JPH09135492A - Lead frame for electro-acoustic transducer - Google Patents
Lead frame for electro-acoustic transducerInfo
- Publication number
- JPH09135492A JPH09135492A JP25409095A JP25409095A JPH09135492A JP H09135492 A JPH09135492 A JP H09135492A JP 25409095 A JP25409095 A JP 25409095A JP 25409095 A JP25409095 A JP 25409095A JP H09135492 A JPH09135492 A JP H09135492A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- lead frame
- solder
- lead
- electroacoustic transducer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/02—Soldered or welded connections
- H01R4/023—Soldered or welded connections between cables or wires and terminals
- H01R4/024—Soldered or welded connections between cables or wires and terminals comprising preapplied solder
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
- H04R1/00—Details of transducers, loudspeakers or microphones
- H04R1/06—Arranging circuit leads; Relieving strain on circuit leads
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Signal Processing (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Audible-Bandwidth Dynamoelectric Transducers Other Than Pickups (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電子部品、特にサ
ウンダー、スピーカー、マイクロホン、イヤホン、ピッ
クアップ、磁気ヘッド等の電気音響変換器の内部素子の
接続及び外部素子との接続に用いるリードフレームに関
するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic component, and more particularly to a lead frame used for connecting internal elements and external elements of electroacoustic transducers such as sounders, speakers, microphones, earphones, pickups and magnetic heads. Is.
【0002】[0002]
【従来の技術】例えば、電気音響変換器の一種であるサ
ウンダーについて説明すると、リードフレーム1は、一
例を図4に示すように、金属基材をエッチングもしくは
打ち抜いて成形した成形体であって、そのリード端子6
A、6B、6C、6Dをインナーリード部としインナー
リード部上に図4の想像線に示す如く(図示されない)
ポールピース部を内包したベース部材を合成樹脂によっ
て成形したベース部が一体成形されると共に、該ベース
部上の、該ポールピースに設置したコイルの端末をリー
ド端子に接続した後、共鳴室を形成するための合成樹脂
のケースを前記ベース部に接合して覆って電気音響変換
器のパッケージを行い、さらに、リード端子のアウター
リード部7A、7B、7C、7Dを90°曲げ加工して
外部接続用端子を構成して電気音響変換器が完成され
る。図中、5はリードフレームの加工及びリードフレー
ム1上に成形加工するためのガイド孔である。前記外部
接続用端子は表面実装用基板に半田付けされる重要な部
分である。2. Description of the Related Art For example, a sounder which is a kind of electro-acoustic transducer will be described. The lead frame 1 is a molded body formed by etching or punching a metal base material as shown in FIG. The lead terminal 6
A, 6B, 6C and 6D are used as inner lead portions, and as shown by imaginary lines in FIG. 4 on the inner lead portions (not shown).
A base member formed by molding a synthetic resin of a base member containing a pole piece is integrally formed, and a resonance chamber is formed after connecting a terminal of a coil installed on the pole piece on the base to a lead terminal. A synthetic resin case for bonding is covered with the base part to cover it to package the electroacoustic transducer, and the outer lead parts 7A, 7B, 7C, 7D of the lead terminals are bent by 90 ° to be externally connected. The electroacoustic transducer is completed by configuring the terminals for use. In the figure, reference numeral 5 is a guide hole for processing the lead frame and forming on the lead frame 1. The external connection terminal is an important part to be soldered to the surface mounting board.
【0003】このような電気音響変換器のリードフレー
ム(以下「フレーム」と言う)には最近Cu−Zn系
(例えばCu−30%Zn、Cu−40%Zn)、Cu
−Sn系(例えばCu−4%Sn−0.2%P)等の合
金(以下「基材」と略記する)が用いられるようになっ
た。上記したCu−Zn系及びCu−Sn系合金のフレ
ーム材は、曲げ加工時のクラック発生を防止するため
に、伸び率が5〜50%のものが用いられていた。さら
に詳細には、例えばCu−30%Zn系合金の板条には
厚さ1μmのCu下地めっきを施した後その上に厚さ5
ないし7μmの光沢半田めっきを施したものがフレーム
として用いられている。この光沢めっきが採用されてい
るのは基材の半田付け性を良くするためである。また、
例えばCu−4%Sn−0.2%P合金に厚さ2ないし
5μmのNi下地めっきを施した後その上に厚さ5ない
し7μmの光沢半田めっきを施したものもフレームとし
て用いられている。The lead frame (hereinafter referred to as "frame") of such an electroacoustic transducer has recently been made of Cu-Zn system (for example, Cu-30% Zn, Cu-40% Zn), Cu.
