JPS52123174A - Specimen scanning method for ion implantation - Google Patents

Specimen scanning method for ion implantation

Info

Publication number
JPS52123174A
JPS52123174A JP3935876A JP3935876A JPS52123174A JP S52123174 A JPS52123174 A JP S52123174A JP 3935876 A JP3935876 A JP 3935876A JP 3935876 A JP3935876 A JP 3935876A JP S52123174 A JPS52123174 A JP S52123174A
Authority
JP
Japan
Prior art keywords
ion implantation
scanning method
specimen scanning
specimen
ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3935876A
Other languages
Japanese (ja)
Inventor
Naoji Yoshihiro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3935876A priority Critical patent/JPS52123174A/en
Publication of JPS52123174A publication Critical patent/JPS52123174A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To make the concentration of the ions to be implanted uniform by disposing specimens on the inside wall surface of a rotating cylinder and implanting impurity ions from the outside through the slits provided on the wall face of the cylinder.
COPYRIGHT: (C)1977,JPO&Japio
JP3935876A 1976-04-09 1976-04-09 Specimen scanning method for ion implantation Pending JPS52123174A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3935876A JPS52123174A (en) 1976-04-09 1976-04-09 Specimen scanning method for ion implantation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3935876A JPS52123174A (en) 1976-04-09 1976-04-09 Specimen scanning method for ion implantation

Publications (1)

Publication Number Publication Date
JPS52123174A true JPS52123174A (en) 1977-10-17

Family

ID=12550839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3935876A Pending JPS52123174A (en) 1976-04-09 1976-04-09 Specimen scanning method for ion implantation

Country Status (1)

Country Link
JP (1) JPS52123174A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5941828A (en) * 1982-09-01 1984-03-08 Hitachi Ltd Ion implanter
JPS6048234U (en) * 1983-09-09 1985-04-04 セイコーインスツルメンツ株式会社 Ion implantation device
JPS61116746A (en) * 1984-09-19 1986-06-04 アプライド　マテリアルズ　インコ−ポレ−テツド Apparatus and method for ion plantation of semiconductor wafer
JPS63109166A (en) * 1986-10-23 1988-05-13 イオネツクス／エツチイ−アイ　コ−ポレ−シヨン Ion implantation apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5941828A (en) * 1982-09-01 1984-03-08 Hitachi Ltd Ion implanter
JPS6048234U (en) * 1983-09-09 1985-04-04 セイコーインスツルメンツ株式会社 Ion implantation device
JPS61116746A (en) * 1984-09-19 1986-06-04 アプライド　マテリアルズ　インコ−ポレ−テツド Apparatus and method for ion plantation of semiconductor wafer
JPH06111752A (en) * 1984-09-19 1994-04-22 Applied Materials Inc Apparatus and method for ion implantation of semiconductor wafer
JPS63109166A (en) * 1986-10-23 1988-05-13 イオネツクス／エツチイ−アイ　コ−ポレ−シヨン Ion implantation apparatus

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