが本発明の磁性層表面形態が得られやす
く、また、S/Nを一層高く、S/N低下を一層小さくできる
ので望ましい。またカレンダー時の圧力は100〜500kg/c
mの範囲が本発明の磁性層表面形態が得られやすく、ま
た、S/Nを一層高く、S/N低下を一層小さくできるので望
ましい。Further, the calendering step, using a polyamide-based resin or a polyester-based resin for the elastic roll, it is easy to obtain the magnetic layer surface morphology of the present invention to be carried out in the temperature range of 25 to 90 ° C., and the S / N is further increased. , S / N can be further reduced, which is desirable. The pressure during calendar is 100-500kg / c
The range of m is desirable because the surface morphology of the magnetic layer of the present invention can be easily obtained, the S / N can be further increased, and the S / N reduction can be further reduced.
次に磁性層が塗布された原反を巻とってロールの形で磁
性層硬化のためにキュアする。キュアの温度条件は40〜
100℃の範囲が本発明の磁性層表面形態が得られやす
く、また、S/Nを一層高く、S/N低下を一層小さくできる
ので望ましい。Next, the raw material coated with the magnetic layer is wound and cured in the form of a roll to cure the magnetic layer. Cure temperature condition is 40 ~
The range of 100 ° C. is preferable because the surface morphology of the magnetic layer of the present invention can be easily obtained, the S / N can be further increased, and the S / N reduction can be further reduced.
このような磁気記録媒体の製造条件の微調整でも本発明
の磁性層表面は得られるが、本発明に記載の好ましい基
材フイルムを用いて下記条件で製造した磁気記録媒体は
本発明の磁性層表面形態が得られやすく、また、S/Nを
一層高く、S/N低下を一層小さくできるので特に望まし
い。Although the surface of the magnetic layer of the present invention can be obtained by finely adjusting the production conditions of such a magnetic recording medium, the magnetic recording medium produced under the following conditions using the preferred base film described in the present invention is a magnetic layer of the present invention. The surface morphology is easily obtained, the S / N is further increased, and the S / N reduction can be further reduced, which is particularly desirable.
すなわち、 イ 基材フイルムの特徴面に磁性層塗布(特徴面に接着
性付与などのアンダーコート等の前処理をする場合も含
めて)する場合:基材フイルムの両面とも特徴面、塗布
面が特徴面、反対面が通常面に相当 ・カレンダー温度:75〜90℃ ・カレンダー圧力:170〜500kg/cm ・キュア温度:40〜70℃ ロ 基材フイルムの特徴面の反対側に磁性層塗布する場
合:基材フイルムの塗布面が通常面、反対面が特徴面に
相当 ・カレンダー温度:20〜80℃ ・カレンダー圧力:100〜300kg/cm ・キュア温度:55〜90℃ さらに、この磁気記録媒体の原反(広幅)をスリットし
て磁気記録媒体を得る。また磁性層と反対側にバックコ
ートをする場合の磁気は特に限定されず、磁性層塗布の
前、カレンダーの前、カレンダー後キュア前、キュア後
のいずれでも良い。In other words, (a) When the magnetic layer is applied to the characteristic surface of the base film (including the case where a pretreatment such as undercoating is applied to the characteristic surface, etc.): Both sides of the base film have a characteristic surface and a coated surface. The characteristic surface and the opposite surface correspond to the normal surface.-Calendar temperature: 75 to 90 ° C-Calendar pressure: 170 to 500 kg / cm-Cure temperature: 40 to 70 ° C (2) Apply the magnetic layer on the opposite side of the characteristic surface of the base film. Case: Normal surface of the base film corresponds to the characteristic surface, and the opposite surface corresponds to the characteristic surface.-Calendar temperature: 20-80 ° C-Calendar pressure: 100-300kg / cm-Cure temperature: 55-90 ° C Furthermore, this magnetic recording medium The original fabric (wide width) is slit to obtain a magnetic recording medium. Further, the magnetism when the back coat is provided on the side opposite to the magnetic layer is not particularly limited, and may be before coating the magnetic layer, before calendering, after calendering or before curing, or after curing.
[物性の測定方法ならびに効果の評価方法] 本発明の特性値の測定方法並びに効果の評価方法は次の
通りである。[Physical property measuring method and effect evaluating method] The characteristic value measuring method and effect evaluating method of the present invention are as follows.
(1)粒子の平均粒径 フィルム表面から熱可塑性樹脂をプラズマ低温灰化処理
法で除去し粒子を露出させる。処理条件は熱可塑性樹脂
は灰化されるが粒子はダメージを受けない条件を選択す
る。これを走査型電子顕微鏡(SEM)で観察し、粒子の
画像をイメージアナライザーで処理する。観察箇所を変
えて粒子数5,000個以上で次の数値処理を行ない、それ
によって求めた数平均径Dを平均粒径とする。(1) Average particle size of particles The thermoplastic resin is removed from the film surface by a plasma low temperature ashing method to expose the particles. The treatment conditions are selected such that the thermoplastic resin is incinerated but the particles are not damaged. This is observed with a scanning electron microscope (SEM), and the image of the particles is processed with an image analyzer. The following numerical processing is performed when the number of particles is 5,000 or more while changing the observation location, and the number average diameter D thus obtained is taken as the average particle diameter.