Alloys such as -Sn system (e.g. Cu-4% Sn-0.2% P) (hereinafter abbreviated as "base material") have come to be used. As the frame material of the above-mentioned Cu-Zn-based and Cu-Sn-based alloys, those having an elongation of 5 to 50% have been used in order to prevent the occurrence of cracks during bending. More specifically, for example, a strip of Cu-30% Zn-based alloy is subjected to Cu undercoating with a thickness of 1 μm and then a thickness of 5
It is used as a frame that has been plated with 7 to 7 μm of bright solder. This bright plating is used to improve the solderability of the base material. Also,
For example, a Cu-4% Sn-0.2% P alloy having a thickness of 2 to 5 .mu.m on which Ni undercoat is plated and then a bright solder plating having a thickness of 5 to 7 .mu.m on it is also used as a frame. .
【0004】[0004]
【発明が解決しようとする課題】これらのめっきを施さ
れたフレームを用いて樹脂封止を行い、最終の工程でア
ウターリード部に90°曲げ加工を施すと、金属基材の
曲げコーナー部分に微細な割れが生じ、さらに基板上に
半田付けする際、これら微細な割れが原因となって曲げ
部分において経時変化による半田濡れ性の劣化が生じ、
基板実装での半田付け不良が発生する。When resin-sealing is performed using these plated frames and the outer lead portions are bent by 90 ° in the final step, the bent corner portions of the metal base material are Fine cracks occur, and when soldering onto the substrate, these fine cracks cause deterioration of solder wettability due to aging in the bent portion,
Poor soldering occurs on board mounting.
【0005】また、Cu−Zn系合金をフレームに用い
た場合Znが半田付時に半田めっき層に析出・拡散し、
半田濡れ性を著しく阻害する。同様に、Cu−Sn系合
金に半田光沢めっきを施したフレームのアウターリード
部を90°曲げ加工すると、基材に微小割れは発生して
いなくとも、半田めっき層に微細な割れが発生し、基板
実装時にアウターリードを外部素子のリードに接合する
際に半田付け不良が発生する。When a Cu-Zn alloy is used for the frame, Zn is deposited and diffused in the solder plating layer during soldering,
Remarkably hinders solder wettability. Similarly, when the outer lead portion of a frame obtained by applying a solder bright plating to a Cu-Sn alloy is bent by 90 °, fine cracks are generated in the solder plating layer even if microcracks are not generated in the base material. Soldering failure occurs when the outer lead is joined to the lead of the external element during mounting on the board.
【0006】このような基板実装における半田付け不良
は電気音響変換器の信頼性の点で大きな問題になってい
る。すなわち電気音響変換器の不良原因を解析すると、
割れ部に実装時の半田が流れ込んでいないために、接続
欠陥があり、これが原因の一つであることが分かった。[0006] Such soldering failure in mounting on a substrate has become a serious problem in terms of reliability of the electroacoustic transducer. That is, when analyzing the cause of the electroacoustic transducer failure,
It was found that one of the causes was a connection defect because solder did not flow into the cracked part during mounting.
【0007】[0007]
【課題を解決するための手段】本発明はこれに鑑み種々
検討の結果、フレームに経済的なめっき処理を施すとと
もに、高信頼性の電気音響変換器を製造できる電気音響
変換器用リードフレームを開発したもので、伸び率20
%以上の金属基板板条から成形したフレームにおいて、
該フレームの全面又は少なくともリード端子部分に光沢
剤を含有しないめっき液によるNi下地めっきを施し、
その上に光沢剤を含有しないめっき液による半田めっき
を施したことを特徴とするものである。As a result of various studies in view of this, the present invention develops an electroacoustic transducer lead frame capable of producing an electroacoustic transducer with high reliability while economically plating the frame. The growth rate is 20
In a frame molded from a metal board plate strip of more than%,
Ni base plating with a plating solution containing no brightening agent is applied to the entire surface of the frame or at least the lead terminal portion,
It is characterized in that a solder plating with a plating solution containing no brightening agent is applied thereon.
【0008】本発明においては、Niめっき浴及び半田
めっき浴にチオ尿素、サッカリン、ブドウ糖などの有機
化合物あるいはチオ硫酸塩などの無機化合物からなる光
沢剤を含有させないでそれぞれのめっきを行う。これ
は、光沢剤が含有されると、めっき面が光沢化しめっき
構造が微細化するとともに、フレームを曲げるときにめ
っき皮膜に割れが発生し易くなるからである。光沢剤を
含有しないめっき液により形成されるめっきを以下「無
光沢めっき」と言う。In the present invention, the Ni plating bath and the solder plating bath are each plated without containing a brightening agent made of an organic compound such as thiourea, saccharin, glucose or the like or an inorganic compound such as thiosulfate. This is because when the brightener is contained, the plated surface becomes glossy and the plated structure becomes finer, and cracks easily occur in the plated film when the frame is bent. The plating formed by the plating solution containing no brightening agent is hereinafter referred to as "matte plating".
