JPS5372572A - Manufacturing device for semiconductor device - Google Patents

Manufacturing device for semiconductor device

Info

Publication number
JPS5372572A
JPS5372572A JP14886576A JP14886576A JPS5372572A JP S5372572 A JPS5372572 A JP S5372572A JP 14886576 A JP14886576 A JP 14886576A JP 14886576 A JP14886576 A JP 14886576A JP S5372572 A JPS5372572 A JP S5372572A
Authority
JP
Japan
Prior art keywords
tube
manufacturing
substrate
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14886576A
Other languages
Japanese (ja)
Other versions
JPS6028138B2 (en
Inventor
Natsuo Tsubouchi
Hirokazu Miyoshi
Akira Nishimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP51148865A priority Critical patent/JPS6028138B2/en
Publication of JPS5372572A publication Critical patent/JPS5372572A/en
Publication of JPS6028138B2 publication Critical patent/JPS6028138B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To ensure a growth of a clean oxide thick film in a short time by storing a tube containing an Si substrate and vapor generator into a high anti-pressure container, supplying the saturation vapor into the tube and oxidizing the Si substrate within a high temperature tube.
COPYRIGHT: (C)1978,JPO&Japio
JP51148865A 1976-12-10 1976-12-10 Semiconductor device manufacturing equipment Expired JPS6028138B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51148865A JPS6028138B2 (en) 1976-12-10 1976-12-10 Semiconductor device manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51148865A JPS6028138B2 (en) 1976-12-10 1976-12-10 Semiconductor device manufacturing equipment

Publications (2)

Publication Number Publication Date
JPS5372572A true JPS5372572A (en) 1978-06-28
JPS6028138B2 JPS6028138B2 (en) 1985-07-03

Family

ID=15462456

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51148865A Expired JPS6028138B2 (en) 1976-12-10 1976-12-10 Semiconductor device manufacturing equipment

Country Status (1)

Country Link
JP (1) JPS6028138B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS567436A (en) * 1979-06-29 1981-01-26 Sony Corp High pressure treating device
JPS60122799A (en) * 1984-05-25 1985-07-01 Hitachi Ltd Heat treatment method for semiconductor wafers

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0190929U (en) * 1987-12-08 1989-06-15

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50114179A (en) * 1974-02-15 1975-09-06

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50114179A (en) * 1974-02-15 1975-09-06

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS567436A (en) * 1979-06-29 1981-01-26 Sony Corp High pressure treating device
JPS60122799A (en) * 1984-05-25 1985-07-01 Hitachi Ltd Heat treatment method for semiconductor wafers

Also Published As

Publication number Publication date
JPS6028138B2 (en) 1985-07-03

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