JPS5526598A - Optical mask for patterning using photosensitive chalcogenide - Google Patents

Optical mask for patterning using photosensitive chalcogenide

Info

Publication number
JPS5526598A
JPS5526598A JP9615179A JP9615179A JPS5526598A JP S5526598 A JPS5526598 A JP S5526598A JP 9615179 A JP9615179 A JP 9615179A JP 9615179 A JP9615179 A JP 9615179A JP S5526598 A JPS5526598 A JP S5526598A
Authority
JP
Japan
Prior art keywords
layer
regions
silver
substrate
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9615179A
Other languages
Japanese (ja)
Inventor
Akira Yoshikawa
Haruo Nagai
Osamu Ochi
Kazuko Nakano
Yoshihiko Mizushima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9615179A priority Critical patent/JPS5526598A/en
Publication of JPS5526598A publication Critical patent/JPS5526598A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To make the adhesiveness to substrates good and make the photosensitivity of the photosensitive chalcogenide layer formed conspicuous by forming the specific amorphous chalcogenide layer to be doped with silver by a sputtering method. CONSTITUTION:An amorphous chalcogenide layer 22 having the composition of Se 75 to 95mole% and Ge5 to 25mole% is provided to a film thickness 4000Angstrom or under by a sputtering method in inert gas of low pressure on a light transmittable substrate 21, after which the substrate is dipped in a solution containing Ag<+>, whereby the photosensitive chalcogenide layer 24 laminated with a silver layer 23 of a film thickness 100Angstrom or under on the layer 22 is formed. Next, the layer 24 is exposed through an optical mask 25, whereby the regions 22' doped with silver by the layer 23 are formed. Next, the layers 23 remaining on the regions other than the regions 22' are dissolved and removed by the first etchant which removes silver, after which the regions other than the regions 22' are dissolved and removed from the substrate 21 by the second etchant being an alkaline solution, causing the resions 22' to remain in pattern form on the substrate 21.
JP9615179A 1979-07-30 1979-07-30 Optical mask for patterning using photosensitive chalcogenide Pending JPS5526598A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9615179A JPS5526598A (en) 1979-07-30 1979-07-30 Optical mask for patterning using photosensitive chalcogenide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9615179A JPS5526598A (en) 1979-07-30 1979-07-30 Optical mask for patterning using photosensitive chalcogenide

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP51066879A Division JPS5934295B2 (en) 1976-06-08 1976-06-08 Photosensitive material for pattern formation having a photosensitive chalcogenide layer and method for producing the same; optical mask for pattern formation using the photosensitive chalcogenide layer and pattern forming method

Publications (1)

Publication Number Publication Date
JPS5526598A true JPS5526598A (en) 1980-02-26

Family

ID=14157371

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9615179A Pending JPS5526598A (en) 1979-07-30 1979-07-30 Optical mask for patterning using photosensitive chalcogenide

Country Status (1)

Country Link
JP (1) JPS5526598A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4825533A (en) * 1971-08-02 1973-04-03
JPS5018032A (en) * 1973-06-18 1975-02-26
JPS5099323A (en) * 1973-12-28 1975-08-07
JPS5496152A (en) * 1978-01-11 1979-07-30 Matec Spa Method and circular knitting machine for forming knitted product

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4825533A (en) * 1971-08-02 1973-04-03
JPS5018032A (en) * 1973-06-18 1975-02-26
JPS5099323A (en) * 1973-12-28 1975-08-07
JPS5496152A (en) * 1978-01-11 1979-07-30 Matec Spa Method and circular knitting machine for forming knitted product

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