JPH11114793A - Cloth used for manufacture of magnetic recording medium - Google Patents
Cloth used for manufacture of magnetic recording mediumInfo
- Publication number
- JPH11114793A JPH11114793A JP29629697A JP29629697A JPH11114793A JP H11114793 A JPH11114793 A JP H11114793A JP 29629697 A JP29629697 A JP 29629697A JP 29629697 A JP29629697 A JP 29629697A JP H11114793 A JPH11114793 A JP H11114793A
- Authority
- JP
- Japan
- Prior art keywords
- cloth
- warp
- filaments
- polishing
- multifilament
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004744 fabric Substances 0.000 title claims abstract description 47
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000000835 fiber Substances 0.000 claims abstract description 42
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 238000005498 polishing Methods 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000002131 composite material Substances 0.000 abstract description 18
- 238000003825 pressing Methods 0.000 abstract description 7
- 239000006061 abrasive grain Substances 0.000 abstract description 6
- 229920000642 polymer Polymers 0.000 description 13
- 229920000728 polyester Polymers 0.000 description 10
- 230000003746 surface roughness Effects 0.000 description 8
- 239000004952 Polyamide Substances 0.000 description 7
- 229920002647 polyamide Polymers 0.000 description 7
- 239000010410 layer Substances 0.000 description 6
- 239000002002 slurry Substances 0.000 description 6
- 239000002759 woven fabric Substances 0.000 description 6
- 230000000295 complement effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- 239000004677 Nylon Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 229920001778 nylon Polymers 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229920001410 Microfiber Polymers 0.000 description 2
- 229910018104 Ni-P Inorganic materials 0.000 description 2
- 229910018536 Ni—P Inorganic materials 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- -1 polyethylene terephthalate Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 206010016807 Fluid retention Diseases 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 206010061592 cardiac fibrillation Diseases 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- GZCKIUIIYCBICZ-UHFFFAOYSA-L disodium;benzene-1,3-dicarboxylate Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC(C([O-])=O)=C1 GZCKIUIIYCBICZ-UHFFFAOYSA-L 0.000 description 1
- 230000002600 fibrillogenic effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は磁気記録媒体等を製
造する工程において、媒体用基板の表面にワイピング又
は研磨を施すクロスに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cloth for wiping or polishing the surface of a medium substrate in a process of manufacturing a magnetic recording medium or the like.
【0002】[0002]
【従来の技術】特公平7−13841号公報、特開平8
−96355号公報等に記載されている通り、磁気記録
媒体としては、従来、アルミニウム合金からなる基板に
アルマイト処理やNi−Pメッキ等の非磁性メッキ処理
を施した後に、Cr等の下地層を被覆し、次いでCo系
合金の磁性薄膜層を被覆し、更に炭素質の保護膜で被覆
したものが主に使用される。2. Description of the Related Art Japanese Patent Publication No. Hei 7-13841,
As described in JP-A-96355, etc., as a magnetic recording medium, conventionally, a substrate made of an aluminum alloy is subjected to a non-magnetic plating treatment such as alumite treatment or Ni-P plating, and then a base layer such as Cr is formed. Coating, then coating with a magnetic thin film layer of a Co-based alloy, and further coating with a carbonaceous protective film are mainly used.
【0003】このような磁気記録媒体(磁気ディスク)
は基板が硬いため寸法精度が高く記録密度があがりやす
いが、磁気ヘッドが高速回転する磁気ディスクと接触す
ると、磁気ヘッドを破壊する所謂ヘッドクラッシュを生
ずる。これを回避するため磁気ヘッドを浮上させて使用
している。[0003] Such a magnetic recording medium (magnetic disk)
Since the substrate is hard, the dimensional accuracy is high and the recording density is easy to increase because of the rigidity of the substrate. In order to avoid this, the magnetic head is used while flying.
【0004】ところが、磁気ディスクの高密度化に伴
い、ヘッド浮上高さは益々小さくなっており、最近では
1.5μm以下が要求されている。このようにヘッド浮
上高さを非常に小さい値に保つことが記録密度向上の最
大のポイントであり、低浮上高さでありながらしかもヘ
ッドクラッシュが生じないようにすることに技術上の最
大課題がある。However, as the density of magnetic disks has increased, the flying height of the head has become smaller, and recently, a height of 1.5 μm or less has been required. Keeping the flying height of the head at a very small value is the biggest point in improving the recording density, and the biggest technical challenge is to keep the flying height low and prevent head crash. is there.