【0009】ニッケルめっき液としては、普通浴、ワッ
ト浴、半光沢浴、スルファミン酸浴などを用いることが
できるが、ワット浴が特に好ましい。同様に半田めっき
浴としては、ほうフッ酸半田めっき浴、メタンスルホン
酸浴などを用いることができるが、メタンスルホン酸浴
が好ましい。As the nickel plating solution, a normal bath, a Watts bath, a semi-bright bath, a sulfamic acid bath and the like can be used, but a Watts bath is particularly preferable. Similarly, as the solder plating bath, a borofluoric acid solder plating bath, a methanesulfonic acid bath, or the like can be used, but a methanesulfonic acid bath is preferable.
【0010】さらに、本発明において、金属基板板条合
金の伸び率を20%以上とするのは、伸び率が20%未
満の金属基材をプレス成形もしくはエッチング加工後め
っきを施し、その後に曲げ加工を施すとリード部のコー
ナーにクラックが発生し、経時変化により下地めっきが
酸化され、半田の濡れ性が劣化するためである。Further, in the present invention, the elongation rate of the strip alloy of the metal substrate is set to 20% or more in order that the metal base material having the elongation rate of less than 20% is subjected to press forming or etching and then plating, followed by bending. This is because when processing is performed, cracks are generated in the corners of the lead portion, the base plating is oxidized due to changes with time, and the wettability of the solder deteriorates.
【0011】すなわち本発明は伸び率20%以上を有す
る金属基板板条合金をプレス又はエッチングによりフレ
ームに成形加工してから図3に示すようにフレーム1の
表面に厚さ0.01ないし2.0μm、好ましくは0.
05ないし0.3μm未満の無光沢Ni下地めっきを施
し、その上に厚さ1ないし10μm、好ましくは5ない
し7μmの無光沢半田めっきの被覆層を設けたものであ
る。Ni及び半田めっきはフレームの全面に施すか、又
は少なくともリード端子部分に施すものとし、電気めっ
きによって所望の厚さにめっきし被覆すればよい。半田
としては特に90%Sn−10%Pb系が好ましい。That is, according to the present invention, a metal substrate sheet alloy having an elongation of 20% or more is formed into a frame by pressing or etching, and then the surface of the frame 1 has a thickness of 0.01 to 2. As shown in FIG. 0 μm, preferably 0.
A matte Ni undercoat having a thickness of 05 to less than 0.3 μm is applied, and a coating layer of a matte solder plating having a thickness of 1 to 10 μm, preferably 5 to 7 μm is provided thereon. Ni and solder plating may be applied to the entire surface of the frame, or at least to the lead terminal portion, and may be plated by electroplating to a desired thickness and coated. 90% Sn-10% Pb-based solder is particularly preferable.
【0012】本発明における金属基材としてFe−3
5.5〜36.5%Ni合金、Fe−40.5〜41.
5%Ni、Fe−49.5〜51.5%Ni合金等のF
e−Ni系合金、及び黄銅、りん青銅、ばね用りん青銅
等の銅合金が好ましく選択されるが、伸び率20%以上
を有し、かつNi下地めっきのなじみが良く半田濡れ性
が良好であれば、上記以外の金属基板が選択可能であ
る。Fe-3 as the metal substrate in the present invention
5.5-36.5% Ni alloy, Fe-40.5-41.
F such as 5% Ni, Fe-49.5 to 51.5% Ni alloy
An e-Ni-based alloy and a copper alloy such as brass, phosphor bronze, and phosphor bronze for springs are preferably selected, but have an elongation rate of 20% or more, and are well compatible with Ni undercoat and have good solder wettability. If so, a metal substrate other than the above can be selected.
【0013】Fe−Ni合金の伸び率を20%以上とす
るには、再結晶焼鈍後の調質圧延の圧延率(板厚減少
率)を10%以下とする工程を採用すればよい。なおこ
の調質圧延後歪取り焼鈍を施すと伸び率はさらに高くな
るが、強度の低下を防ぐためには500〜600℃での
歪取焼鈍が好ましい。又、圧延後、調質焼鈍を600〜
700℃で行うことによっても20%以上の伸び率が得
られるが、調質圧延の方が調質焼鈍より品質のばらつき
が少ない。In order to increase the elongation rate of the Fe-Ni alloy to 20% or more, it is advisable to adopt a process in which the rolling rate (sheet thickness reduction rate) of the temper rolling after recrystallization annealing is 10% or less. The strain rate is further increased by performing stress relief annealing after temper rolling, but strain relief annealing at 500 to 600 ° C. is preferable in order to prevent a decrease in strength. In addition, after rolling, temper annealing is 600 to
An elongation of 20% or more can be obtained by carrying out at 700 ° C, but temper rolling has less variation in quality than temper annealing.