D=ΣDi/N ここで、Diは粒子の円相当径、Nは粒子数である。D = ΣDi / N Here, Di is the equivalent circle diameter of particles, and N is the number of particles.
(2)粒径比 上記(1)の測定において個々の粒子の(長径の平均
値)/(短径の平均値)の比である。すなわち、下式で
求められる。(2) Particle size ratio This is the ratio of (average value of major axis) / (average value of minor axis) of individual particles in the measurement of (1) above. That is, it is calculated by the following formula.
長径=ΣD1i/N 短径=ΣD2i/N D1i、D2iはそれぞれ個々の粒子の長径(最大径)、短径
(最短径)、Nは粒子数である。Major axis = ΣD1i / N Minor axis = ΣD2i / N D1i and D2i are the major axis (maximum diameter) and minor axis (shortest diameter) of each particle, and N is the number of particles.
(3)粒径の相対標準偏差 上記(1)の方法で測定された個々の粒径Di、平均径
D、粒子数Nから計算される標準偏差σ(={Σ(Di−
D)2/N}1/2)を平均径Dで割った値(σ/D)で表わし
た。(3) Relative standard deviation of particle size Standard deviation σ (= {Σ (Di-
D) 2 / N} 1/2 ) was divided by the average diameter D to express (σ / D).
(4)粒子の含有量 熱可塑性樹脂は溶解し粒子は溶解させない溶媒を選択
し、粒子を熱可塑性樹脂から遠心分離し、粒子の全体重
量に対する比率(重量%)をもって粒子含有量とする。(4) Content of particles A solvent that dissolves the thermoplastic resin and does not dissolve the particles is selected, the particles are centrifuged from the thermoplastic resin, and the ratio (% by weight) to the total weight of the particles is defined as the particle content.
(5)結晶化パラメータΔTcg、融解熱 示差走査熱量計(DSC)を用いて測定した。DSCの測定条
件は次の通りである。すなわち、試料10mgをDSC装置に
セットし、300℃の温度で5分間溶融した後、液体窒素
中に急冷する。この急冷試料を10℃/分で昇温し、ガラ
ス転移点Tgを検知する。さらに昇温を続け、ガラス状態
からの結晶化発熱ピーク温度をもって冷結晶化温度Tcc
とした。さらに昇温を続け、融解ピークから融解熱を求
めた。ここでTccとTgの差(Tcc−Tg)を結晶化パラメー
タΔTcgと定義する。(5) Crystallization parameter ΔTcg, heat of fusion It was measured using a differential scanning calorimeter (DSC). The DSC measurement conditions are as follows. That is, 10 mg of a sample is set in a DSC apparatus, melted at a temperature of 300 ° C. for 5 minutes, and then rapidly cooled in liquid nitrogen. The temperature of this quenched sample is raised at 10 ° C./min, and the glass transition point Tg is detected. When the temperature rises further, the crystallization exothermic peak temperature from the glass state is reached and the cold crystallization temperature Tcc
And The temperature was further raised and the heat of fusion was determined from the melting peak. Here, the difference between Tcc and Tg (Tcc-Tg) is defined as the crystallization parameter ΔTcg.
(6)F5値 JIS−Z−1702に規定された方法にしたがって、インス
トロンタイプの引っ張り試験機を用いて、25℃、65%RH
にて測定した。(6) F5 value In accordance with the method specified in JIS-Z-1702, using an Instron type tensile tester, 25 ℃, 65% RH
It was measured at.
(7)全反射ラマン結晶化指数 全反射ラマンスペクトルを測定し、カルボニル基の伸縮
振動である1730cm-1の半価幅をもって表面の全反射ラマ
ン結晶化指数とした。測定条件は次の通りである。但し
測定深さは、表面から500〜1,000Å程度とした。(7) Total reflection Raman crystallization index The total reflection Raman spectrum was measured, and the half-value width of 1730 cm -1 , which is the stretching vibration of the carbonyl group, was used as the total reflection Raman crystallization index of the surface. The measurement conditions are as follows. However, the measurement depth was about 500 to 1,000Å from the surface.
光源 アルゴンイオンレーザー(5,145Å) 試料のセッティング レーザー偏光方向(S偏光)とフィルム長手方向が平行
となるようにフィルム表面を全反射プリズムに圧着さ
せ、レーザーのプリズムへの入射角(フィルム厚さ方向
との角度)は60゜とした。Light source Argon ion laser (5,145Å) Setting the sample Press the film surface to the total reflection prism so that the laser polarization direction (S polarization) and the film longitudinal direction are parallel, and the incident angle of the laser to the prism (the film thickness direction) The angle) was 60 °.