【0005】一方、磁気ディスクについて検討してみる
と、磁気ディスクへの書き込み或はその再生を行う際、
ディスクの静止時に磁気ヘッドの浮上面と磁気ディスク
間に吸着を生ずることがある。上述の吸着現象は、磁気
ヘッド浮上面と磁気ディスク表面が極めて平滑で微小間
隔で対面しているときに、その間でO2 、N2 、H2 O
等の分子により埋めつくされて界面張力により大きな吸
着力が発生することに起因しており、かかる吸着が発生
するとモータ起動時に多大の電力を消費する不都合なこ
とが生ずる。On the other hand, when examining a magnetic disk, when writing to or reproducing from the magnetic disk,
When the disk is stationary, suction may occur between the flying surface of the magnetic head and the magnetic disk. When the magnetic head flying surface and the magnetic disk surface face each other at extremely smooth and minute intervals, the above-mentioned adsorption phenomenon occurs when O 2 , N 2 , and H 2 O are interposed therebetween.
This is due to the fact that a large suction force is generated due to the interfacial tension by being buried by such molecules, and when such suction occurs, a disadvantage that a large amount of power is consumed at the time of starting the motor occurs.
【0006】このような吸着現象を防ぐ目的で、基板の
上に磁性膜などを形成するのに先立って、基板表面を一
旦鏡面仕上げにした後、その表面を粗くして適当な表面
粗さに調整するテクスチャー加工が実施される。In order to prevent such an adsorption phenomenon, prior to forming a magnetic film or the like on the substrate, the surface of the substrate is once made mirror-finished, and then the surface is roughened to an appropriate surface roughness. The texture processing to be adjusted is performed.
【0007】このテクスチャー加工方法としては、従来
次のような方法が採られている。即ち、炭化ケイ素、ア
ルミナ、或はダイヤモンドの砥粒を付着させた研磨テー
プを使用し、NiPめっき基板を回転させた状態で、研
磨テープをテープ裏面側から夫々ロールで押し付けなが
ら基板径方向に接触移動させ、基板表面に同心円状の条
こんを形成して所謂テクスチャー付き基板が得られるよ
うにしている。As the texture processing method, the following method has conventionally been adopted. That is, using a polishing tape to which abrasive grains of silicon carbide, alumina, or diamond are adhered, and rotating the NiP plating substrate, contacting the polishing tape in the radial direction of the substrate while pressing the polishing tape with a roll from the back side of the tape. By moving the substrate, concentric ridges are formed on the surface of the substrate to obtain a so-called textured substrate.
【0008】[0008]
【発明が解決しようとする課題】ところが、従来使用さ
れている研磨テープでは基板表面を適当な表面粗さに調
整して粗面化することがかなり難しく、必要以上に粗く
なり易いという問題が生じている。このようなことを解
消するため、特開平6−295432号公報には、テク
スチャー加工に使用する研磨テープの構成繊維を従来の
ものより細くし、直径5μm(太さ0.1デニール)以
下のものを使用して表面粗さRaを40Å以下にするこ
とが提案されている。又特開平8−96355号公報に
は研磨テープとして、保水率400%以上、繊維強度を
Dry(乾燥)時の10%モジュラス強度(縦方向)に
おいて11(kg/5cm幅)以下となし、且つ、該1
0%モジュラス強度(縦方向)のDry(乾燥)時とW
et(湿潤)時との差を8(kg/5cm幅)以下とな
した不織布が提案されている。However, with the conventionally used polishing tapes, it is very difficult to roughen the substrate surface by adjusting it to an appropriate surface roughness, and there is a problem that the surface tends to be unnecessarily rough. ing. In order to solve such a problem, Japanese Patent Application Laid-Open No. 6-295432 discloses that the constituent fibers of a polishing tape used for texture processing are made thinner than conventional fibers and have a diameter of 5 μm (thickness of 0.1 denier) or less. It has been proposed to reduce the surface roughness Ra to 40 ° or less by using the following method. JP-A-8-96355 discloses a polishing tape having a water retention of 400% or more, a fiber strength of 11 (kg / 5 cm width) or less at a 10% modulus strength (longitudinal direction) at dry (dry), and , The 1
Dry (dry) of 0% modulus strength (vertical direction) and W
A nonwoven fabric has been proposed in which the difference from et (wet) time is 8 (kg / 5 cm width) or less.
【0009】上記公報に記載する各研磨テープは夫々特
徴のある構成を備えており、又これにより特有の効果を
発揮するのであるが、本発明の目的は、これらの研磨テ
ープよりも更に研磨した基板の表面粗さを小さくし、且
つクラッシュの発生を極力少なくし磁気ヘッドの浮上特
性を格段と向上させることのできるワイピング用及び/
又は研磨用クロスの提供にある。Each of the polishing tapes described in the above-mentioned publications has a characteristic configuration and exerts a specific effect by this. However, the object of the present invention is to further polish the polishing tapes. For wiping and / or fining, which can reduce the surface roughness of the substrate, minimize the occurrence of crashes, and significantly improve the flying characteristics of the magnetic head.
Or in providing a polishing cloth.