【0014】銅系合金は再結晶焼鈍の調質圧延の圧延率
を、黄銅の場合は20%以下、一般りん青銅の場合は1
5%以下、ばね用りん青銅の場合は25%以下として、
圧延することにより、20%以上の伸び率を得ることが
できる。Copper-based alloys have a rolling ratio of 20% or less for temper rolling of recrystallization annealing, and 1 for general phosphor bronze.
5% or less, 25% or less for phosphor bronze for springs,
By rolling, an elongation rate of 20% or more can be obtained.
【0015】本発明のフレームは上記構成からなり、金
属基材の伸び率を20%以上としたことでリード端子部
分の90°曲げ加工時のクラック発生を防止している。
さらに基板に実装されるリード端子部分の表面をNiめ
っきで被覆することにより、基材からの含有成分元素の
拡散を防止する。又基材の上に被覆されるNiめっき及
び半田めっきを無光沢めっきとすることにより、90°
曲げ加工によるめっき部分の微細クラックの発生を防止
する。The frame of the present invention has the above-mentioned structure, and the elongation rate of the metal base material is set to 20% or more to prevent the occurrence of cracks during the 90 ° bending process of the lead terminal portion.
Further, by coating the surface of the lead terminal portion mounted on the substrate with Ni plating, diffusion of the contained component elements from the base material is prevented. Also, by making the Ni plating and solder plating coated on the base material dull, 90 °
Prevents the generation of fine cracks in the plated part due to bending.
【0016】しかしてNiの無光沢めっきの厚さは0.
01ないし2μmとすることが必要であり、被覆厚さが
0.01μm未満では合成樹脂封止時の加熱条件におけ
る金属基板に含まれる合金元素や不純物元素の拡散バリ
ヤーとしての効果が失われ、2μmを超えるとより大き
な効果が得られず不経済である。Ni被覆層の厚さは
0.05ないし0.3μmが望ましい。However, the thickness of the matte plating of Ni is 0.
It is necessary to set the thickness to 01 to 2 μm, and if the coating thickness is less than 0.01 μm, the effect as a diffusion barrier for alloying elements and impurity elements contained in the metal substrate under the heating condition at the time of sealing the synthetic resin is lost, and If it exceeds, it is uneconomical because it does not have a greater effect. The thickness of the Ni coating layer is preferably 0.05 to 0.3 μm.
【0017】従来法のように、光沢Niめっきを施す
と、電着ニッケルは歪が多くかつ微結晶となる結果金属
基材よりも硬質で加工性に劣るため、リード端子のアウ
ターリード部の曲げ加工時にクラックが発生し、リード
部の欠陥となり、特に電気音響変換器ではアウターリー
ドの曲げは、半径(r)が0.5mm以下、板厚(t)
に対する比率(r/t)が2.5以下と厳しく、めっき
層につき優れた加工性が要求されるので、本発明におい
ては無光沢Niめっきとした。When the bright Ni plating is applied as in the conventional method, the electrodeposited nickel has a large amount of strain and becomes fine crystals, and as a result, it is harder and less workable than the metal base material, and therefore the outer lead portion of the lead terminal is bent. A crack is generated during processing, which leads to a defect in the lead portion. Particularly, in the electroacoustic transducer, the bending of the outer lead has a radius (r) of 0.5 mm or less and a plate thickness (t).
Since the ratio (r / t) to (2) is strict as 2.5 or less and excellent workability is required for the plating layer, dull Ni plating was used in the present invention.
【0018】また、半田の被覆層の厚さは1ないし10
μmとすることが望ましく、被覆厚さが1μm未満では
基板実装時の半田付け強度が不足し、また10μmを超
えると半田が過剰となりかつ不経済である。半田被覆層
の厚さは好ましくは5ないし7μmが望ましい。また半
田の被覆層を無光沢めっきとしたのは、Niめっきの場
合と同様の理由である。以下、実施例により本発明を詳
しく説明する。The thickness of the solder coating layer is 1 to 10
If the coating thickness is less than 1 μm, the soldering strength at the time of board mounting is insufficient, and if it exceeds 10 μm, the solder becomes excessive and uneconomical. The thickness of the solder coating layer is preferably 5 to 7 μm. The reason why the solder coating layer is matte plating is the same as in the case of Ni plating. Hereinafter, the present invention will be described in detail with reference to examples.