検出器 PM:RCA31034/Photon Counting System(Hamamatsu C123
0)(supply 1,600V) 測定条件 SLIT 1,000μm LASER 100mW GATE TIME 1.0sec SCAN SPEED 12cm-1/min SAMPLING INTERVAL 0.2cm-1 REPEAT TIME 6 (8)表面の分子配向(屈折率) ナトリウムD線(589nm)を光源として、アッベ屈折率
計を用いて測定した。マウント液にはヨウ化メチレンを
用い、25℃、65%RHにて測定した。ポリマの二軸配向性
は長手方向、幅方向、厚さ方向の屈折率をN1、N2、N3と
した時、(N1−N2)の絶対値が0.07以下、かつ、N3/
[(N1+N2)/2]が0.95以下であることをひとつの基準
とできる。また、レーザー型屈折率計を用いて屈折率を
測定しても良い。さらに、この方法では測定が難しい場
合は全反射レーザーラマン法を用いることもできる。レ
ーザー全反射ラマンの測定は、Jobin−Yvon社製Ramanor
U−1000ラマンシステムにより、全反射ラマンスペクト
ルを測定し、例えばポリエチレンテレフタレートの場合
では、1615cm-1(ベンゼン環の骨格振動)と1730cm
-1(カルボニル基の伸縮振動)のバンド強度比の偏光測
定比(YY/XX比など。ここでYY:レーザーの偏光方向をY
にしてYに対して平行なラマン光検出、XX:レーザーの
偏光方向をXにしてXに対して平行なラマン光検出)が
分子配向と対応することを利用できる。ポリマの二軸配
向性はラマン測定から得られたパラメータを長手方向、
幅方向の屈折率に換算して、その絶対値、差などから判
定できる。この場合の測定条件は次のとおりである。Detector PM: RCA31034 / Photon Counting System (Hamamatsu C123
0) (supply 1,600V) Measuring condition SLIT 1,000μm LASER 100mW GATE TIME 1.0sec SCAN SPEED 12cm -1 / min SAMPLING INTERVAL 0.2cm -1 REPEAT TIME 6 (8) Surface molecular orientation (refractive index) Sodium D line (589nm) ) Was used as a light source, and an Abbe refractometer was used for measurement. Methylene iodide was used as the mount solution, and measurement was performed at 25 ° C. and 65% RH. The biaxial orientation of the polymer is such that the absolute value of (N1-N2) is 0.07 or less, and N3 / when the refractive indices in the longitudinal direction, the width direction, and the thickness direction are N1, N2, and N3.
One of the criteria is that [(N1 + N2) / 2] is 0.95 or less. Further, the refractive index may be measured using a laser type refractometer. Further, when the measurement is difficult by this method, the total reflection laser Raman method can be used. Ramanor manufactured by Jobin-Yvon is used for the measurement of laser total reflection Raman.
The total reflection Raman spectrum was measured by the U-1000 Raman system. For example, in the case of polyethylene terephthalate, it was 1615 cm -1 (skeleton vibration of benzene ring) and 1730 cm.
Polarization measurement ratio of -1 (stretching vibration of carbonyl group) band intensity ratio (YY / XX ratio, etc. where YY: laser polarization direction is Y
That is, Raman light detection parallel to Y and XX: Raman light detection parallel to X where X is the polarization direction of the laser) correspond to the molecular orientation. The biaxial orientation of the polymer is the parameter obtained from Raman measurement in the longitudinal direction,
It can be determined from the absolute value, the difference, etc. by converting it into the refractive index in the width direction. The measurement conditions in this case are as follows.
光源 アルゴンイオンレーザー(5145Å) 試料のセッティング フィルム表面を全反射プリズムに圧着させ、レーザのプ
リズムへの入射角(フィルム厚さ方向との角度)は60゜
とした。Light source Argon ion laser (5145Å) Sample setting The film surface was pressed onto a total reflection prism, and the angle of incidence of the laser on the prism (angle with the film thickness direction) was 60 °.
検出器 PM:RCA31034/Photon Counting System(Hamamatsu C123
0)(supply 1600V) 測定条件 SLIT 1000μm LASER 100mW GATE TIME 1.0sec SCAN SPEED 12cm-1/min SAMPLING INTERVAL 0.2cm-1 REPEAT TIME 6 (9)表層粒子濃度比 2次イオンマススペクトル(SIMS)を用いて、フィルム
中の粒子に起因する元素のうち最も高濃度の元素と熱可
塑性樹脂の炭素元素の濃度比を粒子濃度とし、厚さ方向
の分析を行なう。SIMSによって測定される最表層粒子濃
度(深さ0の点)における粒子濃度Aとさらに深さ方向
の分析を続けて得られる最高濃度Bの比、A/Bを表層粒
子濃度比と定義した。測定装置、条件は下記のとおりで
ある。Detector PM: RCA31034 / Photon Counting System (Hamamatsu C123
0) (supply 1600V) Measurement condition SLIT 1000μm LASER 100mW GATE TIME 1.0sec SCAN SPEED 12cm -1 / min SAMPLING INTERVAL 0.2cm -1 REPEAT TIME 6 (9) Surface particle concentration ratio Using secondary ion mass spectrum (SIMS) The concentration ratio of the element having the highest concentration among the elements originating from the particles in the film and the carbon element of the thermoplastic resin is taken as the particle concentration, and the analysis in the thickness direction is performed. The ratio of the particle concentration A at the outermost surface particle concentration (point at the depth of 0) measured by SIMS and the maximum concentration B obtained by continuing the analysis in the depth direction, A / B was defined as the surface layer particle concentration ratio. The measuring device and conditions are as follows.