【0010】又、本発明の他の目的は前記テクスチャー
加工用に止まらず、該加工の後に実施する基板へのバニ
ッシュ加工その他、ガラス円盤からなるイメージ情報収
録用ディスク等の製造にも使用することが出来、従来の
研磨テープよりも更に基板表面を均一にすることが可能
なワイピング用及び/又は研磨用クロスの提供にある。Another object of the present invention is not limited to the above-mentioned texture processing, but is also used for burnishing a substrate to be carried out after the processing, and also for manufacturing a disk for recording image information made of a glass disk. It is an object of the present invention to provide a wiping and / or polishing cloth capable of making the substrate surface more uniform than conventional polishing tapes.
【0011】[0011]
【課題を解決するための手段】上記課題を達成するため
に本発明は次の構成を備えている。即ち磁気記録媒体等
の基板表面にワイピング又は研磨を施すクロスであっ
て、朱子織からなり、JIS L 1096のA法によ
るたて方向の破断強度を20kgf/50mm以上に、
引張伸びを5%/5kgf/50mm以下となし、経糸
にマルチフィラメントを用い、経緯糸の両方又は一方に
熱水収縮率の異なるフィラメントを用い、該フィラメン
トの少なくとも一方のフィラメントは複合繊維を割繊せ
しめてなる単糸繊度0.5デニール以下のマルチフィラ
メントの混繊糸であり、且つクロス表面に、細繊度単糸
が外側を覆う多数のループを形成せしめたことを特徴と
する構成である。To achieve the above object, the present invention has the following arrangement. That is, a cloth for wiping or polishing the surface of a substrate such as a magnetic recording medium, which is made of satin weave and has a breaking strength in the vertical direction of 20 kgf / 50 mm or more according to the method A of JIS L 1096.
Tensile elongation is set to 5% / 5 kgf / 50 mm or less, multifilaments are used for the warp, and filaments having different hot water shrinkage rates are used for both or one of the warp yarns, and at least one of the filaments is a split fiber. It is a multifilament mixed yarn having a single yarn fineness of 0.5 denier or less, and a large number of loops covering the outside of the fine fineness single yarn are formed on the cloth surface.
【0012】[0012]
【発明の実施の形態】以下、図面を参照して本発明の実
施の形態を説明する。先ず最初に、図1及び図2により
テクスチャー加工を例に挙げて本発明クロスの使用状態
を説明する。図1は使用状態の全体を示す斜視図、図2
は図1の側面図である。Embodiments of the present invention will be described below with reference to the drawings. First, the use state of the cloth of the present invention will be described with reference to FIGS. 1 and 2 by taking texture processing as an example. FIG. 1 is a perspective view showing the entire use state, and FIG.
FIG. 2 is a side view of FIG. 1.
【0013】両図に示す通り、矢印A方向に向かって積
極回転する基板1の表裏面2,3の夫々には、各1本ず
つ計2本のクロス4,5が各押圧ロール6,7で押し付
けられつつ矢印B方向に向かって走行すると共に、クロ
ス4,5の各研磨面にノズル8,9から遊離砥粒を含有
する研磨液が連続供給され、スラリー研磨が実施され
る。As shown in both figures, a total of two cloths 4 and 5 are respectively provided on each of the front and back surfaces 2 and 3 of the substrate 1 which positively rotates in the direction of arrow A, by pressing rolls 6 and 7 respectively. While traveling in the direction of arrow B while being pressed by the above, the polishing liquid containing free abrasive grains is continuously supplied to the respective polishing surfaces of the cloths 4 and 5 from the nozzles 8 and 9 to perform slurry polishing.
【0014】各押圧ロール6,7はロール加工用シリン
ダー10により駆動し、基板1の表裏面2,3に夫々ク
ロス4,5を所定の圧力で押圧する。各クロス4,5は
矢印B方向に向かって連続走行するが、その間、基板1
の表裏両面2,3には常に新しいクロスが加圧接触する
状態で供給され、これにより表裏面2,3の研磨が実施
される。Each of the pressing rolls 6 and 7 is driven by a roll processing cylinder 10 and presses the cloths 4 and 5 against the front and back surfaces 2 and 3 of the substrate 1 at a predetermined pressure. Each of the cloths 4 and 5 runs continuously in the direction of arrow B, during which the substrate 1
A new cloth is always supplied to the front and back surfaces 2 and 3 in pressure contact with each other, whereby the front and back surfaces 2 and 3 are polished.
【0015】又クロス4,5は夫々押圧ロール6,7の
往復動により矢印C方向へ往復動(振動)し、この移動
と基板1自体の回転により基板1両面に条こんが作成さ
れ、テクスチャー加工済の基板1が形成される。The cloths 4 and 5 reciprocate (vibrate) in the direction of arrow C due to the reciprocating movement of the pressing rolls 6 and 7, respectively, and by this movement and rotation of the substrate 1 itself, ridges are formed on both surfaces of the substrate 1 and the texture is formed. A processed substrate 1 is formed.