【0019】本発明の無光沢めっき浴組成及び条件とし
て好ましいものは次のとおりである。 A.無光沢Niめっき浴組成 硫酸ニッケル:200g/L〜250g/L 塩化ニッケル: 35g/L〜45g/L ほう酸 : 20g/L〜30g/L pH : 4〜5 浴温度 : 40℃〜55℃ 電流密度 : 1A/dm2 〜8A/dm2 B.無光沢半田めっき浴組成 ほうフッ化第1スズ :80g/L〜120g/L ほうフッ化鉛 :20g/L〜40g/L 遊離ほうフッ化水素酸:80g/L〜120g/L 遊離ほう酸 :20g/L〜30g/L Bナフトール :0.5g/L〜3g/L ホルマリン :8g/L〜15g/L pH :4〜5 浴温度 :15℃〜30℃ 電流密度 :1A/dm2 〜6A/dm2 The preferred matte plating bath composition and conditions of the present invention are as follows. A. Matte Ni plating bath composition Nickel sulfate: 200 g / L to 250 g / L Nickel chloride: 35 g / L to 45 g / L Boric acid: 20 g / L to 30 g / L pH: 4 to 5 Bath temperature: 40 ° C. to 55 ° C. Current density : 1A / dm 2 ~8A / dm 2 B. Matte solder plating bath composition Stannous borofluoride: 80 g / L to 120 g / L Lead borofluoride: 20 g / L to 40 g / L Free hydrofluoric acid: 80 g / L to 120 g / L Free boric acid: 20 g / L to 30 g / L B naphthol: 0.5 g / L to 3 g / L formalin: 8 g / L to 15 g / L pH: 4 to 5 Bath temperature: 15 ° C. to 30 ° C. Current density: 1 A / dm 2 to 6 A / dm 2
【0020】[0020]
【実施例】それぞれ伸び率20%を有する厚さ0.2m
mのFe−36%Ni合金、Fe−42%Ni合金、F
e−50Ni%合金、及びJIS H 3110に規定される黄
銅、りん青銅、JIS H 3130に規定されるばね用りん青銅
用を金属基材板条を圧延方向に幅10mm、長さ100
mmの短冊状の試験片とし、これらを本発明の実施例1
〜6とし、以下述べる試験に供しそして評価した。Examples 0.2 m thick with 20% elongation in each case
Fe-36% Ni alloy, Fe-42% Ni alloy, F
e-50Ni% alloy, brass and phosphor bronze specified in JIS H 3110, and phosphor bronze for springs specified in JIS H 3130, metal base strip 10 mm wide and 100 mm long in the rolling direction.
mm strip-shaped test pieces, which are used in Example 1 of the present invention.
.About.6 and subjected to the tests described below and evaluated.
【0021】無光沢Niめっきは以下の方法で行った。 (1)浴組成 硫酸ニッケル 240g/L 塩化ニッケル 45g/L ほう酸 30g/L pH 5.0 (2)浴温度 50℃ (3)電流密度 5A/dm2 Matte Ni plating was performed by the following method. (1) Bath composition nickel sulfate 240 g / L nickel chloride 45 g / L boric acid 30 g / L pH 5.0 (2) bath temperature 50 ° C. (3) current density 5 A / dm 2
【0022】無光沢半田めっきは以下の方法で行った。 (1)浴組成 ほうフッ化第1スズ 80g/L ほうフッ化鉛 10g/L 遊離ほうフッ化水素酸 100g/L 遊離ほう酸 25g/L βナフトール 1g/L ホルマリン 20g/L pH 5.0 (2)浴温度 25℃ (3)電流密度 3A/dm2 Matte solder plating was performed by the following method. (1) Bath composition stannous borofluoride 80 g / L lead borofluoride 10 g / L free hydrofluoric acid 100 g / L free boric acid 25 g / L β-naphthol 1 g / L formalin 20 g / L pH 5.0 (2 ) Bath temperature 25 ° C (3) Current density 3 A / dm 2
【0023】また、比較例として伸び率20%未満の上
記と同種の金属基材を比較例とし、上記と同様厚さ0.
2mm、幅10mm、長さ100mmの短冊状の試験片
に調制し、評価試験に供した。Further, as a comparative example, the same kind of metal base material having an elongation rate of less than 20% was used as a comparative example, and the thickness of 0.
A strip-shaped test piece having a width of 2 mm, a width of 10 mm, and a length of 100 mm was prepared and subjected to an evaluation test.