1次イオン種:O2 + 1次イオン加速電圧:12KV 1次イオン電流:200nA ラスター領域:400μm□ 分析領域:ゲート30% 測定真空度:6.0×10-9Torr E−GUN:0.5KV−3.0A (10)表面突起の高さ、高さ分析、個数 2検出器方式の走査型電子顕微鏡[ESM−3200、エリオ
ニクス(株)製]と断面測定装置[PMS−1、エリオニ
クス(株)製]においてフィルム表面の平坦面の高さを
0として走査した時の突起の高さ測定値を画像処理装置
[IBAS2000、カールツァイス(株)製]に送り、画像処
理装置上にフイルム表面突起画像を再構築する。次に、
この表面突起画像で突起部分を2値化して得られた個々
の突起の面積から円相当径を求めこれをその突起の平均
径とする。また、この2値化された個々の突起部分の中
で最も高い値をその突起の高さとし、これを個々の突起
について求める。この測定を場所をかえて500回繰返
し、突起個数を求め、測定された全突起についてその高
さの平均値を平均高さとした。また個々の突起の高さデ
ータをもとに、高さ分布の標準偏差を求めた。相対標準
偏差はこの標準偏差を平均高さで割った値である。また
走査型電子顕微鏡の倍率は、1000〜8000倍の間の値を選
択する。なお、場合によっては、高精度光干渉式3次元
表面解析装置(WYKO社製TOPO−3D、対物レンズ:40〜200
倍、高解像度カメラ使用が有効)を用いて得られる高さ
情報を上記SEMの値に読み替えて用いてもよい。Primary ion species: O 2 + Primary ion acceleration voltage: 12KV Primary ion current: 200nA Raster area: 400μm □ Analysis area: Gate 30% Measuring vacuum degree: 6.0 × 10 -9 Torr E-GUN: 0.5KV-3.0 A (10) Surface projection height, height analysis, number 2 Detector scanning electron microscope [ESM-3200, Elionix Co., Ltd.] and cross-section measuring device [PMS-1, Elionix Co., Ltd.] In, the height of the flat surface of the film surface was scanned as 0 and the measured height of the projection was sent to the image processing device [IBAS2000, Carl Zeiss Co., Ltd.] and the film surface projection image was re-displayed on the image processing device. To construct. next,
The equivalent circle diameter is calculated from the area of each protrusion obtained by binarizing the protrusion portion in this surface protrusion image, and this is set as the average diameter of the protrusion. In addition, the highest value among the binarized individual projection portions is set as the height of the projection, and this is obtained for each projection. This measurement was repeated 500 times at different places to determine the number of protrusions, and the average value of the heights of all the measured protrusions was taken as the average height. In addition, the standard deviation of the height distribution was calculated based on the height data of each protrusion. The relative standard deviation is the value obtained by dividing this standard deviation by the average height. The magnification of the scanning electron microscope is selected to be a value between 1000 and 8000 times. Depending on the case, a high-precision optical interference type three-dimensional surface analyzer (TOPO-3D manufactured by WYKO, objective lens: 40 to 200)
Height information obtained by using a double high-resolution camera is effective) may be used instead of the SEM value.
(11)磁性層の表面形態 小坂研究所の非接触表面粗さ計HIPOSS(型式ET−30HK)
を用いて3次元粗さを測定した。条件は下記のとおりで
あり、20回の測定の平均値をもって値とした。(11) Surface morphology of magnetic layer Non-contact surface roughness meter HIPOS (Model ET-30HK) from Kosaka Laboratory
Was used to measure the three-dimensional roughness. The conditions are as follows, and the average value of 20 measurements was taken as the value.
・縦倍率:2万倍 ・横倍率:500倍 ・カットオフ:0.08mm ・送りピッチ:0.5μm ・測定長:500μm ・測定面積:0.0194mm2 ・走査速度:100μm/秒 ・HYST:±5nm 平均表面粗さSRzは上記測定によって得られる10点平均
粗さ、ピーク数SPcは中心面±5nmの領域を下から横切っ
て上に出ているピークを1個と数えた場合のピークの
数、すなわちHYST:±5nmにおけるピーク数であり、個/
0.1mm2に換算したものである。・ Vertical magnification: 20,000 times ・ Horizontal magnification: 500 times ・ Cutoff: 0.08 mm ・ Feeding pitch: 0.5 μm ・ Measuring length: 500 μm ・ Measuring area: 0.0194 mm 2・ Scanning speed: 100 μm / sec ・ HYST: ± 5 nm average The surface roughness SRz is the average roughness of 10 points obtained by the above measurement, and the number of peaks SPc is the number of peaks when the number of peaks protruding from the bottom across the central plane ± 5 nm region is counted as one, that is, HYST: Peak number at ± 5 nm,
It is converted to 0.1 mm 2 .