【0016】本発明クロスは図1及び図2に示す通り、
高い張力下で使用されるので、クロスを構成する地組織
としては編物や不織布ではなく織物で且つ朱子織組織で
あることを要する。朱子織は経糸と緯糸各5本以上で作
られ、織物表面に組織点がとびとびに入っており、織物
の片面に経又は緯糸のどちらか一方が一面に長く浮いて
布面を覆い、組織点がかくれて表面が滑らかである点に
特徴を持っており、本発明のクロスは本質的にこのよう
な特質を備えている。The cloth of the present invention is shown in FIGS.
Since the cloth is used under high tension, the ground structure constituting the cloth needs to be not a knitted fabric or a nonwoven fabric but a woven fabric and a satin weave structure. The satin weave is made of more than 5 warp and weft yarns each, and the texture points are scattered on the surface of the woven fabric. One of the warp or weft yarns floats on one side of the woven fabric and covers the fabric surface. It is characterized by its hiding and a smooth surface, and the cloth of the present invention essentially has such characteristics.
【0017】朱子織では織機のヘルド枚数が多い場合、
例えば10枚朱子などでは織布の耐久性が低下する。か
かる点から本クロスには5〜8枚朱子が適当であり、こ
れ以上の高枚数の朱子織では耐久性に欠ける弊害があ
る。In the case of a satin weave, when the number of healds on a loom is large,
For example, the durability of the woven fabric is reduced when ten pieces of satin are used. From this point, it is appropriate to use 5 to 8 pieces of satin for the present cloth.
【0018】前記朱子織を構成する経糸はナイロン、ポ
リエステル等のマルチフィラメントが使用され、且つ織
布状態において、JIS L 1096に規定するA法
によるたて方向の引張強さ(破断強度)を20kgf/
50mm以上に、又引張伸びを5%/5kgf/50m
m以下にし得る経糸が用いられる。かかる織布はJIS
1096に規定する織物引張試験機において、荷重1
kgの時0%、2kgの時0〜0.05%、3kgの時
2%以内、5kgの時5%以内の伸びを示す。尚、前記
経糸は仮撚機の加工過程を経由したものも使用し得る
が、溶融紡糸された延伸糸そのままの糸条、所謂フラッ
トヤーン(生糸)が更に好ましい。経糸の構成が前記用
件を充足していると、ワイピング或は研磨の際、延伸作
用を受けるクロスの経方向の伸度を低減させることが可
能となり、遊離砥石に対する砥粒保持力や砥粒押し付け
時のクッション性を適当に保つことが出来る。As the warp constituting the satin weave, multifilaments such as nylon and polyester are used, and in a woven fabric state, the tensile strength (breaking strength) in the warp direction according to the method A specified in JIS L 1096 is 20 kgf. /
50% or more and tensile elongation of 5% / 5kgf / 50m
m is used. Such woven fabric is JIS
In the textile tensile tester specified in 1096, the load 1
It shows an elongation of 0% for kg, 0-0.05% for 2kg, 2% for 3kg, and 5% for 5kg. The warp may be a yarn obtained through a processing process of a false twisting machine, but more preferably a melt-spun drawn yarn as it is, a so-called flat yarn (raw yarn). If the configuration of the warp satisfies the above requirements, it is possible to reduce the elongation in the warp direction of the cloth subjected to the stretching action during wiping or polishing, and it is possible to reduce the abrasive holding force and the abrasive The cushioning property at the time of pressing can be appropriately maintained.
【0019】又前記朱子織を構成する経緯糸の少なくと
も一方には、2種以上のポリマーからなる複合繊維(コ
ンジュゲート繊維)を割繊せしめてなる単糸繊度0.5
デニール以下の超極細繊維が位置する。前記超極細繊維
は特公昭61−37383号公報等に記載する分割型の
複合繊維、或は、特公昭62−50594号公報等に記
載する海島型の複合繊維を割繊して得られたものが使用
し得る。Further, at least one of the warp yarns constituting the satin weave is a single fiber fineness of 0.5 obtained by splitting a composite fiber (conjugate fiber) comprising two or more polymers.
Ultra-fine fibers of less than denier are located. The ultra-fine fibers are obtained by splitting a split-type composite fiber described in JP-B-61-37383 or a sea-island type composite fiber described in JP-B-62-50594. Can be used.
【0020】中でも製造の容易性、単糸綾線の少なくと
も一線に形成されるシャープエッジが簡単に得られるこ
とから分割型の複合繊維が好適である。特にポリアミド
及びポリエステルよりなる複合繊維を、フィブリル化
(分割)して得られたものが好ましい。この複合繊維か
ら得られた単糸群はポリエステルの寸法安定性とポリア
ミドの親水性を同時に保持しているので、本発明クロス
として最適である。Of these, split-type composite fibers are preferred because they are easy to manufacture and can easily obtain a sharp edge formed on at least one line of the single yarn. Particularly, a fiber obtained by fibrillating (dividing) a composite fiber composed of polyamide and polyester is preferable. The single yarn group obtained from this conjugate fiber is most suitable as the cloth of the present invention because it maintains the dimensional stability of polyester and the hydrophilicity of polyamide at the same time.
