JPS5497546A - Etching method of permalloy thin layer - Google Patents

Etching method of permalloy thin layer

Info

Publication number
JPS5497546A
JPS5497546A JP549578A JP549578A JPS5497546A JP S5497546 A JPS5497546 A JP S5497546A JP 549578 A JP549578 A JP 549578A JP 549578 A JP549578 A JP 549578A JP S5497546 A JPS5497546 A JP S5497546A
Authority
JP
Japan
Prior art keywords
permalloy
layer
temperature
dipped
thin layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP549578A
Other languages
Japanese (ja)
Other versions
JPS5743149B2 (en
Inventor
Tomio Kume
Shoichi Tsutsumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP549578A priority Critical patent/JPS5497546A/en
Publication of JPS5497546A publication Critical patent/JPS5497546A/en
Publication of JPS5743149B2 publication Critical patent/JPS5743149B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Magnetic Heads (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE: A resist layer is deposited onto a permalloy consisting of two continuous layers, first layer formed at a high temperature and a second layer formed at a low temperature. When dipped into anetching solution, this permalloy construction allows the periphery of pattern to be gradually etched away in tapered form.
CONSTITUTION: A permalloy layer 4 is formed by metallizing or similar means onto a substrate 1 maintained at a temperature of 40 to 250°C, next, layer of permalloy 4a is formed on the first one at a substrate temperature of about 30°C. The resulted two-layered permalloy 4.4a is coated with a resist layer 5 by using know method, and then dipped into etching solution consisting of sulfuric acid, H2O2 and water containing a small quantity of HF of NH4F and surfactant. Etching is continued until the permalloy layer 4 reaches into a tapered form.
COPYRIGHT: (C)1979,JPO&Japio
JP549578A 1978-01-20 1978-01-20 Etching method of permalloy thin layer Granted JPS5497546A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP549578A JPS5497546A (en) 1978-01-20 1978-01-20 Etching method of permalloy thin layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP549578A JPS5497546A (en) 1978-01-20 1978-01-20 Etching method of permalloy thin layer

Publications (2)

Publication Number Publication Date
JPS5497546A true JPS5497546A (en) 1979-08-01
JPS5743149B2 JPS5743149B2 (en) 1982-09-13

Family

ID=11612804

Family Applications (1)

Application Number Title Priority Date Filing Date
JP549578A Granted JPS5497546A (en) 1978-01-20 1978-01-20 Etching method of permalloy thin layer

Country Status (1)

Country Link
JP (1) JPS5497546A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6218612A (en) * 1985-07-17 1987-01-27 Nec Corp Thin film magnetic head
US4704188A (en) * 1983-12-23 1987-11-03 Honeywell Inc. Wet chemical etching of crxsiynz
US5792265A (en) * 1993-07-15 1998-08-11 Mahle Gmbh Device and process for producing reinforcing layers on cylinder running surfaces of internal combustion engines and the like
EP0918081A1 (en) * 1997-11-21 1999-05-26 International Business Machines Corporation Etching composition and use

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4704188A (en) * 1983-12-23 1987-11-03 Honeywell Inc. Wet chemical etching of crxsiynz
JPS6218612A (en) * 1985-07-17 1987-01-27 Nec Corp Thin film magnetic head
US5792265A (en) * 1993-07-15 1998-08-11 Mahle Gmbh Device and process for producing reinforcing layers on cylinder running surfaces of internal combustion engines and the like
WO2004074554A1 (en) * 1993-07-15 2004-09-02 Kurt Maier Device and method for producing armoured layers on the cylinder bearing surfaces of internal combustion engines or similar
EP0918081A1 (en) * 1997-11-21 1999-05-26 International Business Machines Corporation Etching composition and use

Also Published As

Publication number Publication date
JPS5743149B2 (en) 1982-09-13

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