JPS52127764A - Etching method - Google Patents

Etching method

Info

Publication number
JPS52127764A
JPS52127764A JP4460976A JP4460976A JPS52127764A JP S52127764 A JPS52127764 A JP S52127764A JP 4460976 A JP4460976 A JP 4460976A JP 4460976 A JP4460976 A JP 4460976A JP S52127764 A JPS52127764 A JP S52127764A
Authority
JP
Japan
Prior art keywords
etching method
halide
halogen
atmosphere
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4460976A
Other languages
Japanese (ja)
Inventor
Junichi Kai
Moritaka Nakamura
Yoshihiko Kitahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4460976A priority Critical patent/JPS52127764A/en
Publication of JPS52127764A publication Critical patent/JPS52127764A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To form the microscopic pattern with selective etching of material of different kinds by applying ion beam to the processed object deposited in the atmosphere of halogen and/or halide.
COPYRIGHT: (C)1977,JPO&Japio
JP4460976A 1976-04-19 1976-04-19 Etching method Pending JPS52127764A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4460976A JPS52127764A (en) 1976-04-19 1976-04-19 Etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4460976A JPS52127764A (en) 1976-04-19 1976-04-19 Etching method

Publications (1)

Publication Number Publication Date
JPS52127764A true JPS52127764A (en) 1977-10-26

Family

ID=12696176

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4460976A Pending JPS52127764A (en) 1976-04-19 1976-04-19 Etching method

Country Status (1)

Country Link
JP (1) JPS52127764A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55141729A (en) * 1979-04-21 1980-11-05 Nippon Telegr & Teleph Corp <Ntt> Ion-shower device
JPS5680136A (en) * 1979-12-06 1981-07-01 Fujitsu Ltd Dry etching device
JPH07193044A (en) * 1992-12-16 1995-07-28 Science & Tech Agency Pattern etching method for sic

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55141729A (en) * 1979-04-21 1980-11-05 Nippon Telegr & Teleph Corp <Ntt> Ion-shower device
JPS5680136A (en) * 1979-12-06 1981-07-01 Fujitsu Ltd Dry etching device
JPH07193044A (en) * 1992-12-16 1995-07-28 Science & Tech Agency Pattern etching method for sic

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