【0021】前記フィブリル化の方法は、特公昭53−
35633号公報等に記載された公知の方法が用い得
る。中でも、ベンジルアルコールを用いる方法が好まし
い。The method of fibrillation is described in
A known method described in, for example, Japanese Patent No. 35633 can be used. Among them, a method using benzyl alcohol is preferable.
【0022】かかる分割型の複合繊維としては、種々の
ものが公知である。例えば、ポリアミド成分とポリエス
テル成分とが単一フィラメントの任意の横断面におい
て、一方の成分を他方の成分が完全に包囲することなく
両成分が接合された形状を有する複合繊維、具体的には
横断面がサイドバイサイド型の複合繊維[図3
(A)],サイドバイサイド繰り返し型の複合繊維[図
3(B)],放射型の形状を有する部分と該放射部を補
完する形状を有する他の成分からなる複合繊維[図3
(C),(D)],該形状に中空部分を設けた複合繊維
[図3(E)]等が挙げられる。Various types of split type composite fibers are known. For example, in any cross section of a single filament, a polyamide component and a polyester component have a shape in which one component is joined to the other component without completely surrounding the other component. Composite fiber with side-by-side surface [Fig.
(A)], a side-by-side repeating type conjugate fiber [FIG. 3 (B)], a conjugate fiber comprising a part having a radial shape and another component having a shape complementary to the radiating part [FIG.
(C), (D)], and a conjugate fiber having a hollow portion in the shape [FIG. 3 (E)].
【0023】これらの複合繊維のうち本発明クロスの原
糸としては、放射型の形状を有する部分と該放射部を補
完する形状を有する他の部分からなる複合繊維[図3
(C),(D)]が好ましく、先に述べた通り、放射型
の形状を有する部分としてポリアミド、該放射部を補完
する形状を有する部分としてポリエステルを用いたもの
が最適である。Among these composite fibers, the raw yarn of the cloth of the present invention is a composite fiber comprising a portion having a radial shape and another portion having a shape complementary to the radiation portion [FIG.
(C) and (D)], and, as described above, it is most preferable to use a polyamide as the portion having a radiation-type shape and a polyester as a portion having a shape complementary to the radiation portion.
【0024】又、本発明に使用する複合繊維としては、
前述の通り特公昭62−50594号公報等に記載する
海島型繊維(溶解分割型繊維)によって得られたものも
使用し得る。前記公報等に記載する通り、海島繊維は少
なくとも2種のポリマーからなる繊維であって、繊維断
面は海成分と島成分から形成されており、島成分は海成
分により複数に区分されている。The composite fibers used in the present invention include:
As described above, those obtained from sea-island type fibers (dissolution splittable fibers) described in JP-B-62-50594 and the like can also be used. As described in the above publications and the like, sea-island fibers are fibers made of at least two kinds of polymers, and the fiber cross section is formed of a sea component and an island component, and the island component is divided into a plurality of sea components.
【0025】本発明クロスに適用される主な海島型繊維
についてその横断面を図4に示す。図4においてA1・
2は島成分でありBは海成分である。本発明における海
島型ポリマーは薬剤に対して溶解、分解性の異なるポリ
マーを2種類以上選択し使用しており、ポリエチレンテ
レフタレート,同共重合体,(イソフタル酸,イソフタ
ル酸ソディウムスルホネートなど),ナイロン6,ナイ
ロン66等がその代表例として挙げられる。FIG. 4 shows a cross section of a main sea-island type fiber applied to the cloth of the present invention. In FIG. 4, A1.
2 is an island component and B is a sea component. As the sea-island type polymer in the present invention, two or more polymers having different dissolving and degrading properties with respect to the drug are selected and used, and polyethylene terephthalate, the same copolymer, (isophthalic acid, sodium isophthalate sulfonate, etc.), nylon 6 , Nylon 66, and the like.
【0026】以上の中で好ましいポリマーの組み合せ
は、海成分ポリマーが島成分ポリマーに比べて薬剤によ
る溶解性、分解性が大になるような組み合せか、又は、
島成分ポリマーを溶解、分解せず海成分ポリマーのみを
完全に溶解させる組み合せであり、後者が最も好まし
い。Preferred combinations of the above polymers are those in which the sea component polymer is more soluble and degradable by the drug than the island component polymer, or
This is a combination in which only the sea component polymer is completely dissolved without dissolving and decomposing the island component polymer, and the latter is most preferable.
