JPS5275976A - Wafer cleaning device - Google Patents

Wafer cleaning device

Info

Publication number
JPS5275976A
JPS5275976A JP15191275A JP15191275A JPS5275976A JP S5275976 A JPS5275976 A JP S5275976A JP 15191275 A JP15191275 A JP 15191275A JP 15191275 A JP15191275 A JP 15191275A JP S5275976 A JPS5275976 A JP S5275976A
Authority
JP
Japan
Prior art keywords
cleaning device
wafer cleaning
wafer
shorting
magnetic particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15191275A
Other languages
Japanese (ja)
Inventor
Shinichi Kasahara
Tomoyuki Mori
Hideki Tominaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15191275A priority Critical patent/JPS5275976A/en
Publication of JPS5275976A publication Critical patent/JPS5275976A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To obtain a wafer cleaning device which is capable of preventing deposition of magnetic particles on crystal surface and shorting the wafer during cleaning time.
COPYRIGHT: (C)1977,JPO&Japio
JP15191275A 1975-12-22 1975-12-22 Wafer cleaning device Pending JPS5275976A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15191275A JPS5275976A (en) 1975-12-22 1975-12-22 Wafer cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15191275A JPS5275976A (en) 1975-12-22 1975-12-22 Wafer cleaning device

Publications (1)

Publication Number Publication Date
JPS5275976A true JPS5275976A (en) 1977-06-25

Family

ID=15528901

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15191275A Pending JPS5275976A (en) 1975-12-22 1975-12-22 Wafer cleaning device

Country Status (1)

Country Link
JP (1) JPS5275976A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638822A (en) * 1979-09-06 1981-04-14 Toray Eng Co Ltd Usage of pure water in washing process for electronic parts
JPS6159837A (en) * 1984-08-31 1986-03-27 Toshiba Ceramics Co Ltd Continuous washing device of wafer

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4999480A (en) * 1973-01-02 1974-09-19

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4999480A (en) * 1973-01-02 1974-09-19

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638822A (en) * 1979-09-06 1981-04-14 Toray Eng Co Ltd Usage of pure water in washing process for electronic parts
JPS6159837A (en) * 1984-08-31 1986-03-27 Toshiba Ceramics Co Ltd Continuous washing device of wafer

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