【0024】光沢Niめっきは以下の方法で行った。 (1)浴組成 硫酸ニッケル 300g/L 塩化ニッケル 50g/L ほう酸 40g/L 光沢剤(サッカリン)1.5g/L pH 4.5 (2)浴温度 50℃ (3)電流密度 5A/dm2 Bright Ni plating was performed by the following method. (1) Bath composition Nickel sulfate 300 g / L Nickel chloride 50 g / L Boric acid 40 g / L Brightener (saccharin) 1.5 g / L pH 4.5 (2) Bath temperature 50 ° C. (3) Current density 5 A / dm 2
【0025】光沢半田めっきは以下の方法で行った。 (1)浴組成 ほうフッ化第1スズ 150g/L ほうフッ化鉛 50g/L 遊離ほうフッ化水素酸 100g/L 遊離ほう酸 25g/L βナフトール 1g/L ホルマリン 20g/L 光沢剤(アミンアルデヒド系) 60g/L pH 5.0 (2)浴温度 25℃ (3)電流密度 3A/dm2 Bright solder plating was performed by the following method. (1) Bath composition: stannous borofluoride 150 g / L lead borofluoride 50 g / L free hydrofluoric acid 100 g / L free boric acid 25 g / L β-naphthol 1 g / L formalin 20 g / L brightener (amine aldehyde-based ) 60 g / L pH 5.0 (2) Bath temperature 25 ° C (3) Current density 3 A / dm 2
【0026】基材の合金組成は以下のとおりである。 Fe−36%Ni合金:36.1%Ni,0.3%Mn,0.1%Si, 0.003%C、残部Fe Fe−42%Ni合金:41.6%Ni,0.5%Mn,0.3%Si, 0.004%C、残部Fe Fe−50%Ni合金:49.8%Ni,0.6%Mn,0.4%Si, 0.003%C、残部Fe りん青銅(1) :3.8%Sn,0.18%P,残部Cu りん青銅(2) :4.8%Sn,0.20%P,残部Cu りん青銅(3) :6.1%Sn,0.19%P,残部Cu りん青銅(4) :7.9%Sn,0.21%P,残部Cu 70/30黄銅(1):30.5%Zn,残部Cu 70/30黄銅(2):35.8%Zn,残部Cu 70/30黄銅(3):37.5%Zn,残部Cu ばね用りん青銅 :7.9%Sn,0.20%P,残部CuThe alloy composition of the base material is as follows. Fe-36% Ni alloy: 36.1% Ni, 0.3% Mn, 0.1% Si, 0.003% C, balance Fe Fe-42% Ni alloy: 41.6% Ni, 0.5% Mn, 0.3% Si, 0.004% C, balance Fe Fe-50% Ni alloy: 49.8% Ni, 0.6% Mn, 0.4% Si, 0.003% C, balance Fe phosphorus Bronze (1): 3.8% Sn, 0.18% P, balance Cu phosphor bronze (2): 4.8% Sn, 0.20% P, balance Cu phosphor bronze (3): 6.1% Sn , 0.19% P, balance Cu phosphor bronze (4): 7.9% Sn, 0.21% P, balance Cu 70/30 brass (1): 30.5% Zn, balance Cu 70/30 brass ( 2): 35.8% Zn, balance Cu 70/30 brass (3): 37.5% Zn, balance Cu spring phosphor bronze: 7.9% Sn, 0.20 P, the balance Cu
【0027】上記の試験片を用い、めっき及び基板実装
を想定した以下の評価試験を行った。 (1)めっき密着性:金属基板に所定の下地めっき及び
90%Sn−10%Pb半田めっきを施した後、圧延と
平行方向に90°曲げ(内径半径0.2mm)を行い、
めっき剥離の有無を観察した。Using the test pieces described above, the following evaluation tests were carried out assuming plating and mounting on a substrate. (1) Plating adhesion: After performing a predetermined undercoating and 90% Sn-10% Pb solder plating on a metal substrate, bending 90 ° in a direction parallel to rolling (inner diameter 0.2 mm),
The presence or absence of peeling of the plating was observed.
【0028】(2)めっきの半田付け性:金属基板に所
定の下地めっき及び半田めっきを施した試験片にロジン
・アルコール系フラックスを塗布した試験片を230℃
に保持した60%Sn−40%Pb半田に5秒間浸漬
し、半田濡れ面積を観測した。(2) Solderability of plating: A test piece obtained by applying a rosin / alcohol-based flux to a test piece obtained by subjecting a metal substrate to predetermined undercoating and solder plating is tested at 230 ° C.
The solder wetted area was observed by immersing the solder in 60% Sn-40% Pb solder held for 5 seconds.
【0029】(3)耐熱試験後の半田付け性:金属基板
に所定の下地めっき及び半田めっきを施した試験片を圧
延平行方向に90°曲げ加工を行った後、150℃24
時間大気中で加熱後、前項(2)の方法で半田付けを行
った。それぞれの試験結果を表1及び表2に示す。(3) Solderability after heat resistance test: A test piece obtained by subjecting a metal substrate to predetermined undercoating and soldering is bent at 90 ° in the rolling parallel direction, and then at 150 ° C for 24 hours.