【0027】かかる海島型繊維の場合は、島成分として
熱水収縮率の異なる2種の成分を用いれば、海成分の溶
解除去後も、複合繊維のみで、熱水収縮率の異なる成分
を得ることができるが、一般に、多成分となるほど複合
繊維の紡糸が困難となるため、溶解成分と単一の非溶解
成分とからなる複合繊維を用いる場合は、非溶解成分に
対し熱水収縮率の異なる繊維を混繊維して用いることが
必要となる。かかる繊維としては、熱水収縮率が非溶解
成分よりも高い繊維を用いることが好ましく、例えば、
ポリエチレンテレフタレートにイソフタル酸やビスフェ
ノール等の変性成分を共重合したもの等は20〜40%
以上の熱水収縮率を有するため好ましい。かかる混繊糸
の場合は、熱処理により、後述の如く、細繊度糸が表面
に現れ、高収縮糸は内部に位置するため、単糸繊度が1
デニール以上のものを用いても、本発明の効果を阻害す
ることがない。In the case of such a sea-island type fiber, if two kinds of components having different hot water shrinkage rates are used as island components, even after dissolution and removal of the sea component, components having different hot water shrinkage rates can be obtained only with the composite fiber. However, in general, as the number of components increases, the spinning of the composite fiber becomes more difficult. Therefore, when a composite fiber composed of a dissolved component and a single non-dissolved component is used, the hot water shrinkage relative to the non-dissolved component is reduced. It is necessary to use a mixture of different fibers. As such a fiber, it is preferable to use a fiber whose hot water shrinkage is higher than the insoluble component, for example,
20-40% of polyethylene terephthalate copolymerized with modified components such as isophthalic acid and bisphenol
It is preferable because it has the above hot water shrinkage. In the case of such mixed yarns, the fineness yarn appears on the surface and the high shrinkage yarn is located inside by heat treatment as described later, so that the single yarn fineness is 1
Even if a denier or more is used, the effect of the present invention is not inhibited.
【0028】前述の如く、本発明クロスの少なくとも一
部を構成する複合繊維は、織成後、薬剤を用いた割繊処
理によりポリマー毎の各単糸に分割し、その際、熱収縮
率差によりクロス表面上に多数の弧状ループを形成す
る。As described above, the conjugate fiber constituting at least a part of the cloth of the present invention is divided into individual single yarns for each polymer by a splitting treatment using a chemical after weaving. Form a large number of arc-shaped loops on the cloth surface.
【0029】複合繊維の構成ポリマーがポリアミドとポ
リエステルの2種であり、横断面形状が図3(C)の場
合は、クロス表面に形成されるループ層の内層部までポ
リアミドが収縮沱降し、又表層部は実質的に細繊度のポ
リエステルで覆われる。勿論、内装部にポリエステルは
残存するが、ポリアミドが収縮して緻密な組織と成り、
これらは層状構造を呈する。このように本発明クロスの
表層部は実質的に細繊度のフィブリルから形成され、表
面のタッチはソフトであり、一方その内層部は比較的腰
のある構造体となっている。かかる多層構造からワイピ
ング及び研磨時に、後述するように有効な作用効果をク
ロスに付与するのである。In the case where the constituent polymer of the conjugate fiber is two kinds of polyamide and polyester and the cross-sectional shape is as shown in FIG. 3C, the polyamide shrinks down to the inner layer of the loop layer formed on the cloth surface, The surface layer is substantially covered with polyester of fineness. Of course, the polyester remains in the interior part, but the polyamide shrinks to form a dense structure,
These exhibit a layered structure. As described above, the surface layer portion of the cloth of the present invention is substantially formed of fibrils having a fine fineness, and the surface has a soft touch, while the inner layer portion has a relatively rigid structure. From the multi-layer structure, an effective effect is imparted to the cloth during wiping and polishing, as described later.
【0030】図1及び図2に示す方法においては、本発
明クロス4,5と基板1との間に遊離砥粒を含有するス
ラリーを供給し、これをスラリー研削の直前でクロス
4,5上に塗布しているが、スラリーを事前にクロス上
に塗布して用いても良い。In the method shown in FIGS. 1 and 2, a slurry containing loose abrasive grains is supplied between the cloths 4 and 5 of the present invention and the substrate 1, and the slurry is applied to the cloths 4 and 5 immediately before the slurry grinding. However, the slurry may be applied in advance on a cloth.
【0031】本発明クロスを用いることにより、テクス
チャー加工済の基板表面の平均粗さを10〜20Åの範
囲に、より好ましくは10Å以下にすることが出来る。By using the cloth of the present invention, the average roughness of the textured substrate surface can be made in the range of 10 to 20 °, more preferably 10 ° or less.
【0032】上述の如く、前記経糸及び緯糸からなる本
発明クロスは、組織が朱子織であり、且つ構成する少な
くとも一つの糸条を特定範囲の単糸デニールで形成せし
めているので、基板との接触面を極めてソフトなものに
することが出来る。又経糸を特定の糸で形成しているの
で、縦方向の伸びに対する耐久性があり、クロスの無用
な伸びによる研磨不良を生じない。As described above, the cloth of the present invention comprising the warp and the weft has a texture of satin weave, and at least one of the constituent yarns is formed of a specific range of single yarn denier. The contact surface can be made very soft. Further, since the warp is formed of a specific yarn, the warp has durability against elongation in the longitudinal direction, and does not cause poor polishing due to unnecessary elongation of the cloth.
