JPS5277573A - Magnetic field generating device - Google Patents

Magnetic field generating device

Info

Publication number
JPS5277573A
JPS5277573A JP50153318A JP15331875A JPS5277573A JP S5277573 A JPS5277573 A JP S5277573A JP 50153318 A JP50153318 A JP 50153318A JP 15331875 A JP15331875 A JP 15331875A JP S5277573 A JPS5277573 A JP S5277573A
Authority
JP
Japan
Prior art keywords
magnetic field
generating device
field generating
responce
fidelity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50153318A
Other languages
Japanese (ja)
Inventor
Mikio Ichihashi
Tadasuke Munakata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50153318A priority Critical patent/JPS5277573A/en
Publication of JPS5277573A publication Critical patent/JPS5277573A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To provide generation of magnetic field in a good responce to frequency and on the axis of electron line with fidelity, by coating conductive material on the coil which has been wound on a bobbin formed of insulating material.
COPYRIGHT: (C)1977,JPO&Japio
JP50153318A 1975-12-24 1975-12-24 Magnetic field generating device Pending JPS5277573A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50153318A JPS5277573A (en) 1975-12-24 1975-12-24 Magnetic field generating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50153318A JPS5277573A (en) 1975-12-24 1975-12-24 Magnetic field generating device

Publications (1)

Publication Number Publication Date
JPS5277573A true JPS5277573A (en) 1977-06-30

Family

ID=15559862

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50153318A Pending JPS5277573A (en) 1975-12-24 1975-12-24 Magnetic field generating device

Country Status (1)

Country Link
JP (1) JPS5277573A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54128679A (en) * 1978-03-29 1979-10-05 Hitachi Ltd Electron lens with deflector
JPS585952A (en) * 1981-07-03 1983-01-13 Hitachi Ltd Charged-particle focusing deflecting device
JPS61147525A (en) * 1985-12-13 1986-07-05 Hitachi Ltd Charged particle beam applying device
JPH08124505A (en) * 1994-10-27 1996-05-17 Nikon Corp Electromagnetic lens and method of manufacturing the electromagnetic lens
JP2005276819A (en) * 2000-01-27 2005-10-06 Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh Objective lens for charged particle beam device
WO2019043759A1 (en) * 2017-08-28 2019-03-07 株式会社日立ハイテクノロジーズ Multipole lens, aberration corrector using same, and charged particle beam device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54128679A (en) * 1978-03-29 1979-10-05 Hitachi Ltd Electron lens with deflector
JPS585952A (en) * 1981-07-03 1983-01-13 Hitachi Ltd Charged-particle focusing deflecting device
JPS61147525A (en) * 1985-12-13 1986-07-05 Hitachi Ltd Charged particle beam applying device
JPH08124505A (en) * 1994-10-27 1996-05-17 Nikon Corp Electromagnetic lens and method of manufacturing the electromagnetic lens
JP2005276819A (en) * 2000-01-27 2005-10-06 Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh Objective lens for charged particle beam device
WO2019043759A1 (en) * 2017-08-28 2019-03-07 株式会社日立ハイテクノロジーズ Multipole lens, aberration corrector using same, and charged particle beam device
US11004650B2 (en) 2017-08-28 2021-05-11 Hitachi High-Tech Corporation Multipole lens, aberration corrector using the same, and charged particle beam apparatus

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