(12)バックコートの表面粗さパラメータRa 表面粗さ計を用いて測定した。条件は下記のとおりであ
り、20回の測定の平均値をもって値とした。(12) Surface roughness parameter Ra of back coat Measured using a surface roughness meter. The conditions are as follows, and the average value of 20 measurements was taken as the value.
・触針先端半径:0.5μm ・触針荷重:5mg ・測定長:1mm .カットオフ値:0.08mm (13)基材フィルムの積層厚さ 2次イオン質量分析装置(SIMS)を用いて、表層から深
さ3000nmの範囲のフイルム中の粒子の内もっとも高濃度
の粒子に起因する元素とポリエステルの炭素元素の濃度
比(M+/C+)を粒子濃度とし、表面から深さ3000nmまで
厚さ方向の分析を行なう。表層では表面という界面のた
めに粒子濃度は低く表面から遠ざかるにつれて粒子濃度
は高くなる。本発明を構成する望ましいフイルムの場合
は、通常ではいったん極大値となった粒子濃度がまた減
少し始める。この濃度分布曲線をもとに表層粒子濃度が
の極大値の1/2となる深さ(この深さは極大値となる深
さよりも深い)を求め、これを積層厚さとした。条件は
次の通り。・ Stylus tip radius: 0.5μm ・ Stylus load: 5mg ・ Measuring length: 1mm. Cut-off value: 0.08mm (13) Laminated thickness of base film Due to the highest concentration of particles in the film in the depth range of 3000nm from the surface layer using the secondary ion mass spectrometer (SIMS) The concentration ratio (M + / C + ) of the element to be used and the carbon element of polyester is used as the particle concentration, and the analysis in the thickness direction from the surface to a depth of 3000 nm is performed. In the surface layer, the particle concentration is low due to the interface of the surface, and the particle concentration increases as the distance from the surface increases. In the case of the desirable film forming the present invention, the particle concentration, which once reached the maximum value, usually starts to decrease again. Based on this concentration distribution curve, the depth at which the surface layer particle concentration becomes 1/2 of the maximum value of (the depth is deeper than the maximum value) was obtained and used as the stack thickness. The conditions are as follows.
測定装置 2次イオン質量分析装置(SIMS) 西独、ATOMIKA社製 A−DIDA3000 測定条件 1次イオン種:O2 + 1次イオン加速電圧:12KV 1次イオン電流:200nA ラスター領域:400μm□ 分析領域:ゲート30% 測定真空度:5.0×10-9Torr E−GUN:0.5KV−3.0A なお、表層から深さ3000nmの範囲にもっとも多く含有す
る粒子が有機高分子粒子の場合はSIMSでは測定が難しい
ので、表面からエッチングしながらXPS(X線光電子分
光法)、IR(赤外分光法)などで上記同様のデプスプロ
ファイルを測定し積層厚さを求めても良いし、また、電
子顕微鏡等による断面観察で粒子濃度の変化状態やコン
トラストの差から界面を認識し積層厚さを求めることも
できる。Measuring instrument Secondary ion mass spectrometer (SIMS) A-DIDA3000 manufactured by ATOMIKA, West Germany Measuring conditions Primary ion species: O 2 + Primary ion accelerating voltage: 12KV Primary ion current: 200nA Raster area: 400μm □ Analysis area: Gate 30% Measurement vacuum degree: 5.0 × 10 -9 Torr E-GUN: 0.5KV-3.0A In addition, it is difficult to measure with SIMS when the most contained particles in the depth range from the surface layer to 3000 nm are organic polymer particles. Therefore, while etching from the surface, the depth profile similar to the above may be measured by XPS (X-ray photoelectron spectroscopy), IR (infrared spectroscopy), etc. to obtain the laminated thickness, or the cross section by an electron microscope or the like. It is also possible to recognize the interface from the state of change in particle concentration and the difference in contrast by observation to determine the layer thickness.
(14)磁気記録媒体のS/N 磁気記録媒体をVTRカセットに組み込み8mmVTRテープと
した。このテープに家庭用VTRを用いてシバソク製のテ
レビ試験波形発生器(TG7/U706)により100%クロマ信
号を記録し、その再生信号からシバソク製カラービデオ
ノイズ測定器(925D/1)でクロマS/Nを測定した。(14) S / N of magnetic recording medium An 8mm VTR tape was built by incorporating the magnetic recording medium into a VTR cassette. Using a VTR for home use on this tape, 100% chroma signal was recorded by a TV test waveform generator (TG7 / U706) made by Shibasoku, and from the reproduced signal, chroma S was made by a color video noise measuring instrument made by Shibasoku (925D / 1). / N was measured.
このクロマS/Nを市販されているNi8テープ(ハイバンド
用8mmVTRテープ、SONY製Hi8MP120)と比較して、S/Nが1
dB以上高い場合はS/N良好、1dB未満の場合はS/N不良と
判定した。Comparing this chroma S / N with commercially available Ni8 tape (8 mm VTR tape for high band, Hi8MP120 made by SONY), S / N is 1
It was judged that the S / N was good when it was higher than dB, and the S / N was poor when it was less than 1 dB.