【0033】又、本発明に用いる糸条の一つを、熱水収
縮率の異なる2種以上のポリマーで形成しているので熱
処理により、熱収縮率の差に起因する大小様々な微細弧
状ループをクロスの長手方向にムラなく形成せしめるこ
とが可能となり、ワイピング時及び研磨時にこのループ
が弾発機能を持って基板表面と接触し、該表面の平滑性
を更に高くする効果がある。Further, since one of the yarns used in the present invention is formed of two or more kinds of polymers having different hot water shrinkage ratios, the heat treatment makes it possible to obtain various fine arc-shaped loops caused by the difference in the heat shrinkage ratio. Can be formed evenly in the longitudinal direction of the cloth, and this loop has a resilient function and comes into contact with the substrate surface at the time of wiping and polishing, which has the effect of further increasing the smoothness of the surface.
【0034】尚、前記実施の形態においては本発明クロ
スがテクスチャー加工で使用される例について説明した
が、テクスチャー加工の完了した基板に付与されるバニ
ッシュ加工においても、通常使用されるポリエステルフ
ィルム製のラッピングテープに代えて本発明クロスは有
効に使用される。この場合の使用例はテクスチャー加工
と同様に図1及び図2図示の過程で実施され、従来使用
のラッピングテープに比べ、基板表面の平均粗さを更に
向上させることが出来る。In the above-described embodiment, an example in which the cloth of the present invention is used for texture processing has been described. The cloth of the present invention is effectively used in place of the wrapping tape. The use example in this case is carried out in the process shown in FIGS. 1 and 2 in the same manner as the texture processing, and the average roughness of the substrate surface can be further improved as compared with the conventional wrapping tape.
【0035】[0035]
【実施例】以下、実施例を挙げて本発明を更に説明す
る。平均粒径0.5μm以下の砥粒と、表1に示す組織
からなる5種のクロスを使用して、市販のNi−P合金
メッキ処理を施したアルミニウム製基板に図1及び図2
に示す方法により夫々テクスチャー加工を実施した。次
いでテクスチャー加工処理の終了した5種の基板に、夫
々、洗浄、スパッタリングを施した後、更にテクスチャ
ー加工と同一のクロスを用いてバニッシュ加工を実施
し、完成された磁気ディスクを得た。得られた磁気ディ
スクについて表面の平均粗さを測定した。その結果を表
1に示す。The present invention will be further described below with reference to examples. Using abrasive grains having an average particle size of 0.5 μm or less and five types of cloths having the structures shown in Table 1, commercially available Ni—P alloy-plated aluminum substrates were used as shown in FIGS.
The texture processing was performed by the method shown in FIG. Next, the five types of substrates subjected to the texture processing were subjected to cleaning and sputtering, respectively, and then subjected to burnishing using the same cloth as that used for the texture processing to obtain a completed magnetic disk. The average roughness of the surface of the obtained magnetic disk was measured. Table 1 shows the results.
【0036】[0036]
【表1】 [Table 1]
【0037】表1のポリマー表示において、PEはポリ
エステル、Nはナイロンを示しており、緯糸に使用する
N/PEの複合糸は図3(C)に示す複合糸であって、
放射状部をナイロン、これを補完する8個のセグメント
をポリエステルで形成しており、出願人の1人が市販す
る商品名ベリーマX(標準単糸繊度2デニール)とベリ
ーマSX(標準単糸繊度1デニール)を使用している。In the polymer representation in Table 1, PE indicates polyester and N indicates nylon, and the N / PE composite yarn used for the weft is the composite yarn shown in FIG.
The radial portion is made of nylon, and the eight segments that complement it are made of polyester, and are sold by one of the applicants under the trade names Verima X (standard single yarn fineness of 2 denier) and Verima SX (standard single yarn fineness of 1). Denier).
【0038】表1に示す通り、得られた磁気ディスクの
表面粗さは単糸繊度の細い方が有利であり、比較例では
クロスにかかる張力により縦方向に伸びが生じている。
又実施例2の両面4枚朱子織組織では研磨時スラリーの
片流れが生じ、基板の軸央部と外周部で平均粗さに差が
ある。これは起毛により改善することが可能であるが、
若干起生する疵が目立つ欠点がある。実用上、実施例の
ものはいずれも有効であった。尚、本明細書に記載する
表面粗さとはJIS B 0601に規定する表面粗さ
である。As shown in Table 1, the surface roughness of the magnetic disk obtained is preferably as small as the single-filament fineness, and in the comparative example, elongation occurs in the longitudinal direction due to the tension applied to the cloth.
Further, in the four-sided satin weave structure of Example 2, one-sided flow of the slurry occurs during polishing, and there is a difference in average roughness between the central portion and the outer peripheral portion of the substrate. This can be improved by brushing,
There is a drawback that a slightly generated flaw is conspicuous. Practically, all of the examples were effective. The surface roughness described in the present specification is a surface roughness defined in JIS B0601.
