JPS5466785A - Semiconductor integrated circuit device - Google Patents
Semiconductor integrated circuit deviceInfo
- Publication number
- JPS5466785A JPS5466785A JP13306777A JP13306777A JPS5466785A JP S5466785 A JPS5466785 A JP S5466785A JP 13306777 A JP13306777 A JP 13306777A JP 13306777 A JP13306777 A JP 13306777A JP S5466785 A JPS5466785 A JP S5466785A
- Authority
- JP
- Japan
- Prior art keywords
- region
- gate
- current
- potential
- mua
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/65—Integrated injection logic
Landscapes
- Bipolar Integrated Circuits (AREA)
- Logic Circuits (AREA)
Abstract
PURPOSE:To obtain the IC including I<2>L having sufficient operating margin, by preventing the lifting up of ground line. CONSTITUTION:The regions 1a and 2a of the N type epitaxial layer are isolated with isolation diffusion region 1, and longitudinal NPN transistor and transversal PNP taansistor are provided in these regions, and the I<2>L gate circuit is constituted by taking the collector of PNP element and the base of NPN element common. Thus, the region 1a is operated in high speed more than 1 MHz, the current of several tens to several hundreds muA per I<2>L gate is flowed, the region 2 is operated in low speed and the current is taken around 1 muA per gate. With this constitution, the potential at the epitaxial layer of the region 1a remote from the ground line 2 connected to the ground pad 4 is increased, but the current consumption flowed to the region 2b is slight, then the potential fluctuation of the region 2b by the resistance of the wiring 3 is less as if it is negligible and no potential increase is caused.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13306777A JPS5466785A (en) | 1977-11-08 | 1977-11-08 | Semiconductor integrated circuit device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13306777A JPS5466785A (en) | 1977-11-08 | 1977-11-08 | Semiconductor integrated circuit device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5466785A true JPS5466785A (en) | 1979-05-29 |
| JPS6129548B2 JPS6129548B2 (en) | 1986-07-07 |
Family
ID=15096054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13306777A Granted JPS5466785A (en) | 1977-11-08 | 1977-11-08 | Semiconductor integrated circuit device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5466785A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55107256A (en) * | 1979-02-08 | 1980-08-16 | Mitsubishi Electric Corp | Iil integrated circuit device |
-
1977
- 1977-11-08 JP JP13306777A patent/JPS5466785A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55107256A (en) * | 1979-02-08 | 1980-08-16 | Mitsubishi Electric Corp | Iil integrated circuit device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6129548B2 (en) | 1986-07-07 |
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