(15)磁性面の耐久性 上記テープをSONY製Hi8VTRを用いて40℃、80%RHの条件
で1000回再生、巻き戻しを繰り返した後再度上記S/Nを
測定しS/Nの低下が走行前に比べて1dB未満の場合は耐久
性良好、1dB以上の場合は耐久性不良と判定した。(15) Durability of magnetic surface The above tape was reproduced 1,000 times under the condition of 40 ° C and 80% RH using SONY Hi8VTR, and after repeating rewinding, the above S / N was measured again and the S / N declined. It was determined that the durability was good when it was less than 1 dB compared to that before running, and the durability was poor when it was 1 dB or more.
[実施例] 本発明を実施例に基づいて説明する。[Examples] The present invention will be described based on Examples.
実施例1〜10、比較例1〜6 平均粒径の異なる架橋ポリスチレン粒子、コロイダルシ
リカに起因する球形シリカ粒子を含有するエチレングリ
コールスラリーを調製し、テレフタル酸ジメチルとエス
テル交換反応させ、重縮合し、該粒子を1〜35重量%含
有するポリエチレンテレフタレート(以下PETと略す)
のペレットを作った(熱可塑性樹脂A)。また、常法に
よって、コロイダルシリカに起因する球形シリカ粒子
(平均径0.2μm)を0.2重量%を含有するPETを製造
し、熱可塑性樹脂Bとした。Examples 1 to 10 and Comparative Examples 1 to 6 Ethylene glycol slurries containing cross-linked polystyrene particles having different average particle diameters and spherical silica particles derived from colloidal silica were prepared, transesterified with dimethyl terephthalate, and polycondensed. , Polyethylene terephthalate containing 1 to 35% by weight of the particles (hereinafter abbreviated as PET)
Pellets were made (thermoplastic resin A). Further, PET containing 0.2% by weight of spherical silica particles (average diameter 0.2 μm) derived from colloidal silica was produced by a conventional method, and was designated as a thermoplastic resin B.
これらのポリマをそれぞれ180℃で6時間減圧乾燥(3To
rr)した後、熱可塑性樹脂Bを押出機1に供給し310℃
で溶融し、さらに、熱可塑性樹脂Aを押出機2に供給
し、280℃で溶融し、これらのポリマを合流ブロックで
合流積層し、静電印加キャスト法を用いて表面温度30℃
のキャスティングドラムに巻きつけて冷却固化し、積層
未延伸フィルムを作った。この時、それぞれの押出機の
吐出量を調節し総厚さ、熱可塑性樹脂A層の厚さを調節
した。Each of these polymers was dried under reduced pressure at 180 ° C for 6 hours (3To
rr), and then the thermoplastic resin B is supplied to the extruder 1 at 310 ° C.
Melt, and then the thermoplastic resin A is supplied to the extruder 2 and melted at 280 ° C., these polymers are combined and laminated in a confluent block, and a surface temperature of 30 ° C. is obtained by using an electrostatically applied casting method.
It was wound around a casting drum of No. 1 and cooled and solidified to make a laminated unstretched film. At this time, the discharge amount of each extruder was adjusted to adjust the total thickness and the thickness of the thermoplastic resin A layer.
この未延伸フィルムを温度80℃にて長手方向に4.0倍延
伸した。この延伸は2組ずつのロールの周速差で、3段
階で行なった。この一軸延伸フィルムをステンタを用い
て延伸速度2,000%/分で100℃で幅方向に4.0倍延伸
し、さらに縦方向に1.6倍再延伸した後、定長下で、190
℃にて5秒間熱処理し、総厚さ7μmの二軸配向積層フ
ィルムを得た。また公知の方法で0.2μm径の球形シリ
カを0.2重量%および0.6μmの球形シリカを0.05重量%
をフイルム全体に含有する総厚さ7μmの二軸配向単層
フィルムを得た。さらに0.3μm径の球形シリカをフイ
ルム全体に6重量%含有する二軸配向単層フィルムを得
た。This unstretched film was stretched 4.0 times in the longitudinal direction at a temperature of 80 ° C. This stretching was carried out in three stages with the difference in peripheral speed between each pair of rolls. This uniaxially stretched film was stretched 4.0 times in the width direction at 100 ° C at a stretching speed of 2,000% / min using a stenter, and then re-stretched 1.6 times in the longitudinal direction, and then stretched at a constant length to 190 times.
Heat treatment was performed at 5 ° C. for 5 seconds to obtain a biaxially oriented laminated film having a total thickness of 7 μm. Further, 0.2% by weight of spherical silica having a diameter of 0.2 μm and 0.05% by weight of spherical silica having a diameter of 0.6 μm are prepared by a known method.
A biaxially oriented monolayer film having a total thickness of 7 μm containing Further, a biaxially oriented monolayer film containing 6% by weight of spherical silica having a diameter of 0.3 μm in the entire film was obtained.
これらのフィルムに磁性塗料をグラビヤロールを用い
て、A層側の面(特徴面)に塗布した。磁性塗料は次の
ようにして調製した。A magnetic coating was applied to these films using a gravure roll on the surface (characteristic surface) on the layer A side. The magnetic paint was prepared as follows.