After heating in the atmosphere for a period of time, soldering was performed by the method described in (2) above. The test results are shown in Tables 1 and 2.
【0030】又、各特性の評価は次の方法で行った。め
っきの密着性:試験片を90°曲げを行い、めっき剥離
の有・無を判定した。 めっきの半田付け性:半田濡れ面積が95%以上を合
格、95%未満を不合格とした。 耐熱試験後の半田付け性:半田濡れ面積95%以上を合
格、95%未満を不合格とした。The evaluation of each characteristic was performed by the following methods. Plating adhesion: The test piece was bent at 90 ° and the presence or absence of plating peeling was determined. Solderability of plating: A solder wet area of 95% or more was passed, and less than 95% was rejected. Solderability after heat resistance test: Solder wet area 95% or more was passed, and less than 95% was rejected.
【0031】表1及び表2から明らかなように本発明実
施例No.1〜6は比較例No.7〜12と比較し、実
装状態で高い信頼性を有することが判る。また比較例N
o.12のように伸び率20%以上のばね用りん青銅を
用いた場合でも、光沢の下地Niめっきを施したものは
90°曲げ試験でめっき層においてコーナー割れが認め
られ、基板実装試験における半田濡れ性で不良率が高く
信頼性が劣ることが判る。As is clear from Tables 1 and 2, Example No. 1 of the present invention. Comparative Examples Nos. 1 to 6 are Nos. It can be seen that it has high reliability in the mounted state as compared with Nos. 7 to 12. Comparative Example N
o. Even when using phosphor bronze for springs having an elongation of 20% or more as in No. 12, corner cracks were observed in the plating layer in the 90 ° bending test for those with a bright Ni undercoat, and solder wetting in the board mounting test. It can be seen that the defect rate is high and the reliability is inferior.
【0032】[0032]
【発明の効果】このように、本発明に係るフレームによ
れば金属基材の高い伸び率と半田めっきの特性を有効に
発揮させ、信頼性の高い電気音響変換器を製造すること
ができるものである。又このフレームは、金属基板の高
い伸び率と半田めっきを必要とし、かつ厳しい折り曲げ
加工が施される電子部品のフレームとして著しい効用を
もたらすことも期待される。As described above, according to the frame of the present invention, the high elongation of the metal base material and the characteristics of the solder plating can be effectively exhibited, and a highly reliable electroacoustic transducer can be manufactured. Is. Further, this frame is also expected to bring about a remarkable effect as a frame of an electronic component which requires a high elongation of a metal substrate and solder plating, and is subjected to severe bending work.
【図1】本発明の実施例のリードの構造及び特性を示す
図表(表1)である。FIG. 1 is a chart (Table 1) showing a structure and characteristics of a lead of an example of the present invention.
【図2】比較例のリードの構造及び特性を示す図表(表
2)である。FIG. 2 is a chart (Table 2) showing a structure and characteristics of a lead of a comparative example.
【図3】本発明フレームを示す断面図である。FIG. 3 is a sectional view showing a frame of the present invention.
【図4】プレス成型された本発明フレームの平面図であ
る。FIG. 4 is a plan view of a press-molded frame of the present invention.
1 フレーム 2 金属基材 3 無光沢Niめっき被覆層 4 無光沢はんだめっき被覆層 5 ガイド孔 6 リード端子 7 リード端子のアウターリード部(外部端子) 1 frame 2 metal base material 3 dull Ni plating coating layer 4 dull solder plating coating layer 5 guide hole 6 lead terminal 7 outer lead part of lead terminal (external terminal)
───────────────────────────────────────────────────── フロントページの続き (72)発明者 曽根 高裕 静岡県静岡市中吉田20番10号 スター精密 株式会社内 (72)発明者 鈴木 和詞 静岡県静岡市中吉田20番10号 スター精密 株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Takahiro Sone No. 20-10 Nakayoshida, Shizuoka City, Shizuoka Prefecture Star Precision Co., Ltd. In the company
Claims (6)
光沢剤を含有しないめっき液で形成された厚さ0.01
ないし2.0μmのNi下地めっき層とその上に光沢剤
を含有しないめっき液で形成された厚さ1ないし10μ
mの半田めっき層を有することを特徴とする電気音響変
換器用リードフレーム。1. A thickness of 0.01 formed by a plating solution containing no brightening agent on a molded body of a metal substrate having an elongation of 20% or more.