【0039】[0039]
【発明の効果】以上説明した通り、磁気記録媒体等の製
造過程であるテクスチャー加工或はバニッシュ加工等に
本発明クロスを用いることにより、容易且つ適格に基板
表面の表面粗さを飛躍的に向上せしめ、且つクラッシュ
の発生を極力小さくすることが可能となり、冒頭に記載
する技術上の最大課題の解消に大きく寄与する。As described above, by using the cloth of the present invention for texture processing or burnishing processing, which is a manufacturing process of a magnetic recording medium or the like, the surface roughness of the substrate surface can be dramatically improved easily and appropriately. At the same time, it is possible to minimize the occurrence of crashes, which greatly contributes to solving the technical maximum problem described at the beginning.
【図1】本発明に係るクロスの使用状態を示す斜視図で
ある。FIG. 1 is a perspective view showing a use state of a cloth according to the present invention.
【図2】本発明に係るクロスの使用状態を示す側面図で
ある。FIG. 2 is a side view showing a use state of the cloth according to the present invention.
【図3】本クロスに用いる分割型複合繊維の横断面図で
ある。FIG. 3 is a cross-sectional view of a splittable conjugate fiber used in the present cloth.
【図4】本クロスに用いる海島型複合繊維の横断面図で
ある。FIG. 4 is a cross-sectional view of the sea-island composite fiber used in the present cloth.
1 基板 2 表面(基板) 3 裏面(基板) 4,5 クロス 6,7 押圧ロール 8,9 ノズル 10 シリンダー Reference Signs List 1 substrate 2 front surface (substrate) 3 back surface (substrate) 4,5 cloth 6,7 pressing roll 8,9 nozzle 10 cylinder
Claims (1)
又は研磨を施すクロスであって、朱子織からなり、JI
S L 1096のA法によるたて方向の破断強度を2
0kgf/50mm以上に、引張伸びを5%/5kgf
/50mm以下となし、経糸にマルチフィラメントを用
い、経緯糸の両方又は一方に熱水収縮率の異なるフィラ
メントを用い、該フィラメントの少なくとも一方のフィ
ラメントは複合繊維を割繊せしめてなる単糸繊度0.5
デニール以下のマルチフィラメントの混繊糸であり、且
つクロス表面に、細繊度単糸が外側を覆う多数のループ
を形成せしめたことを特徴とする磁気記録媒体等の製造
に用いるクロス。1. A cloth for wiping or polishing the surface of a substrate such as a magnetic recording medium, the cloth being made of satin weave,
The breaking strength in the vertical direction by the method A of SL 1096 was 2
0kgf / 50mm or more, tensile elongation 5% / 5kgf
/ 50 mm or less, multifilaments are used for the warp, filaments having different hot water shrinkage rates are used for both or one of the warp yarns, and at least one of the filaments is a single fiber fineness of 0 obtained by splitting a conjugate fiber. .5
A cloth used for manufacturing a magnetic recording medium or the like, wherein the cloth is a multifilament yarn having a denier or less and has a large number of loops on the surface of the cloth which are covered with a fineness single yarn.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29629697A JP3336374B2 (en) | 1997-10-13 | 1997-10-13 | Cloth used for manufacturing magnetic recording media, etc. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29629697A JP3336374B2 (en) | 1997-10-13 | 1997-10-13 | Cloth used for manufacturing magnetic recording media, etc. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11114793A true JPH11114793A (en) | 1999-04-27 |
| JP3336374B2 JP3336374B2 (en) | 2002-10-21 |
Family
ID=17831725
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29629697A Expired - Fee Related JP3336374B2 (en) | 1997-10-13 | 1997-10-13 | Cloth used for manufacturing magnetic recording media, etc. |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3336374B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20030047509A (en) * | 2001-12-11 | 2003-06-18 | (주)엠이씨 | The pcb supporting equipment for chip mounter |
| US6905752B1 (en) * | 1998-09-30 | 2005-06-14 | Kanebo, Limited | Polishing tape used in production of magnetic recording medium |
| JP2010094780A (en) * | 2008-10-17 | 2010-04-30 | Toray Ind Inc | Textile wiper and method of manufacturing the same |
| JP2011090740A (en) * | 2009-10-22 | 2011-05-06 | Showa Denko Kk | Method for producing wiping tape, wiping tape, and wiping method |
-
1997
- 1997-10-13 JP JP29629697A patent/JP3336374B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6905752B1 (en) * | 1998-09-30 | 2005-06-14 | Kanebo, Limited | Polishing tape used in production of magnetic recording medium |
| KR20030047509A (en) * | 2001-12-11 | 2003-06-18 | (주)엠이씨 | The pcb supporting equipment for chip mounter |
| JP2010094780A (en) * | 2008-10-17 | 2010-04-30 | Toray Ind Inc | Textile wiper and method of manufacturing the same |
| JP2011090740A (en) * | 2009-10-22 | 2011-05-06 | Showa Denko Kk | Method for producing wiping tape, wiping tape, and wiping method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3336374B2 (en) | 2002-10-21 |
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