・Fe(鉄) 100部 平均粒子サイズ 長さ:0.3μm 針状比:10/1 抗磁力 2000 Oe ・ポリウレタン樹脂 15部 ・塩化ビニル・酢酸ビニル共重合体 5部 ・ニトロセルロース樹脂 5部 ・酸化アルミ粉末 3部 平均粒径:0.3μm ・カーボンブラック 1部 ・レシチン 2部 ・メチルエチルケトン 100部 ・メチルイソブチルケトン 100部 ・トルエン 100部 ・ステアリン酸 2部 上記組成物をボールミルで48時間混合分散した後、硬化
剤6部を添加して得られた混練物をフィルターでろ過し
て磁性塗布液を準備し、上記フィルム上に塗布、磁場配
向させ、110℃で乾燥し、さらに小型テストカレンダー
装置(スチールロール/ナイロンロール、5段)で、温
度、線圧を変更してカレンダー処理した後ロール状に巻
とり、10〜150℃の範囲で温度を変更して、48時間キュ
アリングし塗布型磁気記録媒体を得た。・ Fe 100 parts Average particle size Length: 0.3 μm Needle ratio: 10/1 Coercive force 2000 Oe ・ Polyurethane resin 15 parts ・ Vinyl chloride / vinyl acetate copolymer 5 parts ・ Nitrocellulose resin 5 parts ・ Oxidation Aluminum powder 3 parts Average particle size: 0.3 μm ・ Carbon black 1 part ・ Lecithin 2 parts ・ Methyl ethyl ketone 100 parts ・ Methyl isobutyl ketone 100 parts ・ Toluene 100 parts ・ Stearic acid 2 parts After mixing and dispersing the above composition in a ball mill for 48 hours The kneaded product obtained by adding 6 parts of the curing agent was filtered with a filter to prepare a magnetic coating liquid, which was coated on the film, magnetically oriented, dried at 110 ° C., and further a small test calender device (steel). Roll / nylon roll (5 steps), temperature and linear pressure are changed, calendered, rolled into a roll, temperature is changed in the range of 10 to 150 ° C, curing is applied for 48 hours, and coating type It was got distracted recording medium.
これらの磁気記録媒体の特性は第1表、第2表に示した
とおりであり、本発明の要件を満足する塗布型磁気記録
媒体は、S/Nが高く、かつ繰り返し走行させた後のS/N低
下小さく耐久性に優れているが、そうでない場合は上記
を満足する磁気記録媒体は得られないことがわかる。The characteristics of these magnetic recording media are as shown in Tables 1 and 2, and the coating type magnetic recording media satisfying the requirements of the present invention have a high S / N and S after repeated running. Although the / N drop is small and the durability is excellent, it is understood that a magnetic recording medium satisfying the above cannot be obtained if it is not.
比較例7 比較例4で得られた二軸配向単層フィルムの片面に、塩
化ビニル系バインダに平均粒径0.7μmの球状シリカ粒
子を乾燥後に10重量%(約5体積%)となるように含有
した塗液を公知の方法で塗布し、乾燥させて厚さ1.5μ
mの塗膜を形成させた。更に該塗膜の上に磁性層を設
け、塗布型磁気記録媒体を得た。Comparative Example 7 On one side of the biaxially oriented single layer film obtained in Comparative Example 4, spherical silica particles having an average particle size of 0.7 μm were dried in a vinyl chloride binder so that the weight of the spherical silica particles became 10% by weight (about 5% by volume). Apply the contained coating liquid by a known method and dry it to a thickness of 1.5μ.
m coating film was formed. Further, a magnetic layer was provided on the coating film to obtain a coating type magnetic recording medium.
得られた磁気記録媒体の磁性層表面の凹凸ピーク数(SP
c)は70個/0.1mm2、10点平均粗さSRzは35nmであり、該
磁気記録媒体のS/Nは0.9dB、磁性面の耐久性(走行後の
S/N低下)は3.5dBであった。The number of peaks and depressions on the magnetic layer surface of the obtained magnetic recording medium (SP
c) is 70 pieces / 0.1 mm 2 , 10-point average roughness SRz is 35 nm, S / N of the magnetic recording medium is 0.9 dB, and durability of magnetic surface (after running)
S / N decrease) was 3.5 dB.
[発明の効果] 本発明は、磁気記録媒体の磁性層表面を従来と大幅に変
え、緻密な凹凸を多く形成した結果、ノイズの発生は小
さく押さえながらその耐摩耗性を向上できたので、S/N
が高く、かつ繰り返し走行させた後のS/N低下小さく耐
久性に優れる磁気記録媒体が得られたものであり、また
特殊な基材フイルムを用いることにより、上記磁性層の
表面が得やすく、また、S/Nを一層高く、S/N低下を一層
小さくできたものである。[Advantages of the Invention] In the present invention, the surface of the magnetic layer of the magnetic recording medium is significantly changed from the conventional one, and a large number of minute irregularities are formed. As a result, the abrasion resistance can be improved while suppressing the generation of noise. / N
Is high, and a magnetic recording medium having a small S / N reduction after repeated running and excellent durability is obtained, and by using a special substrate film, the surface of the magnetic layer is easily obtained, In addition, the S / N was made higher, and the S / N reduction could be made smaller.