To 2.0 μm Ni base plating layer and a thickness of 1 to 10 μm formed on it by a plating solution containing no brightening agent
A lead frame for an electroacoustic transducer, which has a solder plating layer of m.
ん青銅及びばね用りん青銅からなる群より選択された1
種である請求項1記載の電気音響変換器用リードフレー
ム。2. A metal substrate selected from the group consisting of Fe-Ni alloys, brass, phosphor bronze and phosphor bronze for springs.
The lead frame for an electroacoustic transducer according to claim 1, which is a seed.
の圧延率で調質圧延されたFe−Ni系合金である請求
項1記載の電気音響変換器用リードフレーム。3. The lead frame for an electroacoustic transducer according to claim 1, wherein the metal substrate is a Fe—Ni-based alloy that has been temper-rolled at a rolling rate of 10% or less after recrystallization annealing.
の圧延率で調質圧延された黄銅である請求項1記載の電
気音響変換器用リードフレーム。4. The lead frame for an electroacoustic transducer according to claim 1, wherein the metal substrate is brass that has been temper-rolled at a rolling rate of 20% or less after recrystallization annealing.
の圧延率で調質圧延された一般りん青銅である請求項1
記載の電気音響変換器用リードフレーム。5. The general phosphor bronze, wherein the metal substrate is temper-rolled at a rolling rate of 15% or less after recrystallization annealing.
A lead frame for the electroacoustic transducer described.
の圧延率で調質圧延されたばね用りん青銅である請求項
1記載の電気音響変換器用リードフレーム。6. The lead frame for an electroacoustic transducer according to claim 1, wherein the metal substrate is phosphor bronze for spring that is temper-rolled at a rolling rate of 25% or less after recrystallization annealing.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP07254090A JP3142754B2 (en) | 1995-09-07 | 1995-09-29 | Lead frame for electroacoustic transducer |
| DE1996601021 DE69601021T2 (en) | 1995-09-07 | 1996-09-04 | Connection frame for electroacoustic transducers and electroacoustic transducers |
| EP19960306415 EP0762800B1 (en) | 1995-09-07 | 1996-09-04 | Lead frame for electroacoustic transducer and electroacoustic transducer |
| HK98113341.2A HK1012487B (en) | 1995-09-07 | 1998-12-14 | Lead frame for electroacoustic transducer and electroacoustic transducer |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7-229954 | 1995-09-07 | ||
| JP22995495 | 1995-09-07 | ||
| JP07254090A JP3142754B2 (en) | 1995-09-07 | 1995-09-29 | Lead frame for electroacoustic transducer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09135492A true JPH09135492A (en) | 1997-05-20 |
| JP3142754B2 JP3142754B2 (en) | 2001-03-07 |
Family
ID=26529078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP07254090A Expired - Fee Related JP3142754B2 (en) | 1995-09-07 | 1995-09-29 | Lead frame for electroacoustic transducer |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0762800B1 (en) |
| JP (1) | JP3142754B2 (en) |
| DE (1) | DE69601021T2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FI109075B (en) * | 1998-10-05 | 2002-05-15 | Nokia Corp | Fixing method for a substrate for an acoustic converter |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5914658A (en) * | 1982-07-16 | 1984-01-25 | Hitachi Cable Ltd | Lead frame for semiconductor |
| JPS59168660A (en) * | 1983-03-15 | 1984-09-22 | Hitachi Cable Ltd | Lead frame for semiconductor |
| JPH0611904B2 (en) * | 1986-12-04 | 1994-02-16 | 株式会社神戸製鋼所 | High-strength, high-conductivity copper alloy manufacturing method |
| JPH01109756A (en) * | 1987-10-23 | 1989-04-26 | Kobe Steel Ltd | Lead frame for semiconductor device |
| JP2790421B2 (en) * | 1993-10-25 | 1998-08-27 | スター精密株式会社 | Electroacoustic transducer and method of manufacturing the same |
| JP3125396U (en) | 2006-03-14 | 2006-09-21 | 琢磨 藤原 | Notebook computer stand |
-
1995
- 1995-09-29 JP JP07254090A patent/JP3142754B2/en not_active Expired - Fee Related
-
1996
- 1996-09-04 EP EP19960306415 patent/EP0762800B1/en not_active Expired - Lifetime
- 1996-09-04 DE DE1996601021 patent/DE69601021T2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE69601021D1 (en) | 1999-01-07 |
| EP0762800A2 (en) | 1997-03-12 |
| EP0762800A3 (en) | 1997-04-23 |
| DE69601021T2 (en) | 1999-06-10 |
| EP0762800B1 (en) | 1998-11-25 |
| JP3142754B2 (en) | 2001-03-07 |
| HK1012487A1 (en) | 1999-07-30 |
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