本発明の磁気記録媒体はビデオテープ、フロッピーディ
スク、ビデオフロッピー、オーディオテープ、メモリー
テープ等全ての用途に有用であるが、高密度記録の8mm
ビデオ、8mmハイバンドビデオ、SVHSビデオ、デジタル
ビデオ用、HDTV(ハイディフィニションTV、高品位テレ
ビ)用等の高密度磁気記録媒体あるいは繰り返し使用が
多いソフト用ビデオテープ等に特に有用である。The magnetic recording medium of the present invention is useful for all applications such as video tapes, floppy disks, video floppies, audio tapes, memory tapes, etc.
It is especially useful for high-density magnetic recording media for video, 8 mm high-band video, SVHS video, digital video, HDTV (high definition TV, high-definition television), etc., or video tapes for software that is often used repeatedly.
Claims (7)
性層を設けてなる磁気記録媒体であって、該磁性層の表
面の凹凸のピーク数(SPc)が100以上、かつ、10点平均
粗さSRzが500nm以下であることを特徴とする磁気記録媒
体。1. A magnetic recording medium comprising a coating type magnetic layer provided on at least one side of a substrate film, wherein the number of peaks (SPc) of irregularities on the surface of said magnetic layer is 100 or more and a 10-point average roughness. A magnetic recording medium characterized in that SRz is 500 nm or less.
に熱可塑性樹脂Aと粒子を主成分とする厚さ0.005〜3
μmのフィルム層Aを有する二軸配向熱可塑性樹脂フイ
ルムであって、該フィルム層A中に含有される粒子の平
均粒径がフィルム層Aの厚さの0.1〜10倍、該粒子の含
有量が1〜30重量%であることを特徴とする請求項
(1)記載の磁気記録媒体。2. A base film having a thickness of 0.005 to 3 containing a thermoplastic resin A and particles as main components on at least one surface layer of the base film.
A biaxially oriented thermoplastic resin film having a film layer A of μm, wherein the average particle size of the particles contained in the film layer A is 0.1 to 10 times the thickness of the film layer A, and the content of the particles is The magnetic recording medium according to claim 1, wherein the content is 1 to 30% by weight.
ルムであり、その少なくとも片面の表面突起の平均高さ
がフィルム中の粒子の平均粒径の1/4以上であり、か
つ、突起個数が1万個/mm2以上であることを特徴とする
請求項(1)記載の磁気記録媒体。3. The base film is a biaxially oriented thermoplastic resin film, the average height of surface protrusions on at least one side of the film is 1/4 or more of the average particle size of the particles in the film, and the number of protrusions. 2. The magnetic recording medium according to claim 1, wherein the number is 10,000 / mm 2 or more.
ルムであり、その少なくとも片面の表面について、フィ
ルム中の粒子の平均粒径の1/3以下の高さの突起数が全
突起数の70%以下であることを特徴とする請求項(1)
記載の磁気記録媒体。4. The base film is a biaxially oriented thermoplastic resin film, and the number of protrusions having a height not more than 1/3 of the average particle size of the particles in the film on at least one surface of the film is the total number of protrusions. 70% or less, Claim (1) characterized by the above-mentioned.
The magnetic recording medium described.
ルムであり、その少なくとも片面の表面突起高さ分布の
相対標準偏差が0.6以下であることを特徴とする請求項
(1)記載の磁気記録媒体。5. The magnetic material according to claim 1, wherein the base film is a biaxially oriented thermoplastic resin film, and the relative standard deviation of the surface projection height distribution on at least one surface is 0.6 or less. recoding media.
ルムであり、その長手方向のF5値が15kg/mm2以上である
ことを特徴とする(1)〜(5)のいずれかに記載の磁
気記録媒体。6. The substrate film is a biaxially oriented thermoplastic resin film, and the F5 value in the longitudinal direction thereof is 15 kg / mm 2 or more, (1) to (5). Magnetic recording medium.
する請求項(1)〜(6)のいずれかに記載の磁気記録
媒体。7. The magnetic recording medium according to claim 1, wherein the magnetic layer is a metal coating type.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1337281A JPH07118078B2 (en) | 1989-12-25 | 1989-12-25 | Magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1337281A JPH07118078B2 (en) | 1989-12-25 | 1989-12-25 | Magnetic recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03198218A JPH03198218A (en) | 1991-08-29 |
| JPH07118078B2 true JPH07118078B2 (en) | 1995-12-18 |
Family
ID=18307135
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1337281A Expired - Fee Related JPH07118078B2 (en) | 1989-12-25 | 1989-12-25 | Magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07118078B2 (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63224020A (en) * | 1987-03-12 | 1988-09-19 | Hitachi Maxell Ltd | Magnetic recording medium |
| JPH01146132A (en) * | 1987-12-02 | 1989-06-08 | Mitsubishi Electric Corp | Magnetic disk |
-
1989
- 1989-12-25 JP JP1337281A patent/JPH07118078B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03198218A (en) | 1991-08